JP2005274155A - 欠陥検査装置 - Google Patents
欠陥検査装置 Download PDFInfo
- Publication number
- JP2005274155A JP2005274155A JP2004083568A JP2004083568A JP2005274155A JP 2005274155 A JP2005274155 A JP 2005274155A JP 2004083568 A JP2004083568 A JP 2004083568A JP 2004083568 A JP2004083568 A JP 2004083568A JP 2005274155 A JP2005274155 A JP 2005274155A
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- JP
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- Prior art keywords
- imaging
- subject
- image
- wavelength
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000007689 inspection Methods 0.000 title claims abstract description 95
- 238000003384 imaging method Methods 0.000 claims abstract description 118
- 238000005286 illumination Methods 0.000 claims abstract description 44
- 230000004907 flux Effects 0.000 claims abstract description 16
- 238000001514 detection method Methods 0.000 claims abstract description 11
- 230000007547 defect Effects 0.000 claims description 109
- 230000003287 optical effect Effects 0.000 claims description 22
- 238000003491 array Methods 0.000 claims description 5
- 238000012545 processing Methods 0.000 description 17
- 238000012546 transfer Methods 0.000 description 11
- 239000000758 substrate Substances 0.000 description 10
- 230000008859 change Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 229910052736 halogen Inorganic materials 0.000 description 7
- 150000002367 halogens Chemical class 0.000 description 7
- 239000013307 optical fiber Substances 0.000 description 7
- 230000010355 oscillation Effects 0.000 description 6
- 230000003595 spectral effect Effects 0.000 description 6
- 238000009825 accumulation Methods 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000002950 deficient Effects 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000000284 extract Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- 239000000428 dust Substances 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Images
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004083568A JP2005274155A (ja) | 2004-03-22 | 2004-03-22 | 欠陥検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004083568A JP2005274155A (ja) | 2004-03-22 | 2004-03-22 | 欠陥検査装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005274155A true JP2005274155A (ja) | 2005-10-06 |
| JP2005274155A5 JP2005274155A5 (enExample) | 2007-05-10 |
Family
ID=35174007
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004083568A Pending JP2005274155A (ja) | 2004-03-22 | 2004-03-22 | 欠陥検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005274155A (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014027319A (ja) * | 2013-11-06 | 2014-02-06 | Sokudo Co Ltd | 基板処理装置および検査周辺露光システム |
| KR20160014196A (ko) * | 2014-07-28 | 2016-02-11 | 삼성전자주식회사 | 반도체 계측 시스템 및 이를 이용한 반도체 소자의 계측 방법 |
| JP2017524978A (ja) * | 2014-06-20 | 2017-08-31 | カール ツァイス マイクロスコピー ゲーエムベーハーCarl Zeiss Microscopy Gmbh | 音響光学部品を駆動するための方法及び装置 |
| WO2020152866A1 (ja) * | 2019-01-25 | 2020-07-30 | タカノ株式会社 | 画像検査装置 |
| JP2023023328A (ja) * | 2021-08-05 | 2023-02-16 | 株式会社ディスコ | 検査装置 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01250708A (ja) * | 1988-03-30 | 1989-10-05 | Dainippon Screen Mfg Co Ltd | 薄膜パターンの検出装置 |
| JP2000046532A (ja) * | 1998-07-30 | 2000-02-18 | Nidek Co Ltd | パターン検査装置 |
| JP2003148921A (ja) * | 2001-11-15 | 2003-05-21 | Seiko Epson Corp | 形状測定方法及び装置 |
| JP2003177329A (ja) * | 2001-10-03 | 2003-06-27 | Olympus Optical Co Ltd | 走査型レーザ顕微鏡 |
-
2004
- 2004-03-22 JP JP2004083568A patent/JP2005274155A/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01250708A (ja) * | 1988-03-30 | 1989-10-05 | Dainippon Screen Mfg Co Ltd | 薄膜パターンの検出装置 |
| JP2000046532A (ja) * | 1998-07-30 | 2000-02-18 | Nidek Co Ltd | パターン検査装置 |
| JP2003177329A (ja) * | 2001-10-03 | 2003-06-27 | Olympus Optical Co Ltd | 走査型レーザ顕微鏡 |
| JP2003148921A (ja) * | 2001-11-15 | 2003-05-21 | Seiko Epson Corp | 形状測定方法及び装置 |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014027319A (ja) * | 2013-11-06 | 2014-02-06 | Sokudo Co Ltd | 基板処理装置および検査周辺露光システム |
| JP2017524978A (ja) * | 2014-06-20 | 2017-08-31 | カール ツァイス マイクロスコピー ゲーエムベーハーCarl Zeiss Microscopy Gmbh | 音響光学部品を駆動するための方法及び装置 |
| US10302490B2 (en) | 2014-06-20 | 2019-05-28 | Carl Zeiss Microscopy Gmbh | Method and apparatus for actuating an acousto-optical component |
| KR20160014196A (ko) * | 2014-07-28 | 2016-02-11 | 삼성전자주식회사 | 반도체 계측 시스템 및 이를 이용한 반도체 소자의 계측 방법 |
| KR102292209B1 (ko) * | 2014-07-28 | 2021-08-25 | 삼성전자주식회사 | 반도체 계측 시스템 및 이를 이용한 반도체 소자의 계측 방법 |
| WO2020152866A1 (ja) * | 2019-01-25 | 2020-07-30 | タカノ株式会社 | 画像検査装置 |
| JP2023023328A (ja) * | 2021-08-05 | 2023-02-16 | 株式会社ディスコ | 検査装置 |
| JP7704609B2 (ja) | 2021-08-05 | 2025-07-08 | 株式会社ディスコ | 検査装置 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Effective date: 20070320 Free format text: JAPANESE INTERMEDIATE CODE: A523 |
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| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070320 |
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| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20090918 |
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| A131 | Notification of reasons for refusal |
Effective date: 20091208 Free format text: JAPANESE INTERMEDIATE CODE: A131 |
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| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20100928 |