JP2005316486A5 - - Google Patents
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- Publication number
- JP2005316486A5 JP2005316486A5 JP2005130357A JP2005130357A JP2005316486A5 JP 2005316486 A5 JP2005316486 A5 JP 2005316486A5 JP 2005130357 A JP2005130357 A JP 2005130357A JP 2005130357 A JP2005130357 A JP 2005130357A JP 2005316486 A5 JP2005316486 A5 JP 2005316486A5
- Authority
- JP
- Japan
- Prior art keywords
- design
- optimizing
- evaluation
- corner
- determining
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US55783304P | 2004-03-31 | 2004-03-31 | |
| US60/557833 | 2004-03-31 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005316486A JP2005316486A (ja) | 2005-11-10 |
| JP2005316486A5 true JP2005316486A5 (enExample) | 2007-06-28 |
| JP4727288B2 JP4727288B2 (ja) | 2011-07-20 |
Family
ID=35539303
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005130357A Expired - Fee Related JP4727288B2 (ja) | 2004-03-31 | 2005-03-31 | 基板上に形成されるデザインを最適化する方法及びプログラム |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7856606B2 (enExample) |
| EP (1) | EP1582934A3 (enExample) |
| JP (1) | JP4727288B2 (enExample) |
| KR (1) | KR100847100B1 (enExample) |
| CN (1) | CN1749861B (enExample) |
| SG (1) | SG115825A1 (enExample) |
| TW (1) | TWI385546B (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7349066B2 (en) * | 2005-05-05 | 2008-03-25 | Asml Masktools B.V. | Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence |
| US7962868B2 (en) | 2005-10-28 | 2011-06-14 | Freescale Semiconductor, Inc. | Method for forming a semiconductor device using optical proximity correction for the optical lithography |
| US8370773B2 (en) | 2006-08-16 | 2013-02-05 | Freescale Semiconductor, Inc. | Method and apparatus for designing an integrated circuit using inverse lithography technology |
| US7707539B2 (en) * | 2007-09-28 | 2010-04-27 | Synopsys, Inc. | Facilitating process model accuracy by modeling mask corner rounding effects |
| US8132128B2 (en) * | 2008-10-31 | 2012-03-06 | Synopsys, Inc. | Method and system for performing lithography verification for a double-patterning process |
| CN104570584B (zh) * | 2013-10-16 | 2019-06-28 | 中芯国际集成电路制造(上海)有限公司 | 一种缺口线端的opc修正方法 |
| US9791786B1 (en) * | 2016-04-08 | 2017-10-17 | Applied Materials, Inc. | Method to reduce line waviness |
| CN117706861A (zh) | 2022-09-08 | 2024-03-15 | 联华电子股份有限公司 | 光掩模结构 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3331822B2 (ja) | 1995-07-17 | 2002-10-07 | ソニー株式会社 | マスクパターン補正方法とそれを用いたマスク、露光方法および半導体装置 |
| EP0824722B1 (en) | 1996-03-06 | 2001-07-25 | Asm Lithography B.V. | Differential interferometer system and lithographic step-and-scan apparatus provided with such a system |
| JP3551660B2 (ja) * | 1996-10-29 | 2004-08-11 | ソニー株式会社 | 露光パターンの補正方法および露光パターンの補正装置および露光方法 |
| DE69717975T2 (de) | 1996-12-24 | 2003-05-28 | Asml Netherlands B.V., Veldhoven | In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät |
| US6262796B1 (en) | 1997-03-10 | 2001-07-17 | Asm Lithography B.V. | Positioning device having two object holders |
| JPH11121361A (ja) | 1997-10-20 | 1999-04-30 | Canon Inc | 露光方法 |
| JP2000100692A (ja) | 1998-09-21 | 2000-04-07 | Toshiba Corp | 設計パターン補正方法 |
| US6248485B1 (en) | 1999-07-19 | 2001-06-19 | Lucent Technologies Inc. | Method for controlling a process for patterning a feature in a photoresist |
| JP2001159809A (ja) * | 1999-09-21 | 2001-06-12 | Toshiba Corp | マスクパターン設計装置、マスクパターン設計方法およびマスクパターン設計プログラムを格納したコンピュータ読取り可能な記録媒体 |
| JP2001183804A (ja) | 1999-12-24 | 2001-07-06 | Mitsubishi Electric Corp | レイアウト補正装置 |
| US6453457B1 (en) * | 2000-09-29 | 2002-09-17 | Numerical Technologies, Inc. | Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layout |
| US6625801B1 (en) | 2000-09-29 | 2003-09-23 | Numerical Technologies, Inc. | Dissection of printed edges from a fabrication layout for correcting proximity effects |
| US6665856B1 (en) | 2000-12-01 | 2003-12-16 | Numerical Technologies, Inc. | Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects |
| JP2002250999A (ja) | 2001-02-26 | 2002-09-06 | Mitsubishi Electric Corp | パターン補正装置、方法、パターン補正を行うためのコンピュータプログラム、および、そのようなプログラムを記録した記録媒体 |
| JP2003059809A (ja) | 2001-08-20 | 2003-02-28 | Nikon Corp | 露光方法及びデバイス製造方法 |
| US6763514B2 (en) | 2001-12-12 | 2004-07-13 | Numerical Technologies, Inc. | Method and apparatus for controlling rippling during optical proximity correction |
| TWI236574B (en) | 2002-02-08 | 2005-07-21 | Sony Corp | Forming method of exposure mask pattern, exposure mask pattern and manufacturing method of semiconductor device |
| JP4152647B2 (ja) | 2002-03-06 | 2008-09-17 | 富士通株式会社 | 近接効果補正方法及びプログラム |
| JP3871949B2 (ja) | 2002-03-27 | 2007-01-24 | 株式会社東芝 | マスクデータ作成装置及びマスクデータ作成方法 |
| US7043712B2 (en) * | 2003-09-09 | 2006-05-09 | International Business Machines Corporation | Method for adaptive segment refinement in optical proximity correction |
| JP4247104B2 (ja) * | 2003-12-18 | 2009-04-02 | 株式会社東芝 | パターン検証方法、パターン検証システム |
| JP2005215587A (ja) | 2004-02-02 | 2005-08-11 | Sony Corp | 位相シフトマスクの製造方法 |
| JP2009034095A (ja) | 2007-07-06 | 2009-02-19 | Sanyo Chem Ind Ltd | タンパク質含有水溶液安定化剤、タンパク質含有水溶液の安定化方法及びタンパク質含有水溶液 |
-
2005
- 2005-03-30 US US11/092,983 patent/US7856606B2/en active Active
- 2005-03-31 JP JP2005130357A patent/JP4727288B2/ja not_active Expired - Fee Related
- 2005-03-31 CN CN2005100685372A patent/CN1749861B/zh not_active Expired - Fee Related
- 2005-03-31 SG SG200502034A patent/SG115825A1/en unknown
- 2005-03-31 EP EP05252042A patent/EP1582934A3/en not_active Withdrawn
- 2005-03-31 TW TW094110374A patent/TWI385546B/zh not_active IP Right Cessation
- 2005-03-31 KR KR1020050027091A patent/KR100847100B1/ko not_active Expired - Fee Related
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