JP2005505895A5 - - Google Patents

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Publication number
JP2005505895A5
JP2005505895A5 JP2003534363A JP2003534363A JP2005505895A5 JP 2005505895 A5 JP2005505895 A5 JP 2005505895A5 JP 2003534363 A JP2003534363 A JP 2003534363A JP 2003534363 A JP2003534363 A JP 2003534363A JP 2005505895 A5 JP2005505895 A5 JP 2005505895A5
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JP
Japan
Prior art keywords
boron
mixtures
group
containing reactant
thick film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003534363A
Other languages
English (en)
Japanese (ja)
Other versions
JP4351050B2 (ja
JP2005505895A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2002/033469 external-priority patent/WO2003031373A2/en
Publication of JP2005505895A publication Critical patent/JP2005505895A/ja
Publication of JP2005505895A5 publication Critical patent/JP2005505895A5/ja
Application granted granted Critical
Publication of JP4351050B2 publication Critical patent/JP4351050B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003534363A 2001-10-09 2002-10-08 窒化アルミニウム基板上で使用するための厚膜導体組成物 Expired - Fee Related JP4351050B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US32815301P 2001-10-09 2001-10-09
PCT/US2002/033469 WO2003031373A2 (en) 2001-10-09 2002-10-08 Thick film conductor compositions for use on aluminum nitride substrates

Publications (3)

Publication Number Publication Date
JP2005505895A JP2005505895A (ja) 2005-02-24
JP2005505895A5 true JP2005505895A5 (https=) 2006-01-05
JP4351050B2 JP4351050B2 (ja) 2009-10-28

Family

ID=23279742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003534363A Expired - Fee Related JP4351050B2 (ja) 2001-10-09 2002-10-08 窒化アルミニウム基板上で使用するための厚膜導体組成物

Country Status (9)

Country Link
US (1) US20040245508A1 (https=)
EP (1) EP1434750B1 (https=)
JP (1) JP4351050B2 (https=)
KR (1) KR100585909B1 (https=)
CN (1) CN1307124C (https=)
AT (1) ATE334949T1 (https=)
AU (1) AU2002356830A1 (https=)
DE (1) DE60213628T2 (https=)
WO (1) WO2003031373A2 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7494607B2 (en) * 2005-04-14 2009-02-24 E.I. Du Pont De Nemours And Company Electroconductive thick film composition(s), electrode(s), and semiconductor device(s) formed therefrom
US7611645B2 (en) * 2005-04-25 2009-11-03 E. I. Du Pont De Nemours And Company Thick film conductor compositions and the use thereof in LTCC circuits and devices
US20070023388A1 (en) * 2005-07-28 2007-02-01 Nair Kumaran M Conductor composition for use in LTCC photosensitive tape on substrate applications
JP2010500779A (ja) * 2006-08-11 2010-01-07 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー デバイスチップキャリア、モジュールおよびその製造方法
US7704416B2 (en) * 2007-06-29 2010-04-27 E.I. Du Pont De Nemours And Company Conductor paste for ceramic substrate and electric circuit
KR100954722B1 (ko) 2008-07-04 2010-04-23 (주) 아모엘이디 AlN기판의 전극 재료와 AlN기판에 전극을 형성하는방법 및 AlN기판
US9351398B2 (en) 2013-04-04 2016-05-24 GM Global Technology Operations LLC Thick film conductive inks for electronic devices
CN107211535B (zh) * 2015-01-13 2019-08-16 日本特殊陶业株式会社 电路基板和其制造方法
CN113470865B (zh) * 2021-09-06 2021-12-21 西安宏星电子浆料科技股份有限公司 一种氮化铝用环保型银导体浆料

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3929674A (en) * 1974-06-03 1975-12-30 Du Pont Boride-containing metallizations
US4322316A (en) * 1980-08-22 1982-03-30 Ferro Corporation Thick film conductor employing copper oxide
FR2490210A1 (fr) * 1980-09-15 1982-03-19 Labo Electronique Physique Melange de depart pour une composition fortement resistante, encre serigraphiable constituee avec et circuits electriques ainsi realises
GB2152060B (en) * 1983-12-02 1987-05-13 Osaka Soda Co Ltd Electrically conductive adhesive composition
US4877760A (en) * 1985-05-22 1989-10-31 Ngk Spark Plug Co., Ltd. Aluminum nitride sintered body with high thermal conductivity and process for producing same
JPS6265991A (ja) * 1985-09-13 1987-03-25 株式会社東芝 高熱伝導性セラミツクス基板
US5089172A (en) * 1987-08-31 1992-02-18 Ferro Corporation Thick film conductor compositions for use with an aluminum nitride substrate
US5298330A (en) * 1987-08-31 1994-03-29 Ferro Corporation Thick film paste compositions for use with an aluminum nitride substrate
US4906404A (en) * 1988-11-07 1990-03-06 Dai-Ichi Kogyo Seiyaku Co., Ltd. Copper conductor composition
JPH03246901A (ja) * 1990-02-23 1991-11-05 Hitachi Ltd 厚膜抵抗組成物、該組成物を用いたハイブリッドicおよびその製法
US6074893A (en) * 1993-09-27 2000-06-13 Sumitomo Metal Industries, Ltd. Process for forming fine thick-film conductor patterns
US5637261A (en) * 1994-11-07 1997-06-10 The Curators Of The University Of Missouri Aluminum nitride-compatible thick-film binder glass and thick-film paste composition
JP3927250B2 (ja) * 1995-08-16 2007-06-06 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 窒化アルミニウム基板用厚膜導体ペースト組成物
JP4161423B2 (ja) * 1997-10-30 2008-10-08 住友電気工業株式会社 窒化アルミニウム焼結体及びそのメタライズ基板
JP3228923B2 (ja) * 2000-01-18 2001-11-12 イビデン株式会社 半導体製造・検査装置用セラミックヒータ

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