JP2005167182A - Pressure-sensitive adhesive sheet - Google Patents

Pressure-sensitive adhesive sheet Download PDF

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JP2005167182A
JP2005167182A JP2004138692A JP2004138692A JP2005167182A JP 2005167182 A JP2005167182 A JP 2005167182A JP 2004138692 A JP2004138692 A JP 2004138692A JP 2004138692 A JP2004138692 A JP 2004138692A JP 2005167182 A JP2005167182 A JP 2005167182A
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adhesive
pressure
film
sheet
protective film
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JP4505798B2 (en
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Keisuke Okubo
恵介 大久保
Teiichi Inada
禎一 稲田
Michio Uruno
道生 宇留野
Takayuki Matsuzaki
隆行 松崎
Michio Masuno
道夫 増野
Maiko Kaneda
麻衣子 金田
Suzushi Furuya
涼士 古谷
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Showa Denko Materials Co Ltd
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Hitachi Chemical Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a pressure-sensitive adhesive sheet which can easily peel off a protective film without weakening adhesive strength of the pressure-sensitive adhesive and can adequately glue a dicing ring to a dicing-ring mounting part and provide an easy dicing process. <P>SOLUTION: An adhesive 2 of a prescribed planar shape, a pressure-sensitive adhesive 3 that covers the adhesive 2, has a size somewhat larger than that of the adhesive 2, and has a peripheral edge part that does not overlap the adhesive 2, and a base film 4 that overlaps the pressure-sensitive adhesive 3, are laminated in this order on a surface of a protective film 1, or a pressure-sensitive adhesive 5 of a prescribed planar shape and the base film 4 that overlaps the pressure-sensitive adhesive 5 are laminated in this order on the surface of the protective film, to form the pressure-sensitive adhesive sheet for manufacturing semiconductor devices, wherein a tape-shaped small piece 6 is placed in a part of the peripheral edge part to form a starting point for the peeling that enables easily to peel and remove the protective film 1. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、半導体装置を製造する際に好適に使用される粘接着シート(ダイシングダイボンドシート)に関するものである。   The present invention relates to an adhesive sheet (dicing die bond sheet) that is suitably used when manufacturing a semiconductor device.

従来、半導体チップとリードフレーム等の支持部材との接合には銀ペーストが主に使用されていた。しかし、近年の半導体チップの小型化・高性能化に伴い、使用されるリードフレームも小型化・細密化が要求されるようになり、銀ペーストでは、ワイヤボンディング時においてハミ出しや半導体チップの傾きに起因する不具合が発生したり、あるいは接着剤層の膜厚の制御が困難であったり、接着剤層にボイドが発生する等の理由で、上記要求に対処しきれなくなってきた。   Conventionally, silver paste has been mainly used for joining a semiconductor chip and a support member such as a lead frame. However, with the recent miniaturization and high performance of semiconductor chips, the lead frames used are also required to be miniaturized and densified. With silver paste, squeezing and tilting of the semiconductor chip during wire bonding are required. The above-mentioned demands cannot be dealt with because of problems such as occurrence of defects, difficulty in controlling the film thickness of the adhesive layer, and generation of voids in the adhesive layer.

そこで、近年は、銀ペーストに代えて接着フィルム(フィルム状接着剤、フィルム状ダイボンド材、等ともいう。)を、いわゆる個片貼付け方式として、あるいはウェハ裏面貼付け方式で使用するようになってきている。前者の個片貼付け方式で半導体装置を製造する場合、ロール状(リール状)の接着フィルムからカッティングあるいはパンチングによって接着フィルムの個片を切り出した後、この個片をリードフレームに貼り付け、得られた接着フィルム付きリードフレームに、予めダイシング工程にて切断分離(ダイシング)した素子小片(半導体チップ)を載置し接合(ダイボンド)して半導体チップ付きリードフレームを作製し、その後、必要に応じてワイヤボンド工程、封止工程などを経て半導体装置とする。しかし、この場合は、ロール状の接着フィルムから接着フィルムの個片を切り出し、これをリードフレームへ接着させる専用の組立装置が必要なことから、銀ペーストを使用する方法に比べて製造コストが割高になる。   Therefore, in recent years, instead of silver paste, an adhesive film (also referred to as a film-like adhesive, a film-like die-bonding material, etc.) has been used as a so-called individual piece attaching method or a wafer back surface attaching method. Yes. When a semiconductor device is manufactured by the former method of attaching individual pieces, an individual piece of adhesive film is cut out from a roll-like (reel-like) adhesive film by cutting or punching, and then the individual piece is attached to a lead frame. An element film (semiconductor chip) previously cut and separated (diced) in a dicing process is placed on a lead frame with an adhesive film and bonded (die-bonded) to produce a lead frame with a semiconductor chip. A semiconductor device is obtained through a wire bonding process, a sealing process, and the like. However, in this case, a dedicated assembly device that cuts out pieces of the adhesive film from the roll-like adhesive film and adheres it to the lead frame is required. Therefore, the manufacturing cost is higher than the method using silver paste. become.

一方、後者のウェハ裏面貼付け方式で半導体装置を製造する場合は、まず半導体ウェハの裏面に接着フィルムを貼り付け、更にこの上にダイシングテープを貼り合わせ、その後、ダイシングによって接着フィルムが付いた状態で半導体ウェハを個片化し、得られた接着フィルム付き半導体チップの各個片をピックアップし、これをリードフレームに貼り付け、その後、加熱、硬化、ワイヤボンドなどの工程を経て半導体装置とする。この方法では、接着フィルム付き半導体チップをリードフレームに接合するために、接着フィルムを個片化する装置を必要とせず、従来の銀ペースト用の組立装置をそのままあるいは熱盤を付加するなどの装置の一部改良で済むため、製造コストを比較的安く抑えることができる。しかし、この方法も、ダイシング工程までに、接着フィルムの貼付と、それに続くダイシングテープの貼付との二つの貼付工程が必要である。   On the other hand, in the case of manufacturing a semiconductor device by the latter wafer back surface pasting method, an adhesive film is first pasted on the back surface of the semiconductor wafer, and further a dicing tape is pasted thereon, and then an adhesive film is attached by dicing. The semiconductor wafer is separated into individual pieces, and the individual pieces of the obtained semiconductor chip with an adhesive film are picked up and affixed to a lead frame. Thereafter, the semiconductor device is obtained through processes such as heating, curing, and wire bonding. In this method, in order to join the semiconductor chip with the adhesive film to the lead frame, an apparatus for separating the adhesive film into pieces is not required, and the conventional silver paste assembling apparatus is used as it is or a heating plate is added. Therefore, the manufacturing cost can be kept relatively low. However, this method also requires two pasting steps, that is, pasting of an adhesive film and subsequent pasting of a dicing tape before the dicing step.

そこで、二つの貼付工程を要せず一つの貼付工程で済むようにするために、二種類の方法が考案されている。一方は、予め接着フィルムとダイシングテープとを貼り合わせた二層構成の「粘接着シート(ダイシングダイボンドシート)」、もう一方は、一層でダイシングテープの機能とダイボンドフィルムの機能を併せ持った「粘接着シート」が開発されている(特許文献1、2参照)。特許文献1では、放射線硬化型粘着剤層における放射線硬化後の弾性率を所定の範囲に維持して、ダイシング工程後のエキスパンディング性及びピックアップを容易にすることが狙いである。特許文献2では、光重合性低分子化合物の粘接着層硬化による支持体と粘接着層の接着力低下と、光透過性支持体の表面張力による剥離性を用い、ピックアップを容易にすることが狙いである。   Therefore, two types of methods have been devised so that two attaching steps are not required and only one attaching step is required. One is a two-layer “adhesive adhesive sheet (dicing die bond sheet)” in which an adhesive film and dicing tape are pasted together, and the other is a “viscous adhesive sheet” that combines the functions of a dicing tape and a die bond film. An “adhesive sheet” has been developed (see Patent Documents 1 and 2). In patent document 1, it aims at making the expandability and pick-up after a dicing process easy by maintaining the elasticity modulus after the radiation curing in a radiation curing type adhesive layer in a predetermined range. In Patent Document 2, it is easy to pick up by using the adhesive strength reduction between the support and the adhesive layer by curing the adhesive layer of the photopolymerizable low molecular weight compound and the peelability due to the surface tension of the light-transmitting support. The aim is.

また、最近では、図4に示すような二層構成の粘接着シート、すなわち、長尺の保護フィルム1の上に多数のディスク状の接着剤(ダイボンド材)2を島状に形成し、その上にその接着剤(ダイボンド材)2よりも一回り大きいディスク状の粘着剤3とそれに重なり合う基材フィルム4とを順に積層した「保護フィルム1/接着剤2/粘着剤3/基材フィルム4」の4層構造を有する粘接着シートが開発されている。この粘接着シートを使用する場合は、保護フィルム1を先ず剥がして除くとともに接着剤2を露出させ(粘着剤も帯状円環状に露出する)、続いて、ダイシング用リング載置部(帯状円環状の粘着剤)の上にダイシング用リングを載置し、その内側の半導体ウェハ搭載部に半導体ウェハを載置し、半導体ウェハをダイシングし、個片化した接着フィルム付き半導体チップとし、その後、この接着フィルム付き半導体チップをピックアップし、リードフレーム上に載置し、加熱・接合(ダイボンド)し、引き続いて、ワイヤボンドし、封止材を用いて封止し、半導体装置を製造する。
また、一層構成の粘接着シート、すなわち、長尺の保護フィルム1の上に多数のディスク状の粘接着剤(ダイシングダイボンド材)5とそれに重なり合う基材フィルム4とを順に積層した「保護フィルム1/粘接着剤5/基材フィルム4」の3層構造を有する粘接着シートが開発されている。この粘接着シートを使用する場合は、保護フィルム1を先ず剥がして除くとともに粘接着剤5を露出させ、続いて、ダイシング用リングを載置し、半導体ウェハ搭載部に半導体ウェハを載置し、半導体ウェハをダイシングし、個片化した粘接着フィルム付き半導体チップとし、その後、この粘接着フィルム付き半導体チップをピックアップし、リードフレーム上に載置し、加熱・接合(ダイボンド)し、引き続いて、ワイヤボンドし、封止材を用いて封止し、半導体装置を製造する。
Recently, a two-layered adhesive sheet as shown in FIG. 4, that is, a large number of disk-shaped adhesives (die bond materials) 2 are formed in an island shape on the long protective film 1. On top of that, a disk-shaped pressure-sensitive adhesive 3 that is slightly larger than the adhesive (die-bonding material) 2 and a base film 4 that overlaps the disk-shaped pressure-sensitive adhesive 3 are sequentially laminated. An adhesive sheet having a four-layer structure of “4” has been developed. When this adhesive sheet is used, the protective film 1 is first peeled off and the adhesive 2 is exposed (the adhesive is also exposed in a belt-like ring shape), and then a dicing ring mounting portion (a belt-like circle) A ring for dicing is placed on the ring-shaped adhesive), a semiconductor wafer is placed on the semiconductor wafer mounting portion on the inner side, and the semiconductor wafer is diced into a semiconductor chip with an adhesive film, and then, The semiconductor chip with the adhesive film is picked up, placed on a lead frame, heated and bonded (die-bonded), subsequently wire-bonded, and sealed using a sealing material to manufacture a semiconductor device.
Also, a single-layered adhesive sheet, that is, a “protective” in which a large number of disc-like adhesives (dicing die bond materials) 5 and a base film 4 overlapping therewith are sequentially laminated on a long protective film 1. An adhesive sheet having a three-layer structure of “film 1 / adhesive 5 / base film 4” has been developed. When this adhesive sheet is used, the protective film 1 is first peeled off and the adhesive 5 is exposed, followed by placing a dicing ring and placing the semiconductor wafer on the semiconductor wafer mounting portion. The semiconductor wafer is diced into individual semiconductor chips with an adhesive film, and then the semiconductor chip with an adhesive film is picked up, placed on a lead frame, and heated and bonded (die-bonded). Subsequently, wire bonding and sealing with a sealing material are performed to manufacture a semiconductor device.

特許3348923号Japanese Patent No. 3348923 特許1987034号Patent 198707034

ところで、上記図4および図8に示した粘接着シートの粘着剤および粘接着剤は、ダイシング工程においてダイシング用リングを粘着させなくてはならないため、比較的強い粘着力が必要である。しかし、粘着力が強すぎると保護フィルム1を剥がすことが難しくなり、剥離に時間が掛かったり、あるいは剥離不良になりやすい。本発明の目的は、このような問題点を改善した粘接着シート、すなわち、前記粘着剤および粘接着剤の粘着力を弱めることなく、保護フィルムを容易に剥離させることができ、したがって、粘着剤(ダイシング用リング載置部)および粘接着剤にダイシング用リングを充分に貼り付かせ(密着させ)、その後のダイシング工程等を容易に行える粘接着シートを提供することである。   By the way, the pressure-sensitive adhesive and pressure-sensitive adhesive of the pressure-sensitive adhesive sheet shown in FIG. 4 and FIG. 8 need to have a relatively strong pressure since the dicing ring must be bonded in the dicing process. However, if the adhesive strength is too strong, it is difficult to peel off the protective film 1, and it takes time for the peeling, or a peeling failure tends to occur. The object of the present invention is to provide a pressure-sensitive adhesive sheet with improved such problems, that is, the protective film can be easily peeled off without weakening the pressure-sensitive adhesive strength of the pressure-sensitive adhesive and the pressure-sensitive adhesive. It is to provide a pressure-sensitive adhesive sheet in which a dicing ring is sufficiently adhered (adhered) to a pressure-sensitive adhesive (dicing ring mounting portion) and a pressure-sensitive adhesive, and the subsequent dicing step and the like can be easily performed.

上記目的を達成するために、本発明者らは種々検討した結果、粘接着シート中に積極的に剥離起点をつくれば、保護フィルムを容易に剥がせるのではないかと着想し、本発明を完成するに至った。
すなわち、本発明による二層構成の粘接着シートの場合は、保護フィルム1の片面に、所定平面視形状の接着剤(ダイボンド材)2と、前記接着剤2を覆い、前記接着剤2よりも一回り広く大きく、そして前記接着剤2とは重なり合わない周縁部(ダイシング用リング載置部となる)を有する粘着剤3と、前記粘着剤3に重なり合う基材フィルム4とを、この順に積層した半導体装置製造用粘接着シート(ダイシングダイボンドシート)であって、
前記周縁部の一部に、保護フィルム1を剥離・除去しやすくする剥離起点が形成されていることを特徴とする半導体装置製造用粘接着シート(ダイシングダイボンドシート)である。
また、本発明による一層構成の粘接着シートの場合は、保護フィルム1の片面に、所定平面視形状の粘接着剤(ダイシングダイボンド材)5と、それに重なり合う基材フィルム4とを、この順に積層した半導体装置製造用粘接着シート(ダイシングダイボンドシート)であって、
前記周縁部の一部に、保護フィルム1を剥離・除去しやすくする剥離起点が形成されていることを特徴とする半導体装置製造用粘接着シートである。
In order to achieve the above object, as a result of various studies, the present inventors have conceived that the protective film can be easily peeled off by positively creating a peeling start point in the adhesive sheet. It came to be completed.
That is, in the case of the two-layered adhesive sheet according to the present invention, the adhesive (die-bonding material) 2 having a predetermined plan view shape and the adhesive 2 are covered on one side of the protective film 1. And a base material film 4 that overlaps the pressure-sensitive adhesive 3 in this order, and a pressure-sensitive adhesive 3 having a peripheral portion (being a ring mounting portion for dicing) that does not overlap with the adhesive 2. It is a laminated adhesive sheet for manufacturing semiconductor devices (dicing die bond sheet),
A peeling start point for facilitating peeling / removing of the protective film 1 is formed on a part of the peripheral edge portion. The adhesive sheet for manufacturing a semiconductor device (dicing die bond sheet).
Further, in the case of the single-layered adhesive sheet according to the present invention, the adhesive film (dicing die bond material) 5 having a predetermined plan view shape on one side of the protective film 1 and the base film 4 overlapping therewith, It is an adhesive sheet for manufacturing semiconductor devices (dicing die bond sheet) laminated in order,
A peeling start point for easily peeling and removing the protective film 1 is formed on a part of the peripheral edge portion.

以下、本発明をさらに詳しく説明する。
本発明の二層構成の粘接着シートは、幅は約30cm程度のシート状保護フィルム1と、その上の接着剤2と、この接着剤2よりも一回り広く大きく、そして接着剤2とは重なり合わない周縁部を有する粘着剤3と、その粘着剤3に重なり合ってこれを保護する基材フィルム4とを一組として「ラベル状」の形態で提供することもでき、また、上記接着剤2と上記粘着剤3と上記基材フィルム4とを一組として、
また、単層構成の粘接着シートは、幅は約30cm程度のシート状保護フィルム1と、その上の粘接着剤5と、その粘接着剤5に重なり合ってこれを保護する基材フィルム4とを一組としてこれらが長尺の保護フィルム1の片面に島状に多数配されてロール状に巻かれた「テープ状(又はシート状)」の形態で提供することもできる。
Hereinafter, the present invention will be described in more detail.
The two-layered adhesive sheet of the present invention has a sheet-like protective film 1 having a width of about 30 cm, an adhesive 2 thereon, a size larger than the adhesive 2, and an adhesive 2 Can be provided in the form of a “label” as a set of a pressure-sensitive adhesive 3 having a non-overlapping peripheral edge and a base film 4 that overlaps and protects the pressure-sensitive adhesive 3. As a set, the agent 2, the adhesive 3, and the base film 4
The single-layered adhesive sheet has a sheet-like protective film 1 having a width of about 30 cm, an adhesive 5 thereon, and a base material that overlaps and protects the adhesive 5. The film 4 can be provided as a set in the form of a “tape (or sheet)” in which a large number of islands are arranged on one side of the long protective film 1 and wound into a roll.

また、本発明における二層構成の粘接着シートの、接着剤2または一層構成の粘接着シートの、粘接着剤5の平面視形状は、好ましくは円形、略円形又は半導体ウェハ形状である。   Moreover, the planar view shape of the adhesive 2 of the two-layered adhesive sheet of the present invention in the adhesive 2 or the single-layered adhesive sheet is preferably circular, substantially circular, or semiconductor wafer shape. is there.

また、本発明の粘接着シートでは、これに放射線や紫外線等の高エネルギー線を照射すると、粘着剤3の粘着力が低下し、接着剤2と粘着剤3との界面で剥がれやすくなるもの、または、粘接着剤5の粘着力が低下し、粘接着剤5と基材フィルム4との界面で剥がれやすくなるものが好ましい。   Further, in the adhesive sheet of the present invention, when this is irradiated with high energy rays such as radiation and ultraviolet rays, the adhesive force of the adhesive 3 is reduced and the adhesive sheet 2 is easily peeled off at the interface between the adhesive 2 and the adhesive 3. Alternatively, it is preferable that the adhesive strength of the adhesive 5 is reduced and the adhesive 5 is easily peeled off at the interface between the adhesive 5 and the base film 4.

本発明で用いる保護フィルム1としては、室温から80℃程度までの熱処理により機械的物性を損なわない耐熱性を有するものを用いる。具体的には、ポリエチレンテレフタレートフィルム等のポリエステル系フィルム、ポリテトラフルオロエチレンフィルム、ポリエチレンフィルム、ポリプロピレンフィルム、ポリメチルペンテンフィルム、ポリビニルアセテートフィルム等のポリオレフィン系フィルム、ポリ塩化ビニルフィルム、ポリイミドフィルムなどのプラスチックフィルムが好ましく用いられ、紙、不織布、金属箔なども使用でき、これらの基材を多層構造にして用いることもできる。   As the protective film 1 used in the present invention, a film having heat resistance that does not impair mechanical properties by heat treatment from room temperature to about 80 ° C. is used. Specifically, polyester films such as polyethylene terephthalate film, polytetrafluoroethylene films, polyethylene films, polypropylene films, polymethylpentene films, polyolefin films such as polyvinyl acetate films, plastics such as polyvinyl chloride films and polyimide films A film is preferably used, and paper, non-woven fabric, metal foil, and the like can be used. These base materials can be used in a multilayer structure.

また、基材フィルム4と粘着剤3もしくは、基材フィルム4と粘接着剤5との密着性を向上させるために、基材フィルム4の表面に、慣用の表面処理、例えば、クロム酸処理、オゾン暴露、火炎暴露、高圧電撃暴露、イオン化放射線処理等の化学的又は物理的処理を施してもよい。
また、保護フィルム1の剥離性を上げるために、その剥離面をシリコーン系剥離剤、フッ素系剥離剤、長鎖アルキルアクリレート系剥離剤などの離型剤で処理することが好ましい。
また、保護フィルム1として、フッ素樹脂からなる表面エネルギーの低いフィルムを用いることもできる。
なお、保護フィルム1の具体的なものは、例えば、帝人(株)製のA−63(離型処理剤:変性シリコーン系)や、同じく帝人(株)製のS−31(離型処理剤:Pt系シリコーン系)等がある。
Moreover, in order to improve the adhesiveness of the base film 4 and the adhesive 3, or the base film 4 and the adhesive 5, the surface of the base film 4 is subjected to a conventional surface treatment such as chromic acid treatment. Chemical or physical treatment such as ozone exposure, flame exposure, high piezoelectric impact exposure, ionizing radiation treatment, etc. may be applied.
Moreover, in order to raise the peelability of the protective film 1, it is preferable to process the peeling surface with mold release agents, such as a silicone type release agent, a fluorine-type release agent, and a long-chain alkyl acrylate type release agent.
Further, as the protective film 1, a film made of a fluororesin and having a low surface energy can be used.
Specific examples of the protective film 1 include, for example, A-63 (mold release treatment agent: modified silicone type) manufactured by Teijin Ltd. and S-31 (mold release treatment agent) manufactured by Teijin Ltd. : Pt silicone).

保護フィルム1の厚さは作業性を損なわない範囲で適宜に選択できる。通常は100μm以下、好ましくは10〜75μm、更に好ましくは25〜50μmである。   The thickness of the protective film 1 can be appropriately selected as long as the workability is not impaired. Usually, it is 100 micrometers or less, Preferably it is 10-75 micrometers, More preferably, it is 25-50 micrometers.

本発明で用いる接着剤2および粘接着剤5としては、被着体である半導体チップを熱衝撃などから守るもので、好ましくは、信頼性JEDEC Level 3(温度30℃、RH60%で、192時間吸湿後の265℃IRリフロー)を満足するものを用いる。公知の種々の熱硬化性接着剤、光硬化性接着剤、熱可塑性接着剤あるいは酸素反応性接着剤等から適宜選択する。このような接着剤2として、例えば、日立化成工業(株)製のダイアタッチフィルムHS−232等がある。   As the adhesive 2 and the adhesive 5 used in the present invention, the semiconductor chip as an adherend is protected from thermal shock and the like. Preferably, the reliability JEDEC Level 3 (temperature 30 ° C., RH 60%, 192) A material satisfying 265 ° C IR reflow after time moisture absorption is used. It selects suitably from well-known various thermosetting adhesives, photocurable adhesives, thermoplastic adhesives, oxygen reactive adhesives, etc. Examples of such an adhesive 2 include a die attach film HS-232 manufactured by Hitachi Chemical Co., Ltd.

接着剤2および粘接着剤5の平面視形状は、少なくとも半導体ウェハ(約20cm程度)を載せる大きさ(広さ)が必要であり、また、半導体ウェハの貼付が容易な形状が好ましい。円形、略円形、四角形、五角形、六角形、八角形、ウェハ形状(円の外周の一部が直線である形状)等がある。ただ、半導体ウェハ搭載部以外の無駄部分を少なくするためには、円形やウェハ形状が好ましい。   The planar view shape of the adhesive 2 and the adhesive 5 is required to have at least a size (width) on which a semiconductor wafer (about 20 cm) is placed, and a shape that allows easy attachment of the semiconductor wafer is preferable. There are a circular shape, a substantially circular shape, a quadrangular shape, a pentagonal shape, a hexagonal shape, an octagonal shape, a wafer shape (a shape in which a part of the outer periphery of the circle is a straight line), and the like. However, in order to reduce a waste portion other than the semiconductor wafer mounting portion, a circular shape or a wafer shape is preferable.

接着剤2および粘接着剤5の層厚みは、通常は1〜200μm、好ましくは3〜150μm、更に好ましくは10〜100μmである。1μmよりも薄いと十分なダイボンド接着力を確保するのが困難となったり、あるいは応力緩和効果が乏しくなる傾向となり、200μmよりも厚いと不経済で、半導体装置の小型化の要求に応えられない傾向となり、特性上の利点もない。   The layer thicknesses of the adhesive 2 and the adhesive 5 are usually 1 to 200 μm, preferably 3 to 150 μm, and more preferably 10 to 100 μm. If it is thinner than 1 μm, it will be difficult to ensure sufficient die-bonding adhesive force, or the stress relaxation effect will tend to be poor, and if it is thicker than 200 μm, it will be uneconomical and will not meet the demand for miniaturization of semiconductor devices. There is a trend and no characteristic advantage.

本発明で用いる粘着剤3としては、室温で粘着力があり、被着体に対する必要な密着力を有することができるもの(例えば、アクリル系樹脂、各種合成ゴム、天然ゴム、ポリイミド樹脂など)を使用できる。好ましくは、紫外線や放射線等の高エネルギー線や熱によって硬化する(すなわち、粘着力を低下させる)もの、中でも高エネルギー線によって硬化するものが好ましく、特に紫外線によって硬化するものが好ましい。   As the pressure-sensitive adhesive 3 used in the present invention, those having adhesive strength at room temperature and having necessary adhesion to the adherend (for example, acrylic resin, various synthetic rubbers, natural rubber, polyimide resin, etc.) are used. Can be used. Preferably, those that are cured by high energy rays such as ultraviolet rays and radiation or heat (that is, those that lower the adhesive force), particularly those that are cured by high energy rays, and those that are cured by ultraviolet rays are particularly preferred.

そのような高エネルギー線(又は紫外線)によって硬化する粘着剤は、従来から種々のタイプが知られている。その中から、高エネルギー線(又は紫外線)の照射によって、粘着力が低下するものを適宜選んで用いることができる。エネルギー線を用いて硬化させる場合には、エネルギー線硬化粘着成分を含有させることが必要である。   Various types of pressure-sensitive adhesives that are cured by such high energy rays (or ultraviolet rays) have been conventionally known. Among them, those whose adhesive strength is reduced by irradiation with high energy rays (or ultraviolet rays) can be appropriately selected and used. In the case of curing using energy rays, it is necessary to contain an energy ray curing adhesive component.

なお、このような粘着剤(但し、基材フィルム付き)として、例えば、古河電工(株)製のダイシングテープFS−8801等がある。   In addition, as such an adhesive (however, with a base film), there exists dicing tape FS-8801 etc. by Furukawa Electric Co., Ltd., for example.

粘着剤3の平面視形状は、接着剤2の平面視形状よりも一回り広く大きくて、接着剤2を覆い尽くすことができる形状で、接着剤2と重なり合わない周縁部(ダイシング用リング載置部となる)を有する形状であれば、特に制限されない。円形、略円形、四角形、五角形、六角形、八角形、ウェハ形状等がある。ただ、前記した接着剤2の好ましい形状(円形やウェハ形状)との関係から、好ましい形状は円形である。
接着剤2と重なり合わない周縁部は、ダイシング用リングを載置・固定するのに充分な広さとする。平面視が帯状円環状の場合は、その幅は、約3cm程度である。
The shape of the pressure-sensitive adhesive 3 in plan view is one size larger than the shape of the adhesive 2 in plan view so that it can completely cover the adhesive 2, and the peripheral portion that does not overlap with the adhesive 2 (the dicing ring is mounted). The shape is not particularly limited as long as the shape has a mounting portion. There are circular, substantially circular, quadrangular, pentagonal, hexagonal, octagonal, and wafer shapes. However, the preferable shape is circular because of the relationship with the preferable shape (circular or wafer shape) of the adhesive 2 described above.
The peripheral edge that does not overlap with the adhesive 2 is wide enough to place and fix the dicing ring. When the planar view is a belt-like annular shape, the width is about 3 cm.

粘着剤3の層厚みは、通常は1〜100μm、好ましくは2〜20μm、更に好ましくは3〜10μmである。1μmよりも薄いと十分な粘着力を確保するのが困難になり、ダイシング時に半導体チップが飛散する恐れがあり、100μmよりも厚いと不経済で特性上の利点もない。   The layer thickness of the pressure-sensitive adhesive 3 is usually 1 to 100 μm, preferably 2 to 20 μm, and more preferably 3 to 10 μm. If it is thinner than 1 μm, it will be difficult to secure a sufficient adhesive force, and the semiconductor chip may be scattered during dicing. If it is thicker than 100 μm, it will be uneconomical and there will be no advantage in characteristics.

基材フィルム4としては、保護フィルム1に用いたフィルムもしくはシートと同様な基材を用いることができる。例えば、ポリエチレンテレフタレートフィルム等のポリエステル系フィルム、ポリテトラフルオロエチレンフィルム、ポリエチレンフィルム、ポリプロピレンフィルム、ポリメチルペンテンフィルム、ポリビニルアセテートフィルム等のポリオレフィン系フィルム、ポリ塩化ビニルフィルム、ポリイミドフィルムなどのプラスチックフィルム等であり、多層構造を有していても構わない。なお、基材フィルム4の厚みは、作業性を損なわない範囲で適宜に選択できる。前述の粘着剤として高エネルギー線(中でも紫外線)硬化性粘着剤を用いる場合は、その高エネルギー線の透過を阻害しない厚みで使用する。通常10〜500μm、好ましくは50〜200μmである。   As the base film 4, a base similar to the film or sheet used for the protective film 1 can be used. For example, polyester film such as polyethylene terephthalate film, polytetrafluoroethylene film, polyethylene film, polypropylene film, polyolefin film such as polymethylpentene film, polyvinyl acetate film, plastic film such as polyvinyl chloride film, polyimide film, etc. Yes, it may have a multilayer structure. In addition, the thickness of the base film 4 can be appropriately selected as long as the workability is not impaired. When a high energy ray (in particular, ultraviolet ray) curable adhesive is used as the above-mentioned pressure-sensitive adhesive, it is used with a thickness that does not impede transmission of the high-energy ray. Usually, it is 10-500 micrometers, Preferably it is 50-200 micrometers.

本発明の半導体装置製造用粘接着シートによれば、粘着剤3および粘接着剤5の粘着力を弱めることなく、粘接着シートに設けた剥離起点を利用して保護フィルム1を容易に剥離・除去することができ、また、粘着剤(ダイシング用リング載置部)にダイシング用リングを充分に貼り付かせ(密着させ)、その後のダイシング工程等を容易に行える。   According to the adhesive sheet for manufacturing a semiconductor device of the present invention, the protective film 1 can be easily made using the peeling starting point provided on the adhesive sheet without weakening the adhesive force of the adhesive 3 and the adhesive 5. In addition, the dicing ring is sufficiently adhered (adhered) to the pressure-sensitive adhesive (dicing ring mounting portion), and the subsequent dicing process can be easily performed.

以下、添付図面を参照しながら、本発明の二層構成のダイシングダイボンドシートを更に具体的に説明する。   Hereinafter, the dicing die-bonding sheet having a two-layer structure according to the present invention will be described more specifically with reference to the accompanying drawings.

図1は、本発明に係る第一実施例のダイシングダイボンドシートである。
直径約26cmのディスク状にカットした基材フィルム付き粘着剤(3+4)(例えば、古河電工(株)製のダイシングテープ、FS−8801)と、上記基材フィルム付き粘着剤よりも一回り小さく(直径約20cmに)カットしたディスク状のフィルム状接着剤2(例えば、日立化成工業(株)製のダイアタッチフィルム、HS−232)とを、中心を合わせながら貼り合わせ、次いで、接着剤2と粘着剤3とが重なり合わない粘着剤の帯状円環状周縁部(ダイシング用リング載置部)に幅約2cm×長さ約4cmのナフロンテープ6(例えば、ニチアス株式会社製のTOMBO9001,0.08mmt)を貼り付け、その上から保護フィルム1(帝人(株)製、A−63、離型処理剤:変性シリコーン系)を押し付けて、保護フィルム1/接着剤(ダイボンド材)2/粘着剤3/基材フィルム4の4層一体型のダイシングダイボンドシートを作製する(図1)。このダイシングダイボンドシートでは、ナフロンテープ6を剥離起点として保護フィルム1を簡単に剥離できる。また、ラミネート性(空気を巻き込むことなく半導体ウェハの貼り付けが可能)やダイシング性(ダイシング時のチップ飛びやチップ欠け等の異常を起こさない)も良好である。
FIG. 1 is a dicing die bond sheet of the first embodiment according to the present invention.
Adhesive (3 + 4) with a base film cut into a disk shape having a diameter of about 26 cm (for example, dicing tape FS-8801 manufactured by Furukawa Electric Co., Ltd.) and one size smaller than the above adhesive with a base film ( A disc-shaped film adhesive 2 (for example, a die attach film manufactured by Hitachi Chemical Co., Ltd., HS-232) cut to a diameter of about 20 cm is bonded together with the center aligned, and then the adhesive 2 Naflon tape 6 having a width of about 2 cm and a length of about 4 cm (for example, TOMBO9001, 0.08 mmt manufactured by NICHIAS CORPORATION) ) And a protective film 1 (manufactured by Teijin Ltd., A-63, mold release treatment: modified silicone) is pressed onto the protective film. 1 / adhesive (die bond material) 2 / adhesive 3/4-layer of the substrate film 4 to produce an integrated dicing die-bonding sheet (Figure 1). In this dicing die bond sheet, the protective film 1 can be easily peeled off using the Naflon tape 6 as a peeling starting point. Further, the laminating property (a semiconductor wafer can be attached without involving air) and the dicing property (not causing abnormalities such as chip skipping and chipping during dicing) are also good.

なお、テープ状小片6の(平面視)大きさは、上の寸法に限らず、剥離起点とするのに適当な大きさであればよい。通常は、幅1〜3cm程度、長さが2〜6cm程度である。
また、テープ状小片6の厚みも特に限定されないが、好ましくは、接着剤(ダイボンド材)層の厚みと同じか、同程度とする。テープ状小片の材質も特に限定されない。粘着力は若干あっても構わないが、紙やフッ素系シートのように粘着力を持たないものが好ましい。
The size of the tape-shaped piece 6 (in plan view) is not limited to the above dimension, and may be any size that is appropriate for the separation starting point. Usually, the width is about 1 to 3 cm and the length is about 2 to 6 cm.
Further, the thickness of the tape-shaped piece 6 is not particularly limited, but is preferably the same as or approximately the same as the thickness of the adhesive (die bond material) layer. The material of the tape-shaped piece is not particularly limited. The adhesive strength may be slightly, but those having no adhesive strength such as paper and fluorine-based sheets are preferable.

剥離起点は、接着剤2と粘着剤3とが重なり合わない帯状円環状の周縁部(ダイシング用リング載置部)の一部に予め高エネルギー線を照射して、その部分の粘着剤の粘着力を低下させることによっても形成させることができる。図2は、その例(第二実施例のダイシングダイボンドシート)である。
テープ状小片を用いないほかは、上記第一実施例と同様にして、保護フィルム1/接着剤(ダイボンド材)2/粘着剤3/基材フィルム4の4層一体型のシートを作製する。その後、接着剤2と粘着剤3とが重なり合わない粘着剤の帯状円環状周縁部(ダイシング用リング載置部)の一部に紫外線を照射し、照射された部分の粘着剤の粘着力(密着力)を低下させる(図2)。このダイシングダイボンドシートでは、保護フィルム1を簡単に剥離できる。また、ラミネート性やダイシング性も良好である。
なお、紫外線の照射により、照射前で1cm幅で10〜200N/cmの密着力を有していたものが、照射後には、その3/4以下の密着力へと低下させることができる。
The peeling start point is obtained by irradiating a part of a belt-like annular peripheral part (dicing ring mounting part) where the adhesive 2 and the adhesive 3 do not overlap with each other in advance with high-energy rays, and sticking the adhesive of the part. It can also be formed by reducing the force. FIG. 2 shows an example thereof (the dicing die bond sheet of the second embodiment).
A four-layer integrated sheet of protective film 1 / adhesive (die bond material) 2 / adhesive 3 / base film 4 is produced in the same manner as in the first embodiment except that no tape-shaped piece is used. Thereafter, the adhesive 2 and the adhesive 3 are not overlapped with each other by irradiating a part of the belt-like annular peripheral portion (the dicing ring mounting portion) of the adhesive with ultraviolet rays, and the adhesive strength ( (Adhesion force) is reduced (FIG. 2). In this dicing die bond sheet, the protective film 1 can be easily peeled off. Also, the laminating property and the dicing property are good.
In addition, by irradiation with ultraviolet rays, a material having an adhesive strength of 10 to 200 N / cm with a width of 1 cm before irradiation can be reduced to 3/4 or less after irradiation.

また、剥離起点は、粘着剤3とその基材フィルム4、すなわち、基材フィルム付き粘着剤の一部を内側に予め折り返すことで形成させることもできる。図3は、この例(第三実施例のダイシングダイボンドシート)である。
途中までは第一実施例と同様にして、接着剤(ダイボンド材)2/粘着剤3/基材フィルム4の3層一体型のシートを作製する。次いで、接着剤2と粘着剤3とが重なり合わない粘着剤の帯状円環状周縁部(ダイシング用リング載置部)の一部を折り返したのち、その上から保護フィルム(帝人(株)製、A−63、変性シリコーン系)を押し付け、ダイシングダイボンドシートを作製する(図3)。折り返した基材フィルム付き粘着剤の裏側は粘着性を有さないので、ここが剥離起点となる。このダイシングダイボンドシートでは、保護フィルム1を簡単に剥離できる。また、ラミネート性やダイシング性も良好である。
Moreover, the peeling start point can also be formed by folding in part a part of the pressure-sensitive adhesive 3 and its base film 4, that is, the pressure-sensitive adhesive with a base film. FIG. 3 shows this example (the dicing die bond sheet of the third embodiment).
Halfway, a three-layer integrated sheet of adhesive (die bond material) 2 / adhesive 3 / base film 4 is produced in the same manner as in the first embodiment. Next, after folding a part of the belt-like annular peripheral portion (ring mounting portion for dicing) of the pressure-sensitive adhesive in which the adhesive 2 and the pressure-sensitive adhesive 3 do not overlap, a protective film (manufactured by Teijin Ltd., A-63, a modified silicone type) is pressed to produce a dicing die bond sheet (FIG. 3). Since the back side of the adhesive with a base film turned back does not have adhesiveness, this is a starting point for peeling. In this dicing die bond sheet, the protective film 1 can be easily peeled off. Also, the laminating property and the dicing property are good.

また、図示しないが、剥離起点は、接着剤2と粘着剤3とが重なり合わない帯状円環状の周縁部(ダイシング用リング載置部)に対応する保護フィルム1表面の一部について離型性を他の部分よりも強くしておくことで形成させることもできる。   Moreover, although not shown in figure, a peeling start point is mold release property about a part of surface of the protective film 1 corresponding to the strip | belt-shaped annular periphery (dicing ring mounting part) where the adhesive 2 and the adhesive 3 do not overlap. It is also possible to form by making it stronger than other parts.

また、単層構成のダイシングダイボンドシートにおいても具体的に説明する。図5は、本発明に係る第四実施例のダイシングダイボンドシートである。
直径約26cmのディスク状にカットした基材フィルム付き粘接着剤(5+4)の一部に、幅約2cm×長さ約4cmのナフロンテープ6(例えば、ニチアス株式会社製のTOMBO9001,0.08mmt)を貼り付け、その上から保護フィルム1(帝人(株)製、A−63、離型処理剤:変性シリコーン系)を押し付けて、保護フィルム1/粘接着剤(ダイシングダイボンド材)5/基材フィルム4の3層一体型のダイシングダイボンドシートを作製する(図5)。このダイシングダイボンドシートでは、ナフロンテープ6を剥離起点として保護フィルム1を簡単に剥離できる。また、ラミネート性(空気を巻き込むことなく半導体ウェハの貼り付けが可能)やダイシング性(ダイシング時のチップ飛びやチップ欠け等の異常を起こさない)も良好である。
Further, the dicing die bond sheet having a single layer structure will be specifically described. FIG. 5 shows a dicing die bond sheet according to a fourth embodiment of the present invention.
A part of the adhesive (5 + 4) with a base film cut into a disk having a diameter of about 26 cm and a Naflon tape 6 having a width of about 2 cm and a length of about 4 cm (for example, TOMBO9001, 0.08 mmt manufactured by NICHIAS Corporation) ) And a protective film 1 (manufactured by Teijin Ltd., A-63, mold release treatment agent: modified silicone type) is pressed over the protective film 1 / adhesive (dicing die bond material) 5 / A three-layer integrated dicing die-bonding sheet of the base film 4 is produced (FIG. 5). In this dicing die bond sheet, the protective film 1 can be easily peeled off using the Naflon tape 6 as a peeling starting point. Further, the laminating property (a semiconductor wafer can be attached without involving air) and the dicing property (not causing abnormalities such as chip skipping and chipping during dicing) are also good.

なお、テープ状小片6の(平面視)大きさは、上の寸法に限らず、剥離起点とするのに適当な大きさであればよい。通常は、幅1〜3cm程度、長さが2〜6cm程度である。
また、テープ状小片6の厚みも特に限定されないが、好ましくは、粘接着剤(ダイボンド材)層の厚みと同じか、同程度とする。テープ状小片の材質も特に限定されない。粘着力は若干あっても構わないが、紙やフッ素系シートのように粘着力を持たないものが好ましい。
The size of the tape-shaped piece 6 (in plan view) is not limited to the above dimension, and may be any size that is appropriate for the separation starting point. Usually, the width is about 1 to 3 cm and the length is about 2 to 6 cm.
Further, the thickness of the tape-shaped piece 6 is not particularly limited, but is preferably the same as or approximately the same as the thickness of the adhesive (die bond material) layer. The material of the tape-shaped piece is not particularly limited. The adhesive strength may be slightly, but those having no adhesive strength such as paper and fluorine-based sheets are preferable.

剥離起点は、粘接着剤5のダイシング用リング載置予定部の一部に予め高エネルギー線を照射して、その部分の粘接着剤の粘着力を低下させることによっても形成させることができる。図6は、その例(第五実施例のダイシングダイボンドシート)である。
テープ状小片を用いないほかは、上記第一実施例と同様にして、保護フィルム1/粘接着剤(ダイシングダイボンド材)5/基材フィルム4の3層一体型のダイシングダイボンドシートを作製する。その後、粘接着剤5のダイシング用リング載置予定部の一部に紫外線を照射し、照射された部分の粘接着剤の粘着力(密着力)を低下させる(図6)。このダイシングダイボンドシートでは、保護フィルム1を簡単に剥離できる。また、ラミネート性やダイシング性も良好である。
なお、紫外線の照射により、照射前で1cm幅で10〜200N/cmの密着力を有していたものが、照射後には、その3/4以下の密着力へと低下させることができる。
The peeling start point can also be formed by irradiating a part of the dicing ring placement planned part of the adhesive 5 with a high energy ray in advance and reducing the adhesive strength of the adhesive of that part. it can. FIG. 6 shows an example thereof (dicing die bond sheet of the fifth embodiment).
A three-layer integrated dicing die bond sheet of protective film 1 / adhesive (dicing die bond material) 5 / base film 4 is prepared in the same manner as in the first embodiment except that no tape-shaped piece is used. . After that, a part of the dicing ring placement planned portion of the adhesive 5 is irradiated with ultraviolet rays to reduce the adhesive force (adhesion) of the irradiated adhesive of the irradiated part (FIG. 6). In this dicing die bond sheet, the protective film 1 can be easily peeled off. Also, the laminating property and the dicing property are good.
In addition, by irradiation with ultraviolet rays, a material having an adhesive strength of 10 to 200 N / cm with a width of 1 cm before irradiation can be reduced to 3/4 or less after irradiation.

また、剥離起点は、粘接着剤5とその基材フィルム4、すなわち、基材フィルム付き粘接着剤の一部を内側に予め折り返すことで形成させることもできる。図7は、この例(第六実施例のダイシングダイボンドシート)である。
途中までは第一実施例と同様にして、保護フィルム1/粘接着剤(ダイシングダイボンド材)5/基材フィルム4の3層一体型のダイシングダイボンドシートを作製する。次いで、粘接着剤5の一部を折り返したのち、その上から保護フィルム(帝人(株)製、A−63、変性シリコーン系)を押し付け、ダイシングダイボンドシートを作製する(図8)。折り返した基材フィルム付き粘接着剤の裏側は粘着性を有さないので、ここが剥離起点となる。このダイシングダイボンドシートでは、保護フィルム1を簡単に剥離できる。また、ラミネート性やダイシング性も良好である。
また、図示しないが、剥離起点は、粘接着剤5のダイシング用リング載置予定部に対応する保護フィルム1表面の一部について離型性を他の部分よりも強くしておくことで形成させることもできる。
Moreover, the peeling start point can also be formed by folding in part a part of the adhesive 5 and its base film 4, that is, the base film-attached adhesive. FIG. 7 shows this example (the dicing die bond sheet of the sixth embodiment).
A half-layer integrated dicing die bond sheet of protective film 1 / adhesive (dicing die bond material) 5 / base film 4 is produced until the middle in the same manner as in the first example. Next, after part of the adhesive 5 is folded back, a protective film (A-63, modified silicone type, manufactured by Teijin Ltd.) is pressed from above to produce a dicing die bond sheet (FIG. 8). Since the back side of the folded adhesive with a base film does not have tackiness, this is the starting point for peeling. In this dicing die bond sheet, the protective film 1 can be easily peeled off. Also, the laminating property and the dicing property are good.
Moreover, although not shown in figure, the peeling starting point is formed by making mold release property stronger than another part about a part of surface of the protective film 1 corresponding to the ring mounting plan part of the adhesive 5 for dicing. It can also be made.

本発明に係る第一実施例の二層構成のダイシングダイボンドシートで、(イ)は平面図、(ロ)はA−A断面図である。It is a dicing die-bonding sheet having a two-layer structure according to the first embodiment of the present invention, in which (A) is a plan view and (B) is an AA cross-sectional view. 本発明に係る第二実施例の二層構成のダイシングダイボンドシートにおける平面図である。It is a top view in the dicing die-bonding sheet of the 2 layer structure of the 2nd example concerning the present invention. 本発明に係る第三実施例のダイシングダイボンドシートの平面図である。It is a top view of the dicing die-bonding sheet of the 3rd example concerning the present invention. 従来例の二層構成のダイシングダイボンドシートで、(イ)は平面図、(ロ)はA−A断面図である。It is the dicing die-bonding sheet | seat of the two-layer structure of a prior art example, (A) is a top view, (B) is AA sectional drawing. 本発明に係る第四実施例の単層構成のダイシングダイボンドシートで、(イ)は平面図、(ロ)はA−A断面図である。It is a dicing die bond sheet of the single layer composition of the 4th example concerning the present invention, (a) is a top view and (b) is an AA sectional view. 本発明に係る第五実施例の二層構成のダイシングダイボンドシートにおける平面図である。It is a top view in the dicing die-bonding sheet | seat of the 2 layer structure of 5th Example which concerns on this invention. 本発明に係る第六実施例のダイシングダイボンドシートの平面図である。It is a top view of the dicing die-bonding sheet of the 6th example concerning the present invention. 従来例の単層構成のダイシングダイボンドシートで、(イ)は平面図、(ロ)はB−B断面図である。It is the dicing die-bonding sheet | seat of the single layer structure of a prior art example, (A) is a top view, (B) is BB sectional drawing.

符号の説明Explanation of symbols

1:保護フィルム
2:接着剤(ダイボンド材)
3:粘着剤
4:基材フィルム
5:粘接着剤(ダイシングダイボンド材)
6:テープ状小片

1: Protective film 2: Adhesive (die bond material)
3: Adhesive 4: Base film 5: Adhesive (dicing die bond material)
6: Tape-shaped pieces

Claims (6)

保護フィルムの片面に、所定平面視形状の接着剤と、前記接着剤を覆い、前記接着剤よりも一回り広く大きく、そして前記接着剤とは重なり合わない周縁部を有する粘着剤と、前記粘着剤に重なり合う基材フィルムとを、この順に積層した半導体装置製造用粘接着シート、または、保護フィルムの片面に、所定平面視形状の粘接着剤と、前記粘接着剤に重なり合う基材フィルムとを、この順に積層した半導体装置製造用粘接着シートであって、
前記周縁部の一部に、保護フィルムを剥離・除去しやすくする剥離起点が形成されている半導体装置製造用粘接着シート。
An adhesive having a predetermined plan view shape on one side of the protective film, a pressure-sensitive adhesive that covers the adhesive, is slightly larger than the adhesive, and has a peripheral edge that does not overlap the adhesive; and the adhesive Adhesive sheet for manufacturing semiconductor device, or adhesive film having a predetermined plan view shape on one side of a protective film, and a base material overlapping the adhesive It is an adhesive sheet for manufacturing semiconductor devices in which films are laminated in this order,
A pressure-sensitive adhesive sheet for manufacturing a semiconductor device, wherein a peeling starting point that facilitates peeling and removal of a protective film is formed on a part of the peripheral edge.
接着剤と粘着剤と基材フィルム、または、粘接着剤と基材フィルムとを一組として、これらが長尺の保護フィルムの片面に島状に多数配されロール状に巻かれている、請求項1に記載の半導体装置製造用粘接着シート。 Adhesive and pressure-sensitive adhesive and base film, or adhesive and base film as a set, a large number of islands are arranged on one side of a long protective film, and rolled into a roll, The pressure-sensitive adhesive sheet for manufacturing a semiconductor device according to claim 1. 剥離起点は、粘着力のないテープ状小片を、前記周縁部の粘着剤、または、粘接着剤と保護フィルムとの間に挟み込ませることで形成させている、請求項1又は請求項2に記載の半導体装置製造用粘接着シート。 The peeling starting point is formed by sandwiching a tape-shaped piece having no adhesive force between the adhesive at the peripheral edge or between the adhesive and the protective film. The adhesive sheet for semiconductor device manufacture as described. 剥離起点は、前記周縁部の一部に予め高エネルギー線を照射して、その部分の粘着剤、または、粘接着剤の粘着力を低下させることで形成させている、請求項1又は請求項2に記載の半導体装置製造用粘接着シート。 The peeling start point is formed by irradiating a part of the peripheral edge with a high energy ray in advance and reducing the adhesive force of the adhesive or the adhesive of the part. Item 3. An adhesive sheet for manufacturing a semiconductor device according to Item 2. 剥離起点は、粘着剤、または、粘接着剤とその基材フィルムの一部を内側に予め折り返すことで形成させている、請求項1又は請求項2に記載の半導体装置製造用粘接着シート。 3. The adhesive starting point for manufacturing a semiconductor device according to claim 1 or 2, wherein the peeling starting point is formed by previously folding an adhesive or an adhesive and a part of its base film inward. Sheet. 剥離起点は、前記周縁部に対応する保護フィルム表面の一部についての離型性を他の部分よりも強くしておくことで形成させている、請求項1又は請求項2に記載の半導体装置製造用粘接着シート。

3. The semiconductor device according to claim 1, wherein the separation starting point is formed by making the releasability of a part of the surface of the protective film corresponding to the peripheral edge part stronger than the other part. Adhesive sheet for manufacturing.

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