JP2005156410A - Package for pressure-detecting device - Google Patents

Package for pressure-detecting device Download PDF

Info

Publication number
JP2005156410A
JP2005156410A JP2003396931A JP2003396931A JP2005156410A JP 2005156410 A JP2005156410 A JP 2005156410A JP 2003396931 A JP2003396931 A JP 2003396931A JP 2003396931 A JP2003396931 A JP 2003396931A JP 2005156410 A JP2005156410 A JP 2005156410A
Authority
JP
Japan
Prior art keywords
electrode
insulating plate
insulating
semiconductor element
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003396931A
Other languages
Japanese (ja)
Inventor
Toshiyuki Chitose
敏幸 千歳
Yosuke Moriyama
陽介 森山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2003396931A priority Critical patent/JP2005156410A/en
Publication of JP2005156410A publication Critical patent/JP2005156410A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Measuring Fluid Pressure (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a package for a pressure-detecting device which is compact and has high sensitivity, capable of accurately detecting the external pressure. <P>SOLUTION: The package for the pressure-detecting device is equipped with an insulating substrate 1, having a section 1b to be mounted in its one main surface on which a semiconductor element 3 is mounted; a projection section which is formed at the center section of the other main surface of the insulating substrate 1; a plurality of wiring conductors 5, which are disposed on and inside the insulating substrate 1 and by which electrodes of the semiconductor element 3 are electrically connected, respectively; an insulating plate 2, which is bonded to the periphery of the projecting section of the insulating substrate 1 flexibly so as to form a sealed space between itself and the projecting section; a first electrode 7, which is attached to the upper surface of the projecting section in the sealed space, electrically connected to one of the wiring conductors 5 and is used for forming a capacitor; a second electrode 9, which is attached to the inner main surface of the insulating plate 2 so as to be opposite to the first electrode 7, electrically connected to another wiring conductor 5 and used for making up the capacitor; and a step section 2a, which is formed extending over the entire circumference of the inner main surface of the insulating plate 2 and is in contact with the upper surface of the projection section. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、圧力を検出するための圧力検出装置に使用される圧力検出装置用パッケージに関するものである。   The present invention relates to a pressure detection device package used in a pressure detection device for detecting pressure.

従来、圧力を検出するための圧力検出装置として静電容量型の圧力検出装置が知られている。この静電容量型の圧力検出装置は、例えば図5に断面図で示すように、セラミック材料や樹脂材料から成る配線基板21上に、静電容量型の感圧素子22と、パッケージ28に収容された演算用の半導体素子29とを備えている。   Conventionally, a capacitance type pressure detection device is known as a pressure detection device for detecting pressure. For example, as shown in a sectional view in FIG. 5, this capacitance type pressure detection device is accommodated in a capacitance type pressure sensitive element 22 and a package 28 on a wiring substrate 21 made of a ceramic material or a resin material. And a semiconductor element 29 for operation.

感圧素子22は、例えばセラミック材料等の電気絶縁材料から成り、上面中央部に静電容量形成用の一方の電極23が被着された凹部を有する絶縁基体24と、この絶縁基体24の上面に絶縁基体24との間に密閉空間を形成するようにして可撓な状態で接合されており、下面に静電容量形成用の他方の電極25が被着された絶縁板26と、各静電容量形成用の電極23,25をそれぞれ外部に電気的に接続するための外部リード端子27とから構成されており、外部の圧力に応じて絶縁板26が撓むことにより各静電容量形成用の電極23,25間に形成される静電容量が変化する。そして、この静電容量の変化を演算用の半導体素子29により演算処理することにより外部の圧力を検出することができる。   The pressure-sensitive element 22 is made of, for example, an electrically insulating material such as a ceramic material, and has an insulating base 24 having a recess in which one electrode 23 for forming a capacitance is attached at the center of the upper surface, and the upper surface of the insulating base 24. And an insulating plate 26 which is joined in a flexible state so as to form a sealed space between the insulating base 24 and the other electrode 25 for forming a capacitance on the lower surface. Each of the capacitance forming electrodes 23 and 25 is composed of an external lead terminal 27 for electrically connecting to the outside, and each capacitance is formed by bending the insulating plate 26 according to the external pressure. The capacitance formed between the electrodes 23 and 25 for use changes. Then, an external pressure can be detected by performing arithmetic processing on the change of the electrostatic capacitance with the semiconductor element 29 for arithmetic operation.

しかしながら、この従来の圧力検出装置によると、感圧素子22と半導体素子29とを配線基板21上に個別に実装していることから、圧力検出装置が大型化するとともに圧力検出用の電極23,25と半導体素子29との間の配線が長いものとなり、この長い配線間に不要な静電容量が形成されるため感度が低いという問題点を有していた。   However, according to this conventional pressure detecting device, since the pressure sensitive element 22 and the semiconductor element 29 are individually mounted on the wiring board 21, the pressure detecting device is enlarged and the pressure detecting electrode 23, The wiring between the semiconductor element 29 and the semiconductor element 29 becomes long, and an unnecessary capacitance is formed between the long wirings, so that the sensitivity is low.

そこで、図4に断面図で示すような、一方の主面に半導体素子13が搭載される搭載部11bを有する絶縁基体11と、この絶縁基体11の表面および内部に配設され、半導体素子13の各電極が電気的に接続される複数の配線導体15と、絶縁基体11の他方の主面の中央部に被着され、配線導体15の一つに電気的に接続された静電容量形成用の第一電極17と、絶縁基体11の他方の主面に、この主面の中央部との間に密閉空間を形成するように可撓な状態で接合された絶縁板12と、この絶縁板12の内側主面に第一電極17と対向して被着され、配線導体15の他の一つに電気的に接続された静電容量形成用の第二電極19とを具備する圧力検出装置用パッケージが提案されている(下記の特許文献1参照)。   Therefore, as shown in a cross-sectional view in FIG. 4, an insulating base 11 having a mounting portion 11 b on which one of the main surfaces of the semiconductor element 13 is mounted, and a surface of and inside the insulating base 11 are provided. A plurality of wiring conductors 15 to which the respective electrodes are electrically connected, and capacitance formation that is attached to the central portion of the other main surface of the insulating base 11 and is electrically connected to one of the wiring conductors 15 An insulating plate 12 joined in a flexible state so as to form a sealed space between the first electrode 17 for use and the other main surface of the insulating base 11 and the central portion of the main surface, and the insulating plate 12 Pressure detection comprising a second electrode 19 for forming a capacitance, which is attached to the inner main surface of the plate 12 so as to face the first electrode 17 and is electrically connected to the other one of the wiring conductors 15. A device package has been proposed (see Patent Document 1 below).

この圧力検出装置用パッケージによれば、一方の主面に半導体素子13が搭載される搭載部11bを有する絶縁基体11の他方の主面に静電容量形成用の第一電極17を設けるとともに、この第一電極17に対向する静電容量形成用の第二電極19を内側面に有する絶縁板12を、絶縁基体15の他方の主面との間に密閉空間を形成するようにして可撓な状態で接合させたことから、半導体素子13を収容するパッケージに感圧素子が一体に形成され、その結果、圧力検出装置を小型化することができるとともに圧力検出用の電極と半導体素子13とを接続する配線を短いものとして、これらの配線間に発生する不要な静電容量を小さなものとすることができるというものである。   According to this pressure detection device package, the first electrode 17 for forming a capacitance is provided on the other main surface of the insulating base 11 having the mounting portion 11b on which the semiconductor element 13 is mounted on one main surface, The insulating plate 12 having the second electrode 19 for forming a capacitance facing the first electrode 17 on the inner surface is flexible so as to form a sealed space between the other main surface of the insulating substrate 15. Since the pressure sensitive element is integrally formed in the package that accommodates the semiconductor element 13, the pressure detecting device can be reduced in size and the pressure detecting electrode and the semiconductor element 13 can be reduced. It is possible to reduce the unnecessary electrostatic capacitance generated between these wirings by shortening the wiring for connecting the wires.

従来、これらの圧力検出装置用パッケージの第一電極17は、タングステンやモリブデン,銅,銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して絶縁基体11用のセラミックグリーンシートに印刷塗布し、これを絶縁基体11用の生セラミック成形体とともに焼成することによって絶縁基体11の上面中央部に所定のパターンに形成される。   Conventionally, the first electrode 17 of these pressure detection device packages is made of metal powder metallization such as tungsten, molybdenum, copper, silver, etc., and an appropriate organic binder, solvent, plasticizer, and dispersant are applied to the metal powder such as tungsten. The metallized paste obtained by addition and mixing is printed on a ceramic green sheet for the insulating substrate 11 by using a conventionally known screen printing method, and is fired together with a green ceramic molded body for the insulating substrate 11 to thereby insulate the insulating substrate. 11 is formed in a predetermined pattern at the center of the upper surface.

また、第二電極19は、タングステンやモリブデン,銅,銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して絶縁板12用のセラミックグリーンシートに印刷塗布し、これを絶縁板12用の生セラミック成形体とともに焼成することによって絶縁板12の所定のパターンに形成される。   The second electrode 19 is made of metal powder metallization such as tungsten, molybdenum, copper, or silver, and is obtained by adding and mixing an appropriate organic binder, solvent, plasticizer, and dispersant to metal powder such as tungsten. Is applied to a ceramic green sheet for the insulating plate 12 by using a well-known screen printing method, and is fired together with a green ceramic molded body for the insulating plate 12 to form a predetermined pattern of the insulating plate 12. The

また、第一電極17と第二電極19とを静電容量形成用とするためには、第一電極17と第二電極19との間に一定の領域を形成する必要があるため、絶縁基体11または絶縁板12の外周部に枠状の突起部12bを形成することで、絶縁基体11と絶縁板12との間に静電容量形成用の密閉空間を形成させていた。   In addition, in order to use the first electrode 17 and the second electrode 19 for forming a capacitance, it is necessary to form a certain region between the first electrode 17 and the second electrode 19. 11 or the insulating plate 12 is formed with a frame-like protrusion 12b on the outer peripheral portion thereof, thereby forming a sealed space for forming a capacitance between the insulating base 11 and the insulating plate 12.

また、絶縁基体11と絶縁板12とは、その外周部または枠状の突起部12bに第一接合用メタライズ層18、第二接合用メタライズ層20を形成し、この第一接合用メタライズ層18と第二接合用メタライズ層20とをろう材等により接合していた。
特開2001−356064号公報
Further, the insulating base 11 and the insulating plate 12 are formed with a first bonding metallized layer 18 and a second bonding metallized layer 20 on the outer peripheral part or the frame-shaped protrusion 12b. And the second bonding metallization layer 20 were bonded by a brazing material or the like.
JP 2001-356064 A

しかしながら、従来の圧力検出装置用パッケージによると、絶縁基体11と絶縁板12とを接合する銀−銅ろうから成るろう材は大きな応力により塑性変形を起こしやすいことから、絶縁板12に外部の圧力が長期間にわたり大きく加えられた場合、絶縁板12が撓むことにより発生する応力が絶縁基体11と絶縁板12とを接合するろう材の内周縁部に大きく作用してろう材に塑性変形が発生し易くなり、その結果、圧力が解除されても絶縁板12が元の位置に完全には戻らず、外部の圧力を正確に検出するのが困難になるという問題点を有していた。   However, according to the conventional package for a pressure detection device, the brazing material made of silver-copper brazing that joins the insulating base 11 and the insulating plate 12 is likely to be plastically deformed by a large stress. Is greatly applied over a long period of time, the stress generated by the bending of the insulating plate 12 acts greatly on the inner peripheral edge of the brazing material joining the insulating base 11 and the insulating plate 12, and plastic deformation occurs in the brazing material. As a result, the insulating plate 12 does not return to its original position even when the pressure is released, and it is difficult to accurately detect the external pressure.

従って、本発明はかかる従来の問題点に鑑み案出されたものであり、その目的は、外部の圧力を長期間にわたり正確に検出することが可能な圧力検出装置を提供することにある。   Accordingly, the present invention has been devised in view of such conventional problems, and an object thereof is to provide a pressure detection device capable of accurately detecting an external pressure over a long period of time.

本発明の圧力検出装置用パッケージは、一方の主面に半導体素子が搭載される搭載部を有する絶縁基体と、該絶縁基体の他方の主面の中央部に形成された凸部と、前記絶縁基体の表面および内部に配設され、前記半導体素子の各電極が電気的に接続される複数の配線導体と、前記凸部との間に密閉空間を形成するように可撓な状態で前記絶縁基体の前記凸部の周囲に接合された絶縁板と、前記密閉空間内の前記凸部の上面に被着され、前記配線導体の一つに電気的に接続された静電容量形成用の第一電極と、前記絶縁板の内側の主面に前記第一電極と対向するように被着され、前記配線導体の他の一つに電気的に接続された静電容量形成用の第二電極と、前記絶縁板の内側の主面の外周部に全周にわたって形成されるとともに前記凸部の上面に当接された段差部とを具備していることを特徴とする。   The package for a pressure detection device of the present invention includes an insulating base having a mounting portion on which a semiconductor element is mounted on one main surface, a convex portion formed at a central portion of the other main surface of the insulating base, and the insulating The insulation in a flexible state so as to form a sealed space between a plurality of wiring conductors arranged on the surface and inside of the base body and electrically connected to the electrodes of the semiconductor element. An insulating plate bonded around the convex portion of the base, and an electrostatic capacity forming first electrode that is attached to the upper surface of the convex portion in the sealed space and is electrically connected to one of the wiring conductors. One electrode and a second electrode for forming a capacitance that is attached to the inner main surface of the insulating plate so as to face the first electrode and is electrically connected to the other one of the wiring conductors And the upper surface of the convex portion formed on the outer peripheral portion of the inner main surface of the insulating plate over the entire circumference Characterized in that it comprises the abutted stepped portion.

本発明の圧力検出装置用パッケージによれば、一方の主面に半導体素子が搭載される搭載部を有する絶縁基体と、絶縁基体の他方の主面の中央部に形成された凸部と、絶縁基体の表面および内部に配設され、半導体素子の各電極が電気的に接続される複数の配線導体と、凸部との間に密閉空間を形成するように可撓な状態で前記絶縁基体の凸部の周囲に接合された絶縁板と、密閉空間内の凸部の上面に被着され、配線導体の一つに電気的に接続された静電容量形成用の第一電極と、絶縁板の内側の主面に第一電極と対向するように被着され、配線導体の他の一つに電気的に接続された静電容量形成用の第二電極と、絶縁板の内側の主面の外周部に全周にわたって形成されるとともに凸部の上面に当接された段差部とを具備していることから、第一電極と第二電極との間隔を狭いものとして、圧力検出の感度の高いものとすることができる。   According to the package for a pressure detection device of the present invention, an insulating base having a mounting portion on which a semiconductor element is mounted on one main surface, a convex portion formed at the center of the other main surface of the insulating base, and an insulating A surface of the base body and an inside of the insulating base body in a flexible state so as to form a sealed space between a plurality of wiring conductors that are electrically connected to each electrode of the semiconductor element and a convex portion. An insulating plate joined around the convex portion, a first electrode for forming a capacitance that is attached to the upper surface of the convex portion in the sealed space and electrically connected to one of the wiring conductors, and an insulating plate A second electrode for forming a capacitance that is attached to the inner main surface of the first electrode so as to face the first electrode and is electrically connected to the other one of the wiring conductors, and an inner main surface of the insulating plate A step portion that is formed over the entire circumference and is in contact with the upper surface of the convex portion. As narrow a distance between the first electrode and the second electrode can be made high sensitivity of the pressure detection.

また、絶縁板に外部の圧力が長期間にわたり大きく加えられたとしても、絶縁板が撓むことにより発生する応力を凸部に当接した絶縁板の段差部に集中させることができ、応力が絶縁基体と絶縁板とを接合するろう材に大きく作用してろう材に塑性変形が発生するのを有効に防止することができる。その結果、圧力を解除したときに絶縁板を元の位置に良好に復元することができ、外部の圧力の検出精度を長期にわたって良好に維持することができる。   Moreover, even if external pressure is applied to the insulating plate for a long period of time, the stress generated by the bending of the insulating plate can be concentrated on the step portion of the insulating plate in contact with the convex portion. It is possible to effectively prevent the brazing material from being plastically deformed by acting on the brazing material joining the insulating base and the insulating plate. As a result, when the pressure is released, the insulating plate can be satisfactorily restored to the original position, and the detection accuracy of the external pressure can be maintained well over a long period.

さらに、絶縁板を絶縁基体に接合する際、段差部を凸部に当接させることにより、第一電極と第二電極との間隔をばらつきの少ないきわめて精度良いものとすることができ、圧力検出の感度を非常に高精度にすることができる。また、絶縁板と絶縁基体との接合部の間隔もきわめて精度良く調整でき、絶縁基体と絶縁板との接合を接合強度ばらつきが少なく、非常に強固なものとすることができる。   Furthermore, when the insulating plate is joined to the insulating base, the gap between the first electrode and the second electrode can be made extremely accurate with little variation by bringing the step portion into contact with the convex portion. The sensitivity of can be made very high accuracy. In addition, the interval between the joint portions of the insulating plate and the insulating base can be adjusted with extremely high accuracy, and the bonding between the insulating base and the insulating plate can be made extremely strong with little variation in the bonding strength.

次に、本発明の圧力検出装置用パッケージを添付の図面を基に詳細に説明する。図1は、本発明の圧力検出装置用パッケージの実施の形態の一例を示す断面図であり、図1において、1は絶縁基体、2は絶縁板、3は半導体素子、7は第一電極、9は第二電極である。   Next, a pressure detection device package according to the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional view showing an example of an embodiment of a pressure detecting device package according to the present invention. In FIG. 1, 1 is an insulating substrate, 2 is an insulating plate, 3 is a semiconductor element, 7 is a first electrode, Reference numeral 9 denotes a second electrode.

絶縁基体1は、酸化アルミニウム質焼結体や窒化アルミニウム質焼結体,ムライト質焼結体,ガラス−セラミックス等のセラミック材料から成る積層体である。   The insulating substrate 1 is a laminated body made of a ceramic material such as an aluminum oxide sintered body, an aluminum nitride sintered body, a mullite sintered body, or a glass-ceramic.

絶縁基体1は、例えば、酸化アルミニウム質焼結体から成る場合、酸化アルミニウム,酸化珪素,酸化マグネシウム,酸化カルシウム等のセラミック原料粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して泥漿状となすとともにこれを従来周知のドクタブレード法を採用してシート状に成形することにより複数枚のセラミックグリーンシートを得、しかる後、これらのセラミックグリーンシートに適当な打ち抜き加工,積層加工,切断加工を施すことにより絶縁基体1用の生セラミック成形体を得るとともにこの生セラミック成形体を約1600℃の温度で焼成することにより製作される。   When the insulating substrate 1 is made of, for example, an aluminum oxide sintered body, an appropriate organic binder, solvent, plasticizer, and dispersant are added to and mixed with ceramic raw material powder such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide. Then, it is made into a mud shape and formed into a sheet shape by adopting a conventionally known doctor blade method, and then a plurality of ceramic green sheets are obtained, and then these ceramic green sheets are appropriately punched and laminated. The green ceramic molded body for the insulating substrate 1 is obtained by cutting, and the green ceramic molded body is manufactured by firing at a temperature of about 1600 ° C.

絶縁基体1は、その一方の主面(図1では下面)に半導体素子3を収容するための凹部1aが形成されており、それにより半導体素子3を収容する容器として機能する。そして、この凹部1aの底面中央部が半導体素子3が搭載される搭載部1bとなっており、この搭載部1bに半導体素子3を搭載するとともに凹部1a内に例えばエポキシ樹脂等の樹脂製封止材4を充填することにより半導体素子3が封止される。   The insulating base 1 has a concave portion 1a for accommodating the semiconductor element 3 formed on one main surface (the lower surface in FIG. 1), thereby functioning as a container for accommodating the semiconductor element 3. The central portion of the bottom surface of the recess 1a is a mounting portion 1b on which the semiconductor element 3 is mounted. The semiconductor element 3 is mounted on the mounting portion 1b and the resin sealing such as an epoxy resin is provided in the recess 1a. The semiconductor element 3 is sealed by filling the material 4.

なお、この例では半導体素子3は樹脂製封止材4を凹部1a内に充填することにより封止されるが、半導体素子3は絶縁基体1の下面に金属やセラミックス等から成る蓋体を凹部1aを塞ぐように接合させることにより封止されてもよい。   In this example, the semiconductor element 3 is sealed by filling the resin sealing material 4 into the recess 1a. However, the semiconductor element 3 has a lid made of metal, ceramics, or the like on the lower surface of the insulating base 1. You may seal by making it join so that 1a may be plugged up.

また、搭載部1bには半導体素子3の各電極に接続される複数の配線導体5が導出されており、この配線導体5と半導体素子3の各電極を半田バンプ6等の電気的接続手段を介して接続することにより半導体素子3の各電極と各配線導体5とが電気的に接続されるとともに半導体素子3が搭載部1bに固定される。なお、この例では、半導体素子3の電極と配線導体5とは半田バンプ6を介して接続されるが、半導体素子3の電極と配線導体5とはボンディングワイヤ等の他の種類の電気的接続手段により接続されてもよい。   In addition, a plurality of wiring conductors 5 connected to the respective electrodes of the semiconductor element 3 are led out to the mounting portion 1b, and electrical connection means such as solder bumps 6 are connected to the wiring conductors 5 and the respective electrodes of the semiconductor element 3. By connecting them, each electrode of the semiconductor element 3 and each wiring conductor 5 are electrically connected, and the semiconductor element 3 is fixed to the mounting portion 1b. In this example, the electrode of the semiconductor element 3 and the wiring conductor 5 are connected via the solder bumps 6. However, the electrode of the semiconductor element 3 and the wiring conductor 5 are connected to other types of electrical connections such as bonding wires. It may be connected by means.

配線導体5は、半導体素子3の各電極を外部電気回路および後述する第一電極7,第二電極9に電気的に接続するための導電路として機能し、その一部は絶縁基体1の外周部下面に導出され、別の一部は第一電極7,第二電極9に電気的に接続されている。そして、半導体素子3の各電極をこれらの配線導体5に半田バンプ6等の電気的接続手段を介して電気的に接続するとともに半導体素子3を樹脂製封止材4で封止した後、配線導体5の絶縁基体1の外周部下面に導出した部位を外部電気回路基板の配線導体に半田等の導電性接合材を介して接合することにより、内部に収容する半導体素子3が外部電気回路に電気的に接続されることとなる。   The wiring conductor 5 functions as a conductive path for electrically connecting each electrode of the semiconductor element 3 to an external electric circuit and a first electrode 7 and a second electrode 9 described later, and a part of the wiring conductor 5 is an outer periphery of the insulating base 1. It is led out to the lower surface of the part, and another part is electrically connected to the first electrode 7 and the second electrode 9. Then, each electrode of the semiconductor element 3 is electrically connected to these wiring conductors 5 through electrical connection means such as solder bumps 6 and the semiconductor element 3 is sealed with a resin sealing material 4. The portion of the conductor 5 led to the lower surface of the outer peripheral portion of the insulating base 1 is joined to the wiring conductor of the external electric circuit board via a conductive bonding material such as solder, so that the semiconductor element 3 accommodated therein becomes an external electric circuit. It will be electrically connected.

このような配線導体5は、タングステンやモリブデン,銅,銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ,溶剤,可塑剤,分散剤等を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して絶縁基体1用のセラミックグリーンシートに所定のパターンに印刷塗布し、これを絶縁基体1用の生セラミック成形体とともに焼成することによって絶縁基体1の内部および表面に所定のパターンに形成される。   Such a wiring conductor 5 is made of metal powder metallization such as tungsten, molybdenum, copper, and silver, and is obtained by adding and mixing an appropriate organic binder, solvent, plasticizer, dispersant, etc. to metal powder such as tungsten. The paste is applied in a predetermined pattern to a ceramic green sheet for the insulating substrate 1 by using a conventionally known screen printing method, and this is fired together with a green ceramic molded body for the insulating substrate 1 to synthesize the inside of the insulating substrate 1. In addition, a predetermined pattern is formed on the surface.

なお、配線導体5の表面には、配線導体5が酸化腐食するのを防止するとともに配線導体5と半田等との接合を良好なものとするために、例えば、厚みが1〜10μm程度のニッケルめっき層と厚みが0.1〜3μm程度の金めっき層とが順次被着されているのが好ましい。   In order to prevent the wiring conductor 5 from being oxidized and corroded on the surface of the wiring conductor 5 and to improve the bonding between the wiring conductor 5 and solder or the like, for example, nickel having a thickness of about 1 to 10 μm is used. It is preferable that a plating layer and a gold plating layer having a thickness of about 0.1 to 3 μm are sequentially deposited.

また、絶縁基体1は、他方の主面(図1では上面)の中央部に凸部を有しており、その上面に静電容量形成用の第一電極7が被着されている。この第一電極7は、後述する第二電極9とともに感圧素子用の静電容量を形成するためのものであり、例えば円形状のパターンに形成されている。そして、この第一電極7には配線導体5の一つである配線導体5aが接続されており、配線導体5aの他端に半導体素子3の電極を半田バンプ6等の電気的接続手段を介して接続することによって導体素子3の電極と第一電極7とが電気的に接続されるようになっている。   The insulating substrate 1 has a convex portion at the center of the other main surface (upper surface in FIG. 1), and a first electrode 7 for forming a capacitance is deposited on the upper surface. The first electrode 7 is for forming a capacitance for a pressure sensitive element together with a second electrode 9 described later, and is formed in, for example, a circular pattern. A wiring conductor 5a, which is one of the wiring conductors 5, is connected to the first electrode 7. The electrode of the semiconductor element 3 is connected to the other end of the wiring conductor 5a via an electrical connection means such as a solder bump 6. Thus, the electrode of the conductor element 3 and the first electrode 7 are electrically connected.

このような第一電極7は、厚みが10〜50μm程度のタングステンやモリブデン,銅,銀等の金属粉末メタライズから成り、例えば、タングステン等の金属粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して絶縁基体1用のセラミックグリーンシートに印刷塗布し、これを絶縁基体1用の生セラミック成形体とともに焼成することによって絶縁基体1の上面中央部に所定のパターンに形成される。なお、第一電極7の表面には、第一電極7が酸化腐食するのを防止するために、例えば、厚みが1〜10μm程度のニッケルめっき層が被着されているのがよい。   The first electrode 7 is made of metal powder metallization such as tungsten, molybdenum, copper, and silver having a thickness of about 10 to 50 μm. For example, an organic binder, solvent, plasticizer, dispersion suitable for metal powder such as tungsten. The metallized paste obtained by adding and mixing the agent is printed and applied to the ceramic green sheet for the insulating substrate 1 using a conventionally known screen printing method, and is fired together with the green ceramic molded body for the insulating substrate 1 A predetermined pattern is formed at the center of the upper surface of the insulating substrate 1. In addition, in order to prevent the first electrode 7 from being oxidatively corroded on the surface of the first electrode 7, for example, a nickel plating layer having a thickness of about 1 to 10 μm may be deposited.

また、絶縁基体1の上面外周部には、その全周にわたり枠状の第一接合用メタライズ層8が被着されており、この第一接合用メタライズ層8に、絶縁板2の下面外周部に形成された第二接合用メタライズ層10が銀−銅ろう材等のろう材を介して接合されることにより、絶縁基体1と絶縁板2との間に密閉空間が形成される。   Further, a frame-shaped first bonding metallization layer 8 is attached to the outer peripheral portion of the upper surface of the insulating substrate 1 over the entire periphery, and the lower peripheral portion of the lower surface of the insulating plate 2 is attached to the first bonding metallized layer 8. The second metallization layer 10 for bonding is bonded via a brazing material such as a silver-copper brazing material, whereby a sealed space is formed between the insulating base 1 and the insulating plate 2.

この第一接合用メタライズ層8には配線導体5の一つである配線導体5bが接続されており、配線導体5bの他端に半導体素子3の電極を半田バンプ6等の電気的接続手段を介して電気的に接続することによって半導体素子3の電極と第二電極9とが電気的に接続されるようになっている。   A wiring conductor 5b, which is one of the wiring conductors 5, is connected to the first bonding metallization layer 8. An electrode of the semiconductor element 3 is connected to the other end of the wiring conductor 5b with an electrical connection means such as a solder bump 6. Thus, the electrode of the semiconductor element 3 and the second electrode 9 are electrically connected.

このような第一接合用メタライズ層8は、タングステンやモリブデン,銅,銀等の金属粉末メタライズから成り、例えば、タングステン等の金属粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して絶縁基体1用のセラミックグリーンシートに印刷塗布し、これを絶縁基体1用の生セラミック成形体とともに焼成することによって絶縁基体1の上面外周部に枠状の所定のパターンに形成される。なお、第一接合用メタライズ層8の表面には、第一接合用メタライズ層8が酸化腐食するのを防止するとともに第一接合用メタライズ層8とろう材との接合を強固なものとするために、厚みが1〜10μm程度のニッケルめっき層が被着されているのがよい。   Such a first bonding metallization layer 8 is made of metal powder metallization such as tungsten, molybdenum, copper, and silver. For example, an appropriate organic binder, solvent, plasticizer, and dispersant are added to and mixed with metal powder such as tungsten. The metallized paste obtained in this manner is printed and applied to a ceramic green sheet for the insulating substrate 1 using a conventionally known screen printing method, and is fired together with a green ceramic molded body for the insulating substrate 1 to thereby form the insulating substrate 1. A predetermined frame-like pattern is formed on the outer periphery of the upper surface. The first bonding metallization layer 8 is prevented from being oxidized and corroded on the surface of the first bonding metallization layer 8 and the bonding between the first bonding metallization layer 8 and the brazing material is strengthened. In addition, a nickel plating layer having a thickness of about 1 to 10 μm is preferably applied.

また、絶縁基体1の凸部の高さは10〜200μmであるのがよい。これにより、絶縁板2が撓むことにより発生する応力が絶縁基体1と絶縁板2とを接合するろう材に大きく作用するのを有効に抑制し、ろう材に塑性変形が発生するのを有効に防止することができる。   Further, the height of the convex portion of the insulating substrate 1 is preferably 10 to 200 μm. As a result, it is possible to effectively suppress the stress generated by the bending of the insulating plate 2 from acting greatly on the brazing material joining the insulating base 1 and the insulating plate 2, and to effectively cause plastic deformation in the brazing material. Can be prevented.

なお、凸部は、図1で示すように絶縁基体1の一部からなるものであってもよく、絶縁基体1に板状の絶縁体を取着することにより凸部を形成してもよい。絶縁基体1に絶縁体を取着する場合、絶縁体を研磨等で平坦化した後、絶縁基体1に取着することにより、より平坦性の高い面を容易に形成することが可能となり、第一電極7の平坦性を向上させて圧力検査の精度をより向上させることが可能となる。   As shown in FIG. 1, the convex portion may consist of a part of the insulating base 1, and the convex portion may be formed by attaching a plate-like insulator to the insulating base 1. . When an insulator is attached to the insulating substrate 1, it is possible to easily form a surface with higher flatness by attaching the insulator to the insulating substrate 1 after the insulator is flattened by polishing or the like. It is possible to improve the flatness of the one electrode 7 and further improve the accuracy of the pressure inspection.

また、凸部は導体により形成されていてもよい。例えば、絶縁基体1に凸部となるメタライズ層を形成した後、第一電極7を形成することができる。あるいは、絶縁基体1にメタライズ層を厚く形成して凸部と第一電極7を一体として形成してもよい。このように、凸部をメタライズ等の導体で形成することにより、凸部の段差部2aとの接触部が適度に変形して段差部2aに加わる応力を凸部で有効に吸収することができる。   Moreover, the convex part may be formed with the conductor. For example, the first electrode 7 can be formed after forming a metallized layer to be a convex portion on the insulating substrate 1. Alternatively, a thick metallization layer may be formed on the insulating substrate 1 so that the convex portion and the first electrode 7 are integrally formed. Thus, by forming the convex portion with a conductor such as metallized, the contact portion of the convex portion with the stepped portion 2a is appropriately deformed, and the stress applied to the stepped portion 2a can be effectively absorbed by the convex portion. .

また、絶縁基体1の上面に接合された絶縁板2は、酸化アルミニウム質焼結体や窒化アルミニウム質焼結体,ムライト質焼結体,ガラス−セラミックス等のセラミック材料から成る四角形状や八角形状,円形状等の平板状であり、その下面外周部に高さが0.01〜5mmの枠状の段差部2aを有している。そして、段差部2aで囲まれた中央部が外部の圧力に応じて絶縁基体1側に撓むいわゆる圧力検出用のダイアフラムとして機能する。   The insulating plate 2 bonded to the upper surface of the insulating substrate 1 is a square or octagonal shape made of a ceramic material such as an aluminum oxide sintered body, an aluminum nitride sintered body, a mullite sintered body, or a glass-ceramic. , A flat plate shape such as a circular shape, and has a frame-shaped step portion 2a having a height of 0.01 to 5 mm on the outer peripheral portion of the lower surface thereof. And the center part enclosed by the level | step-difference part 2a functions as what is called a diaphragm for pressure detections bent to the insulating base | substrate 1 side according to an external pressure.

なお、絶縁板2は、その中央部の厚みが0.01mm未満ではその機械的強度が小さいものとなり易い。他方、中央部の厚みが5mmを超えると、小さな圧力では撓みにくくなり、精度良く圧力検出するのが困難になる。したがって、絶縁板2の中央部の厚みは0.01〜5mmの範囲が好ましい。   The insulating plate 2 tends to have a low mechanical strength when the thickness of the central portion is less than 0.01 mm. On the other hand, when the thickness of the central portion exceeds 5 mm, it becomes difficult to bend with a small pressure, and it is difficult to detect the pressure with high accuracy. Therefore, the thickness of the central part of the insulating plate 2 is preferably in the range of 0.01 to 5 mm.

また、段差部2aの高さは、絶縁基体1と絶縁板2とを接合するろう材の塑性変形を防止するために0.1mm以上であるのが好ましく、段差部2aの高さが0.1mm未満の場合、絶縁板2の中央部が外部の圧力により大きく撓んだ際に、その撓みにより発生する応力が段差部2aの内周縁部を介してろう材の内周縁部に大きく作用してろう材に塑性変形が発生し易くなる。また、段差部2aの高さが5mmを超える場合、そのような高さの段差部2aを形成するために圧力検出装置用パッケージの厚みが厚くなりすぎる傾向にある。したがって、段差部2aの高さは0.1〜5mmの範囲が好ましい。   Further, the height of the stepped portion 2a is preferably 0.1 mm or more in order to prevent plastic deformation of the brazing material joining the insulating base 1 and the insulating plate 2, and the height of the stepped portion 2a is 0.00. In the case of less than 1 mm, when the central portion of the insulating plate 2 is greatly bent due to external pressure, the stress generated by the bending acts greatly on the inner peripheral edge of the brazing material via the inner peripheral edge of the stepped portion 2a. It is easy for plastic deformation to occur in the brazing filler metal. Further, when the height of the stepped portion 2a exceeds 5 mm, the thickness of the pressure detection device package tends to be too thick in order to form the stepped portion 2a having such a height. Accordingly, the height of the stepped portion 2a is preferably in the range of 0.1 to 5 mm.

このような絶縁板2は、例えば酸化アルミニウム質焼結体から成る場合であれば、酸化アルミニウム,酸化珪素,酸化マグネシウム,酸化カルシウム等のセラミック原料粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して泥漿状となすとともにこれを従来周知のドクタブレード法を採用してシート状に成形することによりセラミックグリーンシートを得、しかる後、このセラミックグリーンシートに適当な打ち抜き加工や積層加工,切断加工を施すことにより絶縁板2用の生セラミック成形体を得るとともにこの生セラミック成形体を約1600℃の温度で焼成することにより製作される。   When such an insulating plate 2 is made of, for example, an aluminum oxide sintered body, an organic binder, a solvent, a plasticizer, a dispersion suitable for ceramic raw material powders such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide are used. A ceramic green sheet is obtained by adding a mixing agent to form a mud and forming it into a sheet using a conventionally known doctor blade method, and then punching or laminating the ceramic green sheet appropriately. The raw ceramic molded body for the insulating plate 2 is obtained by processing and cutting, and the raw ceramic molded body is manufactured by firing at a temperature of about 1600 ° C.

また、絶縁板2の下面にはその中央部に第一電極7と対向する静電容量形成用の第二電極9が被着されている。この第二電極9は、前述の第一電極7とともに感圧素子用の静電容量を形成するためのものであり、例えば円形状のパターンに形成されている。   Further, a second electrode 9 for forming a capacitance facing the first electrode 7 is attached to the lower surface of the insulating plate 2 at the center thereof. The second electrode 9 is used to form a capacitance for the pressure sensitive element together with the first electrode 7 described above, and is formed in a circular pattern, for example.

このような第二電極9は、厚みが10〜50μm程度のタングステンやモリブデン,銅,銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して絶縁板2用のセラミックグリーンシートに印刷塗布し、これを絶縁板2用の生セラミック成形体とともに焼成することによって絶縁板2の下面中央部に所定のパターンに形成される。なお、第二電極9の表面には、第二電極9が酸化腐食するのを防止するために、厚みが1〜10μm程度のニッケルめっき層が被着されているのがよい。   Such a second electrode 9 is made of metal powder metallization of tungsten, molybdenum, copper, silver or the like having a thickness of about 10 to 50 μm, and an appropriate organic binder, solvent, plasticizer, or dispersant is applied to the metal powder such as tungsten. The metallized paste obtained by addition and mixing is applied to a ceramic green sheet for the insulating plate 2 by employing a conventionally known screen printing method, and is fired together with the green ceramic molded body for the insulating plate 2 to synthesize the insulating plate. 2 is formed in a predetermined pattern at the center of the lower surface. The surface of the second electrode 9 is preferably coated with a nickel plating layer having a thickness of about 1 to 10 μm in order to prevent the second electrode 9 from being oxidized and corroded.

また、絶縁板2の段差部2aの下面には第二電極9に電気的に接続された円形状や八角形状の枠状の第二接合用メタライズ層10が被着されている。この第二接合用メタライズ層10は、絶縁板2を絶縁基体1に接合するための接合用下地金属層として機能し、第二接合用メタライズ層10と第一接合用メタライズ層8とを銀−銅ろう等のろう材を介して接合することにより絶縁基体1と絶縁板2とが接合されるとともに第一接合用メタライズ層8と第二接合用メタライズ層10とが電気的に接続される。   Further, a circular or octagonal frame-like second bonding metallization layer 10 electrically connected to the second electrode 9 is deposited on the lower surface of the stepped portion 2a of the insulating plate 2. The second bonding metallization layer 10 functions as a bonding base metal layer for bonding the insulating plate 2 to the insulating substrate 1, and the second bonding metallization layer 10 and the first bonding metallization layer 8 are silver- The insulating base 1 and the insulating plate 2 are bonded by bonding via a brazing material such as copper brazing, and the first bonding metallized layer 8 and the second bonding metallized layer 10 are electrically connected.

このとき、第一電極7と第二電極9とは、絶縁基体1と絶縁板2との間に形成された密閉空間を挟んで対向しており、これらの間には、第一電極7や第二電極9の面積および第一電極7と第二電極9との間隔に応じて所定の静電容量が形成される。そして、絶縁板2の上面に外部の圧力が加わると、その圧力に応じて絶縁板2が絶縁基体1側に撓んで第一電極7と第二電極9との間隔が変わり、それにより第一電極7と第二電極9との間の静電容量が変化するので、外部の圧力の変化を静電容量の変化として感知する感圧素子として機能する。そして、この静電容量の変化を凹部1a内に収容した半導体素子3に配線導体5a,5bを介して伝達し、これを半導体素子3で演算処理することによって外部の圧力の大きさを知ることができる。   At this time, the first electrode 7 and the second electrode 9 are opposed to each other with a sealed space formed between the insulating base 1 and the insulating plate 2 interposed therebetween. A predetermined capacitance is formed according to the area of the second electrode 9 and the distance between the first electrode 7 and the second electrode 9. When an external pressure is applied to the upper surface of the insulating plate 2, the insulating plate 2 is bent toward the insulating base 1 in accordance with the pressure, and the distance between the first electrode 7 and the second electrode 9 is changed. Since the capacitance between the electrode 7 and the second electrode 9 changes, it functions as a pressure-sensitive element that senses a change in external pressure as a change in capacitance. Then, the change in electrostatic capacity is transmitted to the semiconductor element 3 accommodated in the recess 1a through the wiring conductors 5a and 5b, and this is processed by the semiconductor element 3 so as to know the magnitude of the external pressure. Can do.

このような第二接合用メタライズ層10は、厚みが10〜50μm程度のタングステンやモリブデン,銅,銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して絶縁板2用のセラミックグリーンシートに印刷塗布し、これを絶縁板2用の生セラミック成形体とともに焼成することによって絶縁板2の段差部2a下面に所定のパターンに形成される。   Such a second bonding metallization layer 10 is made of metal powder metallization of tungsten, molybdenum, copper, silver or the like having a thickness of about 10 to 50 μm, and suitable organic binder, solvent, plasticizer, metal powder such as tungsten, A metallized paste obtained by adding and mixing a dispersant is applied and applied to a ceramic green sheet for the insulating plate 2 using a conventionally known screen printing method, and is fired together with a green ceramic molded body for the insulating plate 2 Thus, a predetermined pattern is formed on the lower surface of the stepped portion 2a of the insulating plate 2.

なお、第二接合用メタライズ層10の表面には、第二接合用メタライズ層10が酸化腐食するのを防止するとともに第二接合用メタライズ層10とろう材との接合を良好とするために、厚みが1〜10μm程度のニッケルめっき層が被着されているのがよい。   In order to prevent the second bonding metallization layer 10 from being oxidatively corroded on the surface of the second bonding metallization layer 10 and to improve the bonding between the second bonding metallization layer 10 and the brazing material, A nickel plating layer having a thickness of about 1 to 10 μm is preferably applied.

また、絶縁基体1に絶縁板2を接合するには、例えば、第一接合用メタライズ層8および第二接合用メタライズ層10の表面に予め1〜10μm程度の厚みのニッケルめっき層をそれぞれ被着させておくとともに、第一接合用メタライズ層8と第二接合用メタライズ層10との間に厚みが10〜200μm程度の銀−銅ろうから成るろう材箔を挟んで絶縁基体1と絶縁板2とを重ね合わせ、これらを還元雰囲気中、約850℃の温度に加熱してろう材箔を溶融させて第一接合用メタライズ層8と第二接合用メタライズ層10とをろう付けする方法が採用される。   Further, in order to join the insulating plate 2 to the insulating base 1, for example, a nickel plating layer having a thickness of about 1 to 10 μm is previously deposited on the surfaces of the first joining metallized layer 8 and the second joining metallized layer 10, respectively. Insulating substrate 1 and insulating plate 2 with a brazing material foil made of silver-copper brazing having a thickness of about 10 to 200 μm interposed between metallizing layer 8 for first bonding and metallizing layer 10 for second bonding. And a method of brazing the metallized layer 8 for first bonding and the metallized layer 10 for second bonding by heating them to a temperature of about 850 ° C. in a reducing atmosphere to melt the brazing material foil. Is done.

また、絶縁板2は、図1に示すように、第二接合用メタライズ層が被着された部位が突出した突出部2bが形成されているのがよい。これにより、第一接合用メタライズ層と第二接合用メタライズ層との間のろう材が流出して第一電極7に接触するのを有効に防止することができるため、絶縁基体1と絶縁板2との接合部を第一電極7により接近させることができ、圧力検出装置用パッケージをより小型化することができる。さらに、第一接合用メタライズ層と第二接合用メタライズ層との間のろう材を薄くすることができ、ろう材の高さ方向の熱膨張を小さくして絶縁基体1や絶縁板2に応力が生じるのを有効に防止できる。   Further, as shown in FIG. 1, the insulating plate 2 is preferably formed with a protruding portion 2 b protruding from a portion where the second bonding metallization layer is applied. Accordingly, it is possible to effectively prevent the brazing material between the first bonding metallization layer and the second bonding metallization layer from flowing out and coming into contact with the first electrode 7. 2 can be brought closer to the first electrode 7, and the pressure detection device package can be further downsized. Further, the brazing material between the first bonding metallization layer and the second bonding metallization layer can be thinned, and the thermal expansion in the height direction of the brazing material is reduced, and stress is applied to the insulating substrate 1 and the insulating plate 2. Can be effectively prevented.

また、突出部2bを形成することで、段差部2aとろう材の接合部との距離を大きくし、かつ絶縁板2が撓むことによる応力がろう材に大きく作用することを防止することができるので、段差部2aの高さを0.1mmよりも薄いものとして形成することができ、第一電極7と第二電極9との距離を小さいものとして、感度の高い圧力検出装置用パッケージとすることができる。   Further, by forming the protruding portion 2b, it is possible to increase the distance between the stepped portion 2a and the joint portion of the brazing material and to prevent the stress due to the bending of the insulating plate 2 from acting on the brazing material. Since the height of the stepped portion 2a can be made thinner than 0.1 mm, the distance between the first electrode 7 and the second electrode 9 can be made small, can do.

絶縁板2の段差部2aは、図1のように第一電極7の外周部の上面に接触してもよく、または、図2の圧力検出装置用パッケージの断面図で示すように、第一電極7の周囲の絶縁基体1の凸部の上面に直接当接するようにしても構わない。段差部2aを凸部の上面に直接当接した場合、第一電極7と第二電極9の間隔を、第一電極7の厚み分狭くすることもできるので、より感度の高い圧力検出装置用パッケージとすることができる。   The step 2a of the insulating plate 2 may be in contact with the upper surface of the outer peripheral portion of the first electrode 7 as shown in FIG. 1, or as shown in the sectional view of the pressure detecting device package of FIG. You may make it contact | abut directly on the upper surface of the convex part of the insulation base | substrate 1 around the electrode 7. FIG. When the stepped portion 2a is in direct contact with the upper surface of the convex portion, the distance between the first electrode 7 and the second electrode 9 can be reduced by the thickness of the first electrode 7, so that the pressure sensing device with higher sensitivity can be used. It can be a package.

また、図1および図2においては、絶縁板2の一部にて段差部2aを形成しているが、メタライズ層等により形成していても構わず、例えば、図3の圧力検出装置用パッケージの断面図で示すように、第二電極9の周囲にメタライズ層から成る段差部2aを形成しておき、これが絶縁基体1に当接するようにしておいても良い。このように段差部2aをメタライズ層で形成することにより、段差部2aに加わる応力を、段差部2aが適度に変形して有効に吸収することができるとともに、段差部2aをメタライズ層で形成することでより薄く形成しやすく、第一電極7と第二電極9との間隔をより小さいものとして形成して、感度を高いものとすることができるようになる。   1 and 2, the step portion 2a is formed in a part of the insulating plate 2. However, it may be formed by a metallized layer or the like. For example, the pressure detection device package of FIG. As shown in the cross-sectional view, a stepped portion 2 a made of a metallized layer may be formed around the second electrode 9 so as to abut on the insulating substrate 1. By forming the stepped portion 2a with the metallized layer as described above, the stress applied to the stepped portion 2a can be effectively absorbed by the stepped portion 2a being appropriately deformed, and the stepped portion 2a is formed with the metalized layer. Thus, it is easy to form a thin film, and the distance between the first electrode 7 and the second electrode 9 can be made smaller to increase the sensitivity.

なお、この段差部2aがメタライズ層からなり、第一電極7等に当接する際は、第一電極7と第二電極9とが短絡することがないように、第二電極9と第二接合メタライズ層との接続部と、段差部2aとの間に空隙部を設けておけば良い。   In addition, when this level | step-difference part 2a consists of a metallization layer and contact | abuts to the 1st electrode 7 grade | etc., The 2nd electrode 9 and the 2nd joining so that the 1st electrode 7 and the 2nd electrode 9 may not short-circuit. What is necessary is just to provide a space | gap part between the connection part with a metallizing layer, and the level | step-difference part 2a.

このように、本発明の圧力検出装置用パッケージによれば、一方の主面に半導体素子3が搭載される絶縁基体1の他方の主面に、静電容量形成用の第一電極7を設けるとともにこの第一電極7に対向する静電容量形成用の第二電極9を内側面に有する絶縁板2を絶縁基体1との間に密閉空間を形成するように可撓な状態で接合させたことから、半導体素子3を収容する容器と感圧素子とが一体となり、その結果、圧力検出装置を小型化することができる。また、静電容量形成用の第一電極7および第二電極9を、絶縁基体1に設けた配線導体5a,5bを介して半導体素子3に接続することから、第一電極7および第二電極9を短い距離で半導体素子3に接続することができ、その結果、これらの配線導体5a,5b間に発生する不要な静電容量を小さなものとして感度の高い圧力検出装置を提供することができる。   Thus, according to the package for a pressure detection device of the present invention, the first electrode 7 for forming a capacitance is provided on the other main surface of the insulating base 1 on which the semiconductor element 3 is mounted on one main surface. In addition, the insulating plate 2 having the second electrode 9 for forming a capacitance facing the first electrode 7 on the inner surface is joined in a flexible state so as to form a sealed space with the insulating base 1. Therefore, the container for housing the semiconductor element 3 and the pressure sensitive element are integrated, and as a result, the pressure detection device can be miniaturized. In addition, since the first electrode 7 and the second electrode 9 for forming capacitance are connected to the semiconductor element 3 via the wiring conductors 5a and 5b provided on the insulating substrate 1, the first electrode 7 and the second electrode 9 can be connected to the semiconductor element 3 at a short distance, and as a result, it is possible to provide a highly sensitive pressure detecting device by reducing unnecessary capacitance generated between the wiring conductors 5a and 5b. .

かくして、上述の圧力検出装置用パッケージによれば、搭載部1bに半導体素子3を搭載するとともに半導体素子3の各電極と配線導体5とを電気的に接続し、しかる後、半導体素子3を封止することによって小型でかつ感度が高い圧力検出装置となる。   Thus, according to the above-described package for a pressure detection device, the semiconductor element 3 is mounted on the mounting portion 1b, and each electrode of the semiconductor element 3 and the wiring conductor 5 are electrically connected, and then the semiconductor element 3 is sealed. By stopping, the pressure detection device is small and has high sensitivity.

なお、本発明は、上述の実施の形態の一例に限定されるものではなく、本発明の要旨を逸脱しない範囲であれば種々の変更は可能であることはいうまでもない。   In addition, this invention is not limited to an example of the above-mentioned embodiment, It cannot be overemphasized that a various change is possible if it is a range which does not deviate from the summary of this invention.

本発明の圧力検出装置用パッケージの実施の形態の一例を示す断面図である。It is sectional drawing which shows an example of embodiment of the package for pressure detection apparatuses of this invention. 本発明の圧力検出装置用パッケージの実施の形態の他の例を示す断面図である。It is sectional drawing which shows the other example of embodiment of the package for pressure detection apparatuses of this invention. 本発明の圧力検出装置用パッケージの実施の形態の他の例を示す断面図である。It is sectional drawing which shows the other example of embodiment of the package for pressure detection apparatuses of this invention. 従来の圧力検出装置用パッケージを示す断面図である。It is sectional drawing which shows the package for the conventional pressure detection apparatus. 従来の圧力検出装置用パッケージを示す断面図である。It is sectional drawing which shows the package for the conventional pressure detection apparatus.

符号の説明Explanation of symbols

1・・・・・絶縁基体
2・・・・・絶縁板
2a・・・・段差部
3・・・・・半導体素子
5・・・・・配線導体
7・・・・・第一電極
9・・・・・第二電極
DESCRIPTION OF SYMBOLS 1 ... Insulation base | substrate 2 ... Insulation board 2a ... Step part 3 ... Semiconductor element 5 ... Wiring conductor 7 ... First electrode 9- .... Second electrode

Claims (1)

一方の主面に半導体素子が搭載される搭載部を有する絶縁基体と、該絶縁基体の他方の主面の中央部に形成された凸部と、前記絶縁基体の表面および内部に配設され、前記半導体素子の各電極が電気的に接続される複数の配線導体と、前記凸部との間に密閉空間を形成するように可撓な状態で前記絶縁基体の前記凸部の周囲に接合された絶縁板と、前記密閉空間内の前記凸部の上面に被着され、前記配線導体の一つに電気的に接続された静電容量形成用の第一電極と、前記絶縁板の内側の主面に前記第一電極と対向するように被着され、前記配線導体の他の一つに電気的に接続された静電容量形成用の第二電極と、前記絶縁板の内側の主面の外周部に全周にわたって形成されるとともに前記凸部の上面に当接された段差部とを具備していることを特徴とする圧力検出装置用パッケージ。 An insulating base having a mounting portion on which a semiconductor element is mounted on one main surface; a convex portion formed at a central portion of the other main surface of the insulating base; and a surface and inside of the insulating base; Bonded around the convex portion of the insulating base in a flexible state so as to form a sealed space between the plurality of wiring conductors to which the respective electrodes of the semiconductor element are electrically connected and the convex portion. An insulating plate, a first electrode for forming a capacitance that is attached to an upper surface of the convex portion in the sealed space and is electrically connected to one of the wiring conductors, and an inner side of the insulating plate. A second electrode for forming a capacitance which is attached to the main surface so as to face the first electrode and is electrically connected to the other one of the wiring conductors; and a main surface inside the insulating plate And a step portion that is formed over the entire circumference and abutted against the upper surface of the convex portion. Package for pressure detection apparatus according to claim.
JP2003396931A 2003-11-27 2003-11-27 Package for pressure-detecting device Pending JP2005156410A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003396931A JP2005156410A (en) 2003-11-27 2003-11-27 Package for pressure-detecting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003396931A JP2005156410A (en) 2003-11-27 2003-11-27 Package for pressure-detecting device

Publications (1)

Publication Number Publication Date
JP2005156410A true JP2005156410A (en) 2005-06-16

Family

ID=34722230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003396931A Pending JP2005156410A (en) 2003-11-27 2003-11-27 Package for pressure-detecting device

Country Status (1)

Country Link
JP (1) JP2005156410A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010523946A (en) * 2007-04-07 2010-07-15 インフィコン ゲゼルシャフト ミット ベシュレンクテル ハフツング Method for manufacturing a vacuum diaphragm cell
WO2010122883A1 (en) * 2009-04-24 2010-10-28 京セラ株式会社 Package for pressure sensor, and pressure sensor using the package

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010523946A (en) * 2007-04-07 2010-07-15 インフィコン ゲゼルシャフト ミット ベシュレンクテル ハフツング Method for manufacturing a vacuum diaphragm cell
WO2010122883A1 (en) * 2009-04-24 2010-10-28 京セラ株式会社 Package for pressure sensor, and pressure sensor using the package

Similar Documents

Publication Publication Date Title
JP2001356064A (en) Package for pressure detector
JP2002107254A (en) Package for pressure detector
JP4803917B2 (en) Package for pressure detection device
JP2005156410A (en) Package for pressure-detecting device
JP2006047327A (en) Package for pressure detector, and the pressure detector
JP4974424B2 (en) Package for pressure detection device
JP4863569B2 (en) Package for pressure detection device
JP4557405B2 (en) Package for pressure detection device
JP3955067B2 (en) Pressure detection device package and pressure detection device
JP4925522B2 (en) Package for pressure detection device
JP4794072B2 (en) Package for pressure detection device
JP4753926B2 (en) Pressure detector and pressure detector assembly
JP4789357B2 (en) Package for pressure detection device
JP2006047326A (en) Package for pressure detector, and pressure detector
JP2003042876A (en) Package for pressure detecting apparatus
JP2002039893A (en) Package for pressure detection apparatus
JP2002350265A (en) Package for pressure detector
JP2004205377A (en) Package for pressure detection device
JP2003130744A (en) Package for pressure-detecting apparatus
JP2005156433A (en) Package for pressure-detecting device and manufacturing method therefor
JP2003042877A (en) Package for pressure detecting apparatus
JP2003065874A (en) Package for pressure detection device
JP2002039897A (en) Package for pressure detection apparatus
JP2003042874A (en) Package for pressure detecting apparatus
JP2003139639A (en) Package for pressure detecting device

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20061109

A977 Report on retrieval

Effective date: 20090204

Free format text: JAPANESE INTERMEDIATE CODE: A971007

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090721

A02 Decision of refusal

Effective date: 20091117

Free format text: JAPANESE INTERMEDIATE CODE: A02