JP2006047326A - Package for pressure detector, and pressure detector - Google Patents

Package for pressure detector, and pressure detector Download PDF

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JP2006047326A
JP2006047326A JP2005308906A JP2005308906A JP2006047326A JP 2006047326 A JP2006047326 A JP 2006047326A JP 2005308906 A JP2005308906 A JP 2005308906A JP 2005308906 A JP2005308906 A JP 2005308906A JP 2006047326 A JP2006047326 A JP 2006047326A
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electrode
ceramic
semiconductor element
recess
wiring conductor
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Yuichi Furumoto
雄一 古本
Hiroshi Toki
博司 土岐
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Kyocera Corp
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Kyocera Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a pressure detector for improving precision in pressure detection. <P>SOLUTION: The pressure detector comprises a ceramic substrate 1 that stores a semiconductor element 3 and has a recess 1a, in which a sealing material 4 made of resin is provided so that the semiconductor element 3 is covered; a wiring conductor 5a that passes through the ceramic substrate 1 and is formed so that it is led out to the recess 1a; a first electrode 7 that is formed on the surface of the ceramic substrate 1 and is connected to the wiring conductor 5a; a ceramic diaphragm 2 arranged on the ceramic substrate 1; and a second electrode 9 that is formed on the surface of the ceramic diaphragm 2 so as to face the first electrode 7. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、圧力を検出するための圧力検出装置に使用される圧力検出装置用パッケージに関するものである。   The present invention relates to a pressure detection device package used in a pressure detection device for detecting pressure.

従来、圧力を検出するための圧力検出装置として静電容量型の圧力検出装置が知られている。この静電容量型の圧力検出装置は、例えば図4に断面図で示すように、セラミックス材料や樹脂材料から成る配線基板21上に、静電容量型の感圧素子22と、パッケージ28に収容された演算用の半導体素子29とを備えている。感圧素子22は、例えばセラミックス材料等の電気絶縁材料から成り、上面中央部に静電容量形成用の一方の電極23が被着された凹部を有する絶縁基体24と、この絶縁基体24の上面に絶縁基体24との間に密閉空間を形成するようにして可撓な状態で接合され、下面に静電容量形成用の他方の電極25が被着された絶縁板26と、各静電容量形成用の電極23・25をそれぞれ外部に電気的に接続するための外部リード端子27とから構成されており、外部の圧力に応じて絶縁板26が撓むことにより各静電容量形成用の電極23・25間に形成される静電容量が変化する。そして、この静電容量の変化を演算用の半導体素子29により演算処理することにより外部の圧力を検出することができる。   Conventionally, a capacitance type pressure detection device is known as a pressure detection device for detecting pressure. For example, as shown in a cross-sectional view in FIG. 4, the capacitance type pressure detection device is accommodated in a capacitance type pressure sensitive element 22 and a package 28 on a wiring board 21 made of a ceramic material or a resin material. And a semiconductor element 29 for operation. The pressure sensitive element 22 is made of, for example, an electrically insulating material such as a ceramic material, and has an insulating base 24 having a concave portion in which one electrode 23 for forming a capacitance is attached at the center of the upper face, and an upper face of the insulating base 24 And an insulating plate 26 which is joined in a flexible state so as to form a sealed space with the insulating base 24, and the other electrode 25 for forming a capacitance is attached to the lower surface, and each capacitance It is composed of external lead terminals 27 for electrically connecting the forming electrodes 23 and 25 to the outside, and the insulating plate 26 bends in response to external pressure, thereby forming each capacitance. The capacitance formed between the electrodes 23 and 25 changes. Then, the external pressure can be detected by performing arithmetic processing on the change in the electrostatic capacitance by the semiconductor element 29 for arithmetic operation.

しかしながら、この従来の圧力検出装置によると、感圧素子22と半導体素子29とを配線基板21上に個別に実装していることから、圧力検出装置が大型化してしまうとともに圧力検出用の電極23・25と半導体素子29との間の配線が長いものとなり、この長い配線間に不要な静電容量が形成されるため感度が低いという問題点を有していた。   However, according to this conventional pressure detection device, since the pressure sensitive element 22 and the semiconductor element 29 are individually mounted on the wiring board 21, the pressure detection device becomes large and the pressure detection electrode 23 is increased. The wiring between 25 and the semiconductor element 29 becomes long, and an unnecessary electrostatic capacity is formed between the long wiring, so that the sensitivity is low.

本発明はかかる従来の問題点に鑑み案出されたものであり、その目的は、小型でかつ感度の高い圧力検出装置を提供することにある。   The present invention has been devised in view of such conventional problems, and an object of the present invention is to provide a pressure detection device that is small and has high sensitivity.

本発明は、半導体素子が収容され、該半導体素子を覆うように樹脂製封止材が設けられる凹部を有するセラミック基体と、前記セラミック基体を貫通しているとともに、前記凹部に導出されるように形成された配線導体と、前記セラミック基体の表面に形成され、前記配線導体に接続された第一電極と、前記セラミック基体に対して配置されたセラミックダイアフラムと、前記セラミックダイアフラムの表面に、前記第一電極に対向するように形成された第二電極とを備えていることを特徴とするものである。   According to the present invention, a semiconductor element is accommodated, and a ceramic base having a recess in which a resin sealing material is provided so as to cover the semiconductor element, and through the ceramic base and led to the recess The formed wiring conductor, the first electrode formed on the surface of the ceramic base and connected to the wiring conductor, the ceramic diaphragm disposed with respect to the ceramic base, and the surface of the ceramic diaphragm And a second electrode formed so as to face one electrode.

本発明は、半導体素子を覆うように樹脂製封止材が設けられる凹部を有するセラミック基体と、セラミック基体を貫通しているとともに凹部に導出されるように形成された配線導体とを備えていることにより、静電容量が形成される空間の密閉性を向上させることができ、圧力検出の精度を向上させることが可能となる。   The present invention includes a ceramic base having a recess provided with a resin sealing material so as to cover a semiconductor element, and a wiring conductor formed so as to penetrate the ceramic base and be led out to the recess. As a result, it is possible to improve the sealing performance of the space in which the capacitance is formed, and to improve the accuracy of pressure detection.

次に、本発明を添付の図面を基に詳細に説明する。図1は、本発明の圧力検出装置用パッケージの実施の形態の一例を示す断面図であり、図中、1は絶縁基体、2は絶縁板、3は半導体素子である。   Next, the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional view showing an example of an embodiment of a pressure detection device package according to the present invention, in which 1 is an insulating substrate, 2 is an insulating plate, and 3 is a semiconductor element.

絶縁基体1は、酸化アルミニウム質焼結体や窒化アルミニウム質焼結体・ムライト質焼結体・炭化珪素質焼結体・窒化珪素質焼結体・ガラス−セラミックス等の電気絶縁材料から成る積層体であり、例えば酸化アルミニウム質焼結体から成る場合であれば、酸化アルミニウム・酸化珪素・酸化マグネシウム・酸化カルシウム等のセラミック原料粉末に適当な有機バインダ・溶剤・可塑剤・分散剤を添加混合して泥漿状となすとともにこれを従来周知のドクタブレード法を採用してシート状に成形することにより複数枚のセラミックグリーンシートを得、しかる後、これらのセラミックグリーンシートに適当な打ち抜き加工・積層加工・切断加工を施すことにより絶縁基体1用の生セラミック成形体を得るとともにこの生セラミック成形体を約1600℃の温度で焼成することにより製作される。   The insulating substrate 1 is a laminate made of an electrically insulating material such as an aluminum oxide sintered body, an aluminum nitride sintered body, a mullite sintered body, a silicon carbide sintered body, a silicon nitride sintered body, or glass-ceramics. For example, in the case of an aluminum oxide sintered body, an appropriate organic binder, solvent, plasticizer, and dispersing agent are added to the ceramic raw material powder such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide. Then, it is made into a mud shape and formed into a sheet shape by employing a conventionally known doctor blade method, and then a plurality of ceramic green sheets are obtained, and then appropriate punching and lamination are performed on these ceramic green sheets. By processing and cutting, a green ceramic molded body for the insulating substrate 1 is obtained and this green ceramic molded body is reduced to about 1 Manufactured by firing at a temperature of 600 ° C.

絶縁基体1は、その下面中央部に半導体素子3を収容するための凹部1aが形成されており、これにより半導体素子3を収容する容器として機能する。そして、この凹部1aの底面中央部が半導体素子3が搭載される搭載部1bとなっており、この搭載部1bに半導体素子3を搭載するとともに凹部1a内に例えばエポキシ樹脂等の樹脂製封止材4を充填することにより半導体素子3が封止される。なお、この例では半導体素子3は樹脂製封止材4を凹部1a内に充填することにより封止されるが、半導体素子3は絶縁基体1の下面に金属やセラミックスから成る蓋体を凹部1aを塞ぐように接合させることにより封止されてもよい。   The insulating base 1 is formed with a recess 1a for accommodating the semiconductor element 3 at the center of the lower surface thereof, thereby functioning as a container for accommodating the semiconductor element 3. The central portion of the bottom surface of the recess 1a is a mounting portion 1b on which the semiconductor element 3 is mounted. The semiconductor element 3 is mounted on the mounting portion 1b and the resin sealing such as an epoxy resin is provided in the recess 1a. The semiconductor element 3 is sealed by filling the material 4. In this example, the semiconductor element 3 is sealed by filling the recess 1a with a resin sealing material 4. However, the semiconductor element 3 has a lid made of metal or ceramics on the lower surface of the insulating base 1 to form the recess 1a. It may be sealed by bonding so as to block.

また、搭載部1bには半導体素子3の各電極と接続される複数のメタライズ配線導体5が導出しており、このメタライズ配線導体5と半導体素子3の各電極を半田バンプ6等の導電性材料から成る導電性接合部材を介して接合することにより半導体素子3の各電極と各メタライズ配線導体5とが電気的に接続されるとともに半導体素子3が搭載部1bに固定される。なお、この例では、半導体素子3の電極とメタライズ配線導体5とは半田バンプ6を介して接続されるが、半導体素子3の電極とメタライズ配線導体5とはボンディングワイヤ等の他の種類の電気的接続手段により接続されてもよい。   Further, a plurality of metallized wiring conductors 5 connected to the respective electrodes of the semiconductor element 3 are led out to the mounting portion 1b, and the metalized wiring conductors 5 and the respective electrodes of the semiconductor element 3 are connected to conductive materials such as solder bumps 6 and the like. The electrodes of the semiconductor element 3 and the metallized wiring conductors 5 are electrically connected to each other through the conductive bonding member made of the semiconductor element 3 and the semiconductor element 3 is fixed to the mounting portion 1b. In this example, the electrode of the semiconductor element 3 and the metallized wiring conductor 5 are connected via the solder bumps 6. However, the electrode of the semiconductor element 3 and the metalized wiring conductor 5 are connected to other types of electric wires such as bonding wires. It may be connected by a general connection means.

メタライズ配線導体5は、半導体素子3の各電極を外部電気回路および後述する第一電極7・第二電極9に電気的に接続するための導電路として機能し、その一部は絶縁基体1の外周下面に導出し、別の一部は第一電極7・第二電極9に電気的に接続されている。そして、半導体素子3の各電極をこれらのメタライズ配線導体5に導電性接合材6を介して電気的に接続するとともに半導体素子3を樹脂製封止材4で封止した後、メタライズ配線導体5の絶縁基体1外周下面に導出した部位を外部電気回路基板の配線導体に半田等の導電性接合材を介して接合することにより、内部に収容する半導体素子3が外部電気回路に電気的に接続されることとなる。   The metallized wiring conductor 5 functions as a conductive path for electrically connecting each electrode of the semiconductor element 3 to an external electric circuit and a first electrode 7 and a second electrode 9 to be described later. It leads to the outer peripheral lower surface, and another part is electrically connected to the first electrode 7 and the second electrode 9. Each electrode of the semiconductor element 3 is electrically connected to these metallized wiring conductors 5 via the conductive bonding material 6 and the semiconductor element 3 is sealed with the resin sealing material 4. The part led out to the lower surface of the outer periphery of the insulating base 1 is joined to the wiring conductor of the external electric circuit board via a conductive bonding material such as solder, so that the semiconductor element 3 accommodated therein is electrically connected to the external electric circuit. Will be.

このようなメタライズ配線導体5は、タングステンやモリブデン・銅・銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ・溶剤・可塑剤・分散剤等を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して絶縁基体1用のセラミックグリーンシートに所定のパターンに印刷塗布し、これを絶縁基体1用の生セラミック成形体とともに焼成することによって絶縁基体1の内部および表面に所定のパターンに形成される。なお、メタライズ配線導体5の露出表面には、メタライズ配線導体5が酸化腐食するのを防止するとともにメタライズ配線導体5と半田等の導電性接合材との接合を良好なものとするために、通常であれば、厚みが1〜10μm程度のニッケルめっき層と厚みが0.1〜3μm程度の金めっき層とが順次被着されている。   Such a metallized wiring conductor 5 is made of metal powder metallization such as tungsten, molybdenum, copper, or silver, and is obtained by adding and mixing an appropriate organic binder, solvent, plasticizer, dispersant, or the like to metal powder such as tungsten. The metallized paste is printed and applied in a predetermined pattern on a ceramic green sheet for the insulating substrate 1 using a well-known screen printing method, and is fired together with a green ceramic molded body for the insulating substrate 1 to thereby form the insulating substrate 1. A predetermined pattern is formed inside and on the surface. In order to prevent the metallized wiring conductor 5 from being oxidized and corroded on the exposed surface of the metallized wiring conductor 5 and to improve the bonding between the metallized wiring conductor 5 and a conductive bonding material such as solder, If so, a nickel plating layer having a thickness of about 1 to 10 μm and a gold plating layer having a thickness of about 0.1 to 3 μm are sequentially deposited.

また、絶縁基体1の上面外周部には高さが0.01〜5mm程度の枠状の突起部1cが設けられており、それにより上面中央部に底面が略平坦な凹部1dが形成されている。この凹部1dは、後述するように、絶縁板2との間に密閉空間を形成するためのものであり、この凹部1dの底面には静電容量形成用の第一電極7が被着されている。   Further, a frame-shaped protrusion 1c having a height of about 0.01 to 5 mm is provided on the outer peripheral portion of the upper surface of the insulating base 1, thereby forming a recess 1d having a substantially flat bottom surface at the center of the upper surface. As will be described later, the recess 1d is for forming a sealed space with the insulating plate 2, and a first electrode 7 for forming a capacitance is attached to the bottom surface of the recess 1d. Yes.

この第一電極7は、後述する第二電極9とともに感圧素子用の静電容量を形成するためのものであり、例えば略円形のパターンに形成されている。そして、この第一電極7にはメタライズ配線導体5の一つ5aが接続されており、それによりこのメタライズ配線導体5aに半導体素子3の電極を半田バンプ6等の導電性接合材を介して接続すると半導体素子3の電極と第一電極7とが電気的に接続されるようになっている。   The first electrode 7 is for forming a capacitance for a pressure sensitive element together with a second electrode 9 described later, and is formed in a substantially circular pattern, for example. The first electrode 7 is connected to one of the metallized wiring conductors 5a, whereby the electrode of the semiconductor element 3 is connected to the metallized wiring conductor 5a via a conductive bonding material such as a solder bump 6. Then, the electrode of the semiconductor element 3 and the first electrode 7 are electrically connected.

このような第一電極7は、タングステンやモリブデン・銅・銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ・溶剤・可塑剤・分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して絶縁基体1用のセラミックグリーンシートに印刷塗布し、これを絶縁基体1用の生セラミック成形体とともに焼成することによって絶縁基体1の凹部1d底面に所定のパターンに形成される。なお、第一電極7の露出表面には、第一電極7が酸化腐食するのを防止するために、通常であれば、厚みが1〜10μm程度のニッケルめっき層が被着されている。   The first electrode 7 is made of metal powder metallization such as tungsten, molybdenum, copper, and silver, and is obtained by adding and mixing an appropriate organic binder, solvent, plasticizer, and dispersant to metal powder such as tungsten. The paste is printed and applied to a ceramic green sheet for the insulating substrate 1 using a conventionally known screen printing method, and is fired together with a green ceramic molded body for the insulating substrate 1 to thereby form a predetermined surface on the bottom surface of the recess 1d of the insulating substrate 1. The pattern is formed. In order to prevent the first electrode 7 from being oxidatively corroded, a nickel plating layer having a thickness of about 1 to 10 μm is usually applied to the exposed surface of the first electrode 7.

また、絶縁基体1の突起部1cの上面にはその全周にわたり枠状の接合用メタライズ層8が被着されており、この接合用メタライズ層8には、下面に第二電極9を有する絶縁板2がこの第二電極9と接合用メタライズ層8とを銀−銅ろう材等の導電性接合材を介して接合することにより取着されている。   Further, a frame-like bonding metallization layer 8 is deposited on the entire upper surface of the protruding portion 1c of the insulating substrate 1, and the bonding metallization layer 8 has an insulation having a second electrode 9 on the lower surface. The plate 2 is attached by bonding the second electrode 9 and the bonding metallization layer 8 via a conductive bonding material such as a silver-copper brazing material.

この接合用メタライズ層8にはメタライズ配線導体5の一つ5bが接続されており、それによりこのメタライズ配線導体5bに半導体素子3の電極を半田バンプ6等の導電性接合材を介して電気的に接続すると接合用メタライズ層8に接続された第二電極9と半導体素子3の電極とが電気的に接続されるようになっている。   One metal metallization wiring conductor 5b is connected to the metallization layer 8 for bonding, whereby the electrode of the semiconductor element 3 is electrically connected to the metallized wiring conductor 5b via a conductive bonding material such as a solder bump 6. As a result, the second electrode 9 connected to the bonding metallization layer 8 and the electrode of the semiconductor element 3 are electrically connected.

接合用メタライズ層8は、タングステンやモリブデン・銅・銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ・溶剤・可塑剤・分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して絶縁基体1用のセラミックグリーンシートに印刷塗布し、これを絶縁基体1用の生セラミック成形体とともに焼成することによって絶縁基体1の突起部1c上面に枠状の所定のパターンに形成される。なお、接合用メタライズ層8の露出表面には、接合用メタライズ層8が酸化腐食するのを防止するとともに接合用メタライズ層8と導電性接合材との接合を強固なものとするために、通常であれば、厚みが1〜10μm程度のニッケルめっき層が被着されている。   The metallization layer 8 for bonding is made of metal powder metallization such as tungsten, molybdenum, copper, and silver. A screen printing method known in the art is used to print and apply to a ceramic green sheet for the insulating substrate 1, and this is fired together with a green ceramic molded body for the insulating substrate 1 to form a frame shape on the upper surface of the protrusion 1 c of the insulating substrate 1. Are formed in a predetermined pattern. In order to prevent the joining metallized layer 8 from being oxidized and corroded on the exposed surface of the joining metallized layer 8 and to strengthen the joining between the joining metallized layer 8 and the conductive joining material, If so, a nickel plating layer having a thickness of about 1 to 10 μm is applied.

また、絶縁基体1の上面に取着された絶縁板2は、酸化アルミニウム質焼結体や窒化アルミニウム質焼結体・ムライト質焼結体・窒化珪素質焼結体・炭化珪素質焼結体・ガラス−セラミックス等の電気絶縁材料から成る厚みが0.01〜5mmの略平板であり、外部の圧力に応じて絶縁基体1側に撓むいわゆる圧力検出用のダイアフラムとして機能する。   The insulating plate 2 attached to the upper surface of the insulating substrate 1 is made of an aluminum oxide sintered body, an aluminum nitride sintered body, a mullite sintered body, a silicon nitride sintered body, or a silicon carbide sintered body. A substantially flat plate having a thickness of 0.01 to 5 mm made of an electrically insulating material such as glass-ceramics, and functions as a so-called pressure detecting diaphragm that bends toward the insulating substrate 1 in response to an external pressure.

なお、絶縁板2は、その厚みが0.01mm未満では、その機械的強度が小さいものとなってしまうため、これに大きな外部圧力が印加された場合に破壊されてしまう危険性が大きなものとなり、他方、5mmを超えると、小さな圧力では撓みにくくなり、圧力検出用のダイアフラムとしては不適となってしまう。したがって、絶縁板2の厚みは0.01〜5mmの範囲が好ましい。   In addition, since the mechanical strength of the insulating plate 2 is less than 0.01 mm when the thickness is less, there is a greater risk of being destroyed when a large external pressure is applied thereto. On the other hand, when it exceeds 5 mm, it becomes difficult to bend at a small pressure, and it becomes unsuitable as a diaphragm for pressure detection. Therefore, the thickness of the insulating plate 2 is preferably in the range of 0.01 to 5 mm.

このような絶縁板2は、例えば酸化アルミニウム質焼結体から成る場合であれば、酸化アルミニウム・酸化珪素・酸化マグネシウム・酸化カルシウム等のセラミック原料粉末に適当な有機バインダ・溶剤・可塑剤・分散剤を添加混合して泥漿状となすとともにこれを従来周知のドクタブレード法を採用してシート状に成形することによりセラミックグリーンシートを得、しかる後、このセラミックグリーンシートに適当な打ち抜き加工や切断加工を施すことにより絶縁板2用の生セラミック成形体を得るとともにこの生セラミック成形体を約1600℃の温度で焼成することにより製作される。   If such an insulating plate 2 is made of, for example, an aluminum oxide sintered body, a suitable organic binder, solvent, plasticizer, dispersion for ceramic raw material powder such as aluminum oxide, silicon oxide, magnesium oxide, calcium oxide, etc. A ceramic green sheet is obtained by adding an agent and mixing it into a mud and forming it into a sheet using the well-known doctor blade method, and then punching or cutting the ceramic green sheet appropriately. The raw ceramic molded body for the insulating plate 2 is obtained by processing, and the raw ceramic molded body is manufactured by firing at a temperature of about 1600 ° C.

また、絶縁板2の下面の略全面には静電容量形成用の第二電極9が被着されている。この第二電極9は、前述の第一電極7とともに感圧素子用の静電容量を形成するための電極として機能するとともに絶縁板2を絶縁基体1に接合するための接合用下地金属層として機能する。   Further, a second electrode 9 for forming a capacitance is deposited on substantially the entire lower surface of the insulating plate 2. The second electrode 9 functions as an electrode for forming a capacitance for a pressure sensitive element together with the first electrode 7 described above, and as a bonding base metal layer for bonding the insulating plate 2 to the insulating substrate 1. Function.

このような第二電極9は、タングステンやモリブデン・銅・銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ・溶剤・可塑剤・分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して絶縁板2用のセラミックグリーンシートに印刷塗布し、これを絶縁板2用の生セラミック成形体とともに焼成することによって絶縁板2の下面の略全面に所定のパターンに形成される。なお、第二電極9の露出表面には、第二電極9が酸化腐食するのを防止するとともに第二電極9と導電性接合材との接合を良好とするために、通常であれば、厚みが1〜10μm程度のニッケルめっき層が被着されている。   The second electrode 9 is made of metal powder metallization such as tungsten, molybdenum, copper, or silver, and is obtained by adding and mixing an appropriate organic binder, solvent, plasticizer, or dispersant to metal powder such as tungsten. The paste is printed and applied to a ceramic green sheet for the insulating plate 2 using a well-known screen printing method, and is fired together with a green ceramic molded body for the insulating plate 2 so that the paste is applied to substantially the entire lower surface of the insulating plate 2. A predetermined pattern is formed. In order to prevent the second electrode 9 from being oxidatively corroded on the exposed surface of the second electrode 9 and to improve the bonding between the second electrode 9 and the conductive bonding material, the thickness is usually determined. Is coated with a nickel plating layer of about 1 to 10 μm.

この第二電極9と接合用メタライズ層8とは銀−銅ろう材等の導電性接合材を介して接合されており、それにより、絶縁基体1上面と絶縁板2下面との間に密閉空間が形成されるとともに接合用メタライズ層8と第二電極9とが電気的に接続される。   The second electrode 9 and the bonding metallization layer 8 are bonded via a conductive bonding material such as a silver-copper brazing material, whereby a sealed space is formed between the upper surface of the insulating substrate 1 and the lower surface of the insulating plate 2. Is formed and the metallization layer 8 for bonding and the second electrode 9 are electrically connected.

このとき、第一電極7と第二電極9とは、絶縁基体1と絶縁板2との間に形成された空間を挟んで対向しており、これらの間には、第一電極7や第二電極9の面積および第一電極7と第二電極9との間隔に応じて所定の静電容量が形成される。そして、絶縁板2の上面に外部の圧力が印加されると、その圧力に応じて絶縁板2が絶縁基体1側に撓んで第一電極7と第二電極9との間隔が変わり、それにより第一電極7と第二電極9との間の静電容量が変化するので、外部の圧力の変化を静電容量の変化として感知する感圧素子として機能する。そして、この静電容量の変化を凹部1a内に収容した半導体素子3にメタライズ配線導体5a・5bを介して伝達し、これを半導体素子3で演算処理することによって外部の圧力の大きさを知ることができる。   At this time, the first electrode 7 and the second electrode 9 are opposed to each other with a space formed between the insulating base 1 and the insulating plate 2 interposed therebetween. A predetermined capacitance is formed according to the area of the two electrodes 9 and the distance between the first electrode 7 and the second electrode 9. When an external pressure is applied to the upper surface of the insulating plate 2, the insulating plate 2 bends toward the insulating base 1 in accordance with the pressure, and the interval between the first electrode 7 and the second electrode 9 changes. Since the capacitance between the first electrode 7 and the second electrode 9 changes, it functions as a pressure-sensitive element that senses a change in external pressure as a change in capacitance. Then, the change in electrostatic capacity is transmitted to the semiconductor element 3 accommodated in the recess 1a through the metallized wiring conductors 5a and 5b, and this is processed by the semiconductor element 3 so as to know the magnitude of the external pressure. be able to.

このように、本発明の圧力検出装置用パッケージによれば、一方の主面に半導体素子3が搭載される絶縁基体1の他方の主面に、静電容量形成用の第一電極7を設けるとともにこの第一電極7と対向する静電容量形成用の第二電極9を内側面に有する絶縁板2を絶縁基体1との間に密閉空間を形成するように可撓な状態で接合させたことから、半導体素子3を収容する容器と感圧素子とが一体となり、その結果、圧力検出装置を小型化することができる。また、静電容量形成用の第一電極7および第二電極9を、絶縁基体1に設けたメタライズ配線導体5a・5bを介して半導体素子3に接続することから、第一電極7および第二電極9を短い距離で半導体素子3に接続することができ、その結果、これらのメタライズ配線導体5a・5b間に発生する不要な静電容量を小さなものとして感度の高い圧力検出装置を提供することができる。   Thus, according to the package for a pressure detection device of the present invention, the first electrode 7 for forming a capacitance is provided on the other main surface of the insulating base 1 on which the semiconductor element 3 is mounted on one main surface. At the same time, the insulating plate 2 having the second electrode 9 for forming capacitance facing the first electrode 7 on the inner surface is joined in a flexible state so as to form a sealed space between the insulating base 1 and the insulating plate 2. Therefore, the container for housing the semiconductor element 3 and the pressure sensitive element are integrated, and as a result, the pressure detection device can be miniaturized. Further, since the first electrode 7 and the second electrode 9 for forming the capacitance are connected to the semiconductor element 3 through the metallized wiring conductors 5a and 5b provided on the insulating base 1, the first electrode 7 and the second electrode 9 are formed. The electrode 9 can be connected to the semiconductor element 3 at a short distance, and as a result, a highly sensitive pressure detecting device is provided by reducing unnecessary capacitance generated between the metallized wiring conductors 5a and 5b. Can do.

なお、第一電極7と第二電極9との間隔が1気圧中において0.01mm未満の場合、絶縁板2に大きな圧力が印加された際に、第一電極7と第二電極9とが接触して圧力を検出することができなくなってしまう危険性があり、他方、5mmを超えると、第一電極7と第二電極9との間に形成される静電容量が小さなものとなり、圧力を検出する感度が低いものとなる傾向にある。したがって、第一電極7と第二電極9との間隔は、1気圧中において0.01〜5mmの範囲が好ましい。   In addition, when the space | interval of the 1st electrode 7 and the 2nd electrode 9 is less than 0.01 mm in 1 atmosphere, when a big pressure is applied to the insulating board 2, the 1st electrode 7 and the 2nd electrode 9 will contact. On the other hand, if the pressure exceeds 5 mm, the capacitance formed between the first electrode 7 and the second electrode 9 becomes small, and the pressure is reduced. The detection sensitivity tends to be low. Therefore, the distance between the first electrode 7 and the second electrode 9 is preferably in the range of 0.01 to 5 mm in 1 atmosphere.

かくして、上述の圧力検出装置用パッケージによれば、搭載部1aに半導体素子3を搭載するとともに半導体素子3の各電極とメタライズ配線導体5とを電気的に接続し、しかる後、半導体素子3を封止することによって小型でかつ感度の高い圧力検出装置となる。   Thus, according to the above-described package for a pressure detection device, the semiconductor element 3 is mounted on the mounting portion 1a, and each electrode of the semiconductor element 3 and the metallized wiring conductor 5 are electrically connected. By sealing, it becomes a small and highly sensitive pressure detection device.

なお、本発明は、上述の実施の形態の一例に限定されるものではなく、本発明の要旨を逸脱しない範囲であれば種々の変更は可能である。例えば上述の実施の形態の一例では、絶縁基体1の上面外周部に枠状の突起部1cを設け、この突起部1c上に絶縁板2を接合することにより絶縁基体1上面と絶縁板2との間に密閉空間を設けるようにしたが、本発明は図2に断面図で示すように、絶縁板2の下面外周部に枠状の突起部2aを設け、これを絶縁基体1上面に接合することによって絶縁基体1と絶縁板2との間に密閉空間を設けるようにしてもよい。この場合、突起部2a下面に接合用メタライズ層10を設けておき、この接合用メタライズ層10を接合用メタライズ層8に銀−銅ろう等の導電性接合材を介して接合すればよい。なお、接合用メタライズ層10と第二電極層9とは、絶縁板2にこれらを接続するための接続用メタライズ導体11を設けることにより電気的に接続しておけばよい。   Note that the present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the gist of the present invention. For example, in the above-described embodiment, a frame-shaped protrusion 1c is provided on the outer peripheral portion of the upper surface of the insulating base 1, and the insulating plate 2 is joined to the protrusion 1c, whereby the upper surface of the insulating base 1 and the insulating plate 2 are connected. However, according to the present invention, as shown in a cross-sectional view in FIG. 2, a frame-like protrusion 2 a is provided on the outer periphery of the lower surface of the insulating plate 2, and this is joined to the upper surface of the insulating substrate 1. Thus, a sealed space may be provided between the insulating base 1 and the insulating plate 2. In this case, a metallizing layer 10 for bonding may be provided on the lower surface of the protrusion 2a, and the metallizing layer 10 for bonding may be bonded to the metallizing layer 8 for bonding via a conductive bonding material such as silver-copper solder. The joining metallized layer 10 and the second electrode layer 9 may be electrically connected by providing the insulating plate 2 with a connecting metallized conductor 11 for connecting them.

さらに、本発明は図3に断面図で示すように、絶縁基体1の上面外周部に例えば鉄−ニッケル−コバルト合金や鉄−ニッケル合金等から成る金属枠体12を銀−銅ろう等の導電性接合材を介して接合させておき、この金属枠体12上に絶縁板2を銀−銅ろう等の導電性接合材を介して接合させることにより絶縁基体1と絶縁板2との間に密閉空間を設けるようにしてもよい。   Further, according to the present invention, as shown in a cross-sectional view in FIG. 3, a metal frame 12 made of, for example, iron-nickel-cobalt alloy or iron-nickel alloy is provided on the outer periphery of the upper surface of the insulating base 1 such as silver-copper solder. The insulating plate 2 is bonded between the insulating substrate 1 and the insulating plate 2 by bonding the insulating plate 2 to the metal frame 12 via a conductive bonding material such as silver-copper solder. A sealed space may be provided.

本発明の圧力検出装置用パッケージの実施の形態の一例を示す断面図である。It is sectional drawing which shows an example of embodiment of the package for pressure detection apparatuses of this invention. 本発明の圧力検出装置用パッケージの実施形態の他の例を示す断面図である。It is sectional drawing which shows the other example of embodiment of the package for pressure detection apparatuses of this invention. 本発明の圧力検出装置用パッケージの実施形態のさらに他の例を示す断面図である。It is sectional drawing which shows the further another example of embodiment of the package for pressure detection apparatuses of this invention. 従来の圧力検出装置を示す断面図である。It is sectional drawing which shows the conventional pressure detection apparatus.

符号の説明Explanation of symbols

1・・・・・絶縁基体
2・・・・・ダイアフラム
3・・・・・半導体素子
5,5a,5b・・・・・配線導体
7・・・・・第一電極
9・・・・・第二電極
DESCRIPTION OF SYMBOLS 1 ... Insulation base | substrate 2 ... Diaphragm 3 ... Semiconductor element 5, 5a, 5b ... Wiring conductor 7 ... First electrode 9 ... Second electrode

Claims (4)

半導体素子が収容され、該半導体素子を覆うように樹脂製封止材が設けられる凹部を有するセラミック基体と、
前記セラミック基体を貫通しているとともに、前記凹部に導出されるように形成された配線導体と、
前記セラミック基体の表面に形成され、前記配線導体に接続された第一電極と、
前記セラミック基体に対して配置されたセラミックダイアフラムと、
前記セラミックダイアフラムの表面に、前記第一電極に対向するように形成された第二電極とを備えていることを特徴とする圧力検出装置用パッケージ。
A ceramic substrate having a recess in which a semiconductor element is accommodated and a resin sealing material is provided so as to cover the semiconductor element;
A wiring conductor formed so as to penetrate the ceramic base and to be led to the recess;
A first electrode formed on the surface of the ceramic base and connected to the wiring conductor;
A ceramic diaphragm disposed against the ceramic substrate;
A package for a pressure detection device, comprising a second electrode formed on the surface of the ceramic diaphragm so as to face the first electrode.
前記半導体素子に電気的に接続される他の配線導体が、前記凹部の周囲に導出されるように、前記セラミック基体の内部に形成されていることを特徴とする請求項1記載の圧力検出装置用パッケージ。 2. The pressure detection device according to claim 1, wherein another wiring conductor electrically connected to the semiconductor element is formed inside the ceramic base so as to be led out around the recess. For package. 凹部を有するセラミック基体と、
前記セラミック基体を貫通しているとともに、前記凹部に導出されるように形成された配線導体と、
前記セラミック基体の表面に形成され、前記配線導体に接続された第一電極と、
前記セラミック基体に対して配置されたセラミックダイアフラムと、
前記セラミックダイアフラムの表面に、前記第一電極に対向するように形成された第二電極と、
前記セラミック基体の前記凹部に収容され、前記配線導体に電気的に接続された半導体素子と、
該半導体素子を覆うように、前記セラミック基体の前記凹部に設けられた樹脂製封止材とを備えていることを特徴とする圧力検出装置。
A ceramic substrate having a recess;
A wiring conductor formed so as to penetrate the ceramic base and to be led to the recess;
A first electrode formed on the surface of the ceramic base and connected to the wiring conductor;
A ceramic diaphragm disposed against the ceramic substrate;
A second electrode formed on the surface of the ceramic diaphragm so as to face the first electrode;
A semiconductor element housed in the recess of the ceramic substrate and electrically connected to the wiring conductor;
A pressure detection device comprising: a resin sealing material provided in the concave portion of the ceramic base so as to cover the semiconductor element.
前記セラミック基体および前記セラミックダイアフラムにより形成された空間に対向するように、前記凹部が前記セラミック基体に形成されていることを特徴とする請求項3記載の圧力検出装置。 The pressure detecting device according to claim 3, wherein the recess is formed in the ceramic base so as to face a space formed by the ceramic base and the ceramic diaphragm.
JP2005308906A 2005-10-24 2005-10-24 Package for pressure detector, and pressure detector Pending JP2006047326A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112189130A (en) * 2018-05-22 2021-01-05 株式会社村田制作所 Pressure detection element and pressure detection device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112189130A (en) * 2018-05-22 2021-01-05 株式会社村田制作所 Pressure detection element and pressure detection device

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