JP2005307288A - 炭素系膜及び炭素系膜形成装置 - Google Patents
炭素系膜及び炭素系膜形成装置 Download PDFInfo
- Publication number
- JP2005307288A JP2005307288A JP2004126645A JP2004126645A JP2005307288A JP 2005307288 A JP2005307288 A JP 2005307288A JP 2004126645 A JP2004126645 A JP 2004126645A JP 2004126645 A JP2004126645 A JP 2004126645A JP 2005307288 A JP2005307288 A JP 2005307288A
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- based film
- cathode
- film
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052799 carbon Inorganic materials 0.000 title claims abstract description 114
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 113
- 239000007789 gas Substances 0.000 claims abstract description 71
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 57
- 239000001257 hydrogen Substances 0.000 claims abstract description 52
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 52
- 238000010891 electric arc Methods 0.000 claims abstract description 48
- 239000000463 material Substances 0.000 claims abstract description 34
- 238000001704 evaporation Methods 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims description 46
- 230000008020 evaporation Effects 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 15
- 239000011261 inert gas Substances 0.000 claims description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 239000004215 Carbon black (E152) Substances 0.000 claims description 5
- 239000001307 helium Substances 0.000 claims description 5
- 229910052734 helium Inorganic materials 0.000 claims description 5
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 5
- 229930195733 hydrocarbon Natural products 0.000 claims description 5
- 150000002430 hydrocarbons Chemical class 0.000 claims description 5
- 229910052754 neon Inorganic materials 0.000 claims description 5
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims description 5
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 238000007542 hardness measurement Methods 0.000 claims description 4
- 238000001069 Raman spectroscopy Methods 0.000 claims description 3
- 238000001228 spectrum Methods 0.000 claims description 3
- 230000000087 stabilizing effect Effects 0.000 claims description 2
- 230000006641 stabilisation Effects 0.000 abstract description 2
- 238000011105 stabilization Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 35
- 230000015572 biosynthetic process Effects 0.000 description 20
- 238000000151 deposition Methods 0.000 description 10
- 230000008021 deposition Effects 0.000 description 7
- 239000010406 cathode material Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 229910001315 Tool steel Inorganic materials 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 239000002356 single layer Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229910000851 Alloy steel Inorganic materials 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 238000005513 bias potential Methods 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- -1 etc.) Inorganic materials 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000000752 ionisation method Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004126645A JP2005307288A (ja) | 2004-04-22 | 2004-04-22 | 炭素系膜及び炭素系膜形成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004126645A JP2005307288A (ja) | 2004-04-22 | 2004-04-22 | 炭素系膜及び炭素系膜形成装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006344465A Division JP2007126754A (ja) | 2006-12-21 | 2006-12-21 | 真空アーク蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005307288A true JP2005307288A (ja) | 2005-11-04 |
| JP2005307288A5 JP2005307288A5 (enExample) | 2007-02-15 |
Family
ID=35436384
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004126645A Pending JP2005307288A (ja) | 2004-04-22 | 2004-04-22 | 炭素系膜及び炭素系膜形成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005307288A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009066633A1 (ja) * | 2007-11-21 | 2009-05-28 | Kabushiki Kaisha Kobe Seiko Sho | アークイオンプレーティング装置用の蒸発源及びアークイオンプレーティング装置 |
| WO2018207803A1 (ja) * | 2017-05-11 | 2018-11-15 | 日本アイ・ティ・エフ株式会社 | 硬質炭素膜とその製造方法および摺動部材 |
| WO2019059054A1 (ja) * | 2017-09-25 | 2019-03-28 | 住友電気工業株式会社 | 硬質炭素系被膜の製造方法、及び被膜付き部材 |
| US11613805B2 (en) * | 2015-02-26 | 2023-03-28 | Raytheon Technologies Corporation | Systems and methods for optimal source material deposition along hole edges |
-
2004
- 2004-04-22 JP JP2004126645A patent/JP2005307288A/ja active Pending
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009066633A1 (ja) * | 2007-11-21 | 2009-05-28 | Kabushiki Kaisha Kobe Seiko Sho | アークイオンプレーティング装置用の蒸発源及びアークイオンプレーティング装置 |
| US11613805B2 (en) * | 2015-02-26 | 2023-03-28 | Raytheon Technologies Corporation | Systems and methods for optimal source material deposition along hole edges |
| WO2018207803A1 (ja) * | 2017-05-11 | 2018-11-15 | 日本アイ・ティ・エフ株式会社 | 硬質炭素膜とその製造方法および摺動部材 |
| JP2018188712A (ja) * | 2017-05-11 | 2018-11-29 | 日本アイ・ティ・エフ株式会社 | 硬質炭素膜とその製造方法および摺動部材 |
| CN110612361A (zh) * | 2017-05-11 | 2019-12-24 | 日本Itf株式会社 | 硬质碳膜与其制造方法及滑动构件 |
| US20210156021A1 (en) * | 2017-05-11 | 2021-05-27 | Nippon Itf, Inc. | Hard carbon film, manufacturing method for same, and sliding member |
| CN110612361B (zh) * | 2017-05-11 | 2022-01-25 | 日本Itf株式会社 | 硬质碳膜与其制造方法及滑动构件 |
| US11851741B2 (en) | 2017-05-11 | 2023-12-26 | Nippon Itf, Inc. | Hard carbon film, manufacturing method for same, and sliding member |
| WO2019059054A1 (ja) * | 2017-09-25 | 2019-03-28 | 住友電気工業株式会社 | 硬質炭素系被膜の製造方法、及び被膜付き部材 |
| JPWO2019059054A1 (ja) * | 2017-09-25 | 2020-10-15 | 住友電気工業株式会社 | 硬質炭素系被膜の製造方法、及び被膜付き部材 |
| JP7122316B2 (ja) | 2017-09-25 | 2022-08-19 | 住友電気工業株式会社 | 硬質炭素系被膜の製造方法、及び被膜付き部材 |
| US12084777B2 (en) | 2017-09-25 | 2024-09-10 | Sumitomo Electric Industries, Ltd. | Method for manufacturing hard carbon-based coating, and member provided with coating |
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