JP2005534921A - Ｘ線を方向付けるための光学デバイス及びその方法 - Google Patents

Ｘ線を方向付けるための光学デバイス及びその方法 Download PDF

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JP2005534921A
JP2005534921A JP2004526172A JP2004526172A JP2005534921A JP 2005534921 A JP2005534921 A JP 2005534921A JP 2004526172 A JP2004526172 A JP 2004526172A JP 2004526172 A JP2004526172 A JP 2004526172A JP 2005534921 A JP2005534921 A JP 2005534921A
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optical
crystal
crystals
ray source
ray
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ズー チェン
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エックス−レイ オプティカル システムズ インコーポレーテッド
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Particle Accelerators (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004526172A 2002-08-02 2003-07-25 Ｘ線を方向付けるための光学デバイス及びその方法 Pending JP2005534921A (ja)

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US40080902P 2002-08-02 2002-08-02
PCT/US2003/023412 WO2004013867A2 (en) 2002-08-02 2003-07-25 An optical device for directing x-rays having a plurality of optical crystals

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JP2005534921A true JP2005534921A (ja) 2005-11-17
JP2005534921A5 JP2005534921A5 (https=) 2006-08-31

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US (1) US7035374B2 (https=)
EP (1) EP1527461B1 (https=)
JP (1) JP2005534921A (https=)
AT (1) ATE488011T1 (https=)
AU (1) AU2003256831A1 (https=)
DE (1) DE60334910D1 (https=)
WO (1) WO2004013867A2 (https=)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008191547A (ja) * 2007-02-07 2008-08-21 Japan Atomic Energy Agency 多層膜不等間隔溝凹面回折格子及び同分光装置
JP2009503546A (ja) * 2005-08-01 2009-01-29 ザ リサーチ ファウンデーション オブ ステート ユニバーシティ オブ ニューヨーク 点焦点湾曲モノクロメータ光学体を使用するｘ線結像系
JP2010014418A (ja) * 2008-07-01 2010-01-21 Japan Atomic Energy Agency 多層膜回折格子分光装置
KR101316794B1 (ko) 2012-06-25 2013-10-11 한국과학기술연구원 극소각 중성자 산란 장치의 중성자 집속 장치
JP2014532866A (ja) * 2011-10-26 2014-12-08 エックス−レイ オプティカル システムズ インコーポレーテッド Ｘ線分析エンジンおよび分析器のために高度に位置合わせされた単色化ｘ線光学素子および支持構造体
JP2019529897A (ja) * 2016-09-15 2019-10-17 ユニバーシティ オブ ワシントンＵｎｉｖｅｒｓｉｔｙ ｏｆ Ｗａｓｈｉｎｇｔｏｎ Ｘ線分光計及びその使用方法

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060153332A1 (en) * 2003-03-27 2006-07-13 Hisayuki Kohno X-ray fluorescence analyzer
JP5031215B2 (ja) * 2004-09-21 2012-09-19 ジョルダン バレー アプライド ラディエイション リミテッド 多機能ｘ線分析システム
JP4121146B2 (ja) * 2005-06-24 2008-07-23 株式会社リガク 双晶解析装置
JP5315251B2 (ja) * 2006-11-16 2013-10-16 エックス−レイ オプティカル システムズ インコーポレーテッド それぞれの結晶方位を持つ多層を有するｘ線集束光学系及びこの光学系を形成する方法
US20090041198A1 (en) * 2007-08-07 2009-02-12 General Electric Company Highly collimated and temporally variable x-ray beams
JP5344123B2 (ja) * 2008-07-18 2013-11-20 独立行政法人 宇宙航空研究開発機構 Ｘ線反射体、ｘ線反射装置およびｘ線反射鏡作成方法
US8116429B2 (en) * 2009-01-29 2012-02-14 The Invention Science Fund I, Llc Diagnostic delivery service
US8130904B2 (en) * 2009-01-29 2012-03-06 The Invention Science Fund I, Llc Diagnostic delivery service
US8130908B2 (en) * 2009-02-23 2012-03-06 X-Ray Optical Systems, Inc. X-ray diffraction apparatus and technique for measuring grain orientation using x-ray focusing optic
US20100310041A1 (en) * 2009-06-03 2010-12-09 Adams William L X-Ray System and Methods with Detector Interior to Focusing Element
US8537967B2 (en) * 2009-09-10 2013-09-17 University Of Washington Short working distance spectrometer and associated devices, systems, and methods
US8058621B2 (en) * 2009-10-26 2011-11-15 General Electric Company Elemental composition detection system and method
US8243878B2 (en) 2010-01-07 2012-08-14 Jordan Valley Semiconductors Ltd. High-resolution X-ray diffraction measurement with enhanced sensitivity
US8687766B2 (en) 2010-07-13 2014-04-01 Jordan Valley Semiconductors Ltd. Enhancing accuracy of fast high-resolution X-ray diffractometry
US8437450B2 (en) 2010-12-02 2013-05-07 Jordan Valley Semiconductors Ltd. Fast measurement of X-ray diffraction from tilted layers
US8781070B2 (en) 2011-08-11 2014-07-15 Jordan Valley Semiconductors Ltd. Detection of wafer-edge defects
EP2745101B1 (en) 2011-08-15 2019-11-06 X-Ray Optical Systems, Inc. X-ray analysis apparatus
CN103946693B (zh) 2011-10-06 2017-05-03 X射线光学系统公司 可移除式x‑射线分析仪用的可移动型运输及屏蔽装置
CN104272424A (zh) * 2012-02-28 2015-01-07 X射线光学系统公司 具有使用多材料x 射线管阳极和单色光学装置产生的多激励能带的x射线分析器
WO2015027225A1 (en) 2013-08-23 2015-02-26 The Schepens Eye Research Institute, Inc. Spatial modeling of visual fields
US9726624B2 (en) 2014-06-18 2017-08-08 Bruker Jv Israel Ltd. Using multiple sources/detectors for high-throughput X-ray topography measurement
WO2016108235A1 (en) * 2014-12-30 2016-07-07 Convergent R.N.R Ltd New constructions of x-ray lenses for converging x-rays
US11250968B2 (en) 2014-12-30 2022-02-15 Convergent R.N.R. Ltd. Constructions of x-ray lenses for converging x-rays
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
FR3079035B1 (fr) * 2018-03-14 2022-10-28 Alpyx Dispositif optique pour rayons x
JP7394464B2 (ja) * 2018-07-04 2023-12-08 株式会社リガク 蛍光ｘ線分析装置
WO2021059271A1 (en) * 2019-09-24 2021-04-01 Convergent R.N.R Ltd X-ray optical arrangement
US11874239B2 (en) * 2022-03-11 2024-01-16 Uchicago Argonne, Llc Advanced X-ray emission spectrometers
US12247934B2 (en) 2022-07-29 2025-03-11 X-Ray Optical Systems, Inc. Polarized, energy dispersive x-ray fluorescence system and method
CN115791855B (zh) * 2022-11-14 2025-03-18 中国科学院上海光学精密机械研究所 基于弯晶耦合的背光x射线衍射成像装置
CN115963126B (zh) * 2022-12-30 2026-03-06 国创科学仪器(苏州)有限公司 实验室谱仪

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02257100A (ja) * 1989-03-29 1990-10-17 Shimadzu Corp ヨハンソン型湾曲結晶の製作方法
JPH04262300A (ja) * 1990-08-29 1992-09-17 Carl Zeiss:Fa レントゲン顕微鏡およびレントゲン画像の形成方法
JPH0763897A (ja) * 1993-08-27 1995-03-10 Rigaku Ind Co Ｘ線分光器
WO2001039211A1 (en) * 1999-11-29 2001-05-31 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3927319A (en) * 1974-06-28 1975-12-16 Univ Southern California Crystal for X-ray crystal spectrometer
NL8302263A (nl) * 1983-06-27 1985-01-16 Philips Nv Roentgen analyse apparaat met dubbel gebogen monochromator kristal.
US5127028A (en) * 1990-08-01 1992-06-30 Wittry David B Diffractord with doubly curved surface steps
US5315113A (en) * 1992-09-29 1994-05-24 The Perkin-Elmer Corporation Scanning and high resolution x-ray photoelectron spectroscopy and imaging
JPH09166488A (ja) * 1995-12-13 1997-06-24 Shimadzu Corp Ｘ線分光器
US5787146A (en) * 1996-10-18 1998-07-28 Spad Technologies, Inc. X-ray imaging system using diffractive x-ray optics for high definition low dosage three dimensional imaging of soft tissue
EP0884736B1 (en) * 1997-06-11 2004-01-28 Istituto Nazionale Di Fisica Nucleare Multi-stepped diffractor constructed with constant step width angle (multi-stepped monochromator)
US6285506B1 (en) * 1999-01-21 2001-09-04 X-Ray Optical Systems, Inc. Curved optical device and method of fabrication
US6606371B2 (en) * 1999-12-20 2003-08-12 Agere Systems Inc. X-ray system

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02257100A (ja) * 1989-03-29 1990-10-17 Shimadzu Corp ヨハンソン型湾曲結晶の製作方法
JPH04262300A (ja) * 1990-08-29 1992-09-17 Carl Zeiss:Fa レントゲン顕微鏡およびレントゲン画像の形成方法
JPH0763897A (ja) * 1993-08-27 1995-03-10 Rigaku Ind Co Ｘ線分光器
WO2001039211A1 (en) * 1999-11-29 2001-05-31 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009503546A (ja) * 2005-08-01 2009-01-29 ザ リサーチ ファウンデーション オブ ステート ユニバーシティ オブ ニューヨーク 点焦点湾曲モノクロメータ光学体を使用するｘ線結像系
JP2008191547A (ja) * 2007-02-07 2008-08-21 Japan Atomic Energy Agency 多層膜不等間隔溝凹面回折格子及び同分光装置
JP2010014418A (ja) * 2008-07-01 2010-01-21 Japan Atomic Energy Agency 多層膜回折格子分光装置
JP2014532866A (ja) * 2011-10-26 2014-12-08 エックス−レイ オプティカル システムズ インコーポレーテッド Ｘ線分析エンジンおよび分析器のために高度に位置合わせされた単色化ｘ線光学素子および支持構造体
US10256002B2 (en) 2011-10-26 2019-04-09 X-Ray Optical Systems, Inc. Support structure and highly aligned monochromatic X-ray optics for X-ray analysis engines and analyzers
KR101316794B1 (ko) 2012-06-25 2013-10-11 한국과학기술연구원 극소각 중성자 산란 장치의 중성자 집속 장치
JP2019529897A (ja) * 2016-09-15 2019-10-17 ユニバーシティ オブ ワシントンＵｎｉｖｅｒｓｉｔｙ ｏｆ Ｗａｓｈｉｎｇｔｏｎ Ｘ線分光計及びその使用方法
US11796490B2 (en) 2016-09-15 2023-10-24 University Of Washington X-ray spectrometer and methods for use
JP7418208B2 (ja) 2016-09-15 2024-01-19 ユニバーシティ オブ ワシントン Ｘ線分光計及びその使用方法

Also Published As

Publication number Publication date
WO2004013867A3 (en) 2004-08-05
ATE488011T1 (de) 2010-11-15
EP1527461A2 (en) 2005-05-04
EP1527461B1 (en) 2010-11-10
US20050201517A1 (en) 2005-09-15
AU2003256831A1 (en) 2004-02-23
US7035374B2 (en) 2006-04-25
DE60334910D1 (de) 2010-12-23
AU2003256831A8 (en) 2004-02-23
WO2004013867A2 (en) 2004-02-12

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