JP2005166993A - Method and apparatus for cleaning head pressurization surface - Google Patents

Method and apparatus for cleaning head pressurization surface Download PDF

Info

Publication number
JP2005166993A
JP2005166993A JP2003404332A JP2003404332A JP2005166993A JP 2005166993 A JP2005166993 A JP 2005166993A JP 2003404332 A JP2003404332 A JP 2003404332A JP 2003404332 A JP2003404332 A JP 2003404332A JP 2005166993 A JP2005166993 A JP 2005166993A
Authority
JP
Japan
Prior art keywords
cleaning
chip
bonded
head
tool
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003404332A
Other languages
Japanese (ja)
Other versions
JP3929436B2 (en
JP2005166993A5 (en
Inventor
Katsumi Terada
勝美 寺田
Takashi Takei
崇 武井
健史 ▲濱▼川
Takeshi Hamakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Engineering Co Ltd
Original Assignee
Toray Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Engineering Co Ltd filed Critical Toray Engineering Co Ltd
Priority to JP2003404332A priority Critical patent/JP3929436B2/en
Publication of JP2005166993A publication Critical patent/JP2005166993A/en
Publication of JP2005166993A5 publication Critical patent/JP2005166993A5/ja
Application granted granted Critical
Publication of JP3929436B2 publication Critical patent/JP3929436B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • H01L2224/7501Means for cleaning, e.g. brushes, for hydro blasting, for ultrasonic cleaning, for dry ice blasting, using gas-flow, by etching, by applying flux or plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • H01L2224/751Means for controlling the bonding environment, e.g. valves, vacuum pumps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • H01L2224/7525Means for applying energy, e.g. heating means
    • H01L2224/753Means for applying energy, e.g. heating means by means of pressure
    • H01L2224/75301Bonding head
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • H01L2224/757Means for aligning
    • H01L2224/75743Suction holding means
    • H01L2224/75745Suction holding means in the upper part of the bonding apparatus, e.g. in the bonding head
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • H01L2224/757Means for aligning
    • H01L2224/75753Means for optical alignment, e.g. sensors

Abstract

<P>PROBLEM TO BE SOLVED: To provide a mounting apparatus which realizes the improvement of a mounting quality and the improvement of productivity by the reduction of a mounting time and which has a microvibration means of ultrasonic etc. by reducing flawing of a tool by chipping, and to provide a method for mounting. <P>SOLUTION: The method and apparatus comprises a process of making a recognizing means recognize a first matter to be joined held by a head having the microvibration means and a second matter to be joined held by a stage, and a process of positioning the first matter to be joined and the second matter to be joined. After them, the method and apparatus comprises a joining process and a process of making a cleaning means to clean the holding surface of the first matter to be cleaned of the head having the microvibration means each time of joining the first matter to be joined and the second matter to be joined. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、微振動手段を有したヘッド加圧面に保持された第1被接合物と、ステージ上面に保持された第2被接合物同士を接合する際、ヘッド加圧面を清掃する方法および装置に関するものである。   The present invention relates to a method and an apparatus for cleaning a head pressure surface when bonding a first object to be bonded held on a head pressure surface having fine vibration means and a second object to be bonded held on an upper surface of a stage. It is about.

たとえばリードボンダーにおいて、ツールの表面に酸化物などが付着することによって接合の品質を低下させるなどの理由により、ツール表面を砥石とブラシにて周期的にクリーニングする方法は一般的に知られている。(特許文献1参照)
特開平08−148879号公報 一方、一般的にチップは、ウエハーから切り出されることは周知の通りであるが、ウエハーから切り出されたチップエッジ部に微少なバリが残存していることがある。ウエハーから切り出されたチップとして図14に、バンプ101がフェイスアップ面100aに設けられ、チップエッジ部にバリ102が残存したチップ100を示す。
For example, in a lead bonder, a method of periodically cleaning a tool surface with a grindstone and a brush for the reason that the quality of bonding is deteriorated due to adhesion of oxide or the like to the surface of the tool is generally known. . (See Patent Document 1)
JP, 08-148879, A On the other hand, it is well known that chips are generally cut out from a wafer, but minute burrs may remain on the chip edge portion cut out from the wafer. As a chip cut out from the wafer, FIG. 14 shows a chip 100 in which bumps 101 are provided on the face-up surface 100a and burrs 102 remain on the chip edge portion.

図15に示すように、たとえば超音波振動などの微振動手段をヘッドに有した実装装置107において、チップ100を基盤103に実装する際、ツール加圧面105aにチップ100のフェイスダウン面100bを保持した後、ツール105を降下させて加圧200と微振動201によってチップ100のバンプ101と基板保持ステージ106に保持された基板103のパッド104を擦り合わせるようにしながら接合する。   As shown in FIG. 15, in the mounting apparatus 107 having a fine vibration means such as ultrasonic vibration in the head, when the chip 100 is mounted on the base 103, the tool pressing surface 105a holds the face-down surface 100b of the chip 100. After that, the tool 105 is lowered, and the bumps 101 of the chip 100 and the pads 104 of the substrate 103 held on the substrate holding stage 106 are bonded to each other by the pressure 200 and the fine vibration 201 so as to rub against each other.

そのため、図16に示すように、微振動201によってチップエッジ部のバリ102から分離したチップ片(以下、チッピングという)が、ツール加圧面105aに付着する。さらに微振動201と加圧200が継続されることにより、チッピング102がツール加圧面105aを削りながらツール105の内部に進入して固着(凝着)してしまうので、チッピングがツールを傷つけるだけでなく、ツールの寿命を極めて短くしてしまい、実装品質を低下させる原因にもなっていた。   Therefore, as shown in FIG. 16, a chip piece (hereinafter referred to as chipping) separated from the burr 102 at the chip edge portion by the minute vibration 201 adheres to the tool pressing surface 105a. Furthermore, since the fine vibration 201 and the pressurization 200 are continued, the chipping 102 enters the tool 105 and is fixed (adhered) while scraping the tool pressurization surface 105a, so that the chipping only damages the tool. As a result, the tool life is extremely shortened, and the mounting quality is deteriorated.

さらに、チッピング102のツール105への食い込みは急速に発生するため、特許文献1に述べられているような周期的な清掃ではチッピング102のツール105への進入を止めることは困難であり、ツールの材質よりも硬い砥石で清掃するとツール表面を傷つける可能性がある。   Further, since the chipping 102 bites into the tool 105 occurs rapidly, it is difficult to stop the chipping 102 from entering the tool 105 by periodic cleaning as described in Patent Document 1. Cleaning with a harder stone than the material may damage the tool surface.

本発明は、このような問題点に着目し、たとえば超音波振動などの微振動手段を有した実装装置において、ツール加圧面がチッピングによって傷つくことを低減し、実装品質の向上、実装時間短縮による生産性の向上を実現することを可能にした実装装置および実装方法を提供することを目的としている。   The present invention pays attention to such problems, and for example, in a mounting apparatus having a fine vibration means such as ultrasonic vibration, the tool pressing surface is less damaged by chipping, thereby improving the mounting quality and shortening the mounting time. It is an object of the present invention to provide a mounting apparatus and a mounting method capable of improving productivity.

この発明は、このような目的を達成するために、次のような構成をとる。すなわち、請求項1に記載の発明は、微振動手段を有したヘッドに保持された第1被接合物とステージに保持された第2被接合物同士を接合する際、前記微振動手段を有したヘッドの第1被接合物保持面を清掃する方法であって、微振動手段を有したヘッドに保持された第1被接合物とステージに保持された第2被接合物を認識手段によって認識する工程と、前記第1被接合物と前記第2被接合物を位置合わせ工程後、前記微振動手段により接合する工程と、前記第1被接合物と前記第2被接合物の接合ごとに前記微振動手段を有したヘッドの第1被接合物保持面を清掃手段によって清掃する工程を有することを特徴とする実装方法である。   In order to achieve such an object, the present invention has the following configuration. That is, the invention described in claim 1 has the fine vibration means when the first workpiece held by the head having the fine vibration means and the second workpiece held by the stage are bonded to each other. The first bonded object holding surface of the head is cleaned, and the first bonded object held by the head having the fine vibration means and the second bonded object held by the stage are recognized by the recognition means. A step of aligning the first object to be bonded and the second object to be bonded by the fine vibration means after the alignment step, and a step of bonding the first object to be bonded and the second object to be bonded. A mounting method comprising: a step of cleaning a first bonded object holding surface of the head having the fine vibration means by a cleaning means.

また、請求項2に記載の発明は、前記微振動手段により接合する工程が、超音波振動により合する工程であることを特徴とする請求項1に記載の実装方法である。   The invention according to claim 2 is the mounting method according to claim 1, wherein the step of joining by the fine vibration means is a step of joining by ultrasonic vibration.

また、請求項3に記載の発明は、前記清掃手段によって清掃する工程が、ブラシで清掃する工程であることを特徴とする請求項1または2に記載の実装方法である。   The invention described in claim 3 is the mounting method according to claim 1 or 2, wherein the step of cleaning by the cleaning means is a step of cleaning with a brush.

また、請求項4に記載の発明は、前記清掃手段によって清掃する工程と第1被接合物の搬送工程が共に行われることを特徴とする請求項1、2または3に記載の実装方法である。   The invention according to claim 4 is the mounting method according to claim 1, 2 or 3, characterized in that both the step of cleaning by the cleaning means and the step of transporting the first workpiece are performed. .

また、請求項5に記載の実装装置は、微振動手段を有したヘッドに保持された第1被接合物とステージに保持された第2被接合物同士を接合する際、前記微振動手段を有したヘッドの第1被接合物保持面を清掃する装置であって、微振動手段を有したヘッドに保持された第1被接合物とステージに保持された第2被接合物を認識する認識手段と、前記第1被接合物と前記第2被接合物を位置合わせ手段によって位置合わせした後、接合する接合手段と、前記微振動手段を有したヘッドの第1被接合物保持面を清掃する清掃手段を有し、前記第1被接合物と前記第2被接合物の接合ごとに前記清掃手段によって前記微振動手段を有したヘッドの第1被接合物保持面を清掃することを特徴とする実装装置である。   The mounting apparatus according to claim 5 is configured such that when the first object to be bonded held by the head having the fine vibration means is bonded to the second object to be bonded held by the stage, the fine vibration means is used. A device for cleaning a first workpiece holding surface of a head having a head, and recognizing a first workpiece held by a head having fine vibration means and a second workpiece held by a stage. Cleaning the first to-be-bonded object holding surface of the head having the means, the first to-be-joined object and the second to-be-joined object by the aligning means and then joining the joining means and the fine vibration means And cleaning the first bonded object holding surface of the head having the fine vibration means by the cleaning means for each bonding of the first bonded object and the second bonded object. It is a mounting apparatus.

また、請求項6に記載の実装装置は、前記微振動手段を有したヘッドに設けられた微振動手段が、超音波振動であることを特徴とする請求項5に記載の実装装置である。   The mounting device according to claim 6 is the mounting device according to claim 5, wherein the fine vibration means provided in the head having the fine vibration means is ultrasonic vibration.

また、請求項7に記載の実装装置は、前記清掃手段が、ブラシであることを特徴とする請求項5または6に記載の実装装置である。   The mounting device according to claim 7 is the mounting device according to claim 5 or 6, wherein the cleaning means is a brush.

また、請求項8に記載の実装装置は、前記清掃手段が、搬送手段の直近に配置されていることを特徴とする請求項5、6または7に記載の実装装置である。   Moreover, the mounting apparatus of Claim 8 is a mounting apparatus of Claim 5, 6 or 7 with which the said cleaning means is arrange | positioned in the immediate vicinity of the conveyance means.

本発明に係る実装装置および実装方法によれば、1チップを実装する毎に、少なくとも1回以上、ツール加圧面を清掃手段によって清掃するため、常にチッピングなどの塵を除去することが出来る。したがって、ツール加圧面を清掃しない場合、チップ実装回数に換算すると約1〜1000チップの実装回数にてツールの交換寿命を迎えていたが、1チップを実装する毎に、少なくとも1回以上、ツール加圧面を清掃することによって、チップ実装回数に換算して約10万〜100万チップ以上の実装回数までツールの交換が不要となった。よって、常にチッピングなどの塵が除去されるため、ツールの寿命が延びることによるランニングコストの低減が達成できる。   According to the mounting apparatus and the mounting method according to the present invention, the tool pressing surface is cleaned by the cleaning means at least once every time one chip is mounted, so that dust such as chipping can always be removed. Therefore, when the tool pressurizing surface is not cleaned, the tool replacement life is reached at the number of times of mounting of about 1 to 1000 chips when converted to the number of times of chip mounting, but at least once or more every time one chip is mounted. By cleaning the pressing surface, it is not necessary to replace the tool up to the number of times of mounting of about 100,000 to 1 million chips or more in terms of the number of times of chip mounting. Therefore, since dust such as chipping is always removed, the running cost can be reduced by extending the tool life.

また、微振動手段に超音波振動を用いれば実装品質が向上する。また、清掃手段にブラシを用いればツール表面を傷つけることがない。さらに、清掃手段とチップ搬送手段をお互い直近に配置しチップの搬送工程と共に行われるようにすれば、清掃後すぐにチップを吸着できるため実装時間短縮による生産性の向上を実現することができる。   Further, if ultrasonic vibration is used for the fine vibration means, the mounting quality is improved. Moreover, if a brush is used for the cleaning means, the tool surface will not be damaged. Further, if the cleaning unit and the chip transport unit are arranged in close proximity to each other and are performed together with the chip transport process, the chip can be adsorbed immediately after the cleaning, thereby improving the productivity by shortening the mounting time.

以下に、本発明の望ましい実施の形態を、図面を参照して説明する。
(実施の形態1)
図1、図2は、本発明の一実施態様に係る実装装置、第1被接合物、第2被接合物を示しており、まず、この実装装置における各構成について説明する。
Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.
(Embodiment 1)
1 and 2 show a mounting apparatus, a first object to be bonded, and a second object to be bonded according to an embodiment of the present invention. First, each configuration of the mounting apparatus will be described.

実装装置1は、第1認識マーク13を有した第1被接合物11と、その下方に配され第2認識マーク16を有した第2被接合物14と、を実装する装置に構成されている。   The mounting apparatus 1 is configured as an apparatus for mounting a first object 11 having a first recognition mark 13 and a second object 14 having a second recognition mark 16 disposed below the first object. Yes.

第1被接合物11(以下、チップという)は、フェイスアップ面11aにバンプ12と、第1認識マーク13を有し、第2被接合物14(以下、基板という)は、実装面14aにパッド15と、第2認識マーク16を有している。   The first object 11 (hereinafter referred to as a chip) has bumps 12 and first recognition marks 13 on the face-up surface 11a, and the second object 14 (hereinafter referred to as a substrate) is provided on the mounting surface 14a. A pad 15 and a second recognition mark 16 are provided.

なお、本発明における第1被接合物(チップ)とは、たとえばICチップ、半導体チップ、光素子、表面実装部品、ウエハなど種類や大きさに関係なく第2被接合物(基板)と接合する側全ての形態を示し、第1被接合物(チップ)に設けられたバンプとは、たとえばハンダバンプ、スタッドバンプなど第2被接合物(基板)のパッドと接合する側全ての電極を示す。   Note that the first object to be bonded (chip) in the present invention is bonded to the second object to be bonded (substrate) regardless of the type or size, such as an IC chip, a semiconductor chip, an optical element, a surface mount component, or a wafer. The bumps provided on the first object to be bonded (chip) indicate all electrodes on the side to be bonded to the pads of the second object to be bonded (substrate) such as solder bumps and stud bumps.

また、第2被接合物(基板)とは、たとえば樹脂基板、ガラス基板、フレキシブルプリント基板(FPC)、セラミック基板、チップ、ウエハなど第1被接合物(チップ)と接合する側全ての形態を示し、第2被接合物(基板)に設けられたパッドとは、第1被接合物(チップ)のバンプと接合する側全ての電極を示す。   Further, the second object to be bonded (substrate) includes all forms on the side to be bonded to the first object to be bonded (chip) such as a resin substrate, a glass substrate, a flexible printed circuit board (FPC), a ceramic substrate, a chip, and a wafer. The pads provided on the second object to be bonded (substrate) indicate all electrodes on the side to be bonded to the bumps of the first object to be bonded (chip).

ヘッド2は、微振動手段3の下部にツール4を備え、ツール4の加圧面4aにチップ11を空気吸着保持するための吸気孔5を備えているが、空気吸着による吸着手段以外に、静電気による静電保持手段、磁石や磁気などによる磁気保持手段、単数または複数のツメなどによってチップを挟むまたは押さえる機械的手段など、どのような保持手段であっても良い。   The head 2 is provided with a tool 4 below the fine vibration means 3 and an intake hole 5 for holding the chip 11 on the pressure surface 4a of the tool 4 by air adsorption. Any holding means may be used, such as an electrostatic holding means using a magnet, a magnetic holding means using a magnet or magnetism, or a mechanical means for sandwiching or pressing a chip with one or a plurality of claws.

なお、微振動手段3は、たとえば超音波振動など超音波発振子による振動、ピエゾ素子による振動など、微振動を発生させる全ての形態を示す。   The fine vibration means 3 shows all forms for generating fine vibration such as vibration by an ultrasonic oscillator such as ultrasonic vibration and vibration by a piezo element.

微振動手段3の振動数は、たとえば超音波振動の場合は50kHzを選定しているが、20kHzから200kHzの範囲であってもよい。また50kHzのときの振幅は1μmから6μmの範囲でチップのバンプと基板の電極の接合強度が安定しているが、振動数の組み合わせによっては、0.1μmから10μmの範囲であっても良い。   The frequency of the fine vibration means 3 is, for example, 50 kHz in the case of ultrasonic vibration, but may be in the range of 20 kHz to 200 kHz. The amplitude at 50 kHz is in the range of 1 μm to 6 μm, and the bonding strength between the bumps of the chip and the electrodes of the substrate is stable, but may be in the range of 0.1 μm to 10 μm depending on the combination of frequencies.

また、ヘッド2は、昇降制御可能な形態に設けられているが、昇降制御だけでなく平行移動制御、回転制御、昇降制御および平行移動制御、昇降制御および回転制御、平行移動制御および回転制御、昇降制御および平行移動制御および回転制御などの組み合わせ様態に設けても良い。   Further, the head 2 is provided in a form that can be controlled up and down, but not only in the up and down control, but also in parallel movement control, rotation control, up and down control and parallel movement control, up and down control and rotation control, parallel movement control and rotation control, You may provide in a combination aspect, such as raising / lowering control, parallel movement control, and rotation control.

さらに、ツール4には、たとえばヒータなどの加熱手段(図示略)を備えているが、場合によっては備えていない形態であっても良い。   Furthermore, although the tool 4 is provided with heating means (not shown) such as a heater, for example, it may be in a form not provided.

基板保持ステージ6は、ステージ上面に基板14を空気吸着するための吸気孔(図示略)を備えているが、空気吸着による吸着手段以外に、静電気による静電保持手段、磁石や磁気などによる磁気保持手段、単数または複数のツメなどによってチップを挟むまたは押さえる機械的手段など、どのような保持手段であっても良い。   The substrate holding stage 6 is provided with an intake hole (not shown) for air-adsorbing the substrate 14 on the upper surface of the stage. In addition to the air adsorbing means, electrostatic holding means by static electricity, magnetism by magnets, magnetism, etc. Any holding means such as a holding means, a mechanical means for sandwiching or pressing the chip with one or a plurality of claws or the like may be used.

また、基板保持ステージ6は、平行移動制御および回転制御可能な形態に設けられているが、平行移動制御および回転制御だけでなく平行移動制御、回転制御、昇降制御、平行移動制御および昇降制御、回転制御および昇降制御、昇降制御および平行移動制御および回転制御などの組み合わせ様態に設けても良い。   Further, the substrate holding stage 6 is provided in a form capable of parallel movement control and rotation control, but not only the parallel movement control and rotation control but also the parallel movement control, rotation control, lift control, parallel movement control and lift control, You may provide in the combination mode, such as rotation control and raising / lowering control, raising / lowering control, parallel movement control, and rotation control.

さらに、基板保持ステージ6には、たとえばヒータなどの加熱手段(図示略)を備えているが、場合によっては備えていない形態であっても良い。   Further, the substrate holding stage 6 is provided with a heating means (not shown) such as a heater, but may not be provided in some cases.

2視野の認識手段7は、上下方向に2つの視野を有する手段であり、本実施態様では、上光軸7aでチップ11の第1認識マーク13を、下光軸7bで基板14の第2認識マーク16を読み取る。なお、2視野の認識手段8は、CCDカメラを示すが、CCDカメラ以外に、たとえば、赤外線カメラ、X線カメラ、センサーなど種類に関係なく認識マークを認識できれば、どのような認識手段であっても良い。   The two-field recognition means 7 is a means having two fields of view in the vertical direction. In this embodiment, the first recognition mark 13 of the chip 11 is indicated by the upper optical axis 7a, and the second recognition of the substrate 14 is indicated by the lower optical axis 7b. The recognition mark 16 is read. The two-field recognition means 8 is a CCD camera, but other than the CCD camera, any recognition means can be used as long as the recognition mark can be recognized regardless of the type, such as an infrared camera, an X-ray camera, or a sensor. Also good.

また、2視野の認識手段8は、平行移動制御可能な態様に設けられているが、昇降制御、回転制御、平行移動制御および昇降制御、平行移動制御および回転制御、昇降制御および回転制御、平行移動制御および昇降制御および回転制御などの組み合わせ様態に設けても良い。   The two-field recognition means 8 is provided in such a manner that the parallel movement control is possible, but the vertical movement control, rotation control, parallel movement control and vertical movement control, parallel movement control and rotation control, vertical movement control and rotation control, parallel You may provide in a combination mode, such as movement control, raising / lowering control, and rotation control.

チップ搬送手段9は、チップトレイやウエハー(いずれも図示略)などからチップ11(フェイスダウン面11bが上面向き)をチップ搬送手段9に移載された後、ツール4の加圧面4a下方に平行移動制御する様態に設けられている。   The chip conveying means 9 is parallel to the lower side of the pressing surface 4 a of the tool 4 after the chip 11 (face-down surface 11 b faces upward) is transferred to the chip conveying means 9 from a chip tray or a wafer (both not shown). The movement control is provided.

清掃手段8は、ブラシ10とブラシホルダ10aによって構成されており、ブラシ10を含む清掃手段8の高さは搬送されるチップ11よりも高くなるように設けられている。   The cleaning unit 8 includes a brush 10 and a brush holder 10a, and the cleaning unit 8 including the brush 10 is provided so that the height of the cleaning unit 8 is higher than that of the chip 11 to be conveyed.

また、清掃手段8とチップ搬送手段9は一体型に設けられており、チップ搬送手段9と共にツール4の加圧面4a下方に平行移動制御する様態に設けられ、ツール4の方向側から清掃手段8、チップ搬送手段9の順に配置されているため、チップ11がツールの加圧面4aに保持される毎に確実に清掃することができる。   Further, the cleaning means 8 and the chip conveying means 9 are provided in an integrated manner, and are provided in such a manner as to be controlled in parallel with the chip conveying means 9 below the pressing surface 4a of the tool 4, and the cleaning means 8 from the direction side of the tool 4. Since the chip conveying means 9 are arranged in this order, the chip 11 can be reliably cleaned every time the chip 11 is held on the pressing surface 4a of the tool.

ツール4に加熱手段(図示略)を備えている場合、ツール4の加圧面4aの表面は約100〜200℃の範囲に設定されるため、ブラシ10には200℃を超えるガラス転移点を有する耐熱性のある材質が要求される。また早期に磨耗や倒毛しない材質および耐性も要求される。   When the tool 4 is provided with heating means (not shown), the surface of the pressing surface 4a of the tool 4 is set to a range of about 100 to 200 ° C., so the brush 10 has a glass transition point exceeding 200 ° C. A heat-resistant material is required. In addition, materials and resistance that do not wear or fall down early are also required.

そこで、ブラシ10の材質としてはアラミド繊維を選定しているが、たとえばツール4の加圧面4aを傷つけない硬度の低い材質であれば、たとえば金属製ブラシなどアラミド繊維以外であっても良い。   Therefore, although an aramid fiber is selected as the material of the brush 10, for example, a material other than an aramid fiber such as a metal brush may be used as long as the material has a low hardness that does not damage the pressing surface 4a of the tool 4.

また、ブラシ10の磨耗や倒毛に対する耐性を有し、ブラシとしての柔軟性を満たすために、ブラシ10を構成する線材は0.18mmの線径を有したものを用いているが、異なる複数の線径を試行した結果、0.1〜0.4mmの範囲であれば有効であることが判ったため、有効範囲内であれば0.18mm以外の線径を有した線材を用いたブラシであっても良い。   Further, in order to have resistance to wear and fall of the brush 10 and to satisfy the flexibility as the brush, the wire constituting the brush 10 has a wire diameter of 0.18 mm. As a result of trying the wire diameter, it was found that it was effective in the range of 0.1 to 0.4 mm, so if it was within the effective range, a brush using a wire having a wire diameter other than 0.18 mm There may be.

さらに、ブラシ10の植毛方法として、チッピングのすり抜けを防ぐ機能が要求されるためブラシ10を構成する線材は隙間なく密にブラシホルダ10aによって一括保持されることが好ましいが、たとえば線材を小分けにした束を千鳥型に配置するなどチッピングのすり抜けを防止できればどのような形態であっても良い。   Further, as a method for flocking the brush 10, a function for preventing slipping of chipping is required, so that the wires constituting the brush 10 are preferably held together by the brush holder 10a without gaps. For example, the wires are subdivided. Any form may be used as long as chipping can be prevented from passing through such as arranging the bundle in a staggered pattern.

なお、ブラシ10は磨耗や倒毛に対する耐性を有したものを選択しているが、チップ11がツールの加圧面4aに保持されるごとに確実に清掃するため、半永久的に使用することは難しい。そのためブラシ10とブラシホルダ10aは清掃手段8から自由に脱着可能な形態に設けられている。また、清掃手段8自身が搬送手段9と自由に脱着できる形態であっても良い。   In addition, although the brush 10 has selected the thing which has the tolerance with respect to abrasion and a fallen hair, since the chip | tip 11 is reliably cleaned whenever it hold | maintains at the pressurization surface 4a of a tool, it is difficult to use semipermanently. . Therefore, the brush 10 and the brush holder 10a are provided in a form that can be freely detached from the cleaning means 8. Moreover, the form which the cleaning means 8 itself can be freely attached or detached with the conveyance means 9 may be sufficient.

また、清掃手段8とチップ搬送手段9は、お互い直近に配置され、一体型に設けられているが、各々独立した形態であっても良く、さらには、一体型、独立型を問わず、各々、平行移動制御だけでなく、昇降制御、回転制御、平行移動制御および昇降制御、平行移動制御および回転制御、昇降制御および回転制御、平行移動制御および昇降制御および回転制御などの組み合わせ様態に設けても良い。   Further, the cleaning means 8 and the chip transport means 9 are disposed in close proximity to each other and are provided in an integral form, but may be in an independent form, and each of them may be an integral form or an independent form. In addition to parallel movement control, it is provided in combination modes such as lifting control, rotation control, parallel movement control and lifting control, parallel movement control and rotation control, lifting control and rotation control, parallel movement control and lifting control and rotation control, etc. Also good.

図3〜8は、本発明の一実施態様に係る実装装置の動作形態を示しており、順に説明する。   3-8 has shown the operation | movement form of the mounting apparatus which concerns on one embodiment of this invention, and demonstrates it in order.

図3は、チップ11がチップトレイやウエハー(いずれも図示略)などからフェイスダウン面11bを上面にした後、チップ搬送手段9に移載された状態を示している。チップ11がチップ搬送手段9に移載されると、チップ搬送手段9と清掃手段8は、待避位置からツール4の加圧面直下付近へ平行移動する。   FIG. 3 shows a state in which the chip 11 is transferred from the chip tray or wafer (both not shown) to the chip conveying means 9 after the face-down surface 11b is turned up. When the chip 11 is transferred to the chip conveying means 9, the chip conveying means 9 and the cleaning means 8 move in parallel from the retracted position to the vicinity immediately below the pressing surface of the tool 4.

図4は、チップ搬送手段9と清掃手段8がツール4の加圧面直下付近に平行移動してきた状態を示す。チップ搬送手段9と清掃手段8が平行移動し続けるためブラシ10によってツール4の加圧面が清掃される。   FIG. 4 shows a state in which the chip conveying means 9 and the cleaning means 8 have been translated in the vicinity of just below the pressing surface of the tool 4. Since the chip conveying means 9 and the cleaning means 8 continue to move in parallel, the pressure surface of the tool 4 is cleaned by the brush 10.

なお、チップ搬送手段9と清掃手段8がツール4の加圧面直下付近に平行移動する際、ヘッド2は、予め、待避位置からツール4の加圧面直下付近にチップ11が位置する高さまで降下して待機しているが、たとえばヘッド2が清掃手段8方向へ移動するなど、ツール4の加圧面を清掃手段8で清掃した後、チップ11を吸着保持できれば、ヘッド2、清掃手段8、チップ搬送手段9は、どのような動作様態であっても良く、どのような動作の組み合わせであっても良い。   In addition, when the chip conveying means 9 and the cleaning means 8 move in parallel near the pressure surface of the tool 4, the head 2 is lowered in advance from the retracted position to a height where the chip 11 is positioned near the pressure surface of the tool 4. If the chip 11 can be sucked and held after the pressure surface of the tool 4 is cleaned by the cleaning means 8, for example, the head 2 moves in the direction of the cleaning means 8, the head 2, the cleaning means 8, and the chip transport The means 9 may be in any operation mode or any combination of operations.

そして、図5に示すように、チップ11がツール4の加圧面直下に到達するとチップ搬送手段9と清掃手段8は停止し、図6に示すように、ツール4の加圧面に開口した吸気孔5を通して空気吸引によってチップ11を吸着保持する。その後、ヘッド2はブラシ10がツール4の加圧面にて吸着保持したチップ11と接触しない高さ位置まで上昇した後、チップ搬送手段9と清掃手段8は元の待避位置へ戻る。   Then, as shown in FIG. 5, when the tip 11 reaches just below the pressurizing surface of the tool 4, the tip conveying means 9 and the cleaning means 8 are stopped, and as shown in FIG. The chip 11 is adsorbed and held by air suction through 5. After that, the head 2 moves up to a height position at which the brush 10 does not come into contact with the chip 11 held by suction on the pressure surface of the tool 4, and then the chip conveying means 9 and the cleaning means 8 return to the original retracted position.

図7は、ツール4に保持されたチップ11と、その下方に基板保持ステージ6に保持された基板14が配せられた状態において、両者間に、待避位置から2視野の認識手段7が挿入された状態を示す。上光軸7aでチップ11の第1認識マーク13を、下光軸7bで基板14の第2認識16を読み取る。第1認識マーク13および第2認識マーク16は、少なくとも2個以上設けられた態様であることが好ましい。また、図示は省略するが、読み取ったマークを、記憶手段で記憶し、演算手段に基づいて基板14の位置や向き(角度)を認識する。   FIG. 7 shows that the recognition means 7 with two fields of view is inserted between the chip 11 held by the tool 4 and the substrate 14 held by the substrate holding stage 6 below the chip 11 from the retracted position. Indicates the state that has been performed. The first recognition mark 13 of the chip 11 is read by the upper optical axis 7a, and the second recognition 16 of the substrate 14 is read by the lower optical axis 7b. It is preferable that at least two or more first recognition marks 13 and second recognition marks 16 are provided. Although not shown, the read mark is stored in the storage unit, and the position and orientation (angle) of the substrate 14 are recognized based on the calculation unit.

なお、基板実装面14a側を上面にし、その下面14b側から基板保持ステージ6上面に開口した吸引孔(図示略)を通して空気吸引によって吸着保持された基板14は、予め実装箇所に、たとえばACF、NCF、ACP、NCPなどの接着材が貼り付けまたは塗布されているが、塗布されていない場合であっても良い。   Note that the substrate 14 adsorbed and held by air suction through a suction hole (not shown) opened from the lower surface 14b side to the upper surface of the substrate holding stage 6 from the lower surface 14b side of the substrate mounting surface 14a side in advance, for example, ACF, An adhesive such as NCF, ACP, or NCP is attached or applied, but it may be not applied.

その後、図8に示すように、認識されたチップ11と基板14の相対位置および向き(相対角度)に基づいて、チップ11が、基板14の所定実装位置に位置するように、基板保持ステージ6が平行移動制御および回転制御することにより、アライメント(位置調整)され、2視野の認識手段7が退避位置へ退いた後、ヘッド2が降下して、加圧、加熱、たとえば超音波振動などによる微振動によって接合される。なお、接合手段としては、微振動、微振動および加圧、微振動および加熱など、どのような組み合わせの実装様態であっても良い。   Thereafter, as shown in FIG. 8, the substrate holding stage 6 is arranged so that the chip 11 is positioned at a predetermined mounting position of the substrate 14 based on the recognized relative position and orientation (relative angle) of the chip 11 and the substrate 14. Is aligned (position adjusted) by parallel movement control and rotation control, and after the two-field recognition means 7 retreats to the retracted position, the head 2 descends, and pressurization, heating, for example, by ultrasonic vibration, etc. Joined by slight vibration. Note that the bonding means may be any combination of mounting modes such as micro vibration, micro vibration and pressurization, micro vibration and heating.

なお、アライメント(位置調整)様態においても、ヘッド2側にて回転制御や平行移動制御するなど、チップ11と基板14がアライメント(位置調整)できれば、ヘッド2と基板保持ステージ6は、どのような動作様態あっても良く、どのような動作の組み合わせであっても良い。   Even in the alignment (position adjustment) mode, if the chip 11 and the substrate 14 can be aligned (position adjustment) such as rotation control or parallel movement control on the head 2 side, the head 2 and the substrate holding stage 6 can be any type. There may be an operation mode or any combination of operations.

いずれのアライメント(位置調整)態様であっても、2視野の認識手段7、記憶手段および演算手段によって、チップ11と基板14の位置と向き(角度)は、各々、認識されているので、これらの位置と向き(角度)を基準に、ヘッド2および/または基板保持ステージ6を制御することによって、基板14の任意な所定位置にチップ11を位置合わせすることができ、チップ11を基板14の所定実装位置に、位置ズレのない高精度な実装を行うことができる。
(実施の形態2)
清掃手段8において、実施の形態1ではブラシ10によるツール4の加圧面を清掃する様態を記載したが、ブラシ10の1種だけでなく、その他の清掃手段を組み合わせた複数の清掃様態を、図9〜13にて説明する。
In any alignment (position adjustment) mode, the positions and orientations (angles) of the chip 11 and the substrate 14 are recognized by the two visual field recognition means 7, the storage means, and the calculation means. By controlling the head 2 and / or the substrate holding stage 6 with reference to the position and orientation (angle) of the substrate 11, the chip 11 can be aligned with an arbitrary predetermined position of the substrate 14. It is possible to perform highly accurate mounting at a predetermined mounting position with no positional deviation.
(Embodiment 2)
In the cleaning unit 8, the mode of cleaning the pressure surface of the tool 4 by the brush 10 is described in the first embodiment. However, not only one type of the brush 10 but also a plurality of cleaning modes combining other cleaning units are illustrated. This will be described in 9-13.

なお、清掃手段8以外の構成および動作様態については実施の形態1と同じである。したがって、チップ搬送手段9と清掃手段8がツール4の加圧面直下付近に近づき、清掃手段8によるツール4の加圧面の清掃からチップ11が吸着保持されるまでの説明とする。   The configuration and operation mode other than the cleaning unit 8 are the same as those in the first embodiment. Therefore, the description will be made from the time when the tip conveying means 9 and the cleaning means 8 approach the vicinity immediately below the pressing surface of the tool 4 until the tip 11 is sucked and held after the cleaning means 8 cleans the pressing surface of the tool 4.

図9は、ブラシ10とチップ搬送手段9の間に、清掃手段8上面に開口した吹き出し孔18から空気17を勢いよく吹き出す形態に構成されている。   FIG. 9 is configured in such a manner that air 17 is blown out vigorously between the brush 10 and the chip conveying means 9 from the blowing hole 18 opened on the upper surface of the cleaning means 8.

まず、チップ搬送手段9と清掃手段8が平行移動することによりブラシ10によってツール4の加圧面が清掃され、チップ11がツール4の加圧面直下に到達するとチップ搬送手段9と清掃手段8は停止し、ツール4の加圧面に開口した吸気孔5を通して空気吸引によってチップ11を吸着保持する。   First, the pressure conveying surface of the tool 4 is cleaned by the brush 10 by the parallel movement of the chip conveying means 9 and the cleaning means 8, and the chip conveying means 9 and the cleaning means 8 are stopped when the chip 11 reaches just below the pressure surface of the tool 4. Then, the chip 11 is sucked and held by air suction through the suction hole 5 opened in the pressing surface of the tool 4.

そして、ヘッド2はブラシ10がツール4の加圧面にて吸着保持したチップ11と接触しない高さ位置まで上昇した後、チップ搬送手段9と清掃手段8が元の待避位置へ戻る際、吹き出し孔18から空気17を吹き出しながら退避する。よって、ツール4の加圧面およびチップ11のフェイスアップ面11aを空気17によって清掃されるため、チッピングなどの塵を、より精度よく除去することができる。   Then, the head 2 rises to a height position at which the brush 10 does not come into contact with the chip 11 held by suction on the pressing surface of the tool 4, and then the blowout hole when the chip transport means 9 and the cleaning means 8 return to the original retracted position. The air 17 is retreated while blowing out the air 17. Therefore, since the pressure surface of the tool 4 and the face-up surface 11a of the chip 11 are cleaned by the air 17, dust such as chipping can be more accurately removed.

なお、空気17は、チップ搬送手段9と清掃手段8が元の待避位置へ戻る際、吹き出し孔18から空気17が吹き出される様態だけでなく、ブラシ10がツール4の加圧面を清掃する際、空気17も吹き出しながら清掃する様態であっても良い。   The air 17 is not only in a state where the air 17 is blown out from the blowing hole 18 when the chip conveying means 9 and the cleaning means 8 return to the original retracted position, but also when the brush 10 cleans the pressure surface of the tool 4. The air 17 may be cleaned while being blown out.

図10は、図9において吹き出し孔18から空気17を吹き出す形態に代えてゴムブレード19を搬送されるチップ11よりも高くなるように設けられた形態を示す。なお、ゴムブレード19はシリコンゴムであるが、耐熱性と耐久性に優れたゴムであればシリコン以外のゴムであっても良い。   FIG. 10 shows a form in which the rubber blade 19 is provided so as to be higher than the chip 11 that is conveyed instead of the form in which the air 17 is blown out from the blowout hole 18 in FIG. 9. The rubber blade 19 is silicon rubber, but rubber other than silicon may be used as long as it has excellent heat resistance and durability.

なお、ゴムブレード19はゴムホルダ19aによって固定されているが、チップ11がツール4の加圧面4aに保持されるごとに確実に清掃するため、半永久的に使用することは難しい。そのためゴムブレード19とゴムホルダ19aは清掃手段8から自由に脱着可能な形態に設けられている。また、清掃手段8自身が搬送手段9と自由に脱着できる形態であっても良い。   Although the rubber blade 19 is fixed by the rubber holder 19a, it is difficult to use semipermanently because the chip 11 is reliably cleaned every time the chip 11 is held on the pressing surface 4a of the tool 4. Therefore, the rubber blade 19 and the rubber holder 19a are provided in a form that can be freely detached from the cleaning means 8. Moreover, the form which the cleaning means 8 itself can be freely attached or detached with the conveyance means 9 may be sufficient.

また、図11に示すように、図10におけるブラシ10とブラシホルダ10a部を排除したゴムブレード19のみを設けた形態であっても良い。   Moreover, as shown in FIG. 11, the form which provided only the rubber blade 19 which excluded the brush 10 and the brush holder 10a part in FIG. 10 may be sufficient.

図12は、ブラシ10と吹き出し孔18の間に、チップ4が載せられた形態に構成されている。まず、チップ搬送手段9と清掃手段8が平行移動することによりブラシ10によってツール4の加圧面が清掃され、チップ11がツール4の加圧面直下に到達するとチップ搬送手段9と清掃手段8は停止し、ツール4の加圧面に開口した吸気孔5を通して空気吸引によってチップ11を吸着保持する。その後、吹き出し孔18から空気17を吹き出しながら、チップ搬送手段9と清掃手段9が更に平行移動したあと停止し、ヘッド2はブラシ10がツール4の加圧面にて吸着保持したチップ11と接触しない高さ位置まで上昇した後、チップ搬送手段9と清掃手段8が元の待避位置へ戻る際、吹き出し孔18から空気17を吹き出しながら退避する。   FIG. 12 shows a configuration in which the chip 4 is placed between the brush 10 and the blowout hole 18. First, the pressure conveying surface of the tool 4 is cleaned by the brush 10 by the parallel movement of the chip conveying means 9 and the cleaning means 8, and the chip conveying means 9 and the cleaning means 8 are stopped when the chip 11 reaches just below the pressure surface of the tool 4. Then, the chip 11 is sucked and held by air suction through the suction hole 5 opened in the pressing surface of the tool 4. Thereafter, while the air is blown out from the blowing hole 18, the tip conveying means 9 and the cleaning means 9 are further moved in parallel and then stopped, and the head 2 does not come into contact with the tip 11 that the brush 10 sucks and holds on the pressure surface of the tool 4. After rising to the height position, when the chip conveying means 9 and the cleaning means 8 return to the original retracted position, the air 17 is retreated while being blown out from the blowing holes 18.

図13は、図11においてゴムブレード19に代えて複数のローラとふき取りシートによって構成された形態を示す。ツール4の加圧面4aを清掃するふき取りシート23はシリコンシートであるが、耐熱性と耐久性に優れシートであればシリコン以外のシートであっても良い。   FIG. 13 shows a form constituted by a plurality of rollers and a wiping sheet instead of the rubber blade 19 in FIG. The wiping sheet 23 for cleaning the pressing surface 4a of the tool 4 is a silicon sheet, but may be a sheet other than silicon as long as it has excellent heat resistance and durability.

また、ふき取りシート23は、送りローラ21からスポンジローラ20を経由し、巻き取りローラ22にて巻き取る形態になっているが、送りローラ21と巻き取りローラ22の配置は逆であっても良い。なお、巻き取り動作は周期的、チップ11がツール4の加圧面4aに保持される毎など、どのような動作様態であっても良い。なお、スポンジローラ20における清掃部20aは搬送されるチップ11よりも高くなるように設けられている。   Further, the wiping sheet 23 is wound from the feed roller 21 via the sponge roller 20 by the take-up roller 22, but the arrangement of the feed roller 21 and the take-up roller 22 may be reversed. . Note that the winding operation may be any operation mode such as periodic, every time the chip 11 is held on the pressing surface 4 a of the tool 4. In addition, the cleaning part 20a in the sponge roller 20 is provided so as to be higher than the chip 11 to be conveyed.

なお、ツール4の加圧面4aを清掃する際、ローラ20、21、22は停止(ふき取りシート23も停止)した状態で清掃するが、ローラ20、21、22、ふき取りシート23が巻き取り方向へ動作しながらツール4の加圧面4aを清掃する形態であってもよく、送りローラ21と巻き取りローラ22の配置が逆の際も同様に巻き取り方向へ動作しながら清掃する形態であっても良い。   When cleaning the pressing surface 4a of the tool 4, the rollers 20, 21, and 22 are cleaned in a stopped state (the wiping sheet 23 is also stopped), but the rollers 20, 21, 22, and the wiping sheet 23 are in the winding direction. It may be configured to clean the pressing surface 4a of the tool 4 while operating, or may be configured to clean while operating in the winding direction even when the arrangement of the feeding roller 21 and the winding roller 22 is reversed. good.

なお、たとえばブラシ、空気吹き出し口など、その他の清掃手段と組み合わせた形態であっても良く、清掃手段についてはチッピングなどの塵片を除去できれば実施の形態1、実施の形態2に記載した以外の構成および組み合わせであっても良い。   For example, it may be combined with other cleaning means such as a brush or an air outlet, and the cleaning means other than those described in the first and second embodiments as long as dust particles such as chipping can be removed. It may be a configuration and a combination.

なお、図示は省略するが、実施の形態1、実施の形態2に限らず、清掃手段8による清掃によって除去されるチッピングなどの塵が飛び散らないように、チップ搬送手段9や清掃手段8に塵吸引手段を設けても良い。なお、塵吸引手段はチップ搬送手段9や清掃手段8と一体型に設けた形態だけでなく、独立して動作制御可能な形態に設けても良い。   Although not shown in the drawings, the present invention is not limited to the first and second embodiments, and the dust is not applied to the chip conveying means 9 or the cleaning means 8 so that dust such as chipping removed by cleaning by the cleaning means 8 is not scattered. A suction means may be provided. The dust suction means may be provided not only in the form of being integrated with the chip transfer means 9 and the cleaning means 8, but in a form in which the operation can be controlled independently.

本発明の一実施態様に係る実装装置の概略構成図を示す。The schematic block diagram of the mounting apparatus which concerns on one embodiment of this invention is shown. チップと基板の概略図を示す。A schematic diagram of a chip and a substrate is shown. チップ搬送手段と清掃手段がツール加圧面下方へ移動している状態を示した概略様態図を示す。FIG. 3 is a schematic view showing a state in which the chip conveying means and the cleaning means are moving below the tool pressing surface. 清掃手段がツール加圧面を清掃している状態を示した概略様態図を示す。The schematic state figure which showed the state which the cleaning means is cleaning the tool pressurization surface is shown. チップ搬送手段と清掃手段が停止した状態の概略様態図を示す。FIG. 2 is a schematic view showing a state in which the chip conveying means and the cleaning means are stopped. チップ搬送手段と清掃手段が元の退避位置方向へ移動している状態を示した概略様態図を示す。FIG. 3 is a schematic view showing a state in which the chip conveying means and the cleaning means are moving in the direction of the original retracted position. チップと基板の各認識マークを認識手段で認識している状態を示した概略様態図を示す。FIG. 3 is a schematic view showing a state in which each recognition mark on the chip and the substrate is recognized by a recognition means. チップと基板を接合している状態を示した概略様態図を示す。FIG. 2 is a schematic view showing a state in which the chip and the substrate are bonded together. 清掃手段にブラシと空気吹き出し孔を設けた概略構成図を示す。The schematic block diagram which provided the brush and the air blowing hole in the cleaning means is shown. 清掃手段にブラシとゴムブレードを設けた概略構成図を示す。The schematic block diagram which provided the brush and the rubber blade in the cleaning means is shown. 清掃手段にゴムブレードを設けた概略構成図を示す。The schematic block diagram which provided the rubber blade in the cleaning means is shown. 清掃手段にブラシと空気吹き出し孔を設けた概略構成図を示す。The schematic block diagram which provided the brush and the air blowing hole in the cleaning means is shown. 清掃手段に複数のローラとふき取りシートを設けた概略構成図を示す。The schematic block diagram which provided the some roller and the wiping sheet | seat in the cleaning means is shown. バリを有したチップの概略図を示す。A schematic view of a chip having burrs is shown. 従来技術におけるチップと基板を接合している状態を示した概略様態図を示す。The general | schematic aspect figure which showed the state which has joined the chip | tip and board | substrate in a prior art is shown. チッピングがツールに付着した状態を示した概略様態図を示す。FIG. 3 is a schematic view showing a state in which chipping is attached to the tool.

符号の説明Explanation of symbols

1 実装装置
2 ヘッド
3 微振動手段
4 ツール
4a 加圧面
5 吸気孔
6 基板保持ステージ
7 2視野の認識手段
7a 上光軸
7b 下光軸
8 清掃手段
9 チップ搬送手段
10 ブラシ
10a ブラシホルダ
11 チップ
11a フェイスアップ面
11b フェイスダウン面
12 バンプ
13 第1認識マーク
14 基板
14a 実装面
14b 下面
15 パッド
16 第2認識マーク
17 空気
18 吹き出し孔
19 ゴムブレード
19a ゴムホルダ
20 スポンジローラ
21 送りローラ
22 巻き取りローラ
23 ふき取りシート
100 チップ
100a フェイスアップ面
100b フェイスダウン面
101 バンプ
102 チッピング
103 基板
104 パッド
105 ツール
105a ツール加圧面
106 基板保持ステージ
107 実装装置
200 加圧
201 微振動
DESCRIPTION OF SYMBOLS 1 Mounting apparatus 2 Head 3 Fine vibration means 4 Tool 4a Pressurization surface 5 Air intake hole 6 Substrate holding stage 7 2 Field recognition means 7a Upper optical axis 7b Lower optical axis 8 Cleaning means 9 Chip conveying means 10 Brush 10a Brush holder 11 Tip 11a Face-up surface 11b Face-down surface 12 Bump 13 First recognition mark 14 Substrate 14a Mounting surface 14b Lower surface 15 Pad 16 Second recognition mark 17 Air 18 Blowout hole 19 Rubber blade 19a Rubber holder 20 Sponge roller 21 Feed roller 22 Take-up roller 23 Wipe off Sheet 100 Chip 100a Face-up surface 100b Face-down surface 101 Bump 102 Chipping 103 Substrate 104 Pad 105 Tool 105a Tool pressing surface 106 Substrate holding stage 107 Mounting device 2 0 pressure 201 micro-vibration

Claims (8)

微振動手段を有したヘッドに保持された第1被接合物とステージに保持された第2被接合物同士を接合する際、前記微振動手段を有したヘッドの第1被接合物保持面を清掃する方法であって、
微振動手段を有したヘッドに保持された第1被接合物とステージに保持された第2被接合物を認識手段によって認識する工程と、
前記第1被接合物と前記第2被接合物を位置合わせ工程後、前記微振動手段により接合する工程と、
前記第1被接合物と前記第2被接合物の接合ごとに前記微振動手段を有したヘッドの第1被接合物保持面を清掃手段によって清掃する工程とを行うことを特徴とする実装方法。
When the first workpiece held by the head having the fine vibration means and the second workpiece held by the stage are bonded to each other, the first workpiece holding surface of the head having the fine vibration means is used. A method of cleaning,
A step of recognizing the first object to be bonded held by the head having the fine vibration means and the second object to be bonded held by the stage by the recognition means;
Bonding the first object to be bonded and the second object to be bonded by the fine vibration means after the alignment step;
And a step of cleaning the first bonded object holding surface of the head having the fine vibration means by the cleaning means for each bonding of the first bonded object and the second bonded object. .
前記微振動手段により接合する工程が、超音波振動により接合する工程であることを特徴とする請求項1に記載の実装方法。   The mounting method according to claim 1, wherein the step of bonding by the fine vibration means is a step of bonding by ultrasonic vibration. 前記清掃手段によって清掃する工程が、ブラシで清掃する工程であることを特徴とする請求項1または2に記載の実装方法。   The mounting method according to claim 1, wherein the step of cleaning by the cleaning unit is a step of cleaning with a brush. 前記清掃手段によって清掃する工程と第1被接合物の搬送工程が共に行われることを特徴とする請求項1、2または3に記載の実装方法。   The mounting method according to claim 1, wherein the cleaning step and the transporting step of the first object are performed together. 微振動手段を有したヘッドに保持された第1被接合物とステージに保持された第2被接合物同士を接合する際、前記微振動手段を有したヘッドの第1被接合物保持面を清掃する装置であって、
微振動手段を有したヘッドに保持された第1被接合物とステージに保持された第2被接合物を認識する認識手段と、
前記第1被接合物と前記第2被接合物を位置合わせ手段によって位置合わせした後、接合する接合手段と、
前記微振動手段を有したヘッドの第1被接合物保持面を清掃する清掃手段を有し、
前記第1被接合物と前記第2被接合物の接合ごとに前記清掃手段によって前記微振動手段を有したヘッドの第1被接合物保持面を清掃することを特徴とする実装装置。
When the first workpiece held by the head having the fine vibration means and the second workpiece held by the stage are bonded to each other, the first workpiece holding surface of the head having the fine vibration means is used. A device for cleaning,
Recognizing means for recognizing a first object to be joined held by a head having fine vibration means and a second object to be joined held by the stage;
A joining means for joining the first article to be joined and the second article to be joined by aligning means;
A cleaning means for cleaning the first workpiece holding surface of the head having the fine vibration means;
A mounting apparatus, wherein the first bonded object holding surface of the head having the fine vibration means is cleaned by the cleaning means for each bonding of the first bonded object and the second bonded object.
前記微振動手段を有したヘッドに設けられた微振動手段は、超音波振動であることを特徴とする請求項5に記載の実装装置。   6. The mounting apparatus according to claim 5, wherein the fine vibration means provided in the head having the fine vibration means is ultrasonic vibration. 前記清掃手段は、ブラシであることを特徴とする請求項5または6に記載の実装装置。   The mounting apparatus according to claim 5, wherein the cleaning unit is a brush. 前記清掃手段は、搬送手段の直近に配置されていることを特徴とする請求項5、6または7に記載の実装装置。   The mounting apparatus according to claim 5, wherein the cleaning unit is disposed in the immediate vicinity of the conveying unit.
JP2003404332A 2003-12-03 2003-12-03 Cleaning method of head pressure surface Expired - Fee Related JP3929436B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003404332A JP3929436B2 (en) 2003-12-03 2003-12-03 Cleaning method of head pressure surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003404332A JP3929436B2 (en) 2003-12-03 2003-12-03 Cleaning method of head pressure surface

Publications (3)

Publication Number Publication Date
JP2005166993A true JP2005166993A (en) 2005-06-23
JP2005166993A5 JP2005166993A5 (en) 2005-10-06
JP3929436B2 JP3929436B2 (en) 2007-06-13

Family

ID=34727350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003404332A Expired - Fee Related JP3929436B2 (en) 2003-12-03 2003-12-03 Cleaning method of head pressure surface

Country Status (1)

Country Link
JP (1) JP3929436B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007088150A (en) * 2005-09-21 2007-04-05 Shibaura Mechatronics Corp Mounting device of electronic component, and cleaning method therefor
JP2008311549A (en) * 2007-06-18 2008-12-25 Fuji Mach Mfg Co Ltd Nozzle cleaning system and nozzle cleaning unit, and nozzle cleaning method
CN105405774A (en) * 2014-09-10 2016-03-16 捷进科技有限公司 Bar chip joining device and joining method
KR20180108396A (en) * 2017-03-23 2018-10-04 파스포드 테크놀로지 주식회사 Die bonding device and method of manufacturing semiconductor device
CN111739833A (en) * 2020-07-06 2020-10-02 颀中科技(苏州)有限公司 Chip crimping joint vacuum hole through hole device

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007088150A (en) * 2005-09-21 2007-04-05 Shibaura Mechatronics Corp Mounting device of electronic component, and cleaning method therefor
JP4694928B2 (en) * 2005-09-21 2011-06-08 芝浦メカトロニクス株式会社 Electronic component mounting apparatus and mounting apparatus cleaning method
JP2008311549A (en) * 2007-06-18 2008-12-25 Fuji Mach Mfg Co Ltd Nozzle cleaning system and nozzle cleaning unit, and nozzle cleaning method
CN105405774A (en) * 2014-09-10 2016-03-16 捷进科技有限公司 Bar chip joining device and joining method
JP2016058575A (en) * 2014-09-10 2016-04-21 ファスフォードテクノロジ株式会社 Die bonder and bonding method
TWI575613B (en) * 2014-09-10 2017-03-21 捷進科技有限公司 Grain adapter and bonding method
TWI626696B (en) * 2014-09-10 2018-06-11 捷進科技有限公司 Die splicer
KR101938476B1 (en) * 2014-09-10 2019-01-14 파스포드 테크놀로지 주식회사 Die bonder and bonding method
KR20180108396A (en) * 2017-03-23 2018-10-04 파스포드 테크놀로지 주식회사 Die bonding device and method of manufacturing semiconductor device
KR102007574B1 (en) 2017-03-23 2019-08-05 파스포드 테크놀로지 주식회사 Die bonding device and method of manufacturing semiconductor device
CN111739833A (en) * 2020-07-06 2020-10-02 颀中科技(苏州)有限公司 Chip crimping joint vacuum hole through hole device
CN111739833B (en) * 2020-07-06 2022-04-08 颀中科技(苏州)有限公司 Chip crimping joint vacuum hole through hole device

Also Published As

Publication number Publication date
JP3929436B2 (en) 2007-06-13

Similar Documents

Publication Publication Date Title
KR101938476B1 (en) Die bonder and bonding method
KR100638760B1 (en) Semiconductor device and its manufacturing method
JP6086763B2 (en) Collet cleaning method and die bonder using the same
KR20050028802A (en) Method of manufacturing semiconductor device
JP2009064905A (en) Extension method and extension apparatus
KR20180100363A (en) Electronic parts handling unit
KR102391515B1 (en) Cleaning apparatus for wire clamp and cleaning system including the cleaning apparatus
US6706130B1 (en) Method and device for frictional connection and holding tool used for the frictional connection device
JP3929436B2 (en) Cleaning method of head pressure surface
JP2010161211A (en) Method and device for manufacturing semiconductor device
JP4412051B2 (en) Electronic component mounting apparatus and electronic component mounting method
JP3583868B2 (en) Bonding equipment
JP4364755B2 (en) Electronic component mounting apparatus and mounting apparatus cleaning method
TW516137B (en) Single-point bonding apparatus
JP2006013466A (en) Method of cleaning mounting-nozzle, and its equipment
JP2006269741A (en) Mounting device for electronic component and cleaning method for mounting device
JP5663764B2 (en) Joining device
US20020125303A1 (en) Bonding method and apparatus
JP4694928B2 (en) Electronic component mounting apparatus and mounting apparatus cleaning method
JP4507941B2 (en) Method for manufacturing ultrasonic bonding apparatus
JP2009117867A (en) Method of manufacturing semiconductor apparatus
JP4232752B2 (en) Electronic component mounting apparatus and electronic component mounting method
JP4798441B2 (en) Wafer transfer method and wafer transfer unit
JP2008140931A (en) Electronic component mounting apparatus, and method of cleaning mounting apparatus
JP2007035821A (en) Component-packaging apparatus and component-packaging method

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050811

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050811

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20061222

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20061226

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070213

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20070306

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20070306

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100316

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110316

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120316

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120316

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130316

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140316

Year of fee payment: 7

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees