JP2005534016A - 加速度計におけるオフセットの低減 - Google Patents
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/18—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration in two or more dimensions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
- B81B3/0067—Mechanical properties
- B81B3/0072—For controlling internal stress or strain in moving or flexible elements, e.g. stress compensating layers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/0802—Details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/125—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by capacitive pick-up
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/0235—Accelerometers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/05—Type of movement
- B81B2203/051—Translation according to an axis parallel to the substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/05—Type of movement
- B81B2203/055—Translation in a plane parallel to the substrate, i.e. enabling movement along any direction in the plane
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
- G01P2015/0808—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate
- G01P2015/0811—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass
- G01P2015/0814—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass for translational movement of the mass, e.g. shuttle type
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
- G01P2015/0808—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate
- G01P2015/082—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for two degrees of freedom of movement of a single mass
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49007—Indicating transducer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T74/00—Machine element or mechanism
- Y10T74/12—Gyroscopes
- Y10T74/1293—Flexure hinges for gyros
Abstract
Description
Claims (32)
- 基板と;
外周、内周を定める空洞、及び前記内周の一部に沿う複数の細長い指を有するマスと;
前記マスの質量中心に近接して置かれた少なくとも1つのアンカーによって前記基板に取り付けられて前記内周の中に置かれたマス支持構造であって、前記基板の上で前記マスマスを支持し前記基板に対する前記マスの運動を許容する支持構造と;
複数の細長い検知指であって該検知指に対する前記マス指の運動を検知するものであり、前記内周の中で前記マス指のほぼ横側に置かれて、機械的応力が前記マス指と前記検知指を実質的に等しい方法で運動させるように前記少なくとも1つのアンカーに近接して前記基板に取り付けられた検知指とを;
含んでなる加速度計。 - 請求項1の加速度計であって、前記マスの支持構造物は複数の懸架バネと、支持アームとを含んでなり、前記複数の懸架バネは前記マスと前記支持アームの間に配設され、前記支持アームは基板に取り付けられている加速度計。
- 請求項1の加速度計であって、前記マスの支持構造は、単一のアンカーを使用することで前記基板に取り付けられている加速度計。
- 請求項3の加速度計であって、前記単一のアンカーはほぼ正方形のアンカーである加速度計。
- 請求項1の加速度計であって、前記マス支持構造は、前記マスの質量中心に関して実質的に対称に置かれた複数のアンカーを使用することで前記基板に取り付けられている加速度計。
- 請求項2の加速度計であって、前記複数の支持アームは、ほぼ、十字形又はH型に構成されている加速度計。
- 請求項1の加速度計であって、少なくとも1つの前記細長い検知指は、単一の細長いアンカーを使用して、該アンカーに関して該細長い検知指の回転を減少させるために前記基板に取り付けられている加速度計。
- 請求項1の加速度計であって、少なくとも1つの前記細長い検知指は、複数のアンカーを使用して、該複数のアンカーに関して該細長い検知指の回転を減少させるために前記基板に取り付けられている加速度計。
- 請求項1の加速度計であって、前記マス支持構造は前記マスを前記マス内周の中において前記マス外周に向かって支持する加速度計。
- 加速度計のおけるオフセットを低減する方法であって:
外周、内周を定める空洞、及び前記内周の一部に沿う複数の細長い指を有するマスを形成し;
前記マスの前記内周の中に複数のマス支持構造を形成し;
前記マスの前記内周の中に前記マス指のほぼ横側に沿う複数の細長い検知指であって、該複数の検知指に対する前記マスの運動を検知する検知指を形成し;
前記基板の上で前記マスを支持し前記マスの前記基板に対する運動を許容するために、前記マスの質量中心に近接して置かれる少なくとも1つのアンカーにより前記マス支持構造を前記基板に取り付け;
機械的応力が前記複数のマス指と前記複数の検知指を実質的に等しい方法で運動させるように、前記複数の検知指を前記少なくとも1つのアンカーに近接して前記基板に取り付けることを;
含んでなる方法。 - 請求項10の方法であって、前記マス支持構造は複数の懸架バネと、複数の支持アームとを含んでなり、前記懸架バネは前記マスと前記複数の支持アームの間に配設され、前記支持アームは前記基板に取り付けられている方法。
- 請求項10の方法であって、前記マス支持構造を前記基板に取り付けることは単一のアンカーを使用して前記マス支持構造を前記基板に取り付けることを含む方法。
- 請求項12の方法であって、前記単一のアンカーはほぼ正方形のアンカーである方法。
- 請求項10の方法であって、前記マス支持構造を前記基板に取り付けることは、マスの質量中心に関して実質的に対称に配置された複数のアンカーを使用して前記マス支持構造を前記基板に取り付けることを含む方法。
- 請求項11の方法であって、前記支持アームは、ほぼ、十字形又はH型に形成されている方法。
- 請求項10の方法であって、前記複数の細長い検知指を前記基板に取り付けることは、少なくとも1つの前記細長い検知指を単一の細長いアンカーを用いて、該アンカーに関して該細長い検知指の回転を減少させるために、前記基板に取り付けることを含む方法。
- 請求項10の方法であって、前記複数の細長い検知指を前記基板に取り付けることは、少なくとも1つの前記細長い検知指を複数のアンカーを用いて、該複数のアンカーに関して該細長い検知指の回転を減少させるために、前記基板に取り付けることを含む方法。
- 請求項10の方法であって、前記マス支持構造は前記マスを前記マス内周の中で前記マス外周に向かって支持する方法。
- 基板と;
外周、内周を定める空洞、及び前記内周の一部に沿う複数の細長い指を有するマスと;
前記マスの質量中心に近接して置かれた少なくとも1つのアンカーによって前記基板に取り付けられ前記内周の中に置かれたマス支持構造であって、前記基板を前記マスの上で支持して前記基板に対する前記マスの運動を許容するマス支持構造と;
複数の細長い検知指であって該検知指に対する前記マス指の運動を検知するものであり、前記内周の中において前記マス指のほぼ横側に置かれ、かつ、機械的応力が前記複数のマス指と前記複数の検知指を実質的に等しい方法で運動させるように、前記少なくとも1つのアンカーに近接して前記マス支持構造に取り付けられた検知指とを;
含んでなる加速度計。 - 請求項19の加速度計であって、前記検知指は前記マス支持構造から電気的に切り離されている加速度計。
- 請求項19の加速度計であって、前記マス支持構造は複数の懸架バネと、複数の支持アームとを含み、前記複数の懸架バネは前記マスと前記複数の支持アームの間に配設され、前記支持アームは前記基板に取り付けられている加速度計。
- 請求項19の加速度計であって、前記マス支持構造は単一のアンカーを使用して前記基板に取り付けられている加速度計。
- 請求項22の加速度計であって、前記単一のアンカーはほぼ正方形のアンカーである加速度計。
- 請求項19の加速度計であって、前記マス支持構造は前記マスの質量中心に関して実質的に対称に置かれた複数のアンカーを使用して前記基板に取り付けられている加速度計。
- 請求項21の加速度計であって、前記複数の支持アームは、ほぼ、十字形又はH型に構成されている加速度計。
- 請求項19の加速度計であって、少なくとも1つの前記細長い指は、単一の細長いアンカーを使用して、該アンカーに関して該細長い検知指の回転を減少させるために、前記基板に取り付けられている加速度計。
- 請求項19の加速度計であって、少なくとも1つの前記細長い指は、複数のアンカーを使用して、該複数のアンカーに関して該細長い検知指の回転を減少させるために、前記基板に取り付けられている加速度計。
- 請求項19の加速度計であって、前記マス支持構造は前記マスを前記マスの内周の中において前記マスの外周に向かって支持する加速度計。
- 外周、内周を定める空洞、及び前記内周の一部に沿う複数の細長い検知指を有するフレームと;
前記フレームの内周の中に置かれ、前記複数の検知指のほぼ横側に置かれた複数の細長い指を有するマスと;
前記フレームの前記内周の中に置かれ前記マスを前記フレームに結合し前記フレームに対する前記マスの運動を許容する複数の懸架バネとを、
含んでなる加速度計。 - 請求項29の加速度計であって、前記複数の検知指は前記フレームから電気的に切り離されている加速度計。
- 基板と;
据付点において前記基板に据え付けられた少なくとも1つのマイクロ加工された構造であって、前記据付点に関して曲げ又はねじれを受け、前記据付点に関する曲げ又はねじれを減少させるために、1つの細長いアンカー又は複数のアンカーを使用して前記基板に据え付けられた少なくとも1つのマイクロ加工された構造とを;
含んでなるマイクロ加工された装置。 - 請求項31のマイクロ加工された装置であって、該マイクロ加工された装置が加速度計であり、前記少なくとも1つのマイクロ加工された構造は固定された検知指を含んでなるマイクロ加工された装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US39737902P | 2002-07-19 | 2002-07-19 | |
PCT/US2003/022512 WO2004010150A2 (en) | 2002-07-19 | 2003-07-18 | Reducing offset in accelerometers |
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JP2005534016A true JP2005534016A (ja) | 2005-11-10 |
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JP2004523571A Pending JP2005534016A (ja) | 2002-07-19 | 2003-07-18 | 加速度計におけるオフセットの低減 |
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US (3) | US6892576B2 (ja) |
EP (1) | EP1540355B1 (ja) |
JP (1) | JP2005534016A (ja) |
CN (1) | CN100523821C (ja) |
AT (1) | ATE352041T1 (ja) |
AU (1) | AU2003254005A1 (ja) |
DE (1) | DE60311281T2 (ja) |
WO (1) | WO2004010150A2 (ja) |
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- 2003-07-18 AT AT03765731T patent/ATE352041T1/de not_active IP Right Cessation
- 2003-07-18 WO PCT/US2003/022512 patent/WO2004010150A2/en active IP Right Grant
- 2003-07-18 JP JP2004523571A patent/JP2005534016A/ja active Pending
- 2003-07-18 AU AU2003254005A patent/AU2003254005A1/en not_active Abandoned
- 2003-07-18 DE DE60311281T patent/DE60311281T2/de not_active Expired - Lifetime
- 2003-07-18 CN CNB038223929A patent/CN100523821C/zh not_active Expired - Lifetime
- 2003-07-18 EP EP03765731A patent/EP1540355B1/en not_active Expired - Lifetime
- 2003-07-18 US US10/622,380 patent/US6892576B2/en not_active Expired - Lifetime
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2005
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JP2009244070A (ja) * | 2008-03-31 | 2009-10-22 | Alps Electric Co Ltd | 物理量センサ |
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JP5089807B2 (ja) * | 2009-06-03 | 2012-12-05 | アルプス電気株式会社 | 物理量センサ |
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Also Published As
Publication number | Publication date |
---|---|
AU2003254005A1 (en) | 2004-02-09 |
EP1540355B1 (en) | 2007-01-17 |
DE60311281D1 (de) | 2007-03-08 |
US7363816B2 (en) | 2008-04-29 |
US20070180912A1 (en) | 2007-08-09 |
US20040055382A1 (en) | 2004-03-25 |
WO2004010150A2 (en) | 2004-01-29 |
ATE352041T1 (de) | 2007-02-15 |
CN1682116A (zh) | 2005-10-12 |
CN100523821C (zh) | 2009-08-05 |
WO2004010150A3 (en) | 2004-06-17 |
US6892576B2 (en) | 2005-05-17 |
US20050262942A1 (en) | 2005-12-01 |
DE60311281T2 (de) | 2007-11-15 |
EP1540355A2 (en) | 2005-06-15 |
US7134340B2 (en) | 2006-11-14 |
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