JP2006013390A5 - - Google Patents
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- Publication number
- JP2006013390A5 JP2006013390A5 JP2004192094A JP2004192094A JP2006013390A5 JP 2006013390 A5 JP2006013390 A5 JP 2006013390A5 JP 2004192094 A JP2004192094 A JP 2004192094A JP 2004192094 A JP2004192094 A JP 2004192094A JP 2006013390 A5 JP2006013390 A5 JP 2006013390A5
- Authority
- JP
- Japan
- Prior art keywords
- opening
- electrode
- substrate
- deflector
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000758 substrate Substances 0.000 claims 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000002245 particle Substances 0.000 claims 2
- 235000012239 silicon dioxide Nutrition 0.000 claims 2
- 239000000377 silicon dioxide Substances 0.000 claims 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004192094A JP4477435B2 (ja) | 2004-06-29 | 2004-06-29 | 偏向器作製方法、荷電粒子線露光装置及びデバイス製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004192094A JP4477435B2 (ja) | 2004-06-29 | 2004-06-29 | 偏向器作製方法、荷電粒子線露光装置及びデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006013390A JP2006013390A (ja) | 2006-01-12 |
| JP2006013390A5 true JP2006013390A5 (https=) | 2007-08-09 |
| JP4477435B2 JP4477435B2 (ja) | 2010-06-09 |
Family
ID=35780228
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004192094A Expired - Fee Related JP4477435B2 (ja) | 2004-06-29 | 2004-06-29 | 偏向器作製方法、荷電粒子線露光装置及びデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4477435B2 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5536322B2 (ja) * | 2007-10-09 | 2014-07-02 | 新光電気工業株式会社 | 基板の製造方法 |
| JP7016309B2 (ja) * | 2018-09-19 | 2022-02-04 | 東芝デバイス＆ストレージ株式会社 | 半導体装置 |
| JP7492929B2 (ja) * | 2021-02-19 | 2024-05-30 | 株式会社東芝 | 半導体装置、荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム照射装置 |
| CN117957630A (zh) * | 2021-09-24 | 2024-04-30 | 华为技术有限公司 | 带电粒子束系统、粒子束偏转器及其制作方法 |
-
2004
- 2004-06-29 JP JP2004192094A patent/JP4477435B2/ja not_active Expired - Fee Related
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