JP4943634B2 - アルコキシスチレンポリマーの精製方法 - Google Patents

アルコキシスチレンポリマーの精製方法 Download PDF

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Publication number
JP4943634B2
JP4943634B2 JP2003586200A JP2003586200A JP4943634B2 JP 4943634 B2 JP4943634 B2 JP 4943634B2 JP 2003586200 A JP2003586200 A JP 2003586200A JP 2003586200 A JP2003586200 A JP 2003586200A JP 4943634 B2 JP4943634 B2 JP 4943634B2
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Prior art keywords
polymer
solvent
methanol
alcohol solvent
reactor
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JP2003586200A
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English (en)
Japanese (ja)
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JP2005526885A5 (enExample
JP2005526885A (ja
Inventor
シーハン,マイケル・ティー
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デュポン・エレクトロニック・テクノロジーズ・エル・ピー
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Priority claimed from US10/126,287 external-priority patent/US6593431B2/en
Application filed by デュポン・エレクトロニック・テクノロジーズ・エル・ピー filed Critical デュポン・エレクトロニック・テクノロジーズ・エル・ピー
Publication of JP2005526885A publication Critical patent/JP2005526885A/ja
Publication of JP2005526885A5 publication Critical patent/JP2005526885A5/ja
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00Post-polymerisation treatments
    • C08F6/14Treatment of polymer emulsions
    • C08F6/16Purification
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00Post-polymerisation treatments
    • C08F6/02Neutralisation of the polymerisation mass, e.g. killing the catalyst also removal of catalyst residues
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00Post-polymerisation treatments
    • C08F6/008Treatment of solid polymer wetted by water or organic solvents, e.g. coagulum, filter cakes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00Post-polymerisation treatments
    • C08F6/04Fractionation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00Post-polymerisation treatments
    • C08F6/06Treatment of polymer solutions
    • C08F6/12Separation of polymers from solutions
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00Post-polymerisation treatments
    • C08F6/26Treatment of polymers prepared in bulk also solid polymers or polymer melts
    • C08F6/28Purification

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2003586200A 2002-04-19 2003-04-10 アルコキシスチレンポリマーの精製方法 Expired - Lifetime JP4943634B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10/126,287 2002-04-19
US10/126,287 US6593431B2 (en) 2000-06-27 2002-04-19 Purification means
US10/373,409 2003-02-24
US10/373,409 US6787611B2 (en) 2000-06-27 2003-02-24 Purification means
PCT/US2003/011262 WO2003089481A1 (en) 2002-04-19 2003-04-10 Process fpr purification of alkoxystyrene polymers

Publications (3)

Publication Number Publication Date
JP2005526885A JP2005526885A (ja) 2005-09-08
JP2005526885A5 JP2005526885A5 (enExample) 2008-04-24
JP4943634B2 true JP4943634B2 (ja) 2012-05-30

Family

ID=29254007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003586200A Expired - Lifetime JP4943634B2 (ja) 2002-04-19 2003-04-10 アルコキシスチレンポリマーの精製方法

Country Status (12)

Country Link
US (1) US6787611B2 (enExample)
EP (1) EP1509551B1 (enExample)
JP (1) JP4943634B2 (enExample)
KR (1) KR101099861B1 (enExample)
CN (1) CN1300184C (enExample)
AR (1) AR039432A1 (enExample)
AT (1) ATE473246T1 (enExample)
AU (1) AU2003223576A1 (enExample)
CA (1) CA2482900A1 (enExample)
DE (1) DE60333287D1 (enExample)
TW (1) TWI267522B (enExample)
WO (1) WO2003089481A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7312281B2 (en) * 2002-04-19 2007-12-25 Dupont Electronic Polymers L.P. Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity
JP4825405B2 (ja) * 2003-05-08 2011-11-30 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー フォトレジスト組成物およびそれらの調製方法
US7834113B2 (en) * 2003-05-08 2010-11-16 E. I. Du Pont De Nemours And Company Photoresist compositions and processes for preparing the same
US7534837B2 (en) * 2005-09-26 2009-05-19 E.I. Du Pont De Nemours And Company Random copolymers of ethylene and 4-vinylphenyl esters and method for preparing the same
JP4957148B2 (ja) * 2006-09-26 2012-06-20 富士通株式会社 鍵管理機能を持つセキュア素子および情報処理装置
JP5297015B2 (ja) * 2006-12-19 2013-09-25 花王株式会社 インクジェット記録用水系インク
JP4984067B2 (ja) * 2007-07-23 2012-07-25 信越化学工業株式会社 フォトレジスト組成物用高分子化合物の合成方法
US8163464B2 (en) 2008-08-25 2012-04-24 Du Pont Electronic Polymers L.P. Propanoates and processes for preparing the same
US20120286217A1 (en) * 2011-05-12 2012-11-15 Headwaters Technology Innovation, Llc Methods for mitigating agglomeration of carbon nanospheres using extraction
US9116137B1 (en) 2014-07-15 2015-08-25 Leeo, Inc. Selective electrical coupling based on environmental conditions
EP3056527A1 (fr) * 2015-02-11 2016-08-17 Total Marketing Services Copolymeres a blocs et leur utilisation pour ameliorer les proprietes a froid de carburants ou combustibles

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US3987235A (en) * 1974-09-12 1976-10-19 The Dow Chemical Company Devolatilization of alkenyl aromatic polymers
US4195169A (en) * 1977-09-13 1980-03-25 The Dow Chemical Company Devolatilizing polymers of styrene and acrylic or methacrylic acid
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4636540A (en) * 1985-07-08 1987-01-13 Atlantic Richfield Company Purification of polymer solutions
US4689371A (en) * 1986-07-07 1987-08-25 Celanese Corporation Process for the preparation of poly (vinylphenol) from poly (acetoxystyrene)
US4939070A (en) * 1986-07-28 1990-07-03 Brunsvold William R Thermally stable photoresists with high sensitivity
EP0260104A3 (en) * 1986-09-09 1989-03-15 Celanese Corporation Process for the preparation of poly (vinylphenol) by simultaneous methanolysis and polymerization of 4-acetoxystryene
US4678843A (en) * 1986-09-29 1987-07-07 Celanese Corporation Process for the ammonium hydroxide hydrolysis of polymers of acetoxystyrene to polymers of vinylphenol
US4931379A (en) * 1986-10-23 1990-06-05 International Business Machines Corporation High sensitivity resists having autodecomposition temperatures greater than about 160° C.
EP0277721A3 (en) * 1987-01-28 1989-03-15 Hoechst Celanese Corporation Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol)
US4822862A (en) * 1987-01-28 1989-04-18 Hoechst Celanese Corporation Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol
US4898916A (en) * 1987-03-05 1990-02-06 Hoechst Celanese Corporation Process for the preparation of poly(vinylphenol) from poly(acetoxystyrene) by acid catalyzed transesterification
US4877843A (en) * 1987-09-11 1989-10-31 Hoechst Celanese Corporation Selective hydrolysis of copolymers of para-acetoxy styrene and allyl esters of ethylenically unsaturated acids
US4912173A (en) * 1987-10-30 1990-03-27 Hoechst Celanese Corporation Hydrolysis of poly(acetoxystyrene) in aqueous suspension
US4962147A (en) * 1988-05-26 1990-10-09 Hoechst Celanese Corporation Process for the suspension polymerization of 4-acetoxystyrene and hydrolysis to 4-hydroxystyrene polymers
US5239015A (en) * 1990-06-29 1993-08-24 Hoechst Celanese Corporation Process for making low optical density polymers and copolymers for photoresists and optical applications
US5087772A (en) * 1990-11-16 1992-02-11 Hoechst Celanese Corporation Method for preparing 4-hydroxystyrene
US5264536A (en) * 1990-12-06 1993-11-23 Exxon Research And Engineering Company Supercritical mixed-solvent separation of polymer mixtures
JPH0768296B2 (ja) * 1991-11-28 1995-07-26 丸善石油化学株式会社 ビニルフェノール系重合体の金属除去方法
DE69322946T2 (de) * 1992-11-03 1999-08-12 International Business Machines Corp., Armonk, N.Y. Photolackzusammensetzung
WO1994014858A1 (en) * 1992-12-29 1994-07-07 Hoechst Celanese Corporation Metal ion reduction in polyhydroxystyrene and photoresists
US5304610A (en) * 1993-01-12 1994-04-19 Hoechst Celanese Corporation Amphoteric copolymer derived from vinylpyridine and acetoxystyrene
US5708133A (en) * 1993-11-09 1998-01-13 Mitsubishi Gas Chemical Company, Inc. Process for purifying polymer
US5861231A (en) * 1996-06-11 1999-01-19 Shipley Company, L.L.C. Copolymers and photoresist compositions comprising copolymer resin binder component
US5789522A (en) * 1996-09-06 1998-08-04 Shipley Company, L.L.C. Resin purification process
US5919597A (en) * 1997-10-30 1999-07-06 Ibm Corporation Of Armonk Methods for preparing photoresist compositions
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US5945251A (en) * 1998-05-08 1999-08-31 Olin Corporation Process for producing purified solutions of blocked polyhydroxystyrene resins
KR20010043388A (ko) * 1998-05-08 2001-05-25 스티븐티.워쇼 블로킹된 폴리하이드록시스티렌 수지 정제 용액의 제조방법
US6414110B1 (en) * 1999-11-12 2002-07-02 Triquest Lp Purification means
US6203922B1 (en) * 2000-03-20 2001-03-20 The Regents Of The University Of Michigan High glass transition temperature, ductile, and processable thermoplastic containing conformable ring segments
US6593431B2 (en) * 2000-06-27 2003-07-15 Chemfirst Electronic Materials Lp Purification means
AU2001271444A1 (en) * 2000-06-27 2002-01-08 Triquest, Lp Purification means

Also Published As

Publication number Publication date
US20030144470A1 (en) 2003-07-31
TW200406432A (en) 2004-05-01
KR20040103976A (ko) 2004-12-09
AU2003223576A1 (en) 2003-11-03
AR039432A1 (es) 2005-02-16
KR101099861B1 (ko) 2011-12-28
EP1509551B1 (en) 2010-07-07
JP2005526885A (ja) 2005-09-08
US6787611B2 (en) 2004-09-07
CN1578793A (zh) 2005-02-09
WO2003089481A1 (en) 2003-10-30
DE60333287D1 (de) 2010-08-19
CA2482900A1 (en) 2003-10-30
ATE473246T1 (de) 2010-07-15
EP1509551A1 (en) 2005-03-02
CN1300184C (zh) 2007-02-14
TWI267522B (en) 2006-12-01

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