TW587158B - Optical metrology of single features - Google Patents
Optical metrology of single features Download PDFInfo
- Publication number
- TW587158B TW587158B TW092114373A TW92114373A TW587158B TW 587158 B TW587158 B TW 587158B TW 092114373 A TW092114373 A TW 092114373A TW 92114373 A TW92114373 A TW 92114373A TW 587158 B TW587158 B TW 587158B
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- feature
- item
- shape
- wafer
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 89
- 238000012512 characterization method Methods 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 35
- 210000001747 pupil Anatomy 0.000 claims description 31
- 238000001514 detection method Methods 0.000 claims description 26
- 230000000737 periodic effect Effects 0.000 claims description 22
- 238000004088 simulation Methods 0.000 claims description 11
- 238000005259 measurement Methods 0.000 claims description 10
- 239000013078 crystal Substances 0.000 claims description 6
- 238000012937 correction Methods 0.000 claims description 4
- 238000012360 testing method Methods 0.000 claims description 3
- 238000004458 analytical method Methods 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 claims 2
- 230000008878 coupling Effects 0.000 claims 1
- 238000010168 coupling process Methods 0.000 claims 1
- 238000005859 coupling reaction Methods 0.000 claims 1
- 235000013399 edible fruits Nutrition 0.000 claims 1
- 238000011835 investigation Methods 0.000 claims 1
- 230000003595 spectral effect Effects 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 238000001228 spectrum Methods 0.000 description 15
- 239000013598 vector Substances 0.000 description 9
- 239000002131 composite material Substances 0.000 description 6
- 230000005284 excitation Effects 0.000 description 4
- 238000005070 sampling Methods 0.000 description 4
- 238000000691 measurement method Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 235000010627 Phaseolus vulgaris Nutrition 0.000 description 1
- 244000046052 Phaseolus vulgaris Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000013041 optical simulation Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/4788—Diffraction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/175,207 US6775015B2 (en) | 2002-06-18 | 2002-06-18 | Optical metrology of single features |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200402529A TW200402529A (en) | 2004-02-16 |
| TW587158B true TW587158B (en) | 2004-05-11 |
Family
ID=29733802
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW092114373A TW587158B (en) | 2002-06-18 | 2003-05-28 | Optical metrology of single features |
Country Status (7)
| Country | Link |
|---|---|
| US (4) | US6775015B2 (enExample) |
| JP (1) | JP2005530144A (enExample) |
| KR (1) | KR100796112B1 (enExample) |
| CN (1) | CN1308651C (enExample) |
| AU (1) | AU2003248651A1 (enExample) |
| TW (1) | TW587158B (enExample) |
| WO (1) | WO2003106916A2 (enExample) |
Families Citing this family (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6804005B2 (en) * | 2002-05-02 | 2004-10-12 | Timbre Technologies, Inc. | Overlay measurements using zero-order cross polarization measurements |
| US6775015B2 (en) * | 2002-06-18 | 2004-08-10 | Timbre Technologies, Inc. | Optical metrology of single features |
| US6842261B2 (en) * | 2002-08-26 | 2005-01-11 | Timbre Technologies, Inc. | Integrated circuit profile value determination |
| US20040207836A1 (en) * | 2002-09-27 | 2004-10-21 | Rajeshwar Chhibber | High dynamic range optical inspection system and method |
| US20040090629A1 (en) * | 2002-11-08 | 2004-05-13 | Emmanuel Drege | Diffraction order selection for optical metrology simulation |
| FR2849181B1 (fr) * | 2002-12-23 | 2005-12-23 | Commissariat Energie Atomique | Procede d'etude des reliefs d'une structure par voie optique |
| US20080246951A1 (en) * | 2007-04-09 | 2008-10-09 | Phillip Walsh | Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work-pieces |
| US8564780B2 (en) | 2003-01-16 | 2013-10-22 | Jordan Valley Semiconductors Ltd. | Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work pieces |
| US7274472B2 (en) * | 2003-05-28 | 2007-09-25 | Timbre Technologies, Inc. | Resolution enhanced optical metrology |
| JP3892843B2 (ja) * | 2003-11-04 | 2007-03-14 | 株式会社東芝 | 寸法測定方法、寸法測定装置および測定マーク |
| TWI261927B (en) * | 2003-12-03 | 2006-09-11 | Quanta Display Inc | Method of manufacturing a thin film transistor array |
| JP4282500B2 (ja) | 2004-01-29 | 2009-06-24 | 株式会社東芝 | 構造検査方法及び半導体装置の製造方法 |
| US20050275850A1 (en) * | 2004-05-28 | 2005-12-15 | Timbre Technologies, Inc. | Shape roughness measurement in optical metrology |
| US20080144036A1 (en) | 2006-12-19 | 2008-06-19 | Asml Netherlands B.V. | Method of measurement, an inspection apparatus and a lithographic apparatus |
| US7791727B2 (en) | 2004-08-16 | 2010-09-07 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
| KR100625168B1 (ko) * | 2004-08-23 | 2006-09-20 | 삼성전자주식회사 | 기판에 형성된 패턴의 검사방법 및 이를 수행하기 위한검사장치 |
| US7391524B1 (en) * | 2004-09-13 | 2008-06-24 | N&K Technology, Inc. | System and method for efficient characterization of diffracting structures with incident plane parallel to grating lines |
| JP2008520965A (ja) * | 2004-11-16 | 2008-06-19 | コミサリア ア レネルジィ アトミーク | 糖末端基を含むシラン化剤及び特に固体支持体の官能化のためのその使用 |
| US7315384B2 (en) * | 2005-05-10 | 2008-01-01 | Asml Netherlands B.V. | Inspection apparatus and method of inspection |
| JP4674859B2 (ja) * | 2005-10-27 | 2011-04-20 | 大日本印刷株式会社 | 微細マイクロレンズアレイの形状測定方法 |
| US7525672B1 (en) * | 2005-12-16 | 2009-04-28 | N&K Technology, Inc. | Efficient characterization of symmetrically illuminated symmetric 2-D gratings |
| US7505147B1 (en) * | 2006-05-26 | 2009-03-17 | N&K Technology, Inc. | Efficient calculation of grating matrix elements for 2-D diffraction |
| US7518740B2 (en) * | 2006-07-10 | 2009-04-14 | Tokyo Electron Limited | Evaluating a profile model to characterize a structure to be examined using optical metrology |
| US7515283B2 (en) * | 2006-07-11 | 2009-04-07 | Tokyo Electron, Ltd. | Parallel profile determination in optical metrology |
| US20080013107A1 (en) * | 2006-07-11 | 2008-01-17 | Tokyo Electron Limited | Generating a profile model to characterize a structure to be examined using optical metrology |
| US7469192B2 (en) * | 2006-07-11 | 2008-12-23 | Tokyo Electron Ltd. | Parallel profile determination for an optical metrology system |
| US20080129986A1 (en) * | 2006-11-30 | 2008-06-05 | Phillip Walsh | Method and apparatus for optically measuring periodic structures using orthogonal azimuthal sample orientations |
| US20080135774A1 (en) * | 2006-12-08 | 2008-06-12 | Asml Netherlands B.V. | Scatterometer, a lithographic apparatus and a focus analysis method |
| CN101359612B (zh) * | 2007-07-30 | 2012-07-04 | 东京毅力科创株式会社 | 晶片图案结构的检查装置及其计量数据管理方法 |
| CN101359611B (zh) * | 2007-07-30 | 2011-11-09 | 东京毅力科创株式会社 | 对光学计量系统的选定变量进行优化 |
| WO2009064670A2 (en) * | 2007-11-13 | 2009-05-22 | Zygo Corporation | Interferometer utilizing polarization scanning |
| NL1036468A1 (nl) | 2008-02-27 | 2009-08-31 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
| US8126694B2 (en) * | 2008-05-02 | 2012-02-28 | Nanometrics Incorporated | Modeling conductive patterns using an effective model |
| JP4834706B2 (ja) * | 2008-09-22 | 2011-12-14 | 株式会社東芝 | 構造検査方法 |
| US8560270B2 (en) * | 2008-12-09 | 2013-10-15 | Tokyo Electron Limited | Rational approximation and continued-fraction approximation approaches for computation efficiency of diffraction signals |
| US8441639B2 (en) * | 2009-09-03 | 2013-05-14 | Kla-Tencor Corp. | Metrology systems and methods |
| US8867041B2 (en) | 2011-01-18 | 2014-10-21 | Jordan Valley Semiconductor Ltd | Optical vacuum ultra-violet wavelength nanoimprint metrology |
| US8565379B2 (en) | 2011-03-14 | 2013-10-22 | Jordan Valley Semiconductors Ltd. | Combining X-ray and VUV analysis of thin film layers |
| TWI628730B (zh) | 2011-11-10 | 2018-07-01 | 應用材料股份有限公司 | 透過雷射繞射測量3d半導體結構之溫度的設備及方法 |
| KR20170092522A (ko) | 2014-09-08 | 2017-08-11 | 더 리서치 파운데이션 포 더 스테이트 유니버시티 오브 뉴욕 | 금속 격자 및 이의 측정 방법 |
| US9482519B2 (en) | 2014-12-04 | 2016-11-01 | Globalfoundries Inc. | Measuring semiconductor device features using stepwise optical metrology |
| IL252666B (en) * | 2014-12-10 | 2022-06-01 | Nova Ltd | Test structure for use in metrology measurements of patterns |
| US9970863B2 (en) * | 2015-02-22 | 2018-05-15 | Kla-Tencor Corporation | Optical metrology with reduced focus error sensitivity |
| US11054508B2 (en) * | 2017-01-05 | 2021-07-06 | Innovusion Ireland Limited | High resolution LiDAR using high frequency pulse firing |
| JP6918418B2 (ja) | 2017-09-08 | 2021-08-11 | 株式会社ディスコ | ウェーハの加工方法 |
| WO2020146493A1 (en) | 2019-01-10 | 2020-07-16 | Innovusion Ireland Limited | Lidar systems and methods with beam steering and wide angle signal detection |
| US12013350B2 (en) | 2021-05-05 | 2024-06-18 | Onto Innovation Inc. | Effective cell approximation model for logic structures |
| DE102021205328B3 (de) | 2021-05-26 | 2022-09-29 | Carl Zeiss Smt Gmbh | Verfahren zur Bestimmung einer Abbildungsqualität eines optischen Systems bei Beleuchtung mit Beleuchtungslicht innerhalb einer zu vermessenden Pupille und Metrologiesystem dafür |
| US12461041B2 (en) | 2022-04-20 | 2025-11-04 | Kla Corporation | Measurement of thick films and high aspect ratio structures |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0781836B2 (ja) | 1987-12-01 | 1995-09-06 | キヤノン株式会社 | 光学測定装置 |
| JP3550605B2 (ja) | 1995-09-25 | 2004-08-04 | 株式会社ニコン | 位置検出方法、それを用いた露光方法、その露光方法を用いた半導体素子、液晶表示素子又は薄膜磁気ヘッドの製造方法、及び位置検出装置、それを備えた露光装置 |
| US6034378A (en) | 1995-02-01 | 2000-03-07 | Nikon Corporation | Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus |
| US5703692A (en) | 1995-08-03 | 1997-12-30 | Bio-Rad Laboratories, Inc. | Lens scatterometer system employing source light beam scanning means |
| US5805290A (en) * | 1996-05-02 | 1998-09-08 | International Business Machines Corporation | Method of optical metrology of unresolved pattern arrays |
| US5880838A (en) * | 1996-06-05 | 1999-03-09 | California Institute Of California | System and method for optically measuring a structure |
| US5867276A (en) | 1997-03-07 | 1999-02-02 | Bio-Rad Laboratories, Inc. | Method for broad wavelength scatterometry |
| US6172349B1 (en) * | 1997-03-31 | 2001-01-09 | Kla-Tencor Corporation | Autofocusing apparatus and method for high resolution microscope system |
| CN1145820C (zh) | 1997-08-29 | 2004-04-14 | 奥林巴斯光学工业株式会社 | 显微镜透过明视野照明装置 |
| JP4503716B2 (ja) | 1997-08-29 | 2010-07-14 | オリンパス株式会社 | 顕微鏡透過照明装置 |
| US6049220A (en) * | 1998-06-10 | 2000-04-11 | Boxer Cross Incorporated | Apparatus and method for evaluating a wafer of semiconductor material |
| JP2000009443A (ja) | 1998-06-24 | 2000-01-14 | Dainippon Screen Mfg Co Ltd | 形状測定方法及びその装置 |
| US6137570A (en) * | 1998-06-30 | 2000-10-24 | Kla-Tencor Corporation | System and method for analyzing topological features on a surface |
| JP2001085314A (ja) * | 1999-09-13 | 2001-03-30 | Nikon Corp | 露光方法及び装置、デバイスの製造方法、及び露光装置の製造方法 |
| JP2001267211A (ja) | 2000-03-16 | 2001-09-28 | Nikon Corp | 位置検出方法及び装置、並びに前記位置検出方法を用いた露光方法及び装置 |
| US6429943B1 (en) * | 2000-03-29 | 2002-08-06 | Therma-Wave, Inc. | Critical dimension analysis with simultaneous multiple angle of incidence measurements |
| US6943900B2 (en) * | 2000-09-15 | 2005-09-13 | Timbre Technologies, Inc. | Generation of a library of periodic grating diffraction signals |
| US7139083B2 (en) * | 2000-09-20 | 2006-11-21 | Kla-Tencor Technologies Corp. | Methods and systems for determining a composition and a thickness of a specimen |
| US7106425B1 (en) * | 2000-09-20 | 2006-09-12 | Kla-Tencor Technologies Corp. | Methods and systems for determining a presence of defects and a thin film characteristic of a specimen |
| US6775015B2 (en) | 2002-06-18 | 2004-08-10 | Timbre Technologies, Inc. | Optical metrology of single features |
| JP2008005002A (ja) * | 2006-06-20 | 2008-01-10 | Onkyo Corp | スピーカー用ダンパーおよびこれを用いたスピーカー |
-
2002
- 2002-06-18 US US10/175,207 patent/US6775015B2/en not_active Expired - Lifetime
-
2003
- 2003-05-28 TW TW092114373A patent/TW587158B/zh not_active IP Right Cessation
- 2003-06-09 KR KR1020047020328A patent/KR100796112B1/ko not_active Expired - Fee Related
- 2003-06-09 CN CNB038141531A patent/CN1308651C/zh not_active Expired - Fee Related
- 2003-06-09 JP JP2004513691A patent/JP2005530144A/ja active Pending
- 2003-06-09 WO PCT/US2003/018186 patent/WO2003106916A2/en not_active Ceased
- 2003-06-09 AU AU2003248651A patent/AU2003248651A1/en not_active Abandoned
-
2004
- 2004-05-24 US US10/853,060 patent/US7030999B2/en not_active Expired - Fee Related
-
2006
- 2006-04-14 US US11/404,645 patent/US7379192B2/en not_active Expired - Fee Related
-
2008
- 2008-05-27 US US12/127,640 patent/US7586623B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| AU2003248651A8 (en) | 2003-12-31 |
| TW200402529A (en) | 2004-02-16 |
| US20040212812A1 (en) | 2004-10-28 |
| US6775015B2 (en) | 2004-08-10 |
| WO2003106916A3 (en) | 2004-04-15 |
| AU2003248651A1 (en) | 2003-12-31 |
| US20080259357A1 (en) | 2008-10-23 |
| CN1308651C (zh) | 2007-04-04 |
| US20060187468A1 (en) | 2006-08-24 |
| US7379192B2 (en) | 2008-05-27 |
| US7030999B2 (en) | 2006-04-18 |
| US20030232454A1 (en) | 2003-12-18 |
| WO2003106916A2 (en) | 2003-12-24 |
| US7586623B2 (en) | 2009-09-08 |
| KR100796112B1 (ko) | 2008-01-21 |
| CN1662789A (zh) | 2005-08-31 |
| JP2005530144A (ja) | 2005-10-06 |
| KR20050010919A (ko) | 2005-01-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |