JP2005215579A - 投影光学系、露光装置、および露光方法 - Google Patents

投影光学系、露光装置、および露光方法 Download PDF

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Publication number
JP2005215579A
JP2005215579A JP2004025083A JP2004025083A JP2005215579A JP 2005215579 A JP2005215579 A JP 2005215579A JP 2004025083 A JP2004025083 A JP 2004025083A JP 2004025083 A JP2004025083 A JP 2004025083A JP 2005215579 A JP2005215579 A JP 2005215579A
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Prior art keywords
optical system
imaging optical
projection
imaging
mask
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JP2004025083A
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Japanese (ja)
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JP2005215579A5 (enExample
Inventor
Masahito Kumazawa
雅人 熊澤
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Nikon Corp
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Nikon Corp
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Publication of JP2005215579A5 publication Critical patent/JP2005215579A5/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004025083A 2004-02-02 2004-02-02 投影光学系、露光装置、および露光方法 Withdrawn JP2005215579A (ja)

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JP2004025083A JP2005215579A (ja) 2004-02-02 2004-02-02 投影光学系、露光装置、および露光方法

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JP2004025083A JP2005215579A (ja) 2004-02-02 2004-02-02 投影光学系、露光装置、および露光方法

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JP2005215579A true JP2005215579A (ja) 2005-08-11
JP2005215579A5 JP2005215579A5 (enExample) 2008-02-28

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102768397A (zh) * 2011-05-05 2012-11-07 上海微电子装备有限公司 一种投影光刻物镜
JP2014032278A (ja) * 2012-08-02 2014-02-20 Canon Inc 投影露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102768397A (zh) * 2011-05-05 2012-11-07 上海微电子装备有限公司 一种投影光刻物镜
JP2014032278A (ja) * 2012-08-02 2014-02-20 Canon Inc 投影露光装置

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