JP2005268427A - Method for manufacturing etching foil for aluminum electrode capacitor - Google Patents

Method for manufacturing etching foil for aluminum electrode capacitor Download PDF

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JP2005268427A
JP2005268427A JP2004076648A JP2004076648A JP2005268427A JP 2005268427 A JP2005268427 A JP 2005268427A JP 2004076648 A JP2004076648 A JP 2004076648A JP 2004076648 A JP2004076648 A JP 2004076648A JP 2005268427 A JP2005268427 A JP 2005268427A
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etching
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Kiyoshi Narisawa
清志 成沢
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Nichicon Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a highly productive etching method for realizing the increase of the capacitance of an etching foil for an aluminum electrode capacitor. <P>SOLUTION: In this etching process for roughening aluminum or an aluminum alloy foil by AC application in etching solution containing chlorine ion; the waveform of AC currents is constituted of principal waveform and complementary waveform, the main waveform is AC waveform of 2 cycles or more, the frequency of complementary waveform is made higher than the frequency of principal waveform, and the complementary waveform is AC waveform of 2 to 10 cycles. The AC waveform is repeated while the impression time of the principal waveform is 1 to 30 seconds, and the rate of the maximum amplitude of the complementary waveform to the maximum amplitude of the principal waveform is 0.5 to 1.2. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、アルミニウム電解コンデンサ用エッチング箔(以下、エッチング箔と称す)の製造方法に関するものである。   The present invention relates to a method for producing an aluminum electrolytic capacitor etching foil (hereinafter referred to as an etching foil).

エッチング箔の製造においては、その実効表面積を拡大し、電解コンデンサの静電容量を上げるため、塩酸を含む溶液中で直流または交流を印加してエッチング処理が施される。
エッチング処理には従来から化学エッチング、電解エッチングなどが採用されているが、低圧用陽極箔については、交流電流を用いた電解エッチングが広く行われている(例えば非特許文献1参照)。
永田伊佐也著、「電解液陰極アルミニウム電解コンデンサ(アルミニウム乾式電解コンデンサ増補改訂版 日本蓄電器工業株式会社出版、1997年2月24日、第2版第1刷)p.226〜228、p.236〜239
In manufacturing the etching foil, in order to increase the effective surface area and increase the capacitance of the electrolytic capacitor, the etching process is performed by applying direct current or alternating current in a solution containing hydrochloric acid.
Conventionally, chemical etching, electrolytic etching, and the like have been employed for the etching process, but electrolytic etching using an alternating current is widely performed for the low-pressure anode foil (see, for example, Non-Patent Document 1).
By Isaya Nagata, “Electrolyte cathode aluminum electrolytic capacitor (aluminum dry electrolytic capacitor augmented and revised edition, published by Nihon Densetsu Kogyo Co., Ltd., February 24, 1997, second edition, first edition) p.226-228, p.236 ~ 239

エッチング方法の創意・工夫により、有効拡面倍率が向上し、高容量エッチング箔の製造が可能となってきているが、近年、従来にもましてコンデンサの小形化の必要性が高まっており、更なる高容量化を図る必要がある。
エッチング箔の容量を高めるためには、厚さ当たりの容量を高くする必要があり、エッチング液組成の工夫や改善が行われる一方で、使用する交流電源の周波数や波形に関する発明が数多く行われている。
例えば、商用周波数である50Hzおよび60Hzよりも低い周波数での交流エッチングが有効であるという技術が公開されている(例えば特許文献1参照)。
また、交流電流の波形を工夫することにより、正弦波あるいは矩形波など単純な形状の電流波形に比べて、有効拡面倍率を高めることができると報告されている(例えば特許文献2参照)。
さらに、エッチングを前段と後段に分けて、周波数を順次低くする方法(例えば特許文献3参照)や電流密度を順次高くする方法などが開発されている。
そして、一周期ごとに低い周波数と高い周波数が交互に繰り返す波形の交流電流を用いることにより、エッチング倍率の拡大が図れるという技術も公開されている(例えば特許文献4参照)。
特公昭54―43177号公報 特開昭58―22390号公報 特開平2―239610号公報 特公平5―61767号公報
The effective enlargement ratio has been improved by the inventive method and ingenuity of the etching method, and it has become possible to manufacture high-capacity etching foils.In recent years, however, the need for miniaturization of capacitors has increased more than ever. It is necessary to increase the capacity.
In order to increase the capacity of the etching foil, it is necessary to increase the capacity per thickness, and while the ingenuity and improvement of the etching solution composition are performed, many inventions relating to the frequency and waveform of the AC power supply used have been made. Yes.
For example, a technique is disclosed in which AC etching at frequencies lower than commercial frequencies of 50 Hz and 60 Hz is effective (see, for example, Patent Document 1).
Further, it has been reported that the effective area expansion magnification can be increased by devising the waveform of the alternating current as compared to a current waveform having a simple shape such as a sine wave or a rectangular wave (see, for example, Patent Document 2).
Further, a method has been developed in which the etching is divided into a front stage and a rear stage, and the frequency is sequentially lowered (see, for example, Patent Document 3) and the current density is successively increased.
A technique is also disclosed in which an etching magnification can be increased by using an alternating current having a waveform in which a low frequency and a high frequency are alternately repeated every cycle (see, for example, Patent Document 4).
Japanese Examined Patent Publication No. 54-43177 JP 58-22390 A JP-A-2-239610 Japanese Patent Publication No. 5-61767

上記したように、交流電流の周波数を規制したり、波形形状を改良する方法は、アルミニウムの溶解量が増大するにつれて表面積が大きくなっていくが、ある点を境に溶解量が増大しても表面積はむしろ低下してしまう。
ここで、交流電流を用いたエッチング方法において、印加されたアルミ箔の表面には、一般に還元反応または化学反応によって形成された薄い水和皮膜あるいは水酸化皮膜が存在しており、これらの皮膜に生じた欠陥点を腐食の起点としている。
これらの皮膜は正・負対称波形である交流電流を用いたエッチング条件では、正側と負側の反応が本質的に異なるため、還元反応または化学反応にずれが生じ、エッチングの進行に伴い、皮膜量が変化してしまう。その結果、エッチングの進行とともに、交流電流を印加しても適切な欠陥点が形成されにくくなる。
エッチング段ごとに、交流電流の大きさを変更する方法をとれば、単独の段による場合と比べると、改善されるが、エッチングの進行とともに表面積の増大が緩やかになる。
As described above, the method of regulating the frequency of alternating current or improving the waveform shape increases the surface area as the amount of aluminum dissolved increases, but even if the amount of dissolution increases after a certain point, The surface area is rather reduced.
Here, in the etching method using an alternating current, a thin hydrated film or a hydroxide film generally formed by a reduction reaction or a chemical reaction exists on the surface of the applied aluminum foil. The generated defect point is the starting point of corrosion.
Under the etching conditions using alternating current with positive and negative symmetric waveforms, these films have essentially different reactions on the positive and negative sides, causing a shift in the reduction reaction or chemical reaction. The amount of film changes. As a result, with the progress of etching, appropriate defect points are hardly formed even when an alternating current is applied.
If the method of changing the magnitude of the alternating current for each etching stage is improved as compared with the case of using a single stage, the surface area increases gradually as the etching progresses.

理想的な電流波形の形状を考えると、正側と負側の電流波形を非対称とする必要があり、正側と負側の電流密度や印加時間を変えてエッチングする方法が提案されてはいるが、アルミニウム箔に電流を直接印加する必要があり、大電流を流すことができないという問題がある。
また、一周期ごとに低い周波数と高い周波数が交互に繰り返す波形の交流電流を用いる方法での一周期ごとという間隔は、更なる高倍率化を狙う場合には適切ではない。
さらに、エッチング工程の中間に陽極酸化法や加熱酸化法を施し、皮膜を付与する方法も検討されてはいるが、これらの方法にて形成された皮膜は均一性が高すぎたり、ムラが多すぎるなど、エッチング工程における皮膜としては必ずしも効果的ではなかった。
上記のような問題があったため、エッチングが進行しても、表面積が低下しにくく、エッチング箔の高容量化が可能で、生産性が高いエッチング方法が求められていた。
Considering the ideal current waveform shape, it is necessary to make the current waveform on the positive side and the negative side asymmetric, and a method of etching by changing the current density and application time on the positive side and the negative side has been proposed. However, it is necessary to apply a current directly to the aluminum foil, and there is a problem that a large current cannot flow.
Further, the interval of one cycle in the method using an alternating current having a waveform in which a low frequency and a high frequency are alternately repeated every cycle is not appropriate when aiming at further higher magnification.
Furthermore, methods for applying a film by applying an anodic oxidation method or a heat oxidation method in the middle of the etching process have been studied, but the film formed by these methods is too uniform or has many irregularities. For example, it was not always effective as a film in the etching process.
Due to the above-described problems, there has been a demand for an etching method that has a high productivity and is capable of increasing the capacity of the etching foil because the surface area is unlikely to decrease even when etching proceeds.

本発明は上記課題を解決するものであり、アルミニウムまたはアルミニウム合金箔を、塩素イオンを含有するエッチング液中で交流電流印加により粗面化するエッチング工程において、
上記交流電流の波形が、主波形と副波形とからなり、該主波形が2サイクル以上の交流波形であり、副波形が主波形より高周波で、かつ2〜10サイクルの交流波形であることを特徴とするアルミニウム電解コンデンサ用エッチング箔の製造方法である。
The present invention solves the above-mentioned problem, and in an etching step of roughening aluminum or aluminum alloy foil by applying an alternating current in an etching solution containing chlorine ions,
The waveform of the AC current is composed of a main waveform and a sub waveform, the main waveform is an AC waveform of 2 cycles or more, and the sub waveform is a higher frequency than the main waveform and an AC waveform of 2 to 10 cycles. It is the manufacturing method of the etching foil for aluminum electrolytic capacitors characterized.

また、上記の交流波形が、主波形の印加時間を1〜30秒とした繰り返し波形であることを特徴とするアルミニウム電解コンデンサ用エッチング箔の製造方法である。   Further, the AC waveform is a repetitive waveform in which the application time of the main waveform is 1 to 30 seconds.

そして、上記の主波形の最大振幅に対する副波形の最大振幅の比が0.5〜1.2であることを特徴とするアルミニウム電解コンデンサ用エッチング箔の製造方法である。
このエッチング方法は、エッチング進行の主波形(波形A)において生成される皮膜を、副波形(波形B)によって適切に改質・生成するものである。また、正・負対称の交流電流であり、アルミニウム箔に電流を直接印加する必要もないため、高い生産性を実現できる。
The ratio of the maximum amplitude of the sub waveform to the maximum amplitude of the main waveform is 0.5 to 1.2.
In this etching method, the film generated in the main waveform (waveform A) of the etching progress is appropriately modified and generated by the sub-waveform (waveform B). Moreover, since it is a positive / negative symmetrical alternating current and it is not necessary to apply a current directly to the aluminum foil, high productivity can be realized.

上記したとおり、交流電流として、2サイクル以上の交流波形からなる主波形(波形A)と、該主波形より高周波で、かつ、2〜10サイクルの交流波形からなる副波形(波形B)を、主波形の印加時間1〜30秒にて交互に印加して用いることにより、単一波形の交流電流を用いた場合に比べてエッチング箔の高容量化が可能となる。
すなわち、エッチング進行の主体となる主波形Aにおいて生成される皮膜を、副波形Bによって適切に改質・生成することにより、エッチング効率の高いエッチングが進行し、その結果、アルミニウムの溶解量が増大しても、有効表面積の増大が抑えられることがなくなり、静電容量の高いエッチング箔を得ることができる。
また、正・負対称波形の交流電流のままで使用できる。すなわち、正側と負側の反応のずれをなくすための非対称波形への変更、電流密度・印加時間の変更を行って、アルミニウム箔に電流を直接印加する必要がないため、大電流を低下させずにそのまま使用することができ、生産性向上を図ることができる。
As described above, as an alternating current, a main waveform (waveform A) composed of an alternating waveform of two cycles or more and a sub waveform (waveform B) composed of an alternating waveform of 2 to 10 cycles at a higher frequency than the main waveform, By alternately applying the main waveform for an application time of 1 to 30 seconds, the capacity of the etching foil can be increased as compared with the case where an alternating current having a single waveform is used.
That is, by appropriately modifying and generating the film generated in the main waveform A, which is the main component of the etching, by the sub waveform B, etching with high etching efficiency proceeds, and as a result, the amount of aluminum dissolved increases. Even so, the increase in effective surface area is not suppressed, and an etching foil having a high electrostatic capacity can be obtained.
Moreover, it can be used with an alternating current having a positive / negative symmetrical waveform. In other words, it is not necessary to apply a current directly to the aluminum foil by changing to an asymmetric waveform to eliminate the reaction between the positive side and the negative side, and changing the current density and application time. It can be used as it is, and productivity can be improved.

以下、本願発明について具体的に説明する。
純度99.86%、厚さ50μmのアルミニウム箔の硬質材を用い、塩酸6.0wt%、リン酸1.0wt%を含む電解液中で、30℃にて交流電解エッチングを行った。交流電流として、表1に示す条件の主波形A、副波形Bにてエッチングを行った。
次いで、エッチング箔を純水で洗浄し、45℃の3.0wt%リン酸水溶液でケミカル洗浄処理を2分間行い、純水洗浄した。
その後、10wt%アジピン酸アンモニウム水溶液中で20V化成後、静電容量を測定し、表1の結果を得た。
Hereinafter, the present invention will be specifically described.
AC electrolytic etching was performed at 30 ° C. in an electrolytic solution containing 6.0 wt% hydrochloric acid and 1.0 wt% phosphoric acid using a hard material of aluminum foil having a purity of 99.86% and a thickness of 50 μm. Etching was performed with the main waveform A and the sub waveform B under the conditions shown in Table 1 as the alternating current.
Next, the etching foil was washed with pure water, subjected to chemical washing treatment with a 3.0 wt% phosphoric acid aqueous solution at 45 ° C. for 2 minutes, and washed with pure water.
Then, after forming 20V in 10 wt% ammonium adipate aqueous solution, the electrostatic capacity was measured, and the results shown in Table 1 were obtained.

Figure 2005268427
Figure 2005268427

表1の電解条件において、印加した電流の最大振幅や電気量については、比較例、従来例とも同一とした。従来例については周波数を10Hzとした単一の正弦波を交流電流とした。
実施例1〜15については、表1記載の周波数で印加時間tの主波形Aを有する交流電流と、表1記載の周波数の副波形Bをサイクル数nだけ繰り返す交流電流とを交互に印加した交流電流とした。
実施例1〜6の波形の一例を図1に示す。
Under the electrolysis conditions shown in Table 1, the maximum amplitude of the applied current and the amount of electricity were the same in the comparative example and the conventional example. For the conventional example, a single sine wave with a frequency of 10 Hz was used as an alternating current.
For Examples 1 to 15, an alternating current having a main waveform A with an application time t at the frequency shown in Table 1 and an alternating current repeating the sub waveform B of the frequency shown in Table 1 by the number of cycles n were alternately applied. AC current was used.
An example of the waveform of Examples 1-6 is shown in FIG.

実施例1〜6は、主波形Aの印加時間tを0.1〜60秒の間で変化させたものであり、t=0.1秒(実施例1)およびt=60秒(実施例6)では従来例と比べて、静電容量の向上効果がみられないことから、tは1〜30秒が好ましい。
実施例4、7〜10において、1繰り返し波形中の副波形Bのサイクル数nによる違いを比較すると、n=1(実施例7)、n=15(実施例10)では従来例と比べて、静電容量の向上効果がみられないことから、サイクル数nは2〜10が好ましい。
実施例8、11〜14において、主波形Aの最大振幅に対する副波形Bの最大振幅の比による違いを比較すると、0.2の実施例11、および1.5の実施例14は、従来例と比べて効果がみられないことから、0.5〜1.2の範囲が好ましい。
実施例4、15において、主波形Aの周波数10Hzに対する副波形Bの周波数は15Hz、20Hzが好ましい結果となっている。しかし、比較例1、2のように副波形Bの周波数が主波形Aの周波数より低い2Hz、5Hzとすると、静電容量が低下する。
In Examples 1 to 6, the application time t of the main waveform A is changed between 0.1 and 60 seconds, and t = 0.1 seconds (Example 1) and t = 60 seconds (Examples). In 6), since the effect of improving the capacitance is not observed as compared with the conventional example, t is preferably 1 to 30 seconds.
In Examples 4 and 7 to 10, when the difference due to the number of cycles n of the sub-waveform B in one repetitive waveform is compared, when n = 1 (Example 7) and n = 15 (Example 10), compared to the conventional example. The cycle number n is preferably 2 to 10 because the effect of improving the capacitance is not observed.
In Example 8, 11-14, when the difference by the ratio of the maximum amplitude of the sub waveform B to the maximum amplitude of the main waveform A is compared, Example 11 of 0.2 and Example 14 of 1.5 are conventional examples. In view of the fact that no effect is observed, the range of 0.5 to 1.2 is preferred.
In Examples 4 and 15, the frequency of the sub waveform B with respect to the frequency of 10 Hz of the main waveform A is preferably 15 Hz and 20 Hz. However, when the frequency of the sub waveform B is 2 Hz and 5 Hz which are lower than the frequency of the main waveform A as in Comparative Examples 1 and 2, the capacitance decreases.

なお、本発明は上記実施例に限定されるものではなく、公知のエッチング方法や各種電流波形、多段化したエッチング方法などに組み合わせてもよい。
また、上記実施例では、主波形Aと副波形Bに正弦波を使用したが、矩形波、三角波、台形波等種々の基本波形を適用しても同等の効果が得られる。
さらに、主波形Aと副波形Bの基本波形を異なる波形としてもよい。
また、エッチングが進行するについて、アルミニウム箔の表面状態が変化していくため、エッチングを複数段に分けて、主波形A、副波形Bとも、各段ごとに条件を変更すると、更に効果的である。具体的には、エッチングが進行する、すなわち後半の段になるにつれて、主波形Aの印加時間tを短くするとよい。
In addition, this invention is not limited to the said Example, You may combine with a well-known etching method, various electric current waveforms, the etching method made multistage.
In the above embodiment, sine waves are used for the main waveform A and the sub waveform B. However, the same effect can be obtained by applying various basic waveforms such as a rectangular wave, a triangular wave, and a trapezoidal wave.
Further, the basic waveform of the main waveform A and the sub waveform B may be different from each other.
Further, as the etching progresses, the surface state of the aluminum foil changes, so it is more effective to divide the etching into a plurality of stages and change the conditions for both the main waveform A and the sub waveform B for each stage. is there. Specifically, the application time t of the main waveform A may be shortened as the etching progresses, that is, the latter half of the stage.

本発明の実施例による交流電流の波形図である。It is a waveform diagram of an alternating current according to an embodiment of the present invention.

Claims (3)

アルミニウムまたはアルミニウム合金箔を、塩素イオンを含有するエッチング液中で交流電流印加により粗面化するエッチング工程において、
上記交流電流の波形が、主波形と副波形とからなり、該主波形が2サイクル以上の交流波形であり、副波形が主波形より高周波で、かつ2〜10サイクルの交流波形であることを特徴とするアルミニウム電解コンデンサ用エッチング箔の製造方法。
In the etching step of roughening aluminum or aluminum alloy foil by applying an alternating current in an etching solution containing chlorine ions,
The waveform of the AC current is composed of a main waveform and a sub waveform, the main waveform is an AC waveform of 2 cycles or more, and the sub waveform is a higher frequency than the main waveform and an AC waveform of 2 to 10 cycles. A method for producing an etching foil for an aluminum electrolytic capacitor.
請求項1記載の交流波形が、主波形の印加時間を1〜30秒とした繰り返し波形であることを特徴とするアルミニウム電解コンデンサ用エッチング箔の製造方法。   The method for producing an etching foil for an aluminum electrolytic capacitor, wherein the AC waveform according to claim 1 is a repetitive waveform in which the application time of the main waveform is 1 to 30 seconds. 請求項1記載の主波形の最大振幅に対する副波形の最大振幅の比が0.5〜1.2であることを特徴とするアルミニウム電解コンデンサ用エッチング箔の製造方法。   A method for producing an etching foil for an aluminum electrolytic capacitor, wherein the ratio of the maximum amplitude of the sub waveform to the maximum amplitude of the main waveform according to claim 1 is 0.5 to 1.2.
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007115950A (en) * 2005-10-21 2007-05-10 Nichicon Corp Method of manufacturing etching foil for electrolytic capacitor and apparatus for manufacturing the etching foil
JP2008192647A (en) * 2007-01-31 2008-08-21 Nichicon Corp Production method of aluminum foil for electrolytic capacitor
CN109609997A (en) * 2018-12-06 2019-04-12 东莞东阳光科研发有限公司 Aluminum foil erosion method and aluminium foil
CN114798732A (en) * 2022-06-30 2022-07-29 太原理工大学 Method for regulating interface structure of bimetal laminated composite plate by multi-frequency composite current

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007115950A (en) * 2005-10-21 2007-05-10 Nichicon Corp Method of manufacturing etching foil for electrolytic capacitor and apparatus for manufacturing the etching foil
JP2008192647A (en) * 2007-01-31 2008-08-21 Nichicon Corp Production method of aluminum foil for electrolytic capacitor
CN109609997A (en) * 2018-12-06 2019-04-12 东莞东阳光科研发有限公司 Aluminum foil erosion method and aluminium foil
CN109609997B (en) * 2018-12-06 2020-10-09 东莞东阳光科研发有限公司 Aluminum foil corrosion method and aluminum foil
CN114798732A (en) * 2022-06-30 2022-07-29 太原理工大学 Method for regulating interface structure of bimetal laminated composite plate by multi-frequency composite current

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