AR039432A1 - Medios de purificacion - Google Patents
Medios de purificacionInfo
- Publication number
- AR039432A1 AR039432A1 ARP030101338A ARP030101338A AR039432A1 AR 039432 A1 AR039432 A1 AR 039432A1 AR P030101338 A ARP030101338 A AR P030101338A AR P030101338 A ARP030101338 A AR P030101338A AR 039432 A1 AR039432 A1 AR 039432A1
- Authority
- AR
- Argentina
- Prior art keywords
- butyl
- tert
- group
- propyl
- polymer
- Prior art date
Links
- 238000000746 purification Methods 0.000 title 1
- 229920000642 polymer Polymers 0.000 abstract 9
- -1 tert-amyl Chemical group 0.000 abstract 9
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 6
- 239000002904 solvent Substances 0.000 abstract 4
- 230000001476 alcoholic effect Effects 0.000 abstract 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 abstract 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 3
- 239000000178 monomer Substances 0.000 abstract 3
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 238000005194 fractionation Methods 0.000 abstract 2
- 239000001257 hydrogen Substances 0.000 abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 abstract 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 abstract 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 abstract 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 abstract 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 abstract 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 abstract 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 abstract 1
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 abstract 1
- 125000006176 2-ethylbutyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(C([H])([H])*)C([H])([H])C([H])([H])[H] 0.000 abstract 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 abstract 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 abstract 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 abstract 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 1
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 abstract 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 abstract 1
- 150000004703 alkoxides Chemical class 0.000 abstract 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 abstract 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 abstract 1
- 229910052794 bromium Inorganic materials 0.000 abstract 1
- 229910052801 chlorine Inorganic materials 0.000 abstract 1
- 239000000460 chlorine Substances 0.000 abstract 1
- 125000000490 cinnamyl group Chemical group C(C=CC1=CC=CC=C1)* 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 abstract 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 abstract 1
- 238000004090 dissolution Methods 0.000 abstract 1
- 229910052731 fluorine Inorganic materials 0.000 abstract 1
- 239000011737 fluorine Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 229920001519 homopolymer Polymers 0.000 abstract 1
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 abstract 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 abstract 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 abstract 1
- JLPJFSCQKHRSQR-UHFFFAOYSA-N oxolan-3-one Chemical compound O=C1CCOC1 JLPJFSCQKHRSQR-UHFFFAOYSA-N 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 abstract 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 abstract 1
- 125000003944 tolyl group Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/14—Treatment of polymer emulsions
- C08F6/16—Purification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/02—Neutralisation of the polymerisation mass, e.g. killing the catalyst also removal of catalyst residues
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/008—Treatment of solid polymer wetted by water or organic solvents, e.g. coagulum, filter cakes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/04—Fractionation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/06—Treatment of polymer solutions
- C08F6/12—Separation of polymers from solutions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/26—Treatment of polymers prepared in bulk also solid polymers or polymer melts
- C08F6/28—Purification
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/126,287 US6593431B2 (en) | 2000-06-27 | 2002-04-19 | Purification means |
| US10/373,409 US6787611B2 (en) | 2000-06-27 | 2003-02-24 | Purification means |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AR039432A1 true AR039432A1 (es) | 2005-02-16 |
Family
ID=29254007
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ARP030101338A AR039432A1 (es) | 2002-04-19 | 2003-04-16 | Medios de purificacion |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US6787611B2 (enExample) |
| EP (1) | EP1509551B1 (enExample) |
| JP (1) | JP4943634B2 (enExample) |
| KR (1) | KR101099861B1 (enExample) |
| CN (1) | CN1300184C (enExample) |
| AR (1) | AR039432A1 (enExample) |
| AT (1) | ATE473246T1 (enExample) |
| AU (1) | AU2003223576A1 (enExample) |
| CA (1) | CA2482900A1 (enExample) |
| DE (1) | DE60333287D1 (enExample) |
| TW (1) | TWI267522B (enExample) |
| WO (1) | WO2003089481A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7312281B2 (en) * | 2002-04-19 | 2007-12-25 | Dupont Electronic Polymers L.P. | Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity |
| JP4825405B2 (ja) * | 2003-05-08 | 2011-11-30 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | フォトレジスト組成物およびそれらの調製方法 |
| US7834113B2 (en) * | 2003-05-08 | 2010-11-16 | E. I. Du Pont De Nemours And Company | Photoresist compositions and processes for preparing the same |
| US7534837B2 (en) * | 2005-09-26 | 2009-05-19 | E.I. Du Pont De Nemours And Company | Random copolymers of ethylene and 4-vinylphenyl esters and method for preparing the same |
| JP4957148B2 (ja) * | 2006-09-26 | 2012-06-20 | 富士通株式会社 | 鍵管理機能を持つセキュア素子および情報処理装置 |
| JP5297015B2 (ja) * | 2006-12-19 | 2013-09-25 | 花王株式会社 | インクジェット記録用水系インク |
| JP4984067B2 (ja) * | 2007-07-23 | 2012-07-25 | 信越化学工業株式会社 | フォトレジスト組成物用高分子化合物の合成方法 |
| US8163464B2 (en) | 2008-08-25 | 2012-04-24 | Du Pont Electronic Polymers L.P. | Propanoates and processes for preparing the same |
| US20120286217A1 (en) * | 2011-05-12 | 2012-11-15 | Headwaters Technology Innovation, Llc | Methods for mitigating agglomeration of carbon nanospheres using extraction |
| US9116137B1 (en) | 2014-07-15 | 2015-08-25 | Leeo, Inc. | Selective electrical coupling based on environmental conditions |
| EP3056527A1 (fr) * | 2015-02-11 | 2016-08-17 | Total Marketing Services | Copolymeres a blocs et leur utilisation pour ameliorer les proprietes a froid de carburants ou combustibles |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3987235A (en) * | 1974-09-12 | 1976-10-19 | The Dow Chemical Company | Devolatilization of alkenyl aromatic polymers |
| US4195169A (en) * | 1977-09-13 | 1980-03-25 | The Dow Chemical Company | Devolatilizing polymers of styrene and acrylic or methacrylic acid |
| US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| US4636540A (en) * | 1985-07-08 | 1987-01-13 | Atlantic Richfield Company | Purification of polymer solutions |
| US4689371A (en) * | 1986-07-07 | 1987-08-25 | Celanese Corporation | Process for the preparation of poly (vinylphenol) from poly (acetoxystyrene) |
| US4939070A (en) * | 1986-07-28 | 1990-07-03 | Brunsvold William R | Thermally stable photoresists with high sensitivity |
| EP0260104A3 (en) * | 1986-09-09 | 1989-03-15 | Celanese Corporation | Process for the preparation of poly (vinylphenol) by simultaneous methanolysis and polymerization of 4-acetoxystryene |
| US4678843A (en) * | 1986-09-29 | 1987-07-07 | Celanese Corporation | Process for the ammonium hydroxide hydrolysis of polymers of acetoxystyrene to polymers of vinylphenol |
| US4931379A (en) * | 1986-10-23 | 1990-06-05 | International Business Machines Corporation | High sensitivity resists having autodecomposition temperatures greater than about 160° C. |
| EP0277721A3 (en) * | 1987-01-28 | 1989-03-15 | Hoechst Celanese Corporation | Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol) |
| US4822862A (en) * | 1987-01-28 | 1989-04-18 | Hoechst Celanese Corporation | Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol |
| US4898916A (en) * | 1987-03-05 | 1990-02-06 | Hoechst Celanese Corporation | Process for the preparation of poly(vinylphenol) from poly(acetoxystyrene) by acid catalyzed transesterification |
| US4877843A (en) * | 1987-09-11 | 1989-10-31 | Hoechst Celanese Corporation | Selective hydrolysis of copolymers of para-acetoxy styrene and allyl esters of ethylenically unsaturated acids |
| US4912173A (en) * | 1987-10-30 | 1990-03-27 | Hoechst Celanese Corporation | Hydrolysis of poly(acetoxystyrene) in aqueous suspension |
| US4962147A (en) * | 1988-05-26 | 1990-10-09 | Hoechst Celanese Corporation | Process for the suspension polymerization of 4-acetoxystyrene and hydrolysis to 4-hydroxystyrene polymers |
| US5239015A (en) * | 1990-06-29 | 1993-08-24 | Hoechst Celanese Corporation | Process for making low optical density polymers and copolymers for photoresists and optical applications |
| US5087772A (en) * | 1990-11-16 | 1992-02-11 | Hoechst Celanese Corporation | Method for preparing 4-hydroxystyrene |
| US5264536A (en) * | 1990-12-06 | 1993-11-23 | Exxon Research And Engineering Company | Supercritical mixed-solvent separation of polymer mixtures |
| JPH0768296B2 (ja) * | 1991-11-28 | 1995-07-26 | 丸善石油化学株式会社 | ビニルフェノール系重合体の金属除去方法 |
| DE69322946T2 (de) * | 1992-11-03 | 1999-08-12 | International Business Machines Corp., Armonk, N.Y. | Photolackzusammensetzung |
| WO1994014858A1 (en) * | 1992-12-29 | 1994-07-07 | Hoechst Celanese Corporation | Metal ion reduction in polyhydroxystyrene and photoresists |
| US5304610A (en) * | 1993-01-12 | 1994-04-19 | Hoechst Celanese Corporation | Amphoteric copolymer derived from vinylpyridine and acetoxystyrene |
| US5708133A (en) * | 1993-11-09 | 1998-01-13 | Mitsubishi Gas Chemical Company, Inc. | Process for purifying polymer |
| US5861231A (en) * | 1996-06-11 | 1999-01-19 | Shipley Company, L.L.C. | Copolymers and photoresist compositions comprising copolymer resin binder component |
| US5789522A (en) * | 1996-09-06 | 1998-08-04 | Shipley Company, L.L.C. | Resin purification process |
| US5919597A (en) * | 1997-10-30 | 1999-07-06 | Ibm Corporation Of Armonk | Methods for preparing photoresist compositions |
| EP1076667B1 (en) * | 1998-05-05 | 2004-03-24 | Triquest, L.P. | Preparation of co-and terpolymers of p-hydroxystyrene and alkyl acrylates |
| US5945251A (en) * | 1998-05-08 | 1999-08-31 | Olin Corporation | Process for producing purified solutions of blocked polyhydroxystyrene resins |
| KR20010043388A (ko) * | 1998-05-08 | 2001-05-25 | 스티븐티.워쇼 | 블로킹된 폴리하이드록시스티렌 수지 정제 용액의 제조방법 |
| US6414110B1 (en) * | 1999-11-12 | 2002-07-02 | Triquest Lp | Purification means |
| US6203922B1 (en) * | 2000-03-20 | 2001-03-20 | The Regents Of The University Of Michigan | High glass transition temperature, ductile, and processable thermoplastic containing conformable ring segments |
| US6593431B2 (en) * | 2000-06-27 | 2003-07-15 | Chemfirst Electronic Materials Lp | Purification means |
| AU2001271444A1 (en) * | 2000-06-27 | 2002-01-08 | Triquest, Lp | Purification means |
-
2003
- 2003-02-24 US US10/373,409 patent/US6787611B2/en not_active Expired - Lifetime
- 2003-04-10 KR KR1020047016753A patent/KR101099861B1/ko not_active Expired - Lifetime
- 2003-04-10 AT AT03719713T patent/ATE473246T1/de not_active IP Right Cessation
- 2003-04-10 AU AU2003223576A patent/AU2003223576A1/en not_active Abandoned
- 2003-04-10 CA CA002482900A patent/CA2482900A1/en not_active Abandoned
- 2003-04-10 DE DE60333287T patent/DE60333287D1/de not_active Expired - Lifetime
- 2003-04-10 EP EP03719713A patent/EP1509551B1/en not_active Expired - Lifetime
- 2003-04-10 CN CNB038014440A patent/CN1300184C/zh not_active Expired - Lifetime
- 2003-04-10 WO PCT/US2003/011262 patent/WO2003089481A1/en not_active Ceased
- 2003-04-10 JP JP2003586200A patent/JP4943634B2/ja not_active Expired - Lifetime
- 2003-04-16 AR ARP030101338A patent/AR039432A1/es not_active Application Discontinuation
- 2003-04-17 TW TW092108924A patent/TWI267522B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| US20030144470A1 (en) | 2003-07-31 |
| TW200406432A (en) | 2004-05-01 |
| KR20040103976A (ko) | 2004-12-09 |
| AU2003223576A1 (en) | 2003-11-03 |
| KR101099861B1 (ko) | 2011-12-28 |
| EP1509551B1 (en) | 2010-07-07 |
| JP2005526885A (ja) | 2005-09-08 |
| JP4943634B2 (ja) | 2012-05-30 |
| US6787611B2 (en) | 2004-09-07 |
| CN1578793A (zh) | 2005-02-09 |
| WO2003089481A1 (en) | 2003-10-30 |
| DE60333287D1 (de) | 2010-08-19 |
| CA2482900A1 (en) | 2003-10-30 |
| ATE473246T1 (de) | 2010-07-15 |
| EP1509551A1 (en) | 2005-03-02 |
| CN1300184C (zh) | 2007-02-14 |
| TWI267522B (en) | 2006-12-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FA | Abandonment or withdrawal |