JP2005166897A5 - - Google Patents

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Publication number
JP2005166897A5
JP2005166897A5 JP2003402900A JP2003402900A JP2005166897A5 JP 2005166897 A5 JP2005166897 A5 JP 2005166897A5 JP 2003402900 A JP2003402900 A JP 2003402900A JP 2003402900 A JP2003402900 A JP 2003402900A JP 2005166897 A5 JP2005166897 A5 JP 2005166897A5
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JP
Japan
Prior art keywords
exposure apparatus
motor
flange
space
housing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003402900A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005166897A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2003402900A priority Critical patent/JP2005166897A/ja
Priority claimed from JP2003402900A external-priority patent/JP2005166897A/ja
Priority to US10/998,736 priority patent/US7110088B2/en
Publication of JP2005166897A publication Critical patent/JP2005166897A/ja
Publication of JP2005166897A5 publication Critical patent/JP2005166897A5/ja
Pending legal-status Critical Current

Links

JP2003402900A 2003-12-02 2003-12-02 露光装置 Pending JP2005166897A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003402900A JP2005166897A (ja) 2003-12-02 2003-12-02 露光装置
US10/998,736 US7110088B2 (en) 2003-12-02 2004-11-30 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003402900A JP2005166897A (ja) 2003-12-02 2003-12-02 露光装置

Publications (2)

Publication Number Publication Date
JP2005166897A JP2005166897A (ja) 2005-06-23
JP2005166897A5 true JP2005166897A5 (cg-RX-API-DMAC7.html) 2007-01-25

Family

ID=34616763

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003402900A Pending JP2005166897A (ja) 2003-12-02 2003-12-02 露光装置

Country Status (2)

Country Link
US (1) US7110088B2 (cg-RX-API-DMAC7.html)
JP (1) JP2005166897A (cg-RX-API-DMAC7.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006049815A (ja) * 2004-07-02 2006-02-16 Canon Inc 露光装置
JP5023064B2 (ja) 2005-09-13 2012-09-12 カール・ツァイス・エスエムティー・ゲーエムベーハー 露光工程のための光学要素ユニット
DE102007051669A1 (de) * 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
US8467034B2 (en) * 2008-07-02 2013-06-18 Nikon Corporation Light shielding unit, variable slit apparatus, and exposure apparatus
KR101399303B1 (ko) * 2008-12-05 2014-05-26 엘지디스플레이 주식회사 평판표시장치용 노광장비

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3282222B2 (ja) 1992-07-07 2002-05-13 株式会社ニコン 投影光学装置、及び該装置を用いる素子製造方法
US6078380A (en) * 1991-10-08 2000-06-20 Nikon Corporation Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure
EP1075017A4 (en) * 1998-03-31 2005-04-20 Nikon Corp OPTICAL DEVICE AND EXPOSURE SYSTEM EQUIPPED WITH THE OPTICAL DEVICE
US6333775B1 (en) * 1999-01-13 2001-12-25 Euv Llc Extreme-UV lithography vacuum chamber zone seal
KR20010112265A (ko) * 1999-02-12 2001-12-20 시마무라 테루오 노광방법 및 장치
JP2001345263A (ja) * 2000-03-31 2001-12-14 Nikon Corp 露光装置及び露光方法、並びにデバイス製造方法

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