JP2005172135A - 除振マウント装置 - Google Patents

除振マウント装置 Download PDF

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Publication number
JP2005172135A
JP2005172135A JP2003413148A JP2003413148A JP2005172135A JP 2005172135 A JP2005172135 A JP 2005172135A JP 2003413148 A JP2003413148 A JP 2003413148A JP 2003413148 A JP2003413148 A JP 2003413148A JP 2005172135 A JP2005172135 A JP 2005172135A
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JP
Japan
Prior art keywords
vibration
gas spring
valve
pressure
vibration isolation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003413148A
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English (en)
Japanese (ja)
Other versions
JP2005172135A5 (enExample
Inventor
Michio Yanagisawa
通雄 柳澤
Toshiharu Kagawa
利春 香川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003413148A priority Critical patent/JP2005172135A/ja
Priority to US11/006,778 priority patent/US20050140961A1/en
Publication of JP2005172135A publication Critical patent/JP2005172135A/ja
Publication of JP2005172135A5 publication Critical patent/JP2005172135A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
    • F16F15/027—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means comprising control arrangements
    • F16F15/0275—Control of stiffness

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Acoustics & Sound (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Vibration Prevention Devices (AREA)
  • Fluid-Damping Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2003413148A 2003-12-11 2003-12-11 除振マウント装置 Pending JP2005172135A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003413148A JP2005172135A (ja) 2003-12-11 2003-12-11 除振マウント装置
US11/006,778 US20050140961A1 (en) 2003-12-11 2004-12-08 Anti-vibration system, method of controlling the same, exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003413148A JP2005172135A (ja) 2003-12-11 2003-12-11 除振マウント装置

Publications (2)

Publication Number Publication Date
JP2005172135A true JP2005172135A (ja) 2005-06-30
JP2005172135A5 JP2005172135A5 (enExample) 2007-01-25

Family

ID=34696925

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003413148A Pending JP2005172135A (ja) 2003-12-11 2003-12-11 除振マウント装置

Country Status (2)

Country Link
US (1) US20050140961A1 (enExample)
JP (1) JP2005172135A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007125663A1 (ja) * 2006-04-28 2007-11-08 Tokyo Institute Of Technology 気体バネ式除振装置及び該装置の制御方法
WO2008146877A1 (ja) * 2007-05-31 2008-12-04 Nikon Corporation 防振装置、防振装置の制御方法、及び露光装置
JP2020529635A (ja) * 2017-08-08 2020-10-08 エーエスエムエル ネザーランズ ビー．ブイ． 振動絶縁システムおよびリソグラフィ装置
JP2022162492A (ja) * 2021-04-12 2022-10-24 株式会社空気圧工学研究所 空気浮揚式免震装置および空気浮揚式免震装置の空気供給ユニット
JP2024061706A (ja) * 2022-10-23 2024-05-08 株式会社空気圧工学研究所 空気浮揚式免震装置および空気浮揚式免震装置の空気供給ユニット

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005083294A1 (ja) * 2004-03-01 2005-09-09 Nikon Corporation 気体バネ装置、防振装置、ステージ装置及び露光装置
JP2005282696A (ja) * 2004-03-29 2005-10-13 Canon Inc 除振マウント装置、露光装置及びデバイス製造方法
EP1744215B1 (en) * 2005-07-16 2012-09-12 Integrated Dynamics Engineering GmbH Supporting device for supporting vibration sensitive components
DE102012202553A1 (de) * 2012-02-20 2013-08-22 Carl Zeiss Smt Gmbh Lithographievorrichtung mit dämpfungsvorrichtung
CN107781350B (zh) * 2016-08-31 2019-05-31 上海微电子装备（集团）股份有限公司 减振器气动控制装置及其控制方法以及减振器
US11169450B2 (en) 2018-04-25 2021-11-09 Asml Netherlands B.V. Pneumatic support device and lithographic apparatus with pneumatic support device
US12272573B2 (en) * 2021-03-11 2025-04-08 Taiwan Semiconductor Manufacturing Company, Ltd. Load port and methods of operation

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US140961A (en) * 1873-07-15 Improvement in seeding-machines
JP3500619B2 (ja) * 1993-10-28 2004-02-23 株式会社ニコン 投影露光装置
JP3337906B2 (ja) * 1996-04-02 2002-10-28 キヤノン株式会社 空圧式振動絶縁除去装置、投影露光装置及びこれを用いたデバイス製造方法
US6144442A (en) * 1997-10-23 2000-11-07 U.S. Philips Corp Pneumatic support device with a controlled gas supply, and lithographic device provided with such a support device
JPH11294520A (ja) * 1998-04-08 1999-10-29 Canon Inc 除振装置、これを用いた露光装置およびデバイス製造方法、ならびに除振方法
US6473159B1 (en) * 1999-05-31 2002-10-29 Canon Kabushiki Kaisha Anti-vibration system in exposure apparatus
US6681625B1 (en) * 2000-01-19 2004-01-27 Lockheed Martin Corporation Constant-temperature-difference bidirectional flow sensor
US6408767B1 (en) * 2000-03-01 2002-06-25 Nikon Corporation Low stiffness suspension for a stage
JP2002242983A (ja) * 2001-02-19 2002-08-28 Canon Inc 能動的除振装置
JP2002286083A (ja) * 2001-03-27 2002-10-03 Canon Inc 除振装置、デバイス製造装置、デバイス製造方法、半導体製造工場およびデバイス製造装置の保守方法
US6987559B2 (en) * 2002-10-15 2006-01-17 Nikon Corporation Vibration-attenuation devices having low lateral stiffness, and exposure apparatus comprising same
US6851665B2 (en) * 2002-11-27 2005-02-08 Paccar Inc Air spring heat sink

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007125663A1 (ja) * 2006-04-28 2007-11-08 Tokyo Institute Of Technology 気体バネ式除振装置及び該装置の制御方法
WO2008146877A1 (ja) * 2007-05-31 2008-12-04 Nikon Corporation 防振装置、防振装置の制御方法、及び露光装置
JP2020529635A (ja) * 2017-08-08 2020-10-08 エーエスエムエル ネザーランズ ビー．ブイ． 振動絶縁システムおよびリソグラフィ装置
JP2022162492A (ja) * 2021-04-12 2022-10-24 株式会社空気圧工学研究所 空気浮揚式免震装置および空気浮揚式免震装置の空気供給ユニット
JP2024061706A (ja) * 2022-10-23 2024-05-08 株式会社空気圧工学研究所 空気浮揚式免震装置および空気浮揚式免震装置の空気供給ユニット

Also Published As

Publication number Publication date
US20050140961A1 (en) 2005-06-30

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