JP2005214735A - Package for pressure detecting apparatus - Google Patents

Package for pressure detecting apparatus Download PDF

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JP2005214735A
JP2005214735A JP2004020292A JP2004020292A JP2005214735A JP 2005214735 A JP2005214735 A JP 2005214735A JP 2004020292 A JP2004020292 A JP 2004020292A JP 2004020292 A JP2004020292 A JP 2004020292A JP 2005214735 A JP2005214735 A JP 2005214735A
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electrode
insulating
semiconductor element
insulating substrate
main surface
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Toshiyuki Chitose
敏幸 千歳
Koji Kinomura
浩司 木野村
Yosuke Moriyama
陽介 森山
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Kyocera Corp
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Kyocera Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a compact and highly reliable package for pressure detecting apparatus capable of accurately detecting pressure exerted from the outside with high sensitivity for a long period of time. <P>SOLUTION: The package for pressure detecting device is provided with an insulating substrate 1 having a mounting part 1a for mounting a semiconductor element 3 to a side surface, a plurality of wiring conductors 5 arranged in the surface and inside of the insulating substrate 1 and electrically connected to electrodes of the semiconductor element 3, an insulating plate 2 joined to the insulating substrate 1 in such a flexible state as to form a sealed space in between with one main surface of the insulating substrate 1, a first electrode 7 for forming electrostatic capacitance deposited to the one main surface of the insulating substrate 1 in the sealed space and electrically connected to one of the wiring conductors 5, and a second electrode 9 for forming electrostatic capacitance deposited to an inside main surface the insulating plate 2 in such a way as to be opposed to the first electrode 7 and electrically connected to another one of the wiring conductors 5. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、圧力を検出するための圧力検出装置に使用される圧力検出装置用パッケージに関する。   The present invention relates to a package for a pressure detection device used in a pressure detection device for detecting pressure.

従来、圧力を検出するための圧力検出装置として静電容量型の圧力検出装置が知られている。この静電容量型の圧力検出装置は、図3に断面図で示すように、セラミック材料や樹脂材料から成る配線基板21上に、静電容量型の感圧素子22と、圧力検出装置用パッケージ28に収容された演算用の半導体素子29とを備えている。   Conventionally, a capacitance type pressure detection device is known as a pressure detection device for detecting pressure. As shown in a cross-sectional view in FIG. 3, this capacitance type pressure detection device has a capacitance type pressure sensitive element 22 and a pressure detection device package on a wiring board 21 made of a ceramic material or a resin material. 28 and a semiconductor element 29 for calculation contained in 28.

そして、感圧素子22は、例えばセラミック材料等の電気絶縁材料から成るとともにその上面中央部に静電容量形成用の電極23が被着された凹部を有する絶縁基体24と、この絶縁基体24の上面に絶縁基体24の凹部が密閉空間となるように可撓な状態で接合されるとともに密閉空間側の主面に静電容量形成用の電極25が被着された絶縁板26と、各静電容量形成用の電極23および電極25をそれぞれ外部と電気的に接続するための外部リード端子27とから構成されている。これにより、外部から加わる圧力に応じて絶縁板26が撓むことで電極23と電極25間との間に形成された静電容量が変化し、この変化を演算用の半導体素子29により演算処理することで外部から加わる圧力を検出することができる。   The pressure sensitive element 22 is made of, for example, an electrically insulating material such as a ceramic material, and has an insulating base 24 having a concave portion with a capacitance forming electrode 23 attached to the center of the upper surface thereof. An insulating plate 26 is bonded to the upper surface in a flexible state so that the concave portion of the insulating base 24 becomes a sealed space, and an electrostatic capacitance forming electrode 25 is attached to the main surface on the sealed space side. Each of the capacitance forming electrode 23 and the electrode 25 is composed of an external lead terminal 27 for electrically connecting to the outside. As a result, the capacitance formed between the electrode 23 and the electrode 25 is changed by bending the insulating plate 26 according to the pressure applied from the outside, and this change is calculated by the semiconductor element 29 for calculation. By doing so, the pressure applied from the outside can be detected.

しかしながら、この従来の圧力検出装置によると、感圧素子22と半導体素子29とを配線基板21上に個別に実装していることから、圧力検出装置が大型化するとともに圧力検出用の電極23および電極25と半導体素子29とを接続する配線導体が長いものとなり、不要な静電容量が生じるため感度が低くなるという問題点を有していた。   However, according to this conventional pressure detection device, since the pressure sensitive element 22 and the semiconductor element 29 are individually mounted on the wiring board 21, the pressure detection device is enlarged and the pressure detection electrode 23 and The wiring conductor that connects the electrode 25 and the semiconductor element 29 becomes long, and there is a problem that sensitivity is lowered because unnecessary capacitance is generated.

そこで、図2に断面図で示すような、一方の主面に半導体素子13が搭載される搭載部11aを有する絶縁基体11と、この絶縁基体11の表面および内部に配設され、半導体素子13の各電極が電気的に接続される複数の配線導体15と、絶縁基体11の他方の主面の中央部に被着され、配線導体15の一つである配線導体15aに電気的に接続された静電容量形成用の第一電極17と、絶縁基体11の他方の主面に、この主面の中央部との間に密閉空間を形成するように可撓な状態で接合された絶縁板12と、絶縁板12の内側の主面に第一電極17と対向するように被着されるとともに配線導体15の他の一つである配線導体15bに電気的に接続された静電容量形成用の第二電極19とを具備する圧力検出装置用パッケージが提案されている(例えば、下記の特許文献1参照)。   Therefore, as shown in a cross-sectional view in FIG. 2, an insulating base 11 having a mounting portion 11 a on which the semiconductor element 13 is mounted on one main surface, and the surface and inside of the insulating base 11 are provided. A plurality of wiring conductors 15 that are electrically connected to each other and a central portion of the other main surface of the insulating base 11 are attached to the wiring conductor 15a that is one of the wiring conductors 15 and electrically connected to the wiring conductor 15a. Insulating plate joined in a flexible state so as to form a sealed space between the first electrode 17 for forming capacitance and the other main surface of the insulating substrate 11 and the central portion of the main surface. 12 is formed on the inner surface of the insulating plate 12 so as to face the first electrode 17 and is electrically connected to a wiring conductor 15b, which is another wiring conductor 15. A pressure sensing device package comprising a second electrode 19 is proposed. And are (for example, see Patent Document 1 below).

この圧力検出装置用パッケージによれば、半導体素子13を収容する圧力検出装置用パッケージに感圧素子が一体に形成されるため、圧力検出装置を小型化することができるとともに圧力検出用の電極と半導体素子13とを接続する配線導体15を短いものとすることができ、複数の配線導体15間に発生する不要な静電容量を小さなものとすることができる。   According to this pressure detection device package, since the pressure sensitive element is integrally formed in the pressure detection device package that accommodates the semiconductor element 13, the pressure detection device can be reduced in size and the pressure detection electrode and The wiring conductor 15 connecting the semiconductor element 13 can be shortened, and unnecessary capacitance generated between the plurality of wiring conductors 15 can be reduced.

従来、圧力検出装置用パッケージの配線導体15や静電容量形成用の第一電極17,第二電極19は、タングステン(W)やモリブデン(Mo),銅(Cu),銀(Ag)等の金属粉末メタライズから成り、W等の金属粉末に適当な有機バインダ,溶剤,可塑剤および分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法等によりセラミックグリーンシート(以下、グリーンシートともいう)に印刷塗布し、これらを絶縁基体11や絶縁板12となるグリーンシートが上下に積層された生セラミック成形体とともに焼成することによって製作される。   Conventionally, the wiring conductor 15 of the pressure detection device package, the first electrode 17 for forming capacitance, and the second electrode 19 are made of tungsten (W), molybdenum (Mo), copper (Cu), silver (Ag), or the like. A ceramic green sheet (hereinafter referred to as a green sheet) made of a metal powder metallized and obtained by adding a suitable organic binder, a solvent, a plasticizer and a dispersing agent to a metal powder such as W and mixing them by a conventionally known screen printing method. Also, it is manufactured by printing and coating them together with a green ceramic molded body in which green sheets to be the insulating base 11 and the insulating plate 12 are stacked one above the other.

また、第一電極17および第二電極19を静電容量形成用とするために、第一電極17と第二電極19との間に一定の空間領域を形成する必要があるため、絶縁基体11または絶縁板12の外周部に枠状の突起部12aを形成することで、絶縁基体11と絶縁板12との間に静電容量形成用の密閉空間を形成していた。   Further, in order to use the first electrode 17 and the second electrode 19 for forming a capacitance, it is necessary to form a certain space region between the first electrode 17 and the second electrode 19. Alternatively, by forming the frame-shaped protrusion 12 a on the outer peripheral portion of the insulating plate 12, a sealed space for forming a capacitance is formed between the insulating base 11 and the insulating plate 12.

なお、絶縁基体11と絶縁板12とは、絶縁基体11上に第一電極17の周囲に設けられた第一接合用メタライズ層18と、絶縁板12の外周部に設けられた第二接合用メタライズ層20とがろう材等の導電性接合材によって接合されることにより取着されている。   The insulating substrate 11 and the insulating plate 12 are a first bonding metallization layer 18 provided around the first electrode 17 on the insulating substrate 11 and a second bonding material provided on the outer periphery of the insulating plate 12. The metallized layer 20 is attached by bonding with a conductive bonding material such as a brazing material.

また、このような突起部12aを有する絶縁板12は、密閉空間を形成するための貫通孔が打ち抜き加工法等で形成された突起部12a用のグリーンシートと、第二電極19が形成された底板部12b用のグリーンシートとを積層し絶縁板12用のグリーンシートと成し、高温で焼成することで形成される。
特開2001−356064号公報
In addition, the insulating plate 12 having such a protruding portion 12a is formed with the green sheet for the protruding portion 12a in which a through hole for forming a sealed space is formed by a punching method or the like, and the second electrode 19. It is formed by laminating a green sheet for the bottom plate portion 12b to form a green sheet for the insulating plate 12 and firing at a high temperature.
JP 2001-356064 A

しかしながら、従来の圧力検出装置用パッケージによると、第一電極17に接続された配線導体15aおよび第二電極19に接続された配線導体15bと第一電極17および第二電極19との間に形成される静電容量については考慮されておらず、第一電極17に接続された配線導体15aおよび第二電極19に接続された配線導体15bの一部が第一電極17および第二電極19と上下に重なる位置に配設されており、これらの配線導体15a,15bと第一電極17および第二電極19との間に不要な静電容量が形成され、そのため圧力の検出感度が低下するという問題点を有していた。   However, according to the conventional package for a pressure detection device, the wiring conductor 15 a connected to the first electrode 17 and the wiring conductor 15 b connected to the second electrode 19 are formed between the first electrode 17 and the second electrode 19. The capacitance of the wiring conductor 15 a connected to the first electrode 17 and a part of the wiring conductor 15 b connected to the second electrode 19 are not connected to the first electrode 17 and the second electrode 19. It is disposed at the position where it is vertically overlapped, and unnecessary capacitance is formed between the wiring conductors 15a, 15b and the first electrode 17 and the second electrode 19, so that the pressure detection sensitivity decreases. Had problems.

また、第一電極17に接続された配線導体15aと第二電極19に接続された配線導体15bとの間においても不要な静電容量が形成され、より高感度な圧力検出装置を得ることが困難であるという問題点を有していた。   Also, unnecessary capacitance is formed between the wiring conductor 15a connected to the first electrode 17 and the wiring conductor 15b connected to the second electrode 19, and a more sensitive pressure detecting device can be obtained. It had the problem of being difficult.

従って、本発明は係る上述の要求に鑑み案出されたものであり、その目的は、小型で
かつ外部から加わる圧力の検出感度が高く、長期間にわたって正確に検出することができる信頼性の高い圧力検出装置用のパッケージを提供することにある。
Therefore, the present invention has been devised in view of the above-mentioned requirements, and the purpose thereof is small and has high detection sensitivity of pressure applied from the outside, and can be accurately detected over a long period of time. The object is to provide a package for a pressure sensing device.

本発明の圧力検出装置用パッケージは、側面に半導体素子が搭載される搭載部を有する絶縁基体と、該絶縁基体の表面および内部に配設され、前記半導体素子の電極が電気的に接続される複数の配線導体と、前記絶縁基体の一方の主面との間に密閉空間を形成するように可撓な状態で前記絶縁基体に接合された絶縁板と、前記密閉空間の前記絶縁基体の前記一方の主面に被着され、前記配線導体の一つに電気的に接続された静電容量形成用の第一電極と、前記絶縁板の内側主面に前記第一電極と対向するように被着され、前記配線導体の他の一つに電気的に接続された静電容量形成用の第二電極とを具備していることを特徴とする。   A package for a pressure detection device according to the present invention is provided on an insulating base having a mounting portion on which a semiconductor element is mounted on a side surface, and on the surface and inside of the insulating base, and the electrodes of the semiconductor element are electrically connected to each other. An insulating plate joined to the insulating base in a flexible state so as to form a sealed space between the plurality of wiring conductors and one main surface of the insulating base; and the insulating base in the sealed space A first electrode for forming a capacitance that is attached to one main surface and is electrically connected to one of the wiring conductors, and to face the first electrode on the inner main surface of the insulating plate And a second electrode for forming a capacitance, which is applied and electrically connected to the other one of the wiring conductors.

本発明の圧力検出装置用パッケージによれば、絶縁基体の側面の搭載部に半導体素子が搭載されることから、半導体素子の電極と電気的に接続される第一電極に接続された配線導体および第二電極に接続された配線導体は、第一電極および第二電極と上下に重ならない絶縁基体の側面および外周部の内部のみに配設することができるようになり、その結果配線導体と第一電極および第二電極との間に不要な静電容量が形成されることを有効に防止することができる。   According to the pressure detection device package of the present invention, since the semiconductor element is mounted on the mounting portion on the side surface of the insulating base, the wiring conductor connected to the first electrode electrically connected to the electrode of the semiconductor element, and The wiring conductor connected to the second electrode can be disposed only on the side and outer periphery of the insulating base that does not overlap the first electrode and the second electrode. As a result, the wiring conductor and the second electrode It is possible to effectively prevent unnecessary capacitance from being formed between the one electrode and the second electrode.

また、第一電極に接続された配線導体および第二電極に接続された配線導体を極めて短いものとして配設できるようになり、その結果、配線導体の間に不要な静電容量が形成されることを有効に防止することができる。   Further, the wiring conductor connected to the first electrode and the wiring conductor connected to the second electrode can be arranged as extremely short, and as a result, unnecessary capacitance is formed between the wiring conductors. This can be effectively prevented.

これらにより、小型でかつ外部から加わる圧力の検出感度が高く、長期間にわたって正確に検出することができる信頼性の高い圧力検出装置用のパッケージを提供することができる。   Accordingly, it is possible to provide a highly reliable package for a pressure detection device that is small in size and has high detection sensitivity of pressure applied from the outside, and can be accurately detected over a long period of time.

次に、本発明の圧力検出装置用パッケージを添付の図面に基づいて詳細に説明する。   Next, the pressure detection device package of the present invention will be described in detail with reference to the accompanying drawings.

図1は、本発明の圧力検出装置用パッケージの実施の形態の一例を示す断面図であり、1は絶縁基体、2は絶縁板、3は半導体素子、7は第一電極、9は第二電極である。   FIG. 1 is a cross-sectional view showing an example of an embodiment of a pressure detecting device package according to the present invention, wherein 1 is an insulating substrate, 2 is an insulating plate, 3 is a semiconductor element, 7 is a first electrode, and 9 is a second. Electrode.

本発明の絶縁基体1および絶縁板2は、酸化アルミニウム質焼結体や窒化アルミニウム質焼結体,ムライト質焼結体,炭化珪素質焼結体,窒化珪素質焼結体,ガラスセラミックス等の電気絶縁材料から成る。このような絶縁基体1および絶縁板2が例えば酸化アルミニウム質焼結体から成る場合であれば、酸化アルミニウムや酸化珪素,酸化マグネシウム,酸化カルシウム等のセラミック原料粉末に適当な有機バインダ,溶剤,可塑剤および分散剤を添加混合して泥漿状となすとともに、これを従来周知のドクターブレード法等によりシート状に成形することで複数枚のグリーンシートを得、しかる後、これらのグリーンシートに適当な打ち抜き加工や積層加工,切断加工等を施すとともに上下に積層して生セラミック成形体と成し、これを約1600℃の温度で焼成することにより製作される。   The insulating substrate 1 and insulating plate 2 of the present invention are made of an aluminum oxide sintered body, an aluminum nitride sintered body, a mullite sintered body, a silicon carbide sintered body, a silicon nitride sintered body, a glass ceramic, or the like. Made of electrically insulating material. If the insulating base 1 and the insulating plate 2 are made of, for example, an aluminum oxide sintered body, a suitable organic binder, solvent, plastics for ceramic raw material powders such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide are used. Add and mix the agent and dispersant to form a slurry, and form this into a sheet by a conventionally known doctor blade method or the like to obtain a plurality of green sheets. It is manufactured by punching, laminating, cutting and the like and laminating it vertically to form a green ceramic molded body, which is fired at a temperature of about 1600 ° C.

絶縁基体1は側面に半導体素子3を搭載する搭載部1aを有している。そして、この半導体素子3は、搭載部1aに搭載されるとともに例えばエポキシ樹脂等の樹脂製封止材4により覆われることで封止される。   The insulating substrate 1 has a mounting portion 1a for mounting the semiconductor element 3 on the side surface. The semiconductor element 3 is sealed by being mounted on the mounting portion 1a and being covered with a resin sealing material 4 such as an epoxy resin.

また、搭載部1aには複数の配線導体5が導出されており、配線導体5と半導体素子3の各電極とを半田バンプ等の導電性接合材6を介して接合することにより半導体素子3の各電極と各配線導体5とが電気的に接続されるとともに半導体素子3が搭載部1aに取着される。または、半導体素子3は配線導体5とボンディングワイヤ等の他の電気的接続手段により接続されてもよい。   In addition, a plurality of wiring conductors 5 are led out to the mounting portion 1a, and the wiring conductor 5 and each electrode of the semiconductor element 3 are joined via a conductive joining material 6 such as a solder bump, so that the semiconductor element 3 is connected. Each electrode and each wiring conductor 5 are electrically connected, and the semiconductor element 3 is attached to the mounting portion 1a. Alternatively, the semiconductor element 3 may be connected to the wiring conductor 5 by other electrical connection means such as a bonding wire.

配線導体5は、半導体素子3の各電極を外部電気回路,第一電極7および第二電極9に電気的に接続するための導電路として機能し、その一部は絶縁基体1の一方の主面(図1では下面)外周部に導出され、別の一部は第一電極7や第二電極9に電気的に接続されている。   The wiring conductor 5 functions as a conductive path for electrically connecting each electrode of the semiconductor element 3 to the external electric circuit, the first electrode 7 and the second electrode 9, and a part of the wiring conductor 5 is one main part of the insulating substrate 1. It is led out to the outer periphery of the surface (the lower surface in FIG. 1), and another part is electrically connected to the first electrode 7 and the second electrode 9.

このような配線導体5は、WやMo,Cu,Ag等の金属粉末メタライズから成り、W等の金属粉末に適当な有機バインダ,溶剤,可塑剤および分散剤等を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法により絶縁基体1用のグリーンシートに所定のパターンに印刷塗布し、これを絶縁基体1用の生セラミック成形体とともに焼成することによって絶縁基体1の内部および表面に所定のパターンに形成される。なお、配線導体5の露出表面には、配線導体5が酸化腐食するのを防止するとともに配線導体5と半田等の導電性接合材6との接合を良好なものとするために、厚みが1〜10μm程度のニッケルめっき層と厚みが0.1〜3μm程度の金めっき層とが順次被着されていることが好ましい。   Such a wiring conductor 5 is made of metal powder metallization such as W, Mo, Cu, and Ag, and is obtained by adding and mixing an appropriate organic binder, solvent, plasticizer, dispersant, and the like to metal powder such as W. The paste is printed and applied in a predetermined pattern on a green sheet for the insulating substrate 1 by a well-known screen printing method, and this is baked together with a green ceramic molded body for the insulating substrate 1, thereby predetermining the inside and the surface of the insulating substrate 1. The pattern is formed. The exposed surface of the wiring conductor 5 has a thickness of 1 in order to prevent the wiring conductor 5 from being oxidatively corroded and to improve the bonding between the wiring conductor 5 and the conductive bonding material 6 such as solder. It is preferable that a nickel plating layer having a thickness of about 10 μm and a gold plating layer having a thickness of about 0.1 to 3 μm are sequentially deposited.

また、絶縁基体1の他方の主面(図1では上面)の中央部には静電容量形成用の第一電極7が被着されており、この第一電極7は配線導体5の一部である配線導体5aと電気的に接続されている。この配線導体5aに半導体素子3の電極を半田バンプ等の導電性接合材6を介して接続することにより第一電極7と半導体素子3の電極とが電気的に接続される。また、第一電極7は例えば円形状に形成されている。   A first electrode 7 for forming a capacitance is attached to the center of the other main surface (upper surface in FIG. 1) of the insulating substrate 1, and this first electrode 7 is a part of the wiring conductor 5. Is electrically connected to the wiring conductor 5a. The first electrode 7 and the electrode of the semiconductor element 3 are electrically connected by connecting the electrode of the semiconductor element 3 to the wiring conductor 5a via the conductive bonding material 6 such as a solder bump. The first electrode 7 is formed in a circular shape, for example.

また、絶縁基体1の他方の主面の外周部には、全周にわたり枠状の第一接合用メタライズ層8が被着されており、このメタライズ層8と後述する凹部を有する絶縁板2の第二接合用メタライズ層10とをAg−Cuろう材等のろう材を介して接合することにより、絶縁基体1と絶縁板2との間に密閉空間が形成される。   Further, a frame-shaped first bonding metallization layer 8 is deposited on the outer peripheral portion of the other main surface of the insulating base 1 over the entire periphery, and the insulating plate 2 having the metallized layer 8 and a concave portion to be described later. A sealed space is formed between the insulating base 1 and the insulating plate 2 by bonding the second bonding metallization layer 10 via a brazing material such as an Ag—Cu brazing material.

この第一接合用メタライズ層8はメタライズ配線導体5の一つである配線導体5bが電気的に接続されており、この配線導体5bに半導体素子3の電極を半田バンプ等の導電性接合材6を介して電気的に接続することで、半導体素子3の電極と第二電極9とが電気的に接続される。   The first bonding metallized layer 8 is electrically connected to a wiring conductor 5b, which is one of the metallized wiring conductors 5. The conductive bonding material 6 such as a solder bump is connected to the electrode of the semiconductor element 3 on the wiring conductor 5b. The electrode of the semiconductor element 3 and the second electrode 9 are electrically connected by being electrically connected via.

絶縁板2は四角形状や八角形状等の多角形状、あるいは円形状等の平板状であり、一方の主面の外周部に高さが0.01〜5mmの枠状の突起部2aが形成されることにより、凹部が形成される。そして、絶縁板2の凹部の底面を構成する部位である底板部2bが外部から加わる圧力に応じて絶縁基体1側に撓み、いわゆる圧力検出用のダイアフラムとして機能する。   The insulating plate 2 has a rectangular shape, a polygonal shape such as an octagonal shape, or a flat plate shape such as a circular shape, and a frame-shaped protruding portion 2a having a height of 0.01 to 5 mm is formed on the outer peripheral portion of one main surface. Thus, a recess is formed. And the baseplate part 2b which is a site | part which comprises the bottom face of the recessed part of the insulation board 2 bends to the insulation base | substrate 1 side according to the pressure added from the outside, and functions as a so-called pressure detection diaphragm.

なお、絶縁板2は、底板部2bの厚みが0.01mm未満ではその機械的強度が低いものとなり、外部から加わる圧力が大きい場合に破壊されやすくなる。また、底板部2bの厚みが5mmを超えると外部から加わる圧力が小さい場合に底板部2bは撓み難くなり、圧力検出用のダイアフラムとしての精度が低下しやすくなる。したがって、絶縁板2の凹部の底板部2bの厚みは0.01〜5mmの範囲が好ましい。   The insulating plate 2 has a low mechanical strength when the thickness of the bottom plate portion 2b is less than 0.01 mm, and is easily broken when the pressure applied from the outside is large. Further, if the thickness of the bottom plate portion 2b exceeds 5 mm, the bottom plate portion 2b is difficult to bend when the pressure applied from the outside is small, and the accuracy as a pressure detecting diaphragm is likely to be lowered. Therefore, the thickness of the bottom plate portion 2b of the concave portion of the insulating plate 2 is preferably in the range of 0.01 to 5 mm.

絶縁板2は、その厚み(mm)と密閉空間を形成する凹部の底板部2bの面積(mm)との比率が5〜500であることが好ましい。10未満であると、絶縁板2が撓み難くなるとともに、第二電極9の面積も小さくなり、圧力検出の感度が低下しやすくなる。また、500を超えると、絶縁基体1や絶縁板2が大きくなりパッケージが大型化しやすくなるとともに、絶縁板2の自重等により撓みが発生して第一電極7と第二電極9とが接触しやすくなり精度良く検出できなくなったり、絶縁板2の強度が低下して破損しやすくなる。 It is preferable that the ratio between the thickness (mm) of the insulating plate 2 and the area (mm 2 ) of the bottom plate portion 2b of the concave portion forming the sealed space is 5 to 500. If it is less than 10, the insulating plate 2 is difficult to bend and the area of the second electrode 9 is also reduced, and the pressure detection sensitivity is likely to be lowered. If it exceeds 500, the insulating substrate 1 and the insulating plate 2 become large and the package becomes easy to enlarge, and the first electrode 7 and the second electrode 9 come into contact with each other due to the bending of the insulating plate 2 due to its own weight. It becomes easy and cannot be detected with high accuracy, or the strength of the insulating plate 2 is lowered and easily damaged.

また、絶縁板2の凹部の底面には容量形成用の第二電極9が被着されている。この第二電極9は、例えば円形状に形成され、前述の第一電極7と対向して感圧素子用の静電容量を形成する。   A second electrode 9 for forming a capacitance is attached to the bottom surface of the recess of the insulating plate 2. The second electrode 9 is formed in a circular shape, for example, and forms a capacitance for the pressure sensitive element so as to face the first electrode 7 described above.

上記のような第一電極7および第二電極9は、厚みが10〜50μm程度のWやMo,Cu,Ag等の金属粉末メタライズから成り、配線導体5と同様の方法で形成される。また、第一電極7および第二電極9の表面には酸化腐食するのを防止するために、厚みが1〜10μm程度のニッケルめっき層が被着されているのがよい。   The first electrode 7 and the second electrode 9 as described above are made of metal powder metallization such as W, Mo, Cu, and Ag having a thickness of about 10 to 50 μm, and are formed by the same method as the wiring conductor 5. Further, a nickel plating layer having a thickness of about 1 to 10 μm is preferably deposited on the surfaces of the first electrode 7 and the second electrode 9 in order to prevent oxidative corrosion.

また、絶縁板2の突起部2aの絶縁基体1側の主面には第二電極9に電気的に接続された多角形状または円形状の枠状の第二接合用メタライズ層10が被着されている。そして、第二接合用メタライズ層10は絶縁板2を絶縁基体1に接合するための接合用下地金属層として機能して第二接合用メタライズ層10と第一接合用メタライズ層8とがAg−Cuろう等のろう材を介して接合されるとともに第一接合用メタライズ層8と第二接合用メタライズ層10とが電気的に接続される。   Further, a polygonal or circular frame-shaped second bonding metallization layer 10 electrically connected to the second electrode 9 is attached to the main surface of the protrusion 2a of the insulating plate 2 on the insulating base 1 side. ing. The second bonding metallization layer 10 functions as a bonding base metal layer for bonding the insulating plate 2 to the insulating substrate 1, and the second bonding metallization layer 10 and the first bonding metallization layer 8 are made of Ag-. The first metallization layer 8 for bonding and the second metallization layer 10 for bonding are electrically connected through a brazing filler metal such as Cu brazing.

このとき、第一電極7と第二電極9は、絶縁基体1と絶縁板2との間に形成された密閉空間を挟んで対向し、その電極間に、第一電極7や第二電極9の面積および第一電極7と第二電極9との間隔に応じて所定の静電容量を形成する。そして、外部から絶縁板2の他方の主面に加わる圧力に応じて絶縁板2の底板部2bが絶縁基体1側に撓んで第一電極7と第二電極9との間隔が変化することにより静電容量が変化することで、外部から加わる圧力の変化を静電容量の変化として感知する感圧素子として機能する。さらに、この静電容量の変化を絶縁基体1の側面に搭載された半導体素子3にメタライズ配線導体5a,5bを介して伝達し、半導体素子3で演算処理することにより外部から加わる圧力の大きさを知ることができる。   At this time, the first electrode 7 and the second electrode 9 are opposed to each other with a sealed space formed between the insulating base 1 and the insulating plate 2 interposed therebetween, and the first electrode 7 and the second electrode 9 are interposed between the electrodes. A predetermined capacitance is formed according to the area of the first electrode 7 and the distance between the first electrode 7 and the second electrode 9. Then, the bottom plate portion 2b of the insulating plate 2 bends toward the insulating base 1 according to the pressure applied to the other main surface of the insulating plate 2 from the outside, and the distance between the first electrode 7 and the second electrode 9 changes. By changing the capacitance, it functions as a pressure-sensitive element that senses a change in pressure applied from the outside as a change in capacitance. Further, the change in capacitance is transmitted to the semiconductor element 3 mounted on the side surface of the insulating substrate 1 through the metallized wiring conductors 5a and 5b, and the magnitude of the pressure applied from the outside by performing arithmetic processing in the semiconductor element 3 Can know.

上記のような第一接合用メタライズ層8および第二接合用メタライズ層10は、厚みが10〜50μm程度のWやMo,Cu,Ag等の金属粉末メタライズから成り、上記の配線導体5と同様の方法で形成される。なお、第一接合用メタライズ層8および第二接合用メタライズ層10の表面には酸化腐食するのを防止するとともに第一接合用メタライズ層8および第二接合用メタライズ層10とろう材との接合を強固なものとするために、厚みが1〜10μm程度のニッケルめっき層が被着されているのがよい。   The first bonding metallization layer 8 and the second bonding metallization layer 10 are made of metal powder metallization such as W, Mo, Cu, and Ag having a thickness of about 10 to 50 μm, and are similar to the wiring conductor 5 described above. It is formed by the method. It should be noted that the surfaces of the first bonding metallization layer 8 and the second bonding metallization layer 10 are prevented from being oxidized and corroded, and the first bonding metallization layer 8 and the second bonding metallization layer 10 are bonded to the brazing material. In order to strengthen the thickness, a nickel plating layer having a thickness of about 1 to 10 μm is preferably applied.

また、絶縁基体1と絶縁板2との接合は、第一接合用メタライズ層8および第二接合用メタライズ層10の表面に予め1〜10μm程度の厚みのニッケルめっき層をそれぞれ被着させておくとともに、第一接合用メタライズ層8と第二接合用メタライズ層10との間に厚みが10〜200μm程度のAg−Cuろう等から成るろう材箔を挟み、これらを還元雰囲気中で約850℃の温度に加熱してろう材箔を溶融させ、第一接合用メタライズ層8と第二接合用メタライズ層10とをろう付けすることにより行なわれる。   In addition, in the bonding of the insulating substrate 1 and the insulating plate 2, a nickel plating layer having a thickness of about 1 to 10 μm is previously deposited on the surfaces of the first bonding metallization layer 8 and the second bonding metallization layer 10, respectively. In addition, a brazing material foil made of Ag—Cu brazing having a thickness of about 10 to 200 μm is sandwiched between the first bonding metallization layer 8 and the second bonding metallization layer 10, and these are about 850 ° C. in a reducing atmosphere. This is performed by melting the brazing material foil by heating to a temperature of 1 mm and brazing the metallized layer 8 for first bonding and the metallized layer 10 for second bonding.

そして、本発明においては、絶縁基体1の側面の搭載部1aに半導体素子3が搭載されるが、そのことが重要である。このように、絶縁基体1の側面の搭載部1aに半導体素子3が搭載されることから、半導体素子3の電極と電気的に接続される第一電極7に接続された配線導体5aおよび第二電極9に接続された配線導体5bは、第一電極7および第二電極9と上下に重ならない絶縁基体1の側面および外周部の内部のみに配設することができるようになり、その結果、配線導体5a,5bと第一電極7および第二電極9との間に不要な静電容量が形成されることを有効に防止することができる。   And in this invention, although the semiconductor element 3 is mounted in the mounting part 1a of the side surface of the insulation base | substrate 1, that is important. Thus, since the semiconductor element 3 is mounted on the mounting portion 1a on the side surface of the insulating base 1, the wiring conductor 5a connected to the first electrode 7 electrically connected to the electrode of the semiconductor element 3 and the second The wiring conductor 5b connected to the electrode 9 can be disposed only on the side surface and the outer periphery of the insulating base 1 that does not overlap the first electrode 7 and the second electrode 9, and as a result, It is possible to effectively prevent unnecessary capacitance from being formed between the wiring conductors 5 a and 5 b and the first electrode 7 and the second electrode 9.

また、第一電極7に接続された配線導体5aおよび第二電極9に接続された配線導体5bを極めて短いものとして配設することができるようになり、その結果、配線導体5a,5bの間に不要な静電容量が形成されることを有効に防止することができる。   Further, the wiring conductor 5a connected to the first electrode 7 and the wiring conductor 5b connected to the second electrode 9 can be arranged as extremely short, and as a result, between the wiring conductors 5a and 5b. It is possible to effectively prevent unnecessary capacitance from being formed.

このように、本発明の圧力検出装置用パッケージによれば、側面の搭載部1aに半導体素子3が搭載される絶縁基体1の他方の主面に静電容量形成用の第一電極7が被着されるとともに、絶縁基体1との間に密閉空間を形成するように可撓な状態で絶縁基体1に接合された絶縁板2の内側の主面にこの第一電極7と対向するように被着された静電容量形成用の第二電極9とを具備することから、半導体素子3を収容する容器と感圧素子とが一体となり、圧力検出装置を小型化することができる。   Thus, according to the package for a pressure detection device of the present invention, the first electrode 7 for forming a capacitance is covered on the other main surface of the insulating base 1 on which the semiconductor element 3 is mounted on the side mounting portion 1a. The first electrode 7 is opposed to the inner main surface of the insulating plate 2 joined to the insulating substrate 1 in a flexible state so as to form a sealed space with the insulating substrate 1. Since the deposited second electrode 9 for forming a capacitance is provided, the container for housing the semiconductor element 3 and the pressure sensitive element are integrated, and the pressure detecting device can be miniaturized.

また、絶縁基体1の側面の搭載部1aに搭載された半導体素子3の電極と電気的に接続される第一電極7に接続された配線導体5aおよび第二電極9に接続された配線導体5bが第一電極7および第二電極9と上下に重ならないように配設することができるようになることから、これらの配線導体5a,5bと第一電極7および第二電極9との間に不要な静電容量が形成されることを有効に防止することができるとともに、第一電極7に接続された配線導体5aおよび第二電極9に接続された配線導体5bを極めて短いものとして配設できるようになることから、これらの配線導体5a,5bに不要な静電容量が形成されることを有効に防止することができる。その結果、外部から加わる圧力の検出感度が高く、長期間にわたって正確に検出することができる信頼性の高い圧力検出装置用のパッケージを提供することができる。   Further, the wiring conductor 5a connected to the first electrode 7 electrically connected to the electrode of the semiconductor element 3 mounted on the mounting portion 1a on the side surface of the insulating base 1 and the wiring conductor 5b connected to the second electrode 9 Can be arranged so as not to overlap with the first electrode 7 and the second electrode 9 between the wiring conductors 5a, 5b and the first electrode 7 and the second electrode 9. It is possible to effectively prevent the formation of unnecessary capacitance, and the wiring conductor 5a connected to the first electrode 7 and the wiring conductor 5b connected to the second electrode 9 are arranged as extremely short ones. Therefore, it is possible to effectively prevent unnecessary capacitance from being formed in the wiring conductors 5a and 5b. As a result, it is possible to provide a highly reliable package for a pressure detection device that has high detection sensitivity of pressure applied from the outside and can accurately detect over a long period of time.

なお、本発明は、上述の実施の形態の例に限定されるものではなく、本発明の要旨を逸脱しない範囲内であれば種々の変更は可能である。例えば、図1においては、絶縁基体1と絶縁板2とを導電性接合材により接合しているが、絶縁基体1用のグリーンシートと絶縁板2用のグリーンシートとを積層した後、焼結一体化させたものであっても構わない。   The present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the gist of the present invention. For example, in FIG. 1, the insulating substrate 1 and the insulating plate 2 are bonded together by a conductive bonding material. After the green sheet for the insulating substrate 1 and the green sheet for the insulating plate 2 are laminated, sintering is performed. It may be integrated.

また、静電容量を形成するための密閉空間を設けるための絶縁板2の凹部および突起部2aは、絶縁基体1の他方の主面に設けても構わない。   Further, the concave portion and the protrusion 2 a of the insulating plate 2 for providing a sealed space for forming a capacitance may be provided on the other main surface of the insulating base 1.

さらに、絶縁基体1の側面の搭載部1aに搭載される半導体素子3は、絶縁基体1の側面に凹部を形成し、この凹部に収納するようにしても構わない。   Furthermore, the semiconductor element 3 mounted on the mounting portion 1a on the side surface of the insulating substrate 1 may be formed with a recess formed on the side surface of the insulating substrate 1 and housed in this recess.

また、絶縁板2が接合された絶縁基体1の一方の主面と対向する他方の主面に、同様に第二絶縁板を可撓な状態で接合させて第二密閉空間を形成し、この第二密閉空間内の絶縁基体1の他の主面に第三電極を形成するとともに第二絶縁板の内側主面に第四電極を形成して、第二の容量部を形成してもよい。これにより、遠心力が加わった場合は、絶縁基体1の上下の絶縁板が同じ方向に撓むのに対し、圧力変化に対しては、反対方向に撓むことによって遠心力と圧力変化との区別が容易となって圧力検出の精度をより向上させることができる。   Similarly, the second insulating plate is joined in a flexible state on the other main surface opposite to one main surface of the insulating substrate 1 to which the insulating plate 2 is bonded, thereby forming a second sealed space. The third electrode may be formed on the other main surface of the insulating base 1 in the second sealed space and the fourth electrode may be formed on the inner main surface of the second insulating plate to form the second capacitor portion. . As a result, when a centrifugal force is applied, the upper and lower insulating plates of the insulating substrate 1 bend in the same direction, whereas with respect to the pressure change, the centrifugal force and the pressure change are caused by bending in the opposite direction. The discrimination becomes easy and the accuracy of pressure detection can be further improved.

タイヤ等の圧力状態を検出するための圧力検出装置等に利用可能である。   The present invention can be used for a pressure detection device for detecting a pressure state of a tire or the like.

本発明の圧力検出装置用パッケージの実施の形態の一例を示す断面図である。It is sectional drawing which shows an example of embodiment of the package for pressure detection apparatuses of this invention. 従来の圧力検出装置用パッケージの断面図である。It is sectional drawing of the conventional package for pressure detection apparatuses. 従来の圧力検出装置の断面図である。It is sectional drawing of the conventional pressure detection apparatus.

符号の説明Explanation of symbols

1・・・・・・・・・・・絶縁基体
1a・・・・・・・・・・搭載部
2・・・・・・・・・・・絶縁板
2b・・・・・・・・・・凹部の底板部
3・・・・・・・・・・・半導体素子
5、5a、5b・・・・・配線導体
7・・・・・・・・・・・第一電極
9・・・・・・・・・・・第二電極
1 ········ Insulation base 1a ····· Mounting portion 2 ············· Insulation plate 2b ··· ················································· Semiconductor element 5, 5a, 5b ··· Wiring conductor ..... Second electrode

Claims (1)

側面に半導体素子が搭載される搭載部を有する絶縁基体と、該絶縁基体の表面および内部に配設され、前記半導体素子の電極が電気的に接続される複数の配線導体と、前記絶縁基体の一方の主面との間に密閉空間を形成するように可撓な状態で前記絶縁基体に接合された絶縁板と、前記密閉空間の前記絶縁基体の前記一方の主面に被着され、前記配線導体の一つに電気的に接続された静電容量形成用の第一電極と、前記絶縁板の内側主面に前記第一電極と対向するように被着され、前記配線導体の他の一つに電気的に接続された静電容量形成用の第二電極とを具備していることを特徴とする圧力検出装置用パッケージ。 An insulating base having a mounting portion on which a semiconductor element is mounted on a side surface; a plurality of wiring conductors disposed on and in the surface of the insulating base and electrically connected to electrodes of the semiconductor element; and An insulating plate bonded to the insulating base in a flexible state so as to form a sealed space between the main surface and the one main surface of the insulating base in the sealed space; A first electrode for forming a capacitance electrically connected to one of the wiring conductors, and attached to the inner main surface of the insulating plate so as to face the first electrode; A package for a pressure detection device, comprising: a second electrode for forming a capacitance electrically connected to one.
JP2004020292A 2004-01-28 2004-01-28 Package for pressure detecting apparatus Pending JP2005214735A (en)

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6031032A (en) * 1983-07-29 1985-02-16 Yokogawa Hokushin Electric Corp Semiconductor capacity type pressure sensor
JPH04143628A (en) * 1990-10-05 1992-05-18 Yamatake Honeywell Co Ltd Capacitance type pressure sensor
JPH06258342A (en) * 1993-03-05 1994-09-16 Omron Corp Semiconductor acceleration sensor and semiconductor pressure sensor
JP2001013026A (en) * 1999-03-24 2001-01-19 Envec Mess & Regeltechnik Gmbh & Co Capacitative pressure sensor and capacitative differential pressure sensor
JP2001050842A (en) * 1999-08-06 2001-02-23 Matsushita Electric Ind Co Ltd Pressure sensor
JP2001356064A (en) * 2000-06-14 2001-12-26 Kyocera Corp Package for pressure detector
JP2002323394A (en) * 2001-04-26 2002-11-08 Kyocera Corp Package for pressure detector
JP2005195423A (en) * 2004-01-06 2005-07-21 Alps Electric Co Ltd Pressure sensor

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6031032A (en) * 1983-07-29 1985-02-16 Yokogawa Hokushin Electric Corp Semiconductor capacity type pressure sensor
JPH04143628A (en) * 1990-10-05 1992-05-18 Yamatake Honeywell Co Ltd Capacitance type pressure sensor
JPH06258342A (en) * 1993-03-05 1994-09-16 Omron Corp Semiconductor acceleration sensor and semiconductor pressure sensor
JP2001013026A (en) * 1999-03-24 2001-01-19 Envec Mess & Regeltechnik Gmbh & Co Capacitative pressure sensor and capacitative differential pressure sensor
JP2001050842A (en) * 1999-08-06 2001-02-23 Matsushita Electric Ind Co Ltd Pressure sensor
JP2001356064A (en) * 2000-06-14 2001-12-26 Kyocera Corp Package for pressure detector
JP2002323394A (en) * 2001-04-26 2002-11-08 Kyocera Corp Package for pressure detector
JP2005195423A (en) * 2004-01-06 2005-07-21 Alps Electric Co Ltd Pressure sensor

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