JP2005530144A5 - - Google Patents
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- Publication number
- JP2005530144A5 JP2005530144A5 JP2004513691A JP2004513691A JP2005530144A5 JP 2005530144 A5 JP2005530144 A5 JP 2005530144A5 JP 2004513691 A JP2004513691 A JP 2004513691A JP 2004513691 A JP2004513691 A JP 2004513691A JP 2005530144 A5 JP2005530144 A5 JP 2005530144A5
- Authority
- JP
- Japan
- Prior art keywords
- single structure
- optical signal
- profile
- simulated optical
- light beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims 83
- 238000000034 method Methods 0.000 claims 28
- 210000001747 pupil Anatomy 0.000 claims 11
- 238000004590 computer program Methods 0.000 claims 8
- 238000001514 detection method Methods 0.000 claims 6
- 230000000737 periodic effect Effects 0.000 claims 2
- 230000003595 spectral effect Effects 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/175,207 US6775015B2 (en) | 2002-06-18 | 2002-06-18 | Optical metrology of single features |
| PCT/US2003/018186 WO2003106916A2 (en) | 2002-06-18 | 2003-06-09 | Optical metrology of single features |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005530144A JP2005530144A (ja) | 2005-10-06 |
| JP2005530144A5 true JP2005530144A5 (enExample) | 2006-07-27 |
Family
ID=29733802
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004513691A Pending JP2005530144A (ja) | 2002-06-18 | 2003-06-09 | 単一構造の光学測定法 |
Country Status (7)
| Country | Link |
|---|---|
| US (4) | US6775015B2 (enExample) |
| JP (1) | JP2005530144A (enExample) |
| KR (1) | KR100796112B1 (enExample) |
| CN (1) | CN1308651C (enExample) |
| AU (1) | AU2003248651A1 (enExample) |
| TW (1) | TW587158B (enExample) |
| WO (1) | WO2003106916A2 (enExample) |
Families Citing this family (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6804005B2 (en) * | 2002-05-02 | 2004-10-12 | Timbre Technologies, Inc. | Overlay measurements using zero-order cross polarization measurements |
| US6775015B2 (en) * | 2002-06-18 | 2004-08-10 | Timbre Technologies, Inc. | Optical metrology of single features |
| US6842261B2 (en) * | 2002-08-26 | 2005-01-11 | Timbre Technologies, Inc. | Integrated circuit profile value determination |
| US20040207836A1 (en) * | 2002-09-27 | 2004-10-21 | Rajeshwar Chhibber | High dynamic range optical inspection system and method |
| US20040090629A1 (en) * | 2002-11-08 | 2004-05-13 | Emmanuel Drege | Diffraction order selection for optical metrology simulation |
| FR2849181B1 (fr) * | 2002-12-23 | 2005-12-23 | Commissariat Energie Atomique | Procede d'etude des reliefs d'une structure par voie optique |
| US20080246951A1 (en) * | 2007-04-09 | 2008-10-09 | Phillip Walsh | Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work-pieces |
| US8564780B2 (en) | 2003-01-16 | 2013-10-22 | Jordan Valley Semiconductors Ltd. | Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work pieces |
| US7274472B2 (en) * | 2003-05-28 | 2007-09-25 | Timbre Technologies, Inc. | Resolution enhanced optical metrology |
| JP3892843B2 (ja) * | 2003-11-04 | 2007-03-14 | 株式会社東芝 | 寸法測定方法、寸法測定装置および測定マーク |
| TWI261927B (en) * | 2003-12-03 | 2006-09-11 | Quanta Display Inc | Method of manufacturing a thin film transistor array |
| JP4282500B2 (ja) | 2004-01-29 | 2009-06-24 | 株式会社東芝 | 構造検査方法及び半導体装置の製造方法 |
| US20050275850A1 (en) * | 2004-05-28 | 2005-12-15 | Timbre Technologies, Inc. | Shape roughness measurement in optical metrology |
| US20080144036A1 (en) | 2006-12-19 | 2008-06-19 | Asml Netherlands B.V. | Method of measurement, an inspection apparatus and a lithographic apparatus |
| US7791727B2 (en) | 2004-08-16 | 2010-09-07 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
| KR100625168B1 (ko) * | 2004-08-23 | 2006-09-20 | 삼성전자주식회사 | 기판에 형성된 패턴의 검사방법 및 이를 수행하기 위한검사장치 |
| US7391524B1 (en) * | 2004-09-13 | 2008-06-24 | N&K Technology, Inc. | System and method for efficient characterization of diffracting structures with incident plane parallel to grating lines |
| JP2008520965A (ja) * | 2004-11-16 | 2008-06-19 | コミサリア ア レネルジィ アトミーク | 糖末端基を含むシラン化剤及び特に固体支持体の官能化のためのその使用 |
| US7315384B2 (en) * | 2005-05-10 | 2008-01-01 | Asml Netherlands B.V. | Inspection apparatus and method of inspection |
| JP4674859B2 (ja) * | 2005-10-27 | 2011-04-20 | 大日本印刷株式会社 | 微細マイクロレンズアレイの形状測定方法 |
| US7525672B1 (en) * | 2005-12-16 | 2009-04-28 | N&K Technology, Inc. | Efficient characterization of symmetrically illuminated symmetric 2-D gratings |
| US7505147B1 (en) * | 2006-05-26 | 2009-03-17 | N&K Technology, Inc. | Efficient calculation of grating matrix elements for 2-D diffraction |
| US7518740B2 (en) * | 2006-07-10 | 2009-04-14 | Tokyo Electron Limited | Evaluating a profile model to characterize a structure to be examined using optical metrology |
| US7515283B2 (en) * | 2006-07-11 | 2009-04-07 | Tokyo Electron, Ltd. | Parallel profile determination in optical metrology |
| US20080013107A1 (en) * | 2006-07-11 | 2008-01-17 | Tokyo Electron Limited | Generating a profile model to characterize a structure to be examined using optical metrology |
| US7469192B2 (en) * | 2006-07-11 | 2008-12-23 | Tokyo Electron Ltd. | Parallel profile determination for an optical metrology system |
| US20080129986A1 (en) * | 2006-11-30 | 2008-06-05 | Phillip Walsh | Method and apparatus for optically measuring periodic structures using orthogonal azimuthal sample orientations |
| US20080135774A1 (en) * | 2006-12-08 | 2008-06-12 | Asml Netherlands B.V. | Scatterometer, a lithographic apparatus and a focus analysis method |
| CN101359612B (zh) * | 2007-07-30 | 2012-07-04 | 东京毅力科创株式会社 | 晶片图案结构的检查装置及其计量数据管理方法 |
| CN101359611B (zh) * | 2007-07-30 | 2011-11-09 | 东京毅力科创株式会社 | 对光学计量系统的选定变量进行优化 |
| WO2009064670A2 (en) * | 2007-11-13 | 2009-05-22 | Zygo Corporation | Interferometer utilizing polarization scanning |
| NL1036468A1 (nl) | 2008-02-27 | 2009-08-31 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
| US8126694B2 (en) * | 2008-05-02 | 2012-02-28 | Nanometrics Incorporated | Modeling conductive patterns using an effective model |
| JP4834706B2 (ja) * | 2008-09-22 | 2011-12-14 | 株式会社東芝 | 構造検査方法 |
| US8560270B2 (en) * | 2008-12-09 | 2013-10-15 | Tokyo Electron Limited | Rational approximation and continued-fraction approximation approaches for computation efficiency of diffraction signals |
| US8441639B2 (en) * | 2009-09-03 | 2013-05-14 | Kla-Tencor Corp. | Metrology systems and methods |
| US8867041B2 (en) | 2011-01-18 | 2014-10-21 | Jordan Valley Semiconductor Ltd | Optical vacuum ultra-violet wavelength nanoimprint metrology |
| US8565379B2 (en) | 2011-03-14 | 2013-10-22 | Jordan Valley Semiconductors Ltd. | Combining X-ray and VUV analysis of thin film layers |
| TWI628730B (zh) | 2011-11-10 | 2018-07-01 | 應用材料股份有限公司 | 透過雷射繞射測量3d半導體結構之溫度的設備及方法 |
| KR20170092522A (ko) | 2014-09-08 | 2017-08-11 | 더 리서치 파운데이션 포 더 스테이트 유니버시티 오브 뉴욕 | 금속 격자 및 이의 측정 방법 |
| US9482519B2 (en) | 2014-12-04 | 2016-11-01 | Globalfoundries Inc. | Measuring semiconductor device features using stepwise optical metrology |
| IL252666B (en) * | 2014-12-10 | 2022-06-01 | Nova Ltd | Test structure for use in metrology measurements of patterns |
| US9970863B2 (en) * | 2015-02-22 | 2018-05-15 | Kla-Tencor Corporation | Optical metrology with reduced focus error sensitivity |
| US11054508B2 (en) * | 2017-01-05 | 2021-07-06 | Innovusion Ireland Limited | High resolution LiDAR using high frequency pulse firing |
| JP6918418B2 (ja) | 2017-09-08 | 2021-08-11 | 株式会社ディスコ | ウェーハの加工方法 |
| WO2020146493A1 (en) | 2019-01-10 | 2020-07-16 | Innovusion Ireland Limited | Lidar systems and methods with beam steering and wide angle signal detection |
| US12013350B2 (en) | 2021-05-05 | 2024-06-18 | Onto Innovation Inc. | Effective cell approximation model for logic structures |
| DE102021205328B3 (de) | 2021-05-26 | 2022-09-29 | Carl Zeiss Smt Gmbh | Verfahren zur Bestimmung einer Abbildungsqualität eines optischen Systems bei Beleuchtung mit Beleuchtungslicht innerhalb einer zu vermessenden Pupille und Metrologiesystem dafür |
| US12461041B2 (en) | 2022-04-20 | 2025-11-04 | Kla Corporation | Measurement of thick films and high aspect ratio structures |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0781836B2 (ja) | 1987-12-01 | 1995-09-06 | キヤノン株式会社 | 光学測定装置 |
| JP3550605B2 (ja) | 1995-09-25 | 2004-08-04 | 株式会社ニコン | 位置検出方法、それを用いた露光方法、その露光方法を用いた半導体素子、液晶表示素子又は薄膜磁気ヘッドの製造方法、及び位置検出装置、それを備えた露光装置 |
| US6034378A (en) | 1995-02-01 | 2000-03-07 | Nikon Corporation | Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus |
| US5703692A (en) | 1995-08-03 | 1997-12-30 | Bio-Rad Laboratories, Inc. | Lens scatterometer system employing source light beam scanning means |
| US5805290A (en) * | 1996-05-02 | 1998-09-08 | International Business Machines Corporation | Method of optical metrology of unresolved pattern arrays |
| US5880838A (en) * | 1996-06-05 | 1999-03-09 | California Institute Of California | System and method for optically measuring a structure |
| US5867276A (en) | 1997-03-07 | 1999-02-02 | Bio-Rad Laboratories, Inc. | Method for broad wavelength scatterometry |
| US6172349B1 (en) * | 1997-03-31 | 2001-01-09 | Kla-Tencor Corporation | Autofocusing apparatus and method for high resolution microscope system |
| CN1145820C (zh) | 1997-08-29 | 2004-04-14 | 奥林巴斯光学工业株式会社 | 显微镜透过明视野照明装置 |
| JP4503716B2 (ja) | 1997-08-29 | 2010-07-14 | オリンパス株式会社 | 顕微鏡透過照明装置 |
| US6049220A (en) * | 1998-06-10 | 2000-04-11 | Boxer Cross Incorporated | Apparatus and method for evaluating a wafer of semiconductor material |
| JP2000009443A (ja) | 1998-06-24 | 2000-01-14 | Dainippon Screen Mfg Co Ltd | 形状測定方法及びその装置 |
| US6137570A (en) * | 1998-06-30 | 2000-10-24 | Kla-Tencor Corporation | System and method for analyzing topological features on a surface |
| JP2001085314A (ja) * | 1999-09-13 | 2001-03-30 | Nikon Corp | 露光方法及び装置、デバイスの製造方法、及び露光装置の製造方法 |
| JP2001267211A (ja) | 2000-03-16 | 2001-09-28 | Nikon Corp | 位置検出方法及び装置、並びに前記位置検出方法を用いた露光方法及び装置 |
| US6429943B1 (en) * | 2000-03-29 | 2002-08-06 | Therma-Wave, Inc. | Critical dimension analysis with simultaneous multiple angle of incidence measurements |
| US6943900B2 (en) * | 2000-09-15 | 2005-09-13 | Timbre Technologies, Inc. | Generation of a library of periodic grating diffraction signals |
| US7139083B2 (en) * | 2000-09-20 | 2006-11-21 | Kla-Tencor Technologies Corp. | Methods and systems for determining a composition and a thickness of a specimen |
| US7106425B1 (en) * | 2000-09-20 | 2006-09-12 | Kla-Tencor Technologies Corp. | Methods and systems for determining a presence of defects and a thin film characteristic of a specimen |
| US6775015B2 (en) | 2002-06-18 | 2004-08-10 | Timbre Technologies, Inc. | Optical metrology of single features |
| JP2008005002A (ja) * | 2006-06-20 | 2008-01-10 | Onkyo Corp | スピーカー用ダンパーおよびこれを用いたスピーカー |
-
2002
- 2002-06-18 US US10/175,207 patent/US6775015B2/en not_active Expired - Lifetime
-
2003
- 2003-05-28 TW TW092114373A patent/TW587158B/zh not_active IP Right Cessation
- 2003-06-09 KR KR1020047020328A patent/KR100796112B1/ko not_active Expired - Fee Related
- 2003-06-09 CN CNB038141531A patent/CN1308651C/zh not_active Expired - Fee Related
- 2003-06-09 JP JP2004513691A patent/JP2005530144A/ja active Pending
- 2003-06-09 WO PCT/US2003/018186 patent/WO2003106916A2/en not_active Ceased
- 2003-06-09 AU AU2003248651A patent/AU2003248651A1/en not_active Abandoned
-
2004
- 2004-05-24 US US10/853,060 patent/US7030999B2/en not_active Expired - Fee Related
-
2006
- 2006-04-14 US US11/404,645 patent/US7379192B2/en not_active Expired - Fee Related
-
2008
- 2008-05-27 US US12/127,640 patent/US7586623B2/en not_active Expired - Fee Related
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