JP2005526885A5 - - Google Patents
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- Publication number
- JP2005526885A5 JP2005526885A5 JP2003586200A JP2003586200A JP2005526885A5 JP 2005526885 A5 JP2005526885 A5 JP 2005526885A5 JP 2003586200 A JP2003586200 A JP 2003586200A JP 2003586200 A JP2003586200 A JP 2003586200A JP 2005526885 A5 JP2005526885 A5 JP 2005526885A5
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- solvent
- separation
- crude polymer
- purification
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 description 14
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 238000000926 separation method Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 238000000746 purification Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 238000010908 decantation Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 238000005809 transesterification reaction Methods 0.000 description 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229920002959 polymer blend Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/126,287 | 2002-04-19 | ||
| US10/126,287 US6593431B2 (en) | 2000-06-27 | 2002-04-19 | Purification means |
| US10/373,409 | 2003-02-24 | ||
| US10/373,409 US6787611B2 (en) | 2000-06-27 | 2003-02-24 | Purification means |
| PCT/US2003/011262 WO2003089481A1 (en) | 2002-04-19 | 2003-04-10 | Process fpr purification of alkoxystyrene polymers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005526885A JP2005526885A (ja) | 2005-09-08 |
| JP2005526885A5 true JP2005526885A5 (enExample) | 2008-04-24 |
| JP4943634B2 JP4943634B2 (ja) | 2012-05-30 |
Family
ID=29254007
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003586200A Expired - Lifetime JP4943634B2 (ja) | 2002-04-19 | 2003-04-10 | アルコキシスチレンポリマーの精製方法 |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US6787611B2 (enExample) |
| EP (1) | EP1509551B1 (enExample) |
| JP (1) | JP4943634B2 (enExample) |
| KR (1) | KR101099861B1 (enExample) |
| CN (1) | CN1300184C (enExample) |
| AR (1) | AR039432A1 (enExample) |
| AT (1) | ATE473246T1 (enExample) |
| AU (1) | AU2003223576A1 (enExample) |
| CA (1) | CA2482900A1 (enExample) |
| DE (1) | DE60333287D1 (enExample) |
| TW (1) | TWI267522B (enExample) |
| WO (1) | WO2003089481A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7312281B2 (en) * | 2002-04-19 | 2007-12-25 | Dupont Electronic Polymers L.P. | Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity |
| JP4825405B2 (ja) * | 2003-05-08 | 2011-11-30 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | フォトレジスト組成物およびそれらの調製方法 |
| US7834113B2 (en) * | 2003-05-08 | 2010-11-16 | E. I. Du Pont De Nemours And Company | Photoresist compositions and processes for preparing the same |
| US7534837B2 (en) * | 2005-09-26 | 2009-05-19 | E.I. Du Pont De Nemours And Company | Random copolymers of ethylene and 4-vinylphenyl esters and method for preparing the same |
| JP4957148B2 (ja) * | 2006-09-26 | 2012-06-20 | 富士通株式会社 | 鍵管理機能を持つセキュア素子および情報処理装置 |
| JP5297015B2 (ja) * | 2006-12-19 | 2013-09-25 | 花王株式会社 | インクジェット記録用水系インク |
| JP4984067B2 (ja) * | 2007-07-23 | 2012-07-25 | 信越化学工業株式会社 | フォトレジスト組成物用高分子化合物の合成方法 |
| US8163464B2 (en) | 2008-08-25 | 2012-04-24 | Du Pont Electronic Polymers L.P. | Propanoates and processes for preparing the same |
| US20120286217A1 (en) * | 2011-05-12 | 2012-11-15 | Headwaters Technology Innovation, Llc | Methods for mitigating agglomeration of carbon nanospheres using extraction |
| US9116137B1 (en) | 2014-07-15 | 2015-08-25 | Leeo, Inc. | Selective electrical coupling based on environmental conditions |
| EP3056527A1 (fr) * | 2015-02-11 | 2016-08-17 | Total Marketing Services | Copolymeres a blocs et leur utilisation pour ameliorer les proprietes a froid de carburants ou combustibles |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3987235A (en) * | 1974-09-12 | 1976-10-19 | The Dow Chemical Company | Devolatilization of alkenyl aromatic polymers |
| US4195169A (en) * | 1977-09-13 | 1980-03-25 | The Dow Chemical Company | Devolatilizing polymers of styrene and acrylic or methacrylic acid |
| US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| US4636540A (en) * | 1985-07-08 | 1987-01-13 | Atlantic Richfield Company | Purification of polymer solutions |
| US4689371A (en) * | 1986-07-07 | 1987-08-25 | Celanese Corporation | Process for the preparation of poly (vinylphenol) from poly (acetoxystyrene) |
| US4939070A (en) * | 1986-07-28 | 1990-07-03 | Brunsvold William R | Thermally stable photoresists with high sensitivity |
| EP0260104A3 (en) * | 1986-09-09 | 1989-03-15 | Celanese Corporation | Process for the preparation of poly (vinylphenol) by simultaneous methanolysis and polymerization of 4-acetoxystryene |
| US4678843A (en) * | 1986-09-29 | 1987-07-07 | Celanese Corporation | Process for the ammonium hydroxide hydrolysis of polymers of acetoxystyrene to polymers of vinylphenol |
| US4931379A (en) * | 1986-10-23 | 1990-06-05 | International Business Machines Corporation | High sensitivity resists having autodecomposition temperatures greater than about 160° C. |
| EP0277721A3 (en) * | 1987-01-28 | 1989-03-15 | Hoechst Celanese Corporation | Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol) |
| US4822862A (en) * | 1987-01-28 | 1989-04-18 | Hoechst Celanese Corporation | Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol |
| US4898916A (en) * | 1987-03-05 | 1990-02-06 | Hoechst Celanese Corporation | Process for the preparation of poly(vinylphenol) from poly(acetoxystyrene) by acid catalyzed transesterification |
| US4877843A (en) * | 1987-09-11 | 1989-10-31 | Hoechst Celanese Corporation | Selective hydrolysis of copolymers of para-acetoxy styrene and allyl esters of ethylenically unsaturated acids |
| US4912173A (en) * | 1987-10-30 | 1990-03-27 | Hoechst Celanese Corporation | Hydrolysis of poly(acetoxystyrene) in aqueous suspension |
| US4962147A (en) * | 1988-05-26 | 1990-10-09 | Hoechst Celanese Corporation | Process for the suspension polymerization of 4-acetoxystyrene and hydrolysis to 4-hydroxystyrene polymers |
| US5239015A (en) * | 1990-06-29 | 1993-08-24 | Hoechst Celanese Corporation | Process for making low optical density polymers and copolymers for photoresists and optical applications |
| US5087772A (en) * | 1990-11-16 | 1992-02-11 | Hoechst Celanese Corporation | Method for preparing 4-hydroxystyrene |
| US5264536A (en) * | 1990-12-06 | 1993-11-23 | Exxon Research And Engineering Company | Supercritical mixed-solvent separation of polymer mixtures |
| JPH0768296B2 (ja) * | 1991-11-28 | 1995-07-26 | 丸善石油化学株式会社 | ビニルフェノール系重合体の金属除去方法 |
| DE69322946T2 (de) * | 1992-11-03 | 1999-08-12 | International Business Machines Corp., Armonk, N.Y. | Photolackzusammensetzung |
| WO1994014858A1 (en) * | 1992-12-29 | 1994-07-07 | Hoechst Celanese Corporation | Metal ion reduction in polyhydroxystyrene and photoresists |
| US5304610A (en) * | 1993-01-12 | 1994-04-19 | Hoechst Celanese Corporation | Amphoteric copolymer derived from vinylpyridine and acetoxystyrene |
| US5708133A (en) * | 1993-11-09 | 1998-01-13 | Mitsubishi Gas Chemical Company, Inc. | Process for purifying polymer |
| US5861231A (en) * | 1996-06-11 | 1999-01-19 | Shipley Company, L.L.C. | Copolymers and photoresist compositions comprising copolymer resin binder component |
| US5789522A (en) * | 1996-09-06 | 1998-08-04 | Shipley Company, L.L.C. | Resin purification process |
| US5919597A (en) * | 1997-10-30 | 1999-07-06 | Ibm Corporation Of Armonk | Methods for preparing photoresist compositions |
| EP1076667B1 (en) * | 1998-05-05 | 2004-03-24 | Triquest, L.P. | Preparation of co-and terpolymers of p-hydroxystyrene and alkyl acrylates |
| US5945251A (en) * | 1998-05-08 | 1999-08-31 | Olin Corporation | Process for producing purified solutions of blocked polyhydroxystyrene resins |
| KR20010043388A (ko) * | 1998-05-08 | 2001-05-25 | 스티븐티.워쇼 | 블로킹된 폴리하이드록시스티렌 수지 정제 용액의 제조방법 |
| US6414110B1 (en) * | 1999-11-12 | 2002-07-02 | Triquest Lp | Purification means |
| US6203922B1 (en) * | 2000-03-20 | 2001-03-20 | The Regents Of The University Of Michigan | High glass transition temperature, ductile, and processable thermoplastic containing conformable ring segments |
| US6593431B2 (en) * | 2000-06-27 | 2003-07-15 | Chemfirst Electronic Materials Lp | Purification means |
| AU2001271444A1 (en) * | 2000-06-27 | 2002-01-08 | Triquest, Lp | Purification means |
-
2003
- 2003-02-24 US US10/373,409 patent/US6787611B2/en not_active Expired - Lifetime
- 2003-04-10 KR KR1020047016753A patent/KR101099861B1/ko not_active Expired - Lifetime
- 2003-04-10 AT AT03719713T patent/ATE473246T1/de not_active IP Right Cessation
- 2003-04-10 AU AU2003223576A patent/AU2003223576A1/en not_active Abandoned
- 2003-04-10 CA CA002482900A patent/CA2482900A1/en not_active Abandoned
- 2003-04-10 DE DE60333287T patent/DE60333287D1/de not_active Expired - Lifetime
- 2003-04-10 EP EP03719713A patent/EP1509551B1/en not_active Expired - Lifetime
- 2003-04-10 CN CNB038014440A patent/CN1300184C/zh not_active Expired - Lifetime
- 2003-04-10 WO PCT/US2003/011262 patent/WO2003089481A1/en not_active Ceased
- 2003-04-10 JP JP2003586200A patent/JP4943634B2/ja not_active Expired - Lifetime
- 2003-04-16 AR ARP030101338A patent/AR039432A1/es not_active Application Discontinuation
- 2003-04-17 TW TW092108924A patent/TWI267522B/zh not_active IP Right Cessation
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