JP2005283896A5 - - Google Patents

Download PDF

Info

Publication number
JP2005283896A5
JP2005283896A5 JP2004096564A JP2004096564A JP2005283896A5 JP 2005283896 A5 JP2005283896 A5 JP 2005283896A5 JP 2004096564 A JP2004096564 A JP 2004096564A JP 2004096564 A JP2004096564 A JP 2004096564A JP 2005283896 A5 JP2005283896 A5 JP 2005283896A5
Authority
JP
Japan
Prior art keywords
recording
stage
positional deviation
exposure apparatus
recording medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004096564A
Other languages
English (en)
Japanese (ja)
Other versions
JP4472403B2 (ja
JP2005283896A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004096564A priority Critical patent/JP4472403B2/ja
Priority claimed from JP2004096564A external-priority patent/JP4472403B2/ja
Priority to KR1020050025427A priority patent/KR100696968B1/ko
Priority to US11/090,070 priority patent/US20050225788A1/en
Publication of JP2005283896A publication Critical patent/JP2005283896A/ja
Publication of JP2005283896A5 publication Critical patent/JP2005283896A5/ja
Application granted granted Critical
Publication of JP4472403B2 publication Critical patent/JP4472403B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004096564A 2004-03-29 2004-03-29 露光装置及び露光方法 Expired - Fee Related JP4472403B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004096564A JP4472403B2 (ja) 2004-03-29 2004-03-29 露光装置及び露光方法
KR1020050025427A KR100696968B1 (ko) 2004-03-29 2005-03-28 노광 장치 및 방법
US11/090,070 US20050225788A1 (en) 2004-03-29 2005-03-28 Exposure apparatus and exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004096564A JP4472403B2 (ja) 2004-03-29 2004-03-29 露光装置及び露光方法

Publications (3)

Publication Number Publication Date
JP2005283896A JP2005283896A (ja) 2005-10-13
JP2005283896A5 true JP2005283896A5 (enExample) 2007-02-01
JP4472403B2 JP4472403B2 (ja) 2010-06-02

Family

ID=35060218

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004096564A Expired - Fee Related JP4472403B2 (ja) 2004-03-29 2004-03-29 露光装置及び露光方法

Country Status (3)

Country Link
US (1) US20050225788A1 (enExample)
JP (1) JP4472403B2 (enExample)
KR (1) KR100696968B1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4752286B2 (ja) * 2004-12-28 2011-08-17 株式会社ニコン 位置調整装置の制御方法、位置調整装置、及び露光装置
JP4606992B2 (ja) * 2005-10-20 2011-01-05 富士フイルム株式会社 描画装置及び描画方法
US8482732B2 (en) * 2007-10-01 2013-07-09 Maskless Lithography, Inc. Alignment system for various materials and material flows
US7847938B2 (en) * 2007-10-01 2010-12-07 Maskless Lithography, Inc. Alignment system for optical lithography
US8335999B2 (en) * 2010-06-11 2012-12-18 Orbotech Ltd. System and method for optical shearing
JP5424271B2 (ja) 2010-11-08 2014-02-26 株式会社ブイ・テクノロジー 露光装置
JP5685756B2 (ja) 2010-11-10 2015-03-18 株式会社ブイ・テクノロジー フィルム露光方法
WO2021221633A1 (en) * 2020-04-29 2021-11-04 Applied Materials, Inc. Image stabilization for digital lithography
KR20230008866A (ko) * 2020-05-13 2023-01-16 카티바, 인크. 스트로브 led 광원을 이용한 액적 측정
TWI765567B (zh) 2021-02-08 2022-05-21 上銀科技股份有限公司 量測進給系統的位置誤差的方法
CN113960890B (zh) * 2021-10-22 2023-12-15 深圳市先地图像科技有限公司 一种激光成像设备中的运动组件控制方法及相关设备

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5002364A (en) * 1986-03-04 1991-03-26 Georgia Tech Research Corp. Stereoscopic process and apparatus using different deviations of different colors
JPH07302748A (ja) * 1994-05-02 1995-11-14 Canon Inc 半導体露光装置
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置

Similar Documents

Publication Publication Date Title
ES2424891T3 (es) Bastidor de montaje y procedimiento para ajustar un cilindro
JP2005283896A5 (enExample)
CN102439962B (zh) 一种记录装置以及一种用于改变记录装置的校准的方法
JP2012133582A5 (enExample)
JP5515432B2 (ja) 三次元形状計測装置
JPH11162832A5 (enExample)
KR20070105997A (ko) 화상 렌더링 장치의 교정 방법 및 화상 렌더링 장치
US8154572B2 (en) Adjusting the calibration of an imaging system
JP2016205957A (ja) Ｘ−ｙ基板検査装置の可動ヘッド位置補正方法およびｘ−ｙ基板検査装置
JP4472403B2 (ja) 露光装置及び露光方法
JP4328301B2 (ja) 露光装置及び露光方法
KR100763431B1 (ko) 노광 장치 및 노광 방법
CN116592757A (zh) 一种测量系统的二维精度补偿方法
US8132886B2 (en) Adjusting the calibration of a recording apparatus with recording head movement changes
CN102422625B (zh) 一种记录装置以及一种用于改变记录装置的校准的方法
KR101261353B1 (ko) 묘화점 데이터 취득 방법 및 장치, 묘화 방법 및 장치
WO2006090823A1 (ja) 位置合わせ機能の校正方法
KR20080032213A (ko) 묘화 방법 및 장치
KR20170038657A (ko) 보정 정보 생성 장치, 묘화 장치, 보정 정보 생성 방법 및 묘화 방법
JP4294229B2 (ja) 走査光学系ビーム測定装置および走査光学系ビーム測定方法
US20100305776A1 (en) Adjusting the calibration of an imaging system
JP2008283117A (ja) レーザダイオードの調整方法及び調整装置
JP2007058207A (ja) 描画方法および装置
JP2008032896A (ja) 画像露光記録装置及び記録方法
JP2007313744A (ja) 液体噴射ヘッドの検査方法