JP2006005358A5 - - Google Patents

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Publication number
JP2006005358A5
JP2006005358A5 JP2005175893A JP2005175893A JP2006005358A5 JP 2006005358 A5 JP2006005358 A5 JP 2006005358A5 JP 2005175893 A JP2005175893 A JP 2005175893A JP 2005175893 A JP2005175893 A JP 2005175893A JP 2006005358 A5 JP2006005358 A5 JP 2006005358A5
Authority
JP
Japan
Prior art keywords
polishing
layer
polishing pad
pressure relief
relief passage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005175893A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006005358A (ja
JP4761846B2 (ja
Filing date
Publication date
Priority claimed from US10/869,657 external-priority patent/US7252871B2/en
Application filed filed Critical
Publication of JP2006005358A publication Critical patent/JP2006005358A/ja
Publication of JP2006005358A5 publication Critical patent/JP2006005358A5/ja
Application granted granted Critical
Publication of JP4761846B2 publication Critical patent/JP4761846B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2005175893A 2004-06-16 2005-06-16 圧力逃がし通路を有する研磨パッド Expired - Lifetime JP4761846B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/869,657 US7252871B2 (en) 2004-06-16 2004-06-16 Polishing pad having a pressure relief channel
US10/869,657 2004-06-16

Publications (3)

Publication Number Publication Date
JP2006005358A JP2006005358A (ja) 2006-01-05
JP2006005358A5 true JP2006005358A5 (enExample) 2008-07-17
JP4761846B2 JP4761846B2 (ja) 2011-08-31

Family

ID=35480929

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005175893A Expired - Lifetime JP4761846B2 (ja) 2004-06-16 2005-06-16 圧力逃がし通路を有する研磨パッド

Country Status (5)

Country Link
US (1) US7252871B2 (enExample)
JP (1) JP4761846B2 (enExample)
KR (1) KR20060048382A (enExample)
CN (1) CN100388431C (enExample)
TW (1) TW200602156A (enExample)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101294863B1 (ko) * 2006-02-06 2013-08-08 도레이 카부시키가이샤 연마 패드 및 연마 장치
US7455571B1 (en) * 2007-06-20 2008-11-25 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Window polishing pad
JP2011517111A (ja) * 2008-04-11 2011-05-26 イノパッド，インコーポレイテッド ボイドネットワークを有する化学機械的平坦化パッド
US9017140B2 (en) 2010-01-13 2015-04-28 Nexplanar Corporation CMP pad with local area transparency
JP2012106328A (ja) * 2010-03-25 2012-06-07 Toyo Tire & Rubber Co Ltd 積層研磨パッド
US9156124B2 (en) 2010-07-08 2015-10-13 Nexplanar Corporation Soft polishing pad for polishing a semiconductor substrate
TWI635929B (zh) 2013-07-11 2018-09-21 日商荏原製作所股份有限公司 研磨裝置及研磨狀態監視方法
US9873180B2 (en) 2014-10-17 2018-01-23 Applied Materials, Inc. CMP pad construction with composite material properties using additive manufacturing processes
US10875145B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US9776361B2 (en) 2014-10-17 2017-10-03 Applied Materials, Inc. Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
CN107078048B (zh) 2014-10-17 2021-08-13 应用材料公司 使用加成制造工艺的具复合材料特性的cmp衬垫建构
US10821573B2 (en) 2014-10-17 2020-11-03 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US11745302B2 (en) 2014-10-17 2023-09-05 Applied Materials, Inc. Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
US10399201B2 (en) 2014-10-17 2019-09-03 Applied Materials, Inc. Advanced polishing pads having compositional gradients by use of an additive manufacturing process
US10875153B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Advanced polishing pad materials and formulations
KR20230169424A (ko) 2015-10-30 2023-12-15 어플라이드 머티어리얼스, 인코포레이티드 원하는 제타 전위를 가진 연마 제품을 형성하는 장치 및 방법
US10593574B2 (en) 2015-11-06 2020-03-17 Applied Materials, Inc. Techniques for combining CMP process tracking data with 3D printed CMP consumables
US10391605B2 (en) 2016-01-19 2019-08-27 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
US11123215B2 (en) 2016-08-16 2021-09-21 Renuka Pradhan Pressure relief apparatus for wound
US10596763B2 (en) 2017-04-21 2020-03-24 Applied Materials, Inc. Additive manufacturing with array of energy sources
US11471999B2 (en) 2017-07-26 2022-10-18 Applied Materials, Inc. Integrated abrasive polishing pads and manufacturing methods
US11072050B2 (en) 2017-08-04 2021-07-27 Applied Materials, Inc. Polishing pad with window and manufacturing methods thereof
WO2019032286A1 (en) 2017-08-07 2019-02-14 Applied Materials, Inc. ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME
CN112654655A (zh) 2018-09-04 2021-04-13 应用材料公司 先进抛光垫配方
US11813712B2 (en) 2019-12-20 2023-11-14 Applied Materials, Inc. Polishing pads having selectively arranged porosity
US11806829B2 (en) 2020-06-19 2023-11-07 Applied Materials, Inc. Advanced polishing pads and related polishing pad manufacturing methods
US11878389B2 (en) 2021-02-10 2024-01-23 Applied Materials, Inc. Structures formed using an additive manufacturing process for regenerating surface texture in situ

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08108372A (ja) * 1994-10-07 1996-04-30 Mitsubishi Electric Corp 研磨布
US5605760A (en) 1995-08-21 1997-02-25 Rodel, Inc. Polishing pads
JP2000254860A (ja) * 1999-03-08 2000-09-19 Nikon Corp 研磨装置
JP2001150333A (ja) * 1999-11-29 2001-06-05 Nec Corp 研磨パッド
JP2002001647A (ja) * 2000-06-19 2002-01-08 Rodel Nitta Co 研磨パッド
JP2002001652A (ja) * 2000-06-22 2002-01-08 Nikon Corp 研磨パッド及び研磨装置及び素子製造方法
US6623331B2 (en) * 2001-02-16 2003-09-23 Cabot Microelectronics Corporation Polishing disk with end-point detection port
JP2003163191A (ja) * 2001-11-28 2003-06-06 Tokyo Seimitsu Co Ltd 機械化学的研磨装置用の研磨パッド
US6599765B1 (en) * 2001-12-12 2003-07-29 Lam Research Corporation Apparatus and method for providing a signal port in a polishing pad for optical endpoint detection
JP3878016B2 (ja) * 2001-12-28 2007-02-07 株式会社荏原製作所 基板研磨装置
JP2003300150A (ja) * 2002-04-03 2003-10-21 Sony Corp 研磨パッド、研磨装置および研磨方法
CN1302522C (zh) * 2002-05-15 2007-02-28 旺宏电子股份有限公司 一种化学机械抛光装置的终点侦测系统
US6884156B2 (en) * 2003-06-17 2005-04-26 Cabot Microelectronics Corporation Multi-layer polishing pad material for CMP

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