JP2005302791A5 - - Google Patents

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Publication number
JP2005302791A5
JP2005302791A5 JP2004112535A JP2004112535A JP2005302791A5 JP 2005302791 A5 JP2005302791 A5 JP 2005302791A5 JP 2004112535 A JP2004112535 A JP 2004112535A JP 2004112535 A JP2004112535 A JP 2004112535A JP 2005302791 A5 JP2005302791 A5 JP 2005302791A5
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JP
Japan
Prior art keywords
shots
processed
light
wavelength
detecting
Prior art date
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Application number
JP2004112535A
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English (en)
Japanese (ja)
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JP2005302791A (ja
JP4497988B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2004112535A priority Critical patent/JP4497988B2/ja
Priority claimed from JP2004112535A external-priority patent/JP4497988B2/ja
Priority to US11/002,906 priority patent/US7253885B2/en
Publication of JP2005302791A publication Critical patent/JP2005302791A/ja
Priority to US11/695,705 priority patent/US7551262B2/en
Publication of JP2005302791A5 publication Critical patent/JP2005302791A5/ja
Application granted granted Critical
Publication of JP4497988B2 publication Critical patent/JP4497988B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004112535A 2003-12-05 2004-04-06 露光装置及び方法、並びに、波長選択方法 Expired - Fee Related JP4497988B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004112535A JP4497988B2 (ja) 2004-04-06 2004-04-06 露光装置及び方法、並びに、波長選択方法
US11/002,906 US7253885B2 (en) 2003-12-05 2004-12-03 Wavelength selecting method, position detecting method and apparatus, exposure method and apparatus, and device manufacturing method
US11/695,705 US7551262B2 (en) 2003-12-05 2007-04-03 Exposure apparatus having a position detecting system and a wavelength detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004112535A JP4497988B2 (ja) 2004-04-06 2004-04-06 露光装置及び方法、並びに、波長選択方法

Publications (3)

Publication Number Publication Date
JP2005302791A JP2005302791A (ja) 2005-10-27
JP2005302791A5 true JP2005302791A5 (enExample) 2007-05-24
JP4497988B2 JP4497988B2 (ja) 2010-07-07

Family

ID=35333966

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004112535A Expired - Fee Related JP4497988B2 (ja) 2003-12-05 2004-04-06 露光装置及び方法、並びに、波長選択方法

Country Status (1)

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JP (1) JP4497988B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6160850B2 (ja) * 2015-01-28 2017-07-12 株式会社東京精密 レーザーダイシング装置
JP2020112605A (ja) * 2019-01-08 2020-07-27 キヤノン株式会社 露光装置およびその制御方法、および、物品製造方法
DE102021204170B4 (de) * 2021-04-27 2024-09-26 Carl Zeiss Smt Gmbh Messvorrichtung sowie Verfahren zur Messung einer Wirkung einer wellenlängenabhängigen Messlicht-Reflektivität sowie einer Wirkung einer Polarisation von Messlicht auf eine Messlicht-Beaufschlagung einer Lithografiemaske

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61128522A (ja) * 1984-11-28 1986-06-16 Hitachi Ltd 焦点合せ装置
JP2786270B2 (ja) * 1989-09-27 1998-08-13 株式会社日立製作所 干渉式傾きもしくは高さ検出装置並びに縮小投影式露光装置及びその方法
JPH08111361A (ja) * 1994-10-11 1996-04-30 Nikon Corp 面位置検出装置
JP3780221B2 (ja) * 2002-03-26 2006-05-31 キヤノン株式会社 露光方法及び装置

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