JP2005277005A5 - - Google Patents

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Publication number
JP2005277005A5
JP2005277005A5 JP2004086631A JP2004086631A JP2005277005A5 JP 2005277005 A5 JP2005277005 A5 JP 2005277005A5 JP 2004086631 A JP2004086631 A JP 2004086631A JP 2004086631 A JP2004086631 A JP 2004086631A JP 2005277005 A5 JP2005277005 A5 JP 2005277005A5
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JP
Japan
Prior art keywords
reaction tube
reaction
reaction chamber
heating
detection unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004086631A
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English (en)
Japanese (ja)
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JP2005277005A (ja
JP4422525B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2004086631A priority Critical patent/JP4422525B2/ja
Priority claimed from JP2004086631A external-priority patent/JP4422525B2/ja
Publication of JP2005277005A publication Critical patent/JP2005277005A/ja
Publication of JP2005277005A5 publication Critical patent/JP2005277005A5/ja
Application granted granted Critical
Publication of JP4422525B2 publication Critical patent/JP4422525B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004086631A 2004-03-24 2004-03-24 半導体製造装置 Expired - Fee Related JP4422525B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004086631A JP4422525B2 (ja) 2004-03-24 2004-03-24 半導体製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004086631A JP4422525B2 (ja) 2004-03-24 2004-03-24 半導体製造装置

Publications (3)

Publication Number Publication Date
JP2005277005A JP2005277005A (ja) 2005-10-06
JP2005277005A5 true JP2005277005A5 (enExample) 2007-10-25
JP4422525B2 JP4422525B2 (ja) 2010-02-24

Family

ID=35176361

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004086631A Expired - Fee Related JP4422525B2 (ja) 2004-03-24 2004-03-24 半導体製造装置

Country Status (1)

Country Link
JP (1) JP4422525B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3007511B1 (fr) * 2013-06-19 2017-09-08 Herakles Installation pour traitements thermiques de produits en materiau composite comprenant des moyens de mesure de temperature delocalises
JP6087323B2 (ja) * 2014-07-31 2017-03-01 東京エレクトロン株式会社 熱処理装置、熱処理方法及びその熱処理方法を実行させるためのプログラムを記録した記録媒体
CN115747956A (zh) * 2022-12-05 2023-03-07 宁波恒普真空科技股份有限公司 一种应用于立式成膜设备的热场

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