JP2005538535A - 熱的インターコネクトおよびインターフェースシステム、製造方法およびその使用 - Google Patents
熱的インターコネクトおよびインターフェースシステム、製造方法およびその使用 Download PDFInfo
- Publication number
- JP2005538535A JP2005538535A JP2004521992A JP2004521992A JP2005538535A JP 2005538535 A JP2005538535 A JP 2005538535A JP 2004521992 A JP2004521992 A JP 2004521992A JP 2004521992 A JP2004521992 A JP 2004521992A JP 2005538535 A JP2005538535 A JP 2005538535A
- Authority
- JP
- Japan
- Prior art keywords
- component
- thermal
- resin
- layered
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3735—Laminates or multilayers, e.g. direct bond copper ceramic substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3737—Organic materials with or without a thermoconductive filler
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/42—Fillings or auxiliary members in containers or encapsulations selected or arranged to facilitate heating or cooling
- H01L23/427—Cooling by change of state, e.g. use of heat pipes
- H01L23/4275—Cooling by change of state, e.g. use of heat pipes by melting or evaporation of solids
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/2039—Modifications to facilitate cooling, ventilating, or heating characterised by the heat transfer by conduction from the heat generating element to a dissipating body
- H05K7/20436—Inner thermal coupling elements in heat dissipating housings, e.g. protrusions or depressions integrally formed in the housing
- H05K7/20445—Inner thermal coupling elements in heat dissipating housings, e.g. protrusions or depressions integrally formed in the housing the coupling element being an additional piece, e.g. thermal standoff
- H05K7/20472—Sheet interfaces
- H05K7/20481—Sheet interfaces characterised by the material composition exhibiting specific thermal properties
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Materials Engineering (AREA)
- Thermal Sciences (AREA)
- Ceramic Engineering (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US39629402P | 2002-07-15 | 2002-07-15 | |
| PCT/US2003/022710 WO2004008497A2 (en) | 2002-07-15 | 2003-07-15 | Thermal interconnect and interface systems, methods of production and uses thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005538535A true JP2005538535A (ja) | 2005-12-15 |
| JP2005538535A5 JP2005538535A5 (enExample) | 2006-08-31 |
Family
ID=30116003
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004521992A Pending JP2005538535A (ja) | 2002-07-15 | 2003-07-15 | 熱的インターコネクトおよびインターフェースシステム、製造方法およびその使用 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20060040112A1 (enExample) |
| EP (1) | EP1531985A4 (enExample) |
| JP (1) | JP2005538535A (enExample) |
| CN (1) | CN1681648A (enExample) |
| AU (1) | AU2003254046A1 (enExample) |
| TW (1) | TW200409246A (enExample) |
| WO (1) | WO2004008497A2 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016171269A (ja) * | 2015-03-16 | 2016-09-23 | 三菱電機株式会社 | 電力用半導体装置 |
| JP2018538690A (ja) * | 2015-12-03 | 2018-12-27 | 深▲セン▼▲徳▼邦界面材料有限公司Shenzhen Darbond Interface Materials Co.,Ltd. | ゴム変性の相変化熱伝導材料及びその製造方法 |
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7210227B2 (en) * | 2002-11-26 | 2007-05-01 | Intel Corporation | Decreasing thermal contact resistance at a material interface |
| DE10319888A1 (de) | 2003-04-25 | 2004-11-25 | Siemens Ag | Lotmaterial auf SnAgCu-Basis |
| JP4551074B2 (ja) * | 2003-10-07 | 2010-09-22 | 信越化学工業株式会社 | 硬化性オルガノポリシロキサン組成物および半導体装置 |
| US7261389B2 (en) * | 2003-11-26 | 2007-08-28 | Fuji Xerox Co., Ltd. | Systems and methods for dissipating heat into a fluid ejector carriage device |
| US7192116B2 (en) * | 2003-11-26 | 2007-03-20 | Fuji Xerox Co., Ltd. | Systems and methods for dissipating heat from a fluid ejector carriage |
| EP1731002A4 (en) * | 2004-03-30 | 2010-05-26 | Honeywell Int Inc | HEAT DISTRIBUTION STRUCTURES, INTEGRATED CIRCUITS, METHOD FOR GENERATING HEAT DISTRIBUTION CONSTRUCTIONS, AND METHOD FOR GENERATING INTEGRATED CIRCUITS |
| JP2005317796A (ja) * | 2004-04-28 | 2005-11-10 | Toshiba Corp | ポンプ、冷却装置および電子機器 |
| CN100389166C (zh) * | 2004-04-29 | 2008-05-21 | 鸿富锦精密工业(深圳)有限公司 | 一种热界面材料及其制造方法 |
| US7319048B2 (en) * | 2004-09-03 | 2008-01-15 | Intel Corporation | Electronic assemblies having a low processing temperature |
| DE102005045767B4 (de) * | 2005-09-23 | 2012-03-29 | Infineon Technologies Ag | Verfahren zur Herstellung eines Halbleiterbauteils mit Kunststoffgehäusemasse |
| US20070069373A1 (en) * | 2005-09-29 | 2007-03-29 | Roth Arti P | Device with surface cooling and method of making |
| WO2007076014A2 (en) * | 2005-12-23 | 2007-07-05 | World Properties, Inc. | Thermal management circuit materials, method of manufacture thereof, and articles formed therefrom |
| US8344523B2 (en) | 2006-05-08 | 2013-01-01 | Diemat, Inc. | Conductive composition |
| US20070256783A1 (en) * | 2006-05-08 | 2007-11-08 | Dietz Raymond L | Thermally enhanced adhesive paste |
| US20080296756A1 (en) * | 2007-05-30 | 2008-12-04 | Koch James L | Heat spreader compositions and materials, integrated circuitry, methods of production and uses thereof |
| US8702919B2 (en) * | 2007-08-13 | 2014-04-22 | Honeywell International Inc. | Target designs and related methods for coupled target assemblies, methods of production and uses thereof |
| US20100328895A1 (en) * | 2007-09-11 | 2010-12-30 | Dorab Bhagwagar | Composite, Thermal Interface Material Containing the Composite, and Methods for Their Preparation and Use |
| KR20100069667A (ko) * | 2007-09-11 | 2010-06-24 | 다우 코닝 코포레이션 | 열계면재료, 열계면재료를 포함하는 전자장치, 그리고 이들의 제조방법 및 용도 |
| US20090111925A1 (en) * | 2007-10-31 | 2009-04-30 | Burnham Kikue S | Thermal interface materials, methods of production and uses thereof |
| US20100319898A1 (en) * | 2008-03-13 | 2010-12-23 | Underwood Patrick K | Thermal interconnect and integrated interface systems, methods of production and uses thereof |
| KR20100062550A (ko) * | 2008-12-02 | 2010-06-10 | 삼성전기주식회사 | 패턴부가 형성된 솔더 레지스트층을 구비한 패키지 기판 및그 제조방법 |
| WO2010104542A1 (en) | 2009-03-02 | 2010-09-16 | Honeywell International Inc. | Thermal interface material and method of making and using the same |
| WO2014074538A1 (en) * | 2012-11-09 | 2014-05-15 | 3M Innovative Properties Company | Thermal interface compositions and methods for making and using same |
| CN105229763B (zh) * | 2013-02-27 | 2019-06-14 | 翱旭公司 | 能量存储装置组件 |
| US9738976B2 (en) | 2013-02-27 | 2017-08-22 | Ioxus, Inc. | Energy storage device assembly |
| US9899643B2 (en) | 2013-02-27 | 2018-02-20 | Ioxus, Inc. | Energy storage device assembly |
| US9892868B2 (en) | 2013-06-21 | 2018-02-13 | Ioxus, Inc. | Energy storage device assembly |
| EP3077578A4 (en) | 2013-12-05 | 2017-07-26 | Honeywell International Inc. | Stannous methansulfonate solution with adjusted ph |
| US9826662B2 (en) * | 2013-12-12 | 2017-11-21 | General Electric Company | Reusable phase-change thermal interface structures |
| PL3166999T3 (pl) | 2014-07-07 | 2023-07-03 | Honeywell International Inc. | Materiał termoprzewodzący ze zmiataczem jonów |
| CN112080258A (zh) | 2014-12-05 | 2020-12-15 | 霍尼韦尔国际公司 | 具有低热阻的高性能热界面材料 |
| US10312177B2 (en) | 2015-11-17 | 2019-06-04 | Honeywell International Inc. | Thermal interface materials including a coloring agent |
| WO2017152353A1 (en) * | 2016-03-08 | 2017-09-14 | Honeywell International Inc. | Phase change material |
| US10501671B2 (en) | 2016-07-26 | 2019-12-10 | Honeywell International Inc. | Gel-type thermal interface material |
| FR3061989B1 (fr) * | 2017-01-18 | 2020-02-14 | Safran | Procede de fabrication d'un module electronique de puissance par fabrication additive, substrat et module associes |
| US11041103B2 (en) | 2017-09-08 | 2021-06-22 | Honeywell International Inc. | Silicone-free thermal gel |
| US10428256B2 (en) | 2017-10-23 | 2019-10-01 | Honeywell International Inc. | Releasable thermal gel |
| CN108235666B (zh) * | 2018-02-11 | 2024-03-01 | 中国科学院工程热物理研究所 | 表面调控的柔性微槽群热沉、散热装置和方法 |
| US11072706B2 (en) | 2018-02-15 | 2021-07-27 | Honeywell International Inc. | Gel-type thermal interface material |
| US11373921B2 (en) | 2019-04-23 | 2022-06-28 | Honeywell International Inc. | Gel-type thermal interface material with low pre-curing viscosity and elastic properties post-curing |
| CN116640366A (zh) * | 2023-06-27 | 2023-08-25 | 广东力王新材料有限公司 | 一种橡胶相变材料及其制备工艺 |
| US20250214088A1 (en) * | 2023-12-28 | 2025-07-03 | Lenovo Enterprise Solutions (Singapore) Pte Ltd. | Removing a ferromagnetic liquid from a surface |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2228814B1 (enExample) * | 1973-05-11 | 1975-11-21 | Rhone Poulenc Ind | |
| EP0042693B1 (en) * | 1980-06-21 | 1985-03-27 | LUCAS INDUSTRIES public limited company | Semi-conductor power device assembly and method of manufacture thereof |
| US4584336A (en) * | 1984-10-29 | 1986-04-22 | Sws Silicones Corporation | Thermally conductive room temperature vulcanizable compositions |
| US5440230A (en) * | 1993-04-02 | 1995-08-08 | Heflinger; Bruce L. | Combinatorial signature for component identification |
| US5679457A (en) * | 1995-05-19 | 1997-10-21 | The Bergquist Company | Thermally conductive interface for electronic devices |
| US5847929A (en) * | 1996-06-28 | 1998-12-08 | International Business Machines Corporation | Attaching heat sinks directly to flip chips and ceramic chip carriers |
| US6084775A (en) * | 1998-12-09 | 2000-07-04 | International Business Machines Corporation | Heatsink and package structures with fusible release layer |
| US6238596B1 (en) * | 1999-03-09 | 2001-05-29 | Johnson Matthey Electronics, Inc. | Compliant and crosslinkable thermal interface materials |
| US6605238B2 (en) * | 1999-09-17 | 2003-08-12 | Honeywell International Inc. | Compliant and crosslinkable thermal interface materials |
| US6653730B2 (en) * | 2000-12-14 | 2003-11-25 | Intel Corporation | Electronic assembly with high capacity thermal interface |
-
2003
- 2003-07-15 AU AU2003254046A patent/AU2003254046A1/en not_active Abandoned
- 2003-07-15 US US10/519,337 patent/US20060040112A1/en not_active Abandoned
- 2003-07-15 TW TW92119265A patent/TW200409246A/zh unknown
- 2003-07-15 CN CNA038218844A patent/CN1681648A/zh active Pending
- 2003-07-15 WO PCT/US2003/022710 patent/WO2004008497A2/en not_active Ceased
- 2003-07-15 EP EP03764825A patent/EP1531985A4/en not_active Withdrawn
- 2003-07-15 JP JP2004521992A patent/JP2005538535A/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016171269A (ja) * | 2015-03-16 | 2016-09-23 | 三菱電機株式会社 | 電力用半導体装置 |
| JP2018538690A (ja) * | 2015-12-03 | 2018-12-27 | 深▲セン▼▲徳▼邦界面材料有限公司Shenzhen Darbond Interface Materials Co.,Ltd. | ゴム変性の相変化熱伝導材料及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1531985A4 (en) | 2008-03-19 |
| EP1531985A2 (en) | 2005-05-25 |
| AU2003254046A8 (en) | 2004-02-02 |
| AU2003254046A1 (en) | 2004-02-02 |
| US20060040112A1 (en) | 2006-02-23 |
| TW200409246A (en) | 2004-06-01 |
| WO2004008497A3 (en) | 2004-04-01 |
| WO2004008497A2 (en) | 2004-01-22 |
| WO2004008497B1 (en) | 2004-05-06 |
| CN1681648A (zh) | 2005-10-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2005538535A (ja) | 熱的インターコネクトおよびインターフェースシステム、製造方法およびその使用 | |
| US20070164424A1 (en) | Thermal interconnect and interface systems, methods of production and uses thereof | |
| KR100685013B1 (ko) | 열적 계면 물질 | |
| US20100319898A1 (en) | Thermal interconnect and integrated interface systems, methods of production and uses thereof | |
| WO2004090938A9 (en) | Thermal interconnect and interface systems, methods of production and uses thereof | |
| US20080291634A1 (en) | Thermal interconnect and interface materials, methods of production and uses thereof | |
| EP1974378A2 (en) | Thermal interconnect and interface systems, methods of production and uses thereof | |
| TW201918536A (zh) | 薄膜狀接著劑、使用薄膜狀接著劑之半導體封裝體之製造方法 | |
| TWI835762B (zh) | 積層體及電子裝置 | |
| JP4237505B2 (ja) | インターフェース材料、ならびにその製造方法および使用方法 | |
| US7608324B2 (en) | Interface materials and methods of production and use thereof | |
| US20050222323A1 (en) | Thermally conductive coating compositions, methods of production and uses thereof | |
| KR20050019873A (ko) | 열적 상호연결 및 인터페이스 시스템, 이들의 제조 방법및 용도 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060713 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060713 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20090624 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090630 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20091201 |