JP2005336452A - レジスト組成物用樹脂、ネガ型レジスト組成物及びレジストパターン形成方法 - Google Patents
レジスト組成物用樹脂、ネガ型レジスト組成物及びレジストパターン形成方法 Download PDFInfo
- Publication number
- JP2005336452A JP2005336452A JP2004263753A JP2004263753A JP2005336452A JP 2005336452 A JP2005336452 A JP 2005336452A JP 2004263753 A JP2004263753 A JP 2004263753A JP 2004263753 A JP2004263753 A JP 2004263753A JP 2005336452 A JP2005336452 A JP 2005336452A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- structural unit
- group
- resist
- resist composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004263753A JP2005336452A (ja) | 2004-04-27 | 2004-09-10 | レジスト組成物用樹脂、ネガ型レジスト組成物及びレジストパターン形成方法 |
PCT/JP2005/007391 WO2005105873A1 (ja) | 2004-04-27 | 2005-04-18 | レジスト組成物用樹脂、ネガ型レジスト組成物及びレジストパターン形成方法 |
TW094112308A TW200609249A (en) | 2004-04-27 | 2005-04-18 | Resin for a resist composition, negative resist composition, and method of forming resist pattern |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004131115 | 2004-04-27 | ||
JP2004263753A JP2005336452A (ja) | 2004-04-27 | 2004-09-10 | レジスト組成物用樹脂、ネガ型レジスト組成物及びレジストパターン形成方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2005336452A true JP2005336452A (ja) | 2005-12-08 |
Family
ID=35241639
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004263753A Withdrawn JP2005336452A (ja) | 2004-04-27 | 2004-09-10 | レジスト組成物用樹脂、ネガ型レジスト組成物及びレジストパターン形成方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2005336452A (zh) |
TW (1) | TW200609249A (zh) |
WO (1) | WO2005105873A1 (zh) |
Cited By (60)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007178848A (ja) * | 2005-12-28 | 2007-07-12 | Fujifilm Corp | 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物 |
JP2009074085A (ja) * | 2007-08-30 | 2009-04-09 | Central Glass Co Ltd | ポジ型レジスト組成物 |
WO2011158817A1 (ja) | 2010-06-15 | 2011-12-22 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法、高分子化合物、化合物 |
US8129100B2 (en) | 2008-04-04 | 2012-03-06 | Shin-Etsu Chemical Co., Ltd. | Double patterning process |
US8192915B2 (en) | 2008-08-22 | 2012-06-05 | Tokyo Ohka Kogyo Co., Ltd. | Positive resist composition, method of forming resist pattern, and polymeric compound |
US8227170B2 (en) | 2009-01-14 | 2012-07-24 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, polymeric compound, and compound |
US8247160B2 (en) | 2008-07-18 | 2012-08-21 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, and novel compound and acid generator |
US8247166B2 (en) | 2008-09-05 | 2012-08-21 | Shin-Etsu Chemical Co., Ltd. | Double patterning process |
US8252509B2 (en) | 2009-09-03 | 2012-08-28 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US8283105B2 (en) | 2009-03-11 | 2012-10-09 | Tokyo Ohka Kogyo Co., Ltd. | Positive resist composition and method of forming resist pattern |
US8338076B2 (en) | 2008-11-28 | 2012-12-25 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, novel compound, and acid generator |
US8354218B2 (en) | 2009-07-02 | 2013-01-15 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US8367297B2 (en) | 2008-12-10 | 2013-02-05 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, novel compound and acid generator |
US8404427B2 (en) | 2005-12-28 | 2013-03-26 | Fujifilm Corporation | Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition |
US8415082B2 (en) | 2009-04-27 | 2013-04-09 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, compound and method of producing the same, acid generator |
US8497395B2 (en) | 2010-12-08 | 2013-07-30 | Tokyo Ohka Kogyo Co., Ltd. | Compound |
US8609320B2 (en) | 2010-11-30 | 2013-12-17 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, polymeric compound and compound |
US8614049B2 (en) | 2010-12-08 | 2013-12-24 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US8685620B2 (en) | 2011-11-09 | 2014-04-01 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern and polymeric compound |
US8703387B2 (en) | 2011-05-25 | 2014-04-22 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, novel compound, and acid generator |
US8735052B2 (en) | 2010-03-19 | 2014-05-27 | Tokyo Ohka Kogyo Co., Ltd. | Surface modifying material, method of forming resist pattern, and method of forming pattern |
US8765352B2 (en) | 2010-09-02 | 2014-07-01 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, novel compound, and acid generator |
US8778595B2 (en) | 2011-11-25 | 2014-07-15 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, and polymeric compound |
US8785106B2 (en) | 2012-02-23 | 2014-07-22 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US8846291B2 (en) | 2010-12-08 | 2014-09-30 | Tokyo Ohka Kogyo Co. Ltd. | Resist composition, method of forming resist pattern, and new compound |
US8877432B2 (en) | 2010-03-30 | 2014-11-04 | Tokyo Ohka Kogyo Co., Ltd. | Method of forming resist pattern and resist composition |
US8883396B2 (en) | 2011-11-02 | 2014-11-11 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US8900795B2 (en) | 2012-01-11 | 2014-12-02 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern and novel compound |
US8932795B2 (en) | 2010-05-19 | 2015-01-13 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, novel compound, and acid generator |
US8956801B2 (en) | 2012-02-17 | 2015-02-17 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US9005872B2 (en) | 2011-02-18 | 2015-04-14 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US9005874B2 (en) | 2011-04-20 | 2015-04-14 | Tokyo Ohka Kogyo Co., Ltd. | Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern |
US9012125B2 (en) | 2011-01-26 | 2015-04-21 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US9017919B2 (en) | 2010-10-29 | 2015-04-28 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, novel compound and acid generator |
US9023580B2 (en) | 2011-11-24 | 2015-05-05 | Tokyo Ohka Kogyo Co., Ltd. | Method of forming polymeric compound, resist composition and method of forming resist pattern |
US9052592B2 (en) | 2013-03-25 | 2015-06-09 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and resist pattern forming method |
US9057948B2 (en) | 2011-10-17 | 2015-06-16 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition for EUV or EB, and method of forming resist pattern |
US9063416B2 (en) | 2011-12-14 | 2015-06-23 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern and compound |
US9075304B2 (en) | 2012-07-10 | 2015-07-07 | Tokyo Ohka Kogyo Co., Ltd. | Method of producing ammonium salt compound, method of producing compound, and compound, polymeric compound, acid generator, resist composition and method of forming resist pattern |
US9097969B2 (en) | 2012-06-13 | 2015-08-04 | Tokyo Ohka Kogyo Co., Ltd. | Compound, resist composition and method of forming resist pattern |
US9097971B2 (en) | 2011-06-17 | 2015-08-04 | Tokyo Ohka Kogyo Co., Ltd. | Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern |
US9104101B2 (en) | 2011-02-23 | 2015-08-11 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern and polymeric compound |
US9164381B2 (en) | 2012-05-30 | 2015-10-20 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, and compound |
US9164379B2 (en) | 2012-05-08 | 2015-10-20 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method for forming resist pattern, and compound |
US9164380B2 (en) | 2011-12-14 | 2015-10-20 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US9170487B2 (en) | 2012-03-28 | 2015-10-27 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, and polymeric compound |
US9188863B2 (en) | 2012-06-20 | 2015-11-17 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US9235123B2 (en) | 2013-03-25 | 2016-01-12 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and resist pattern forming method |
US9274424B2 (en) | 2013-03-25 | 2016-03-01 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and resist pattern forming method |
US9341947B2 (en) | 2014-08-26 | 2016-05-17 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US9354515B2 (en) | 2013-07-31 | 2016-05-31 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, acid generator, polymeric compound and method of forming resist pattern |
US9494860B2 (en) | 2010-12-28 | 2016-11-15 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern |
US9606433B2 (en) | 2012-05-16 | 2017-03-28 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, polymeric compound and compound |
US9618843B2 (en) | 2011-03-25 | 2017-04-11 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US9618842B2 (en) | 2009-11-11 | 2017-04-11 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US9778567B2 (en) | 2013-11-15 | 2017-10-03 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, polymeric compound, compound |
US9890233B2 (en) | 2014-01-16 | 2018-02-13 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, and polymeric compound |
US10437147B2 (en) | 2016-03-31 | 2019-10-08 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method for forming resist pattern |
WO2020235608A1 (ja) | 2019-05-22 | 2020-11-26 | 東京応化工業株式会社 | レジスト組成物精製品の製造方法、レジストパターン形成方法、及びレジスト組成物精製品 |
US11693313B2 (en) | 2019-11-14 | 2023-07-04 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7655378B2 (en) * | 2006-07-24 | 2010-02-02 | Shin-Etsu Chemical Co., Ltd. | Negative resist composition and patterning process using the same |
KR101457076B1 (ko) * | 2006-10-12 | 2014-10-31 | 닛산 가가쿠 고교 가부시키 가이샤 | 광가교 경화에 의한 레지스트 하층막을 이용하는 반도체 장치의 제조방법 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1307695C (en) * | 1986-01-13 | 1992-09-22 | Wayne Edmund Feely | Photosensitive compounds and thermally stable and aqueous developablenegative images |
JP3727044B2 (ja) * | 1998-11-10 | 2005-12-14 | 東京応化工業株式会社 | ネガ型レジスト組成物 |
JP3900135B2 (ja) * | 2002-10-29 | 2007-04-04 | Jsr株式会社 | 感放射線性樹脂組成物 |
JP2005070316A (ja) * | 2003-08-22 | 2005-03-17 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
JP2005084239A (ja) * | 2003-09-05 | 2005-03-31 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
-
2004
- 2004-09-10 JP JP2004263753A patent/JP2005336452A/ja not_active Withdrawn
-
2005
- 2005-04-18 WO PCT/JP2005/007391 patent/WO2005105873A1/ja active Application Filing
- 2005-04-18 TW TW094112308A patent/TW200609249A/zh unknown
Cited By (63)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007178848A (ja) * | 2005-12-28 | 2007-07-12 | Fujifilm Corp | 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物 |
US8404427B2 (en) | 2005-12-28 | 2013-03-26 | Fujifilm Corporation | Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition |
JP2009074085A (ja) * | 2007-08-30 | 2009-04-09 | Central Glass Co Ltd | ポジ型レジスト組成物 |
US8129100B2 (en) | 2008-04-04 | 2012-03-06 | Shin-Etsu Chemical Co., Ltd. | Double patterning process |
US8247160B2 (en) | 2008-07-18 | 2012-08-21 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, and novel compound and acid generator |
US8192915B2 (en) | 2008-08-22 | 2012-06-05 | Tokyo Ohka Kogyo Co., Ltd. | Positive resist composition, method of forming resist pattern, and polymeric compound |
US8541529B2 (en) | 2008-08-22 | 2013-09-24 | Tokyo Ohka Kogyo Co., Ltd. | Positive resist composition, method of forming resist pattern, and polymeric compound |
US8247166B2 (en) | 2008-09-05 | 2012-08-21 | Shin-Etsu Chemical Co., Ltd. | Double patterning process |
US8338076B2 (en) | 2008-11-28 | 2012-12-25 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, novel compound, and acid generator |
US8367297B2 (en) | 2008-12-10 | 2013-02-05 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, novel compound and acid generator |
US8227170B2 (en) | 2009-01-14 | 2012-07-24 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, polymeric compound, and compound |
US8283105B2 (en) | 2009-03-11 | 2012-10-09 | Tokyo Ohka Kogyo Co., Ltd. | Positive resist composition and method of forming resist pattern |
US8415082B2 (en) | 2009-04-27 | 2013-04-09 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, compound and method of producing the same, acid generator |
US8354218B2 (en) | 2009-07-02 | 2013-01-15 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US8252509B2 (en) | 2009-09-03 | 2012-08-28 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US9618842B2 (en) | 2009-11-11 | 2017-04-11 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US8735052B2 (en) | 2010-03-19 | 2014-05-27 | Tokyo Ohka Kogyo Co., Ltd. | Surface modifying material, method of forming resist pattern, and method of forming pattern |
US8877432B2 (en) | 2010-03-30 | 2014-11-04 | Tokyo Ohka Kogyo Co., Ltd. | Method of forming resist pattern and resist composition |
US8932795B2 (en) | 2010-05-19 | 2015-01-13 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, novel compound, and acid generator |
US9023581B2 (en) | 2010-06-15 | 2015-05-05 | Tokyo Ohka Kogyo Co., Ltd | Resist composition, method of forming resist pattern, polymeric compound, and compound |
WO2011158817A1 (ja) | 2010-06-15 | 2011-12-22 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法、高分子化合物、化合物 |
US8765352B2 (en) | 2010-09-02 | 2014-07-01 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, novel compound, and acid generator |
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US8846291B2 (en) | 2010-12-08 | 2014-09-30 | Tokyo Ohka Kogyo Co. Ltd. | Resist composition, method of forming resist pattern, and new compound |
US8614049B2 (en) | 2010-12-08 | 2013-12-24 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US8497395B2 (en) | 2010-12-08 | 2013-07-30 | Tokyo Ohka Kogyo Co., Ltd. | Compound |
US9494860B2 (en) | 2010-12-28 | 2016-11-15 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern |
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US9104101B2 (en) | 2011-02-23 | 2015-08-11 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern and polymeric compound |
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US9005874B2 (en) | 2011-04-20 | 2015-04-14 | Tokyo Ohka Kogyo Co., Ltd. | Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern |
US8703387B2 (en) | 2011-05-25 | 2014-04-22 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, novel compound, and acid generator |
US9097971B2 (en) | 2011-06-17 | 2015-08-04 | Tokyo Ohka Kogyo Co., Ltd. | Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern |
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US8883396B2 (en) | 2011-11-02 | 2014-11-11 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
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US9164380B2 (en) | 2011-12-14 | 2015-10-20 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
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US9075304B2 (en) | 2012-07-10 | 2015-07-07 | Tokyo Ohka Kogyo Co., Ltd. | Method of producing ammonium salt compound, method of producing compound, and compound, polymeric compound, acid generator, resist composition and method of forming resist pattern |
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US9778567B2 (en) | 2013-11-15 | 2017-10-03 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, polymeric compound, compound |
US9890233B2 (en) | 2014-01-16 | 2018-02-13 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, and polymeric compound |
US9341947B2 (en) | 2014-08-26 | 2016-05-17 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
US10437147B2 (en) | 2016-03-31 | 2019-10-08 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method for forming resist pattern |
WO2020235608A1 (ja) | 2019-05-22 | 2020-11-26 | 東京応化工業株式会社 | レジスト組成物精製品の製造方法、レジストパターン形成方法、及びレジスト組成物精製品 |
US11693313B2 (en) | 2019-11-14 | 2023-07-04 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
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