JP2005321673A - ホログラム記録材料及びホログラム記録媒体 - Google Patents
ホログラム記録材料及びホログラム記録媒体 Download PDFInfo
- Publication number
- JP2005321673A JP2005321673A JP2004140672A JP2004140672A JP2005321673A JP 2005321673 A JP2005321673 A JP 2005321673A JP 2004140672 A JP2004140672 A JP 2004140672A JP 2004140672 A JP2004140672 A JP 2004140672A JP 2005321673 A JP2005321673 A JP 2005321673A
- Authority
- JP
- Japan
- Prior art keywords
- hologram recording
- recording material
- compound
- photopolymerizable monomer
- matrix material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 104
- 239000011159 matrix material Substances 0.000 claims abstract description 53
- 239000000178 monomer Substances 0.000 claims abstract description 44
- 239000007791 liquid phase Substances 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims description 45
- 239000002184 metal Substances 0.000 claims description 45
- 150000002902 organometallic compounds Chemical class 0.000 claims description 43
- 125000003118 aryl group Chemical group 0.000 claims description 24
- 150000002739 metals Chemical group 0.000 claims description 22
- 125000002524 organometallic group Chemical group 0.000 claims description 17
- 229910052719 titanium Inorganic materials 0.000 claims description 8
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 229910052732 germanium Inorganic materials 0.000 claims description 4
- 239000001301 oxygen Chemical group 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 229910052718 tin Inorganic materials 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 230000035945 sensitivity Effects 0.000 abstract description 8
- 150000001875 compounds Chemical class 0.000 description 33
- 239000000758 substrate Substances 0.000 description 25
- 239000002609 medium Substances 0.000 description 23
- -1 alkoxide compound Chemical class 0.000 description 19
- 239000003999 initiator Substances 0.000 description 17
- 239000000243 solution Substances 0.000 description 17
- 239000010936 titanium Substances 0.000 description 16
- 239000011521 glass Substances 0.000 description 14
- 238000006116 polymerization reaction Methods 0.000 description 14
- 238000006460 hydrolysis reaction Methods 0.000 description 12
- 230000007062 hydrolysis Effects 0.000 description 11
- 229920000642 polymer Polymers 0.000 description 11
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 10
- 239000002904 solvent Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- 229920001223 polyethylene glycol Polymers 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000002202 Polyethylene glycol Substances 0.000 description 6
- 150000004703 alkoxides Chemical class 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical group C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 125000002091 cationic group Chemical group 0.000 description 4
- 239000000470 constituent Substances 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 229920000620 organic polymer Polymers 0.000 description 4
- 238000003980 solgel method Methods 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 4
- FNYWFRSQRHGKJT-UHFFFAOYSA-N 3-ethyl-3-[(3-ethyloxetan-3-yl)methoxymethyl]oxetane Chemical compound C1OCC1(CC)COCC1(CC)COC1 FNYWFRSQRHGKJT-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 125000002723 alicyclic group Chemical group 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 238000009529 body temperature measurement Methods 0.000 description 3
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 3
- 238000010538 cationic polymerization reaction Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- CYIGRWUIQAVBFG-UHFFFAOYSA-N 1,2-bis(2-ethenoxyethoxy)ethane Chemical compound C=COCCOCCOCCOC=C CYIGRWUIQAVBFG-UHFFFAOYSA-N 0.000 description 2
- AOBIOSPNXBMOAT-UHFFFAOYSA-N 2-[2-(oxiran-2-ylmethoxy)ethoxymethyl]oxirane Chemical compound C1OC1COCCOCC1CO1 AOBIOSPNXBMOAT-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 2
- CCDWGDHTPAJHOA-UHFFFAOYSA-N benzylsilicon Chemical compound [Si]CC1=CC=CC=C1 CCDWGDHTPAJHOA-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 150000004292 cyclic ethers Chemical group 0.000 description 2
- 238000013500 data storage Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- VDCSGNNYCFPWFK-UHFFFAOYSA-N diphenylsilane Chemical group C=1C=CC=CC=1[SiH2]C1=CC=CC=C1 VDCSGNNYCFPWFK-UHFFFAOYSA-N 0.000 description 2
- 239000002612 dispersion medium Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 125000003566 oxetanyl group Chemical group 0.000 description 2
- 229920001921 poly-methyl-phenyl-siloxane Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 230000000930 thermomechanical effect Effects 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 229960000834 vinyl ether Drugs 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- ZXHDVRATSGZISC-UHFFFAOYSA-N 1,2-bis(ethenoxy)ethane Chemical compound C=COCCOC=C ZXHDVRATSGZISC-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- UEIPWOFSKAZYJO-UHFFFAOYSA-N 1-(2-ethenoxyethoxy)-2-[2-(2-ethenoxyethoxy)ethoxy]ethane Chemical compound C=COCCOCCOCCOCCOC=C UEIPWOFSKAZYJO-UHFFFAOYSA-N 0.000 description 1
- CZAVRNDQSIORTH-UHFFFAOYSA-N 1-ethenoxy-2,2-bis(ethenoxymethyl)butane Chemical compound C=COCC(CC)(COC=C)COC=C CZAVRNDQSIORTH-UHFFFAOYSA-N 0.000 description 1
- SAMJGBVVQUEMGC-UHFFFAOYSA-N 1-ethenoxy-2-(2-ethenoxyethoxy)ethane Chemical compound C=COCCOCCOC=C SAMJGBVVQUEMGC-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- SYEWHONLFGZGLK-UHFFFAOYSA-N 2-[1,3-bis(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COCC(OCC1OC1)COCC1CO1 SYEWHONLFGZGLK-UHFFFAOYSA-N 0.000 description 1
- HDPLHDGYGLENEI-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COC(C)COCC1CO1 HDPLHDGYGLENEI-UHFFFAOYSA-N 0.000 description 1
- SHKUUQIDMUMQQK-UHFFFAOYSA-N 2-[4-(oxiran-2-ylmethoxy)butoxymethyl]oxirane Chemical compound C1OC1COCCCCOCC1CO1 SHKUUQIDMUMQQK-UHFFFAOYSA-N 0.000 description 1
- WTYYGFLRBWMFRY-UHFFFAOYSA-N 2-[6-(oxiran-2-ylmethoxy)hexoxymethyl]oxirane Chemical compound C1OC1COCCCCCCOCC1CO1 WTYYGFLRBWMFRY-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- RIWRBSMFKVOJMN-UHFFFAOYSA-N 2-methyl-1-phenylpropan-2-ol Chemical compound CC(C)(O)CC1=CC=CC=C1 RIWRBSMFKVOJMN-UHFFFAOYSA-N 0.000 description 1
- SLNCKLVYLZHRKK-UHFFFAOYSA-N 3-ethyl-3-[2-[(3-ethyloxetan-3-yl)methoxy]ethoxymethyl]oxetane Chemical compound C1OCC1(CC)COCCOCC1(CC)COC1 SLNCKLVYLZHRKK-UHFFFAOYSA-N 0.000 description 1
- UXEOSBGULDWPRJ-UHFFFAOYSA-N 3-ethyl-3-[5-[(3-ethyloxetan-3-yl)methoxy]pentoxymethyl]oxetane Chemical compound C1OCC1(CC)COCCCCCOCC1(CC)COC1 UXEOSBGULDWPRJ-UHFFFAOYSA-N 0.000 description 1
- HPINXYMPRYQBGF-UHFFFAOYSA-N 3-ethyl-3-[[3-[(3-ethyloxetan-3-yl)methoxy]-2,2-bis[(3-ethyloxetan-3-yl)methoxymethyl]propoxy]methyl]oxetane Chemical compound C1OCC1(CC)COCC(COCC1(CC)COC1)(COCC1(CC)COC1)COCC1(CC)COC1 HPINXYMPRYQBGF-UHFFFAOYSA-N 0.000 description 1
- LMIOYAVXLAOXJI-UHFFFAOYSA-N 3-ethyl-3-[[4-[(3-ethyloxetan-3-yl)methoxymethyl]phenyl]methoxymethyl]oxetane Chemical compound C=1C=C(COCC2(CC)COC2)C=CC=1COCC1(CC)COC1 LMIOYAVXLAOXJI-UHFFFAOYSA-N 0.000 description 1
- MECNWXGGNCJFQJ-UHFFFAOYSA-N 3-piperidin-1-ylpropane-1,2-diol Chemical compound OCC(O)CN1CCCCC1 MECNWXGGNCJFQJ-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- VUHWCFQPWHCXOE-UHFFFAOYSA-N 6-oxabicyclo[3.1.1]heptan-4-ylmethyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1C(=O)OCC1C(O2)CC2CC1 VUHWCFQPWHCXOE-UHFFFAOYSA-N 0.000 description 1
- ADAHGVUHKDNLEB-UHFFFAOYSA-N Bis(2,3-epoxycyclopentyl)ether Chemical compound C1CC2OC2C1OC1CCC2OC21 ADAHGVUHKDNLEB-UHFFFAOYSA-N 0.000 description 1
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 1
- FIPWRIJSWJWJAI-UHFFFAOYSA-N Butyl carbitol 6-propylpiperonyl ether Chemical compound C1=C(CCC)C(COCCOCCOCCCC)=CC2=C1OCO2 FIPWRIJSWJWJAI-UHFFFAOYSA-N 0.000 description 1
- JNVSHALFPVGANN-UHFFFAOYSA-N C1COCOC1.O=C1CCCCC1 Chemical compound C1COCOC1.O=C1CCCCC1 JNVSHALFPVGANN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004386 Erythritol Substances 0.000 description 1
- UNXHWFMMPAWVPI-UHFFFAOYSA-N Erythritol Natural products OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- DJUWPHRCMMMSCV-UHFFFAOYSA-N bis(7-oxabicyclo[4.1.0]heptan-4-ylmethyl) hexanedioate Chemical compound C1CC2OC2CC1COC(=O)CCCCC(=O)OCC1CC2OC2CC1 DJUWPHRCMMMSCV-UHFFFAOYSA-N 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- FDPIMTJIUBPUKL-UHFFFAOYSA-N dimethylacetone Natural products CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- UNXHWFMMPAWVPI-ZXZARUISSA-N erythritol Chemical compound OC[C@H](O)[C@H](O)CO UNXHWFMMPAWVPI-ZXZARUISSA-N 0.000 description 1
- 235000019414 erythritol Nutrition 0.000 description 1
- 229940009714 erythritol Drugs 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229940052303 ethers for general anesthesia Drugs 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- HOXINJBQVZWYGZ-UHFFFAOYSA-N fenbutatin oxide Chemical compound C=1C=CC=CC=1C(C)(C)C[Sn](O[Sn](CC(C)(C)C=1C=CC=CC=1)(CC(C)(C)C=1C=CC=CC=1)CC(C)(C)C=1C=CC=CC=1)(CC(C)(C)C=1C=CC=CC=1)CC(C)(C)C1=CC=CC=C1 HOXINJBQVZWYGZ-UHFFFAOYSA-N 0.000 description 1
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical class [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- NBTOZLQBSIZIKS-UHFFFAOYSA-N methoxide Chemical compound [O-]C NBTOZLQBSIZIKS-UHFFFAOYSA-N 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N o-dimethylbenzene Natural products CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920001289 polyvinyl ether Polymers 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- DVQHRBFGRZHMSR-UHFFFAOYSA-N sodium methyl 2,2-dimethyl-4,6-dioxo-5-(N-prop-2-enoxy-C-propylcarbonimidoyl)cyclohexane-1-carboxylate Chemical compound [Na+].C=CCON=C(CCC)[C-]1C(=O)CC(C)(C)C(C(=O)OC)C1=O DVQHRBFGRZHMSR-UHFFFAOYSA-N 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/2403—Layers; Shape, structure or physical properties thereof
- G11B7/24035—Recording layers
- G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/249—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing organometallic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
- G11B7/0065—Recording, reproducing or erasing by using optical interference patterns, e.g. holograms
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
- G11B7/2531—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising glass
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Holo Graphy (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
【解決手段】 軟化温度が50℃以上であるマトリックス材料と、室温で液相である光重合性モノマーとを含むホログラム記録材料。ホログラム記録材料全体に対して、マトリックス材料50重量%以上90重量%以下を含むことが好ましい。ホログラム記録材料の軟化温度が0℃以上であることが好ましい。
【選択図】 図1
Description
(1) 軟化温度が50℃以上であるマトリックス材料と、室温で液相である光重合性モノマーとを含むホログラム記録材料。室温とは、20℃〜30℃の温度範囲、例えば25℃を意味する。
Siと、Si以外の他の金属とは、酸素原子を介して結合している、(1) 〜(4) のうちのいずれかに記載のホログラム記録材料。
s≦p<3s、及び
0.3s≦m≦3s の関係を満たしていることが好ましい。具体的には、前記有機金属化合物組成物全体としては、1つのSi原子に1つ以上3つ未満のフェニル基が結合していることが、光重合性化合物やそれの重合により生成する有機ポリマーとの相溶性の観点から好ましい。また、Ti等のSi以外の他の金属の数(m)は、Siの数(s)に対して上記の範囲となることが好ましい。他の金属の数(m)が0.3s未満であると、前記有機金属化合物に2種以上の金属を包含させる効果、すなわち屈折率などの特性の制御が行いやすい効果が薄くなり、一方、他の金属の数(m)が3sを超えて多くなると、前記有機金属化合物全体として、無機マトリックスの性質を帯びやすくなり、相溶性や柔軟性の低下が見られる。
本発明のホログラム記録材料は、前記マトリックス材料と前記光重合性モノマーとをそれぞれ適切な溶媒に溶解させて溶液として、得られた両溶液を混合して、混合後に溶媒を乾燥させて得てもよい。また、前記マトリックス材料の原料物質を前記光重合性モノマーと混合して、混合後に重合反応によって軟化温度が50℃以上となるようにマトリックス材料を形成してもよい。
ジフェニルジメトキシシランと次の構造式で示されるチタンブトキシド多量体を用いて、ゾル−ゲル法により以下の手順で、ホログラム記録材料を作製した。
ジフェニルジメトキシシラン7.8gと、チタンブトキシド多量体(日本曹達製、B−10)7.2gとをテトラヒドロフラン溶媒40mL中で混合し、アルコキシド溶液とした。すなわち、SiとTiのモル比は1:1であった。
水2.1mL、1N塩酸水溶液0.3mL、及びテトラヒドロフラン5mLからなる溶液を、前記アルコキシド溶液に攪拌しながら室温で滴下し、2時間攪拌を続け加水分解反応を行った。このようにして、Si:Ti:フェニル基=1:1:2(モル比)で含む有機金属化合物のゾル溶液Aを得た。
光重合性モノマーとしてポリエチレングリコールジアクリレート(東亜合成製、M−245)を用いた。この光重合性モノマーは、室温で液体であり、粘度は60mPa・sであった。ポリエチレングリコールジアクリレート100重量部に、光重合開始剤としてIRG−784(チバ・スペシャリティ・ケミカルズ)3重量部を加え、混合した。
ホログラム記録材料全体に対して、マトリックス材料(不揮発分として)の割合が67重量%、光重合性モノマーの割合が33重量%となるように、前記ゾル溶液Aと光重合性モノマーとを室温にて混合し、黄色透明なホログラム記録材料溶液Bを得た。
ホログラム記録媒体の概略断面を示す図1を参照して説明する。
片面に反射防止膜(22a) が設けられたガラス基板(22)を準備した。ガラス基板(22)の反射防止膜(22a) が設けられていない面上に、基板の端部(22e) を除いて、得られたホログラム記録材料溶液Bを乾燥膜厚が100μmとなるように塗布し、50℃で24時間乾燥し、溶媒を揮発させた。この乾燥工程により、マトリックス材料のゲル化(重合反応)を進め、マトリックス材料と光重合性モノマーとが均一に分散したホログラム記録材料層(21)を得た。
ホログラム記録材料層(21)が形成された側のガラス基板(22)の前記端部(22e) 上に100μm厚みのスペーサ(24)をおき、ホログラム記録材料層(21)上を片面に反射防止膜(23a) が設けられた別のガラス基板(23)でカバーした。この際、ガラス基板(23)の反射防止膜(23a) が設けられていない面がホログラム記録材料層(21)面と接するようにカバーした。このようにして、ホログラム記録材料層(21)を2枚のガラス基板(22)(23)で挟んだ構造をもつホログラム記録媒体(11)を得た。
軟化温度測定用のガラス基板上に、上記のマトリックス材料のゾル溶液Aを乾燥膜厚が100μmとなるように塗布し、50℃で24時間乾燥し、溶媒を揮発させゲル化を行い、マトリックス材料のみからなる層を得た。
測定条件:昇温速度 3℃/min
荷重 14kPa(0.1N)
圧子(φ:3mm)
窒素ガス雰囲気中にて、−100℃から測定
得られたホログラム記録媒体サンプルについて、図3に示すようなホログラム記録光学系において、特性評価を行った。
ホログラム記録材料全体に対して、マトリックス材料(不揮発分として)の割合が46重量%となるようにした以外は、実施例1と全く同じ操作を行い、ホログラム記録材料を得た。さらに、ホログラム記録媒体を作製した。
実施例2のホログラム記録媒体サンプルについては、前露光処理を行うことなく記録が可能であったが、初期の記録感度は0.002〔M#/(mJ/cm2 )〕と実施例1のサンプルに比べると低い値であった。
比較例1では、マトリックス材料として、室温で液体のフェニルメチルシリコーンオイル(屈折率n=1.58、軟化温度:−15℃以下)を用いた。光重合性モノマー及び光重合開始剤としては、実施例1で用いたのと同じものをそれぞれ用いた。
(21):ホログラム記録材料層
(22a) (23a) :反射防止膜
(22)(23):ガラス基板
(22e) :基板面の端部
(24):スペーサ
(1) :Nd:YAGレーザの光源
(2)(5):レンズ
(3) :ピンホール
(4)(9):シャッター
(8) :ビームスプリッター
(12):パワーメータ
(6)(7)(10):ミラー
Claims (8)
- 軟化温度が50℃以上であるマトリックス材料と、室温で液相である光重合性モノマーとを含むホログラム記録材料。
- ホログラム記録材料全体に対して、前記マトリックス材料50重量%以上90重量%以下を含む、請求項1に記載のホログラム記録材料。
- ホログラム記録材料の軟化温度が0℃以上である、請求項1又は2に記載のホログラム記録材料。
- 前記マトリックス材料は、少なくとも2種の金属、酸素、及び芳香族基を少なくとも有し、且つ2つの芳香族基が1つの金属に直接結合している有機金属単位を有している有機金属化合物であって、軟化温度が50℃以上である有機金属化合物からなる、請求項1〜3のうちのいずれか1項に記載のホログラム記録材料。
- 前記少なくとも2種の金属のうちの1種はSiであり、Si以外の他の金属は、Ti、Zr、Ge、Sn、Al及びZnからなる群から選ばれ、
Siと、Si以外の他の金属とは、酸素原子を介して結合している、請求項1〜4のうちのいずれか1項に記載のホログラム記録材料。 - 前記有機金属単位は、2つの芳香族基が1つのSiに直接結合しているものである、請求項1〜5のうちのいずれか1項に記載のホログラム記録材料。
- さらに光重合開始剤を含む、請求項1〜6のうちのいずれか1項に記載のホログラム記録材料。
- 請求項1〜7のうちのいずれか1項に記載のホログラム記録材料を有する、ホログラム記録媒体。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004140672A JP4461901B2 (ja) | 2004-05-11 | 2004-05-11 | ホログラム記録材料及びホログラム記録媒体 |
US11/579,536 US8343691B2 (en) | 2004-05-11 | 2005-04-25 | Hologram recording material and hologram recording medium |
PCT/JP2005/008315 WO2005109116A1 (ja) | 2004-05-11 | 2005-04-25 | ホログラム記録材料及びホログラム記録媒体 |
CN2005800152959A CN1954271B (zh) | 2004-05-11 | 2005-04-25 | 全息照相记录材料及全息照相记录介质 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004140672A JP4461901B2 (ja) | 2004-05-11 | 2004-05-11 | ホログラム記録材料及びホログラム記録媒体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005321673A true JP2005321673A (ja) | 2005-11-17 |
JP4461901B2 JP4461901B2 (ja) | 2010-05-12 |
Family
ID=35320366
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004140672A Expired - Fee Related JP4461901B2 (ja) | 2004-05-11 | 2004-05-11 | ホログラム記録材料及びホログラム記録媒体 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8343691B2 (ja) |
JP (1) | JP4461901B2 (ja) |
CN (1) | CN1954271B (ja) |
WO (1) | WO2005109116A1 (ja) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007156451A (ja) * | 2005-11-11 | 2007-06-21 | Tdk Corp | ホログラム記録材料及びホログラム記録媒体 |
JP2008090027A (ja) * | 2006-10-03 | 2008-04-17 | Tdk Corp | ホログラム記録材料及びホログラム記録媒体 |
JP2008197273A (ja) * | 2007-02-09 | 2008-08-28 | Tdk Corp | ホログラム記録材料、その製造方法及びホログラム記録媒体 |
JP2008292989A (ja) * | 2007-04-27 | 2008-12-04 | Tdk Corp | ホログラム記録材料、その製造方法及びホログラム記録媒体 |
JP2009098371A (ja) * | 2007-10-16 | 2009-05-07 | Tdk Corp | ホログラム記録媒体 |
JP2009210931A (ja) * | 2008-03-05 | 2009-09-17 | Tdk Corp | ホログラム記録媒体及びその製造方法 |
WO2009119576A1 (ja) * | 2008-03-25 | 2009-10-01 | 日産化学工業株式会社 | 偽造防止ホログラム用感光性組成物及び偽造防止ホログラム媒体 |
US8349524B2 (en) * | 2005-11-11 | 2013-01-08 | Tdk Corporation | Hologram recording material and hologram recording medium |
US8367274B2 (en) * | 2005-11-11 | 2013-02-05 | Tdk Corporation | Hologram recording material, and hologram recording medium |
WO2019112358A1 (ko) * | 2017-12-08 | 2019-06-13 | 주식회사 엘지화학 | 포토폴리머 조성물 |
US11226557B2 (en) | 2017-12-08 | 2022-01-18 | Lg Chem, Ltd. | Photopolymer composition |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4461725B2 (ja) * | 2003-07-10 | 2010-05-12 | Tdk株式会社 | ホログラム記録材料、その製造方法及びホログラム記録媒体 |
JP4461902B2 (ja) * | 2004-05-11 | 2010-05-12 | Tdk株式会社 | ホログラム記録材料及びホログラム記録媒体 |
EP1837870A1 (en) * | 2006-03-20 | 2007-09-26 | Deutsche Thomson-Brandt Gmbh | Pre-exposure and curing of photo-sensitive material for optical data storage |
JP2008058840A (ja) | 2006-09-01 | 2008-03-13 | Tdk Corp | ホログラム記録媒体 |
JP2008058834A (ja) | 2006-09-01 | 2008-03-13 | Tdk Corp | ホログラム記録媒体 |
JP4844299B2 (ja) * | 2006-09-01 | 2011-12-28 | Tdk株式会社 | ホログラム記録材料、その製造方法及びホログラム記録媒体 |
JP2008083405A (ja) * | 2006-09-27 | 2008-04-10 | Tdk Corp | ホログラム記録材料及びホログラム記録媒体 |
US7883821B2 (en) * | 2006-12-15 | 2011-02-08 | Tdk Corporation | Process for producing titanium-containing metal oxide, hologram recording material, process for producing the same, and hologram recording medium |
US8007982B2 (en) * | 2006-12-20 | 2011-08-30 | Sony Corporation | Optical information recording medium |
JP2008164941A (ja) * | 2006-12-28 | 2008-07-17 | Tdk Corp | ホログラム記録媒体 |
JP4893433B2 (ja) * | 2007-04-10 | 2012-03-07 | Tdk株式会社 | 体積型ホログラム記録材料及び体積型ホログラム記録媒体 |
JP5115126B2 (ja) * | 2007-10-05 | 2013-01-09 | Tdk株式会社 | ホログラム記録媒体 |
JP5115125B2 (ja) * | 2007-10-05 | 2013-01-09 | Tdk株式会社 | ホログラム記録材料及びホログラム記録媒体 |
JP2009175367A (ja) * | 2008-01-23 | 2009-08-06 | Tdk Corp | ケイ素含有複合酸化物ゾルの製造方法、ケイ素含有ホログラム記録材料の製造方法及びホログラム記録媒体 |
JP5381494B2 (ja) * | 2008-10-08 | 2014-01-08 | Tdk株式会社 | 体積型ホログラム記録材料及び体積型ホログラム記録媒体 |
JP5533249B2 (ja) | 2010-05-20 | 2014-06-25 | Tdk株式会社 | 体積型ホログラム記録材料及び体積型ホログラム記録媒体 |
JP5889568B2 (ja) | 2011-08-11 | 2016-03-22 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | 酸化タングステン膜形成用組成物およびそれを用いた酸化タングステン膜の製造法 |
US9315636B2 (en) | 2012-12-07 | 2016-04-19 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds, their compositions and methods |
US9201305B2 (en) | 2013-06-28 | 2015-12-01 | Az Electronic Materials (Luxembourg) S.A.R.L. | Spin-on compositions of soluble metal oxide carboxylates and methods of their use |
US9296922B2 (en) | 2013-08-30 | 2016-03-29 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds as hardmasks and filling materials, their compositions and methods of use |
US9409793B2 (en) | 2014-01-14 | 2016-08-09 | Az Electronic Materials (Luxembourg) S.A.R.L. | Spin coatable metallic hard mask compositions and processes thereof |
US9418836B2 (en) | 2014-01-14 | 2016-08-16 | Az Electronic Materials (Luxembourg) S.A.R.L. | Polyoxometalate and heteropolyoxometalate compositions and methods for their use |
US9499698B2 (en) * | 2015-02-11 | 2016-11-22 | Az Electronic Materials (Luxembourg)S.A.R.L. | Metal hardmask composition and processes for forming fine patterns on semiconductor substrates |
KR102399362B1 (ko) | 2017-09-06 | 2022-05-18 | 메르크 파텐트 게엠베하 | 하드 마스크로서 유용한 스핀-온 무기 산화물 함유 조성물 및 개선된 열적 안정성을 지닌 충전 재료 |
GB202004985D0 (en) * | 2020-04-03 | 2020-05-20 | Univ Dublin Technological | Copositions for holographic applications |
Family Cites Families (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5292620A (en) * | 1988-01-15 | 1994-03-08 | E. I. Du Pont De Nemours And Company | Optical waveguide devices, elements for making the devices and methods of making the devices and elements |
EP0324482B1 (en) | 1988-01-15 | 1993-03-31 | E.I. Du Pont De Nemours And Company | Process of forming reflection holograms in photopolymerizable layers |
US4942112A (en) * | 1988-01-15 | 1990-07-17 | E. I. Du Pont De Nemours And Company | Photopolymerizable compositions and elements for refractive index imaging |
US4963471A (en) * | 1989-07-14 | 1990-10-16 | E. I. Du Pont De Nemours And Company | Holographic photopolymer compositions and elements for refractive index imaging |
US6479193B1 (en) * | 1992-06-30 | 2002-11-12 | Nippon Sheet Glass Co., Ltd. | Optical recording film and process for production thereof |
JP3482256B2 (ja) | 1994-10-03 | 2003-12-22 | 日本ペイント株式会社 | 体積ホログラム記録用感光性組成物、及びそれを用いた記録媒体ならびに体積ホログラム形成方法 |
JP2948744B2 (ja) | 1995-03-28 | 1999-09-13 | 株式会社関西新技術研究所 | 感光性有機・無機複合体組成物、その製造方法および該組成物からなるフォトレジスト |
DE69616813T2 (de) | 1995-10-06 | 2002-07-18 | Polaroid Corp | Halographisches aufzeichnungsmaterial und verfahren |
US6268089B1 (en) * | 1998-02-23 | 2001-07-31 | Agere Systems Guardian Corp. | Photorecording medium and process for forming medium |
US6482551B1 (en) | 1998-03-24 | 2002-11-19 | Inphase Technologies | Optical article and process for forming article |
US6103454A (en) * | 1998-03-24 | 2000-08-15 | Lucent Technologies Inc. | Recording medium and process for forming medium |
JP4043681B2 (ja) | 2000-02-23 | 2008-02-06 | 富士フイルム株式会社 | 感光性樹脂組成物及び画像形成方法 |
EP1235104A4 (en) * | 2000-08-29 | 2008-10-01 | Jsr Corp | COMPOSITION HAVING SUBSTANTIALLY MODIFIABLE REFRACTION INDEX AND METHOD FOR FORMING REFRACTION INDEX PATTERN |
EP1231511B1 (en) * | 2001-02-09 | 2014-04-02 | Dai Nippon Printing Co., Ltd. | Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording |
US6743552B2 (en) * | 2001-08-07 | 2004-06-01 | Inphase Technologies, Inc. | Process and composition for rapid mass production of holographic recording article |
JP4164581B2 (ja) | 2002-06-20 | 2008-10-15 | イビデングリーンテック株式会社 | 棒鋼らせん形状曲げ加工機 |
JP2005274587A (ja) * | 2002-08-14 | 2005-10-06 | Konica Minolta Holdings Inc | 光像記録材料、その記録方法およびその製造方法 |
JP4461725B2 (ja) * | 2003-07-10 | 2010-05-12 | Tdk株式会社 | ホログラム記録材料、その製造方法及びホログラム記録媒体 |
US20050036179A1 (en) * | 2003-08-13 | 2005-02-17 | General Electric Company | Holographic storage medium comprising metal-containing high refractive index region, and storage article containing same |
JP4461902B2 (ja) | 2004-05-11 | 2010-05-12 | Tdk株式会社 | ホログラム記録材料及びホログラム記録媒体 |
US8349524B2 (en) * | 2005-11-11 | 2013-01-08 | Tdk Corporation | Hologram recording material and hologram recording medium |
US8367274B2 (en) * | 2005-11-11 | 2013-02-05 | Tdk Corporation | Hologram recording material, and hologram recording medium |
JP2008058840A (ja) * | 2006-09-01 | 2008-03-13 | Tdk Corp | ホログラム記録媒体 |
JP4844299B2 (ja) * | 2006-09-01 | 2011-12-28 | Tdk株式会社 | ホログラム記録材料、その製造方法及びホログラム記録媒体 |
JP2008058834A (ja) * | 2006-09-01 | 2008-03-13 | Tdk Corp | ホログラム記録媒体 |
JP2008083405A (ja) * | 2006-09-27 | 2008-04-10 | Tdk Corp | ホログラム記録材料及びホログラム記録媒体 |
US7883821B2 (en) | 2006-12-15 | 2011-02-08 | Tdk Corporation | Process for producing titanium-containing metal oxide, hologram recording material, process for producing the same, and hologram recording medium |
JP2008164941A (ja) | 2006-12-28 | 2008-07-17 | Tdk Corp | ホログラム記録媒体 |
JP4840179B2 (ja) | 2007-02-09 | 2011-12-21 | Tdk株式会社 | ホログラム記録材料、その製造方法及びホログラム記録媒体 |
JP4893433B2 (ja) * | 2007-04-10 | 2012-03-07 | Tdk株式会社 | 体積型ホログラム記録材料及び体積型ホログラム記録媒体 |
JP4946952B2 (ja) * | 2007-04-27 | 2012-06-06 | Tdk株式会社 | ホログラム記録材料、その製造方法及びホログラム記録媒体 |
JP5115126B2 (ja) | 2007-10-05 | 2013-01-09 | Tdk株式会社 | ホログラム記録媒体 |
JP5115125B2 (ja) | 2007-10-05 | 2013-01-09 | Tdk株式会社 | ホログラム記録材料及びホログラム記録媒体 |
JP5115137B2 (ja) | 2007-10-16 | 2013-01-09 | Tdk株式会社 | ホログラム記録媒体 |
JP2009175367A (ja) | 2008-01-23 | 2009-08-06 | Tdk Corp | ケイ素含有複合酸化物ゾルの製造方法、ケイ素含有ホログラム記録材料の製造方法及びホログラム記録媒体 |
JP5381494B2 (ja) | 2008-10-08 | 2014-01-08 | Tdk株式会社 | 体積型ホログラム記録材料及び体積型ホログラム記録媒体 |
-
2004
- 2004-05-11 JP JP2004140672A patent/JP4461901B2/ja not_active Expired - Fee Related
-
2005
- 2005-04-25 CN CN2005800152959A patent/CN1954271B/zh not_active Expired - Fee Related
- 2005-04-25 US US11/579,536 patent/US8343691B2/en not_active Expired - Fee Related
- 2005-04-25 WO PCT/JP2005/008315 patent/WO2005109116A1/ja active Application Filing
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007156451A (ja) * | 2005-11-11 | 2007-06-21 | Tdk Corp | ホログラム記録材料及びホログラム記録媒体 |
US8367274B2 (en) * | 2005-11-11 | 2013-02-05 | Tdk Corporation | Hologram recording material, and hologram recording medium |
US8349524B2 (en) * | 2005-11-11 | 2013-01-08 | Tdk Corporation | Hologram recording material and hologram recording medium |
JP2008090027A (ja) * | 2006-10-03 | 2008-04-17 | Tdk Corp | ホログラム記録材料及びホログラム記録媒体 |
US7939221B2 (en) * | 2007-02-09 | 2011-05-10 | Tdk Corporation | Hologram recording material, process for producing the same and hologram recording medium |
JP2008197273A (ja) * | 2007-02-09 | 2008-08-28 | Tdk Corp | ホログラム記録材料、その製造方法及びホログラム記録媒体 |
JP2008292989A (ja) * | 2007-04-27 | 2008-12-04 | Tdk Corp | ホログラム記録材料、その製造方法及びホログラム記録媒体 |
JP2009098371A (ja) * | 2007-10-16 | 2009-05-07 | Tdk Corp | ホログラム記録媒体 |
JP2009210931A (ja) * | 2008-03-05 | 2009-09-17 | Tdk Corp | ホログラム記録媒体及びその製造方法 |
WO2009119576A1 (ja) * | 2008-03-25 | 2009-10-01 | 日産化学工業株式会社 | 偽造防止ホログラム用感光性組成物及び偽造防止ホログラム媒体 |
JPWO2009119576A1 (ja) * | 2008-03-25 | 2011-07-28 | 日産化学工業株式会社 | 偽造防止ホログラム用感光性組成物及び偽造防止ホログラム媒体 |
WO2019112358A1 (ko) * | 2017-12-08 | 2019-06-13 | 주식회사 엘지화학 | 포토폴리머 조성물 |
US11226557B2 (en) | 2017-12-08 | 2022-01-18 | Lg Chem, Ltd. | Photopolymer composition |
Also Published As
Publication number | Publication date |
---|---|
CN1954271A (zh) | 2007-04-25 |
JP4461901B2 (ja) | 2010-05-12 |
US20070243473A1 (en) | 2007-10-18 |
CN1954271B (zh) | 2012-01-11 |
US8343691B2 (en) | 2013-01-01 |
WO2005109116A1 (ja) | 2005-11-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4461901B2 (ja) | ホログラム記録材料及びホログラム記録媒体 | |
JP2005321674A (ja) | ホログラム記録材料及びホログラム記録媒体 | |
US8367274B2 (en) | Hologram recording material, and hologram recording medium | |
JP4840179B2 (ja) | ホログラム記録材料、その製造方法及びホログラム記録媒体 | |
JP5115125B2 (ja) | ホログラム記録材料及びホログラム記録媒体 | |
JP4893433B2 (ja) | 体積型ホログラム記録材料及び体積型ホログラム記録媒体 | |
JP4946952B2 (ja) | ホログラム記録材料、その製造方法及びホログラム記録媒体 | |
US8349524B2 (en) | Hologram recording material and hologram recording medium | |
JP4844299B2 (ja) | ホログラム記録材料、その製造方法及びホログラム記録媒体 | |
JP4461725B2 (ja) | ホログラム記録材料、その製造方法及びホログラム記録媒体 | |
JP5115137B2 (ja) | ホログラム記録媒体 | |
JP5115126B2 (ja) | ホログラム記録媒体 | |
JP2008083405A (ja) | ホログラム記録材料及びホログラム記録媒体 | |
JP2008058840A (ja) | ホログラム記録媒体 | |
JP7357992B2 (ja) | ホログラム媒体 | |
JP5286661B2 (ja) | ホログラム記録材料及びホログラム記録媒体 | |
JP5286660B2 (ja) | ホログラム記録材料及びホログラム記録媒体 | |
JP4550616B2 (ja) | 体積ホログラム記録用感光性組成物およびそれを用いる体積ホログラム記録媒体の製造方法 | |
JP4816389B2 (ja) | ホログラム記録材料及びホログラム記録媒体 | |
KR20240064249A (ko) | 포토폴리머 조성물, 홀로그램 기록 매체, 이의 제조 방법 및 이를 포함하는 광학 소자 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20061121 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20091104 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091228 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100126 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100208 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130226 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140226 Year of fee payment: 4 |
|
LAPS | Cancellation because of no payment of annual fees |