JP2005504337A5 - - Google Patents
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- Publication number
- JP2005504337A5 JP2005504337A5 JP2003531236A JP2003531236A JP2005504337A5 JP 2005504337 A5 JP2005504337 A5 JP 2005504337A5 JP 2003531236 A JP2003531236 A JP 2003531236A JP 2003531236 A JP2003531236 A JP 2003531236A JP 2005504337 A5 JP2005504337 A5 JP 2005504337A5
- Authority
- JP
- Japan
- Prior art keywords
- projection lens
- beam splitter
- lens according
- object plane
- plane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical Effects 0.000 claims 19
- PQXKHYXIUOZZFA-UHFFFAOYSA-M Lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 claims 2
- 238000005286 illumination Methods 0.000 claims 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L Calcium fluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims 1
- 230000004075 alteration Effects 0.000 claims 1
- 238000005452 bending Methods 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 claims 1
- 229910001634 calcium fluoride Inorganic materials 0.000 claims 1
- 150000004673 fluoride salts Chemical class 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000001393 microlithography Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US32333001P | 2001-09-20 | 2001-09-20 | |
| US33125001P | 2001-11-13 | 2001-11-13 | |
| US33127601P | 2001-11-13 | 2001-11-13 | |
| PCT/EP2002/010281 WO2003027747A1 (en) | 2001-09-20 | 2002-09-13 | Catadioptric reduction lens |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005504337A JP2005504337A (ja) | 2005-02-10 |
| JP2005504337A5 true JP2005504337A5 (zh) | 2005-10-27 |
Family
ID=27406266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003531236A Pending JP2005504337A (ja) | 2001-09-20 | 2002-09-13 | 反射屈折縮小レンズ |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1430346A1 (zh) |
| JP (1) | JP2005504337A (zh) |
| TW (1) | TWI226453B (zh) |
| WO (1) | WO2003027747A1 (zh) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10127227A1 (de) | 2001-05-22 | 2002-12-05 | Zeiss Carl | Katadioptrisches Reduktionsobjektiv |
| WO2004025349A1 (de) * | 2002-09-09 | 2004-03-25 | Carl Zeiss Smt Ag | Katadioptrisches projektionsobjektiv sowie verfahren zur kompensation der intrinsischen doppelbrechung in einem solchen |
| JP2006147809A (ja) * | 2004-11-18 | 2006-06-08 | Canon Inc | 露光装置の投影光学系、露光装置およびデバイスの製造方法 |
| KR101763092B1 (ko) * | 2005-06-02 | 2017-07-28 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투영 대물 렌즈 |
| EP1746463A2 (de) * | 2005-07-01 | 2007-01-24 | Carl Zeiss SMT AG | Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv |
| DE102010021539B4 (de) * | 2010-05-19 | 2014-10-09 | Carl Zeiss Smt Gmbh | Projektionsobjektiv mit Blenden |
| US8830590B2 (en) * | 2012-05-30 | 2014-09-09 | Ultratech, Inc. | Unit magnification large-format catadioptric lens for microlithography |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2698521B2 (ja) * | 1992-12-14 | 1998-01-19 | キヤノン株式会社 | 反射屈折型光学系及び該光学系を備える投影露光装置 |
| DE4417489A1 (de) * | 1994-05-19 | 1995-11-23 | Zeiss Carl Fa | Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie |
| JP3812051B2 (ja) * | 1997-04-30 | 2006-08-23 | 株式会社ニコン | 反射屈折投影光学系 |
| JPH1184248A (ja) * | 1997-09-12 | 1999-03-26 | Nikon Corp | 反射屈折縮小光学系 |
| JPH11326767A (ja) * | 1998-05-07 | 1999-11-26 | Nikon Corp | 反射屈折縮小光学系 |
| EP1102100A3 (de) * | 1999-11-12 | 2003-12-10 | Carl Zeiss | Katadioptrisches Objektiv mit physikalischem Strahlteiler |
-
2002
- 2002-09-13 EP EP02799405A patent/EP1430346A1/en not_active Withdrawn
- 2002-09-13 JP JP2003531236A patent/JP2005504337A/ja active Pending
- 2002-09-13 WO PCT/EP2002/010281 patent/WO2003027747A1/en not_active Application Discontinuation
- 2002-09-20 TW TW91121599A patent/TWI226453B/zh not_active IP Right Cessation
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