JP2005210083A5 - - Google Patents
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- Publication number
- JP2005210083A5 JP2005210083A5 JP2004350021A JP2004350021A JP2005210083A5 JP 2005210083 A5 JP2005210083 A5 JP 2005210083A5 JP 2004350021 A JP2004350021 A JP 2004350021A JP 2004350021 A JP2004350021 A JP 2004350021A JP 2005210083 A5 JP2005210083 A5 JP 2005210083A5
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- opening
- film
- forming
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010408 film Substances 0.000 claims 100
- 239000004065 semiconductor Substances 0.000 claims 21
- 239000010409 thin film Substances 0.000 claims 18
- 238000004519 manufacturing process Methods 0.000 claims 15
- 238000000034 method Methods 0.000 claims 15
- 239000004020 conductor Substances 0.000 claims 7
- 239000000463 material Substances 0.000 claims 6
- 230000008674 spewing Effects 0.000 claims 6
- 238000000059 patterning Methods 0.000 claims 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004350021A JP4712361B2 (ja) | 2003-12-02 | 2004-12-02 | 薄膜トランジスタの作製方法 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003403848 | 2003-12-02 | ||
| JP2003403666 | 2003-12-02 | ||
| JP2003403848 | 2003-12-02 | ||
| JP2003403666 | 2003-12-02 | ||
| JP2004350021A JP4712361B2 (ja) | 2003-12-02 | 2004-12-02 | 薄膜トランジスタの作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005210083A JP2005210083A (ja) | 2005-08-04 |
| JP2005210083A5 true JP2005210083A5 (cg-RX-API-DMAC7.html) | 2006-10-05 |
| JP4712361B2 JP4712361B2 (ja) | 2011-06-29 |
Family
ID=34916066
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004350021A Expired - Fee Related JP4712361B2 (ja) | 2003-12-02 | 2004-12-02 | 薄膜トランジスタの作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4712361B2 (cg-RX-API-DMAC7.html) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7737442B2 (en) * | 2005-06-28 | 2010-06-15 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| JP4670596B2 (ja) | 2005-11-04 | 2011-04-13 | セイコーエプソン株式会社 | 膜パターン形成方法、デバイス、電気光学装置、及び電子機器 |
| KR101050767B1 (ko) * | 2005-11-15 | 2011-07-20 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체장치 제조방법 |
| JP5028900B2 (ja) * | 2006-08-01 | 2012-09-19 | カシオ計算機株式会社 | 発光素子を用いたディスプレイパネルの製造方法 |
| JP4919738B2 (ja) * | 2006-08-31 | 2012-04-18 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| CN101681578B (zh) * | 2007-06-08 | 2012-04-11 | 株式会社半导体能源研究所 | 显示装置 |
| US8471988B2 (en) | 2008-08-27 | 2013-06-25 | Sharp Kabushiki Kaisha | Electrode contact structure, liquid crystal display apparatus including same, and method for manufacturing electrode contact structure |
| KR101694877B1 (ko) * | 2009-10-16 | 2017-01-11 | 삼성전자주식회사 | 그라핀 소자 및 그 제조 방법 |
| JP6088852B2 (ja) * | 2012-03-01 | 2017-03-01 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法、及び半導体装置 |
| EP3001242B1 (en) | 2014-01-16 | 2020-08-12 | Huawei Device Co., Ltd. | Liquid crystal display, detection method for liquid crystal display and electronic device |
| KR102468861B1 (ko) * | 2017-12-22 | 2022-11-18 | 엘지디스플레이 주식회사 | 전계발광표시장치 |
| US11107876B2 (en) * | 2018-04-26 | 2021-08-31 | Sakai Display Products Corporation | Organic electroluminescent device and method for producing same |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03159174A (ja) * | 1989-11-16 | 1991-07-09 | Sanyo Electric Co Ltd | 液晶表示装置 |
| JP3926076B2 (ja) * | 1999-12-24 | 2007-06-06 | 日本電気株式会社 | 薄膜パターン形成方法 |
| KR100650417B1 (ko) * | 2001-02-19 | 2006-11-28 | 인터내셔널 비지네스 머신즈 코포레이션 | 박막 트랜지스터 구조, 그 박막 트랜지스터 구조의 제조방법 및 그 박막 트랜지스터 구조를 사용한 디스플레이 장치 |
| JP2003318193A (ja) * | 2002-04-22 | 2003-11-07 | Seiko Epson Corp | デバイス、その製造方法及び電子装置 |
| JP2003318401A (ja) * | 2002-04-22 | 2003-11-07 | Seiko Epson Corp | デバイスの製造方法、デバイス、表示装置、および電子機器 |
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2004
- 2004-12-02 JP JP2004350021A patent/JP4712361B2/ja not_active Expired - Fee Related