JP2005166750A - Method and apparatus for repairing wiring - Google Patents

Method and apparatus for repairing wiring Download PDF

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JP2005166750A
JP2005166750A JP2003400425A JP2003400425A JP2005166750A JP 2005166750 A JP2005166750 A JP 2005166750A JP 2003400425 A JP2003400425 A JP 2003400425A JP 2003400425 A JP2003400425 A JP 2003400425A JP 2005166750 A JP2005166750 A JP 2005166750A
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wiring
masking agent
conductive substance
solution containing
disconnection
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JP4370151B2 (en
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Michinobu Mizumura
通伸 水村
Koichi Kajiyama
康一 梶山
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V Technology Co Ltd
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V Technology Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To realize repairing of the disconnected part of the wiring of an electronic circuit substrate by bringing the disconnected part of the wiring into coincidence with the size and the shape of the wiring into coincidence accurately. <P>SOLUTION: A method of repairing the wiring for connecting the disconnected part of the wiring includes a step of applying a masking reagent 16 over a region larger than the disconnected part 15c of the wiring part 15a of the wiring 15 formed on the electronic circuit substrate (work) W as seen in plane and irradiating with a laser beam L, a step of removing the masking reagent 16 of the wiring region 17 including the disconnected part 15c, then a step of coating the wiring region 17 from which the masking reagent 16 is removed with a metal colloid, etc. 19, a step of depositing the metal thin film 20 by irradiating the metal colloid, etc. 19 with the laser beam L to heat the metal colloid, etc. 19, and a step of connecting the disconnected part 15c. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、液晶パネル、半導体基板、プリント配線基板等の電子回路基板上に形成された配線の断線を補修する配線補修方法および配線補修装置に関するものである。   The present invention relates to a wiring repair method and a wiring repair apparatus for repairing a disconnection of a wiring formed on an electronic circuit board such as a liquid crystal panel, a semiconductor substrate, and a printed wiring board.

従来、この種の配線補修方法として、電子回路基板上の配線の断線部に、パラジウム、金、銀、白金の一種以上の金属を含む金属錯体溶液を射出器により塗布した後に、該塗布部にレーザ座光を照射し、前記金属錯体溶液中の溶媒を蒸発させて前記金属の薄膜を前記断線部に析出させることにより、前記金属の薄膜により前記断線部の両端側の配線同士を接続、導通させる方法が知られている(例えば、特許文献1参照)。
また、電子回路基板上の断線部を有する配線上を該断線部とその両端部側の配線部とにわたってガラスピペットを移動させながら、該ガラスピペットの先端から金属錯体溶液を吐出させて前記断線部およびその両端部の配線部に塗布した後、該塗布部にレーザ光を照射して加熱して金属錯体溶液中の溶媒を蒸発させると同時に、塗布部に残留した金属錯体を熱分解して前記金属の導電性薄膜を形成することにより、配線の断線部を修復する方法がが知られている(例えば、特許文献2参照)。
特開平7−29982号公報 特開平9−135064号公報
Conventionally, as a wiring repair method of this type, a metal complex solution containing one or more metals of palladium, gold, silver, and platinum is applied to the disconnection portion of the wiring on the electronic circuit board by an injector, and then applied to the application portion. By irradiating laser spot light, evaporating the solvent in the metal complex solution and precipitating the metal thin film on the disconnection part, the wires on both ends of the disconnection part are connected and connected by the metal thin film. The method of making it known is known (for example, refer patent document 1).
In addition, while moving the glass pipette over the wiring having the disconnection part on the electronic circuit board over the disconnection part and the wiring part on both ends thereof, the metal complex solution is discharged from the tip of the glass pipette to thereby disconnect the disconnection part. And coating the wiring portions at both ends thereof, the coating portion is irradiated with laser light and heated to evaporate the solvent in the metal complex solution, and at the same time, the metal complex remaining in the coating portion is thermally decomposed to There is known a method of repairing a disconnected portion of a wiring by forming a metal conductive thin film (see, for example, Patent Document 2).
JP-A-7-29982 JP-A-9-133504

上記従来の配線の補修方法では、射出器やガラスピペットから配線の断線部に塗布される金属錯体溶液が、断線部だけでなく、その両端側の配線部の上側に塗布されたり、隣接する電極や配線側に膨らんで塗布される場合があり、その場合には、配線補修部とその周辺部に形成される導電性薄膜を含む電導体の厚さや幅が配線の他の部分に対して均等にならず、配線補修部を有する配線の抵抗値が配線補修部を有しない配線の抵抗値と異なってしまい、電子回路基板の配線パターンの電気容量が設計値と一致しなくなるという不都合が生じる。
また、配線の断線部に塗布される金属錯体溶液が、断線部だけでなく、隣接する電極や配線側に及んで塗布される場合もあり、その場合には、配線補修部とその周辺部に形成される導電性薄膜を含む電導体によって補修部を有する配線が隣接する配線に短絡することになるので、その短絡部をレーザ光を照射して切り離したり、隣接する配線における前記短絡部との接続部分側の一定領域をレーザ光の照射により加工して、前記隣接する配線から前記短絡部分を切り離す等の付加的な処理をしなければならず、配線の補修工数が多くかかる上に、隣接する配線側の電気抵抗が変化してしまい、前記と同様に、電子回路基板の配線パターンの電気容量が設計値と一致しなくなる等の問題がある。
In the above conventional wiring repair method, the metal complex solution applied to the disconnection part of the wiring from the injector or glass pipette is applied not only to the disconnection part but also to the upper side of the wiring part on both ends thereof, or adjacent electrodes. In such a case, the thickness and width of the conductor including the conductive thin film formed in the wiring repair portion and the peripheral portion thereof are equal to the other portions of the wiring. In other words, the resistance value of the wiring having the wiring repairing portion is different from the resistance value of the wiring not having the wiring repairing portion, and the electric capacity of the wiring pattern of the electronic circuit board does not match the design value.
In addition, the metal complex solution applied to the disconnection part of the wiring may be applied not only to the disconnection part but also to the adjacent electrode and the wiring side. Since the wiring having the repaired portion is short-circuited to the adjacent wiring by the conductor including the conductive thin film to be formed, the short-circuited portion is separated by irradiating laser light, or the short-circuited portion in the adjacent wiring A certain area on the connection part side must be processed by laser light irradiation to perform additional processing such as separating the short-circuited part from the adjacent wiring. As a result, the electric resistance of the wiring pattern of the electronic circuit board does not match the design value.

本発明は、上記事情に鑑みてなされたものであって、電子回路基板の配線の断線部を、前記配線の寸法、形状に正確に一致させて補修することができる配線補修方法および配線補修装置を提供することを目的とする。   The present invention has been made in view of the above circumstances, and a wiring repair method and a wiring repair apparatus capable of repairing a broken portion of a wiring of an electronic circuit board by accurately matching the size and shape of the wiring. The purpose is to provide.

本発明は、前記課題を解決するために、以下の点を特徴としている。
すなわち、請求項1に係る配線補修方法および請求項6に係る配線補修装置は、電子回路基板上に形成された配線の断線部に、平面視で、その断線部より広い領域にわたってマスキング剤を塗布してレーザ光を照射し、前記断線部を含む配線領域のマスキング剤を除去した後に、該マスキング剤を除去された配線領域に導電性のある物質を含んだ溶液を塗布すると共に、該導電性のある物質を含んだ溶液にレーザ光を照射して加熱することにより導電性のある物質の薄膜を析出させて前記断線部を接続することを特徴としている。
The present invention is characterized by the following points in order to solve the above problems.
That is, the wiring repair method according to claim 1 and the wiring repair device according to claim 6 apply a masking agent to a broken portion of the wiring formed on the electronic circuit board over a wider area in plan view. Then, after irradiating the laser beam and removing the masking agent in the wiring region including the disconnection portion, a solution containing a conductive substance is applied to the wiring region from which the masking agent has been removed, and the conductive A solution containing a certain substance is irradiated with a laser beam and heated to deposit a thin film of a conductive substance to connect the disconnected portion.

この配線補修方法においては、検査装置によって電子回路基板の配線の断線部が検出されると、平面視で該断線部を含んでそれより広い領域にマスキング剤が第1の塗布装置によって塗布された後、レーザ照射装置によって前記マスキング剤にレーザ光が照射されて、断線部を含む所定の配線領域におけるマスキング剤が除去される。次に、そのマスキング剤が除去された領域に、第2の塗布装置によって導電性のある物質(例えば貴金属)を含んだ溶液が塗布されると共に、塗布された導電性のある物質を含んだ溶液に前記レーザ照射装置によってレーザ光が照射されて、該導電性のある物質を含んだ溶液が加熱されることにより、導電性のある物質を含んだ溶液中の溶剤が蒸発して導電性のある物質の薄膜が析出し、この析出された導電性のある物質の薄膜によって前記断線部が接続されて補修される。   In this wiring repair method, when the disconnection portion of the wiring of the electronic circuit board is detected by the inspection device, the masking agent is applied to the wider area including the disconnection portion in plan view by the first coating device. Thereafter, the masking agent is irradiated with laser light by a laser irradiation device, and the masking agent in a predetermined wiring region including the disconnected portion is removed. Next, a solution containing a conductive substance (for example, a noble metal) is applied to the region from which the masking agent has been removed by the second coating apparatus, and the solution containing the applied conductive substance is applied. When the laser irradiation device is irradiated with laser light and the solution containing the conductive substance is heated, the solvent in the solution containing the conductive substance evaporates and becomes conductive. A thin film of material is deposited, and the disconnected portion is connected and repaired by the deposited thin film of conductive material.

請求項2に係る配線補修方法は、請求項1に記載の配線補修方法において、前記導電性のある物質を含んだ溶液にレーザ光を照射した後に電子回路基板上に残ったマスキング剤と導電性のある物質を含んだ溶液を洗浄して除去することを特徴としている。   The wiring repair method according to claim 2 is the wiring repair method according to claim 1, wherein the masking agent and the conductive material remaining on the electronic circuit board after irradiating the solution containing the conductive substance with laser light. It is characterized in that a solution containing a certain substance is removed by washing.

請求項3に係る配線補修方法は、請求項1または2に記載の配線補修方法において、前記導電性のある物質を含んだ溶液に対して前記断線部を含む配線領域の形状に整合する平面視で四辺形状に整形されたレーザ光を照射することを特徴としている。   The wiring repair method according to claim 3 is the wiring repair method according to claim 1 or 2, wherein the solution containing the conductive substance matches the shape of the wiring region including the disconnection portion in plan view. It is characterized by irradiating a laser beam shaped into a quadrilateral shape.

請求項4に係る配線補修方法は、請求項1〜3のいずれかに記載の配線補修方法において、前記マスキング剤と導電性のある物質を含んだ溶液をインクジェット装置によって塗布することを特徴としている。   A wiring repair method according to claim 4 is the wiring repair method according to any one of claims 1 to 3, wherein a solution containing the masking agent and a conductive substance is applied by an ink jet apparatus. .

請求項5に係る配線補修方法は、請求項1〜3のいずれかに記載の配線補修方法において、前記マスキング剤と導電性のある物質を含んだ溶液をディスペンサー装置によって塗布することを特徴としている。   The wiring repair method according to claim 5 is characterized in that, in the wiring repair method according to any one of claims 1 to 3, a solution containing the masking agent and a conductive substance is applied by a dispenser device. .

本発明によれば、以下の優れた効果を奏する。
請求項1に係る配線補修方法および請求項6に係る配線補修装置によれば、マスキング剤で囲まれて限定された断線部を含む配線領域に導電性のある物質を含んだ溶液が塗布されて、該導電性のある物質を含んだ溶液から析出されて形成された導電性のある物質の薄膜によって前記断線部が接続されるので、断線の接続部の形状が電子回路基板上の配線の形状に整合したものとすることができ、配線の補修をその形状の合わせて正確に行うことができる。
The present invention has the following excellent effects.
According to the wiring repair method according to claim 1 and the wiring repair device according to claim 6, a solution containing a conductive substance is applied to a wiring region including a limited disconnection portion surrounded by a masking agent. The disconnection portion is connected by a thin film of the conductive material formed by being deposited from the solution containing the conductive substance, so that the shape of the connection portion of the disconnection is the shape of the wiring on the electronic circuit board. Therefore, the wiring can be repaired accurately in accordance with its shape.

請求項2に係る配線補修方法によれば、配線の断線部の補修が終了した後に、電子回路基板上に残ったマスキング剤と断線の補修に使用されなかった導電性のある物質を含んだ溶液が除去されるので、断線を補修された電子回路基板を清浄に保つことができる。   According to the wiring repair method according to claim 2, a solution containing a masking agent remaining on the electronic circuit board and a conductive substance that has not been used for repairing the disconnection after the repair of the disconnection portion of the wiring is completed. Therefore, it is possible to keep the electronic circuit board whose wire breakage has been repaired clean.

請求項3に係る配線補修方法によれば、配線の断線部を含む配線領域の形状に整合した形状に導電性のある物質の薄膜を析出させて断線部を接続することができ、配線の補修を一層正確に行うことができる。
請求項4に係る配線補修方法によれば、インクジェット装置によってマスキング剤と導電性のある物質を含んだ溶液を、それぞれ、所定領域に無駄なく、適量、円滑に塗布することができる。
According to the wiring repair method according to claim 3, it is possible to deposit a thin film of a conductive substance in a shape matched with the shape of the wiring region including the wiring disconnection portion, and to connect the disconnection portion. Can be performed more accurately.
According to the wiring repair method of the fourth aspect, an appropriate amount and a smooth solution of the masking agent and the conductive substance containing the conductive material can be applied to the predetermined areas without waste using the inkjet apparatus.

請求項5に係る配線補修方法によれば、ディスペンサー装置によって粘度の高いマスキング剤と濃度の高い導電性ペーストを、それぞれ、所定領域に、それ以外の周辺にそれらの物質が広がることを可及的に少なくして的確に塗布することができる。   According to the wiring repair method according to the fifth aspect, it is possible to spread a high-viscosity masking agent and a high-concentration conductive paste to a predetermined region and other areas around the other by a dispenser device. It can be applied accurately with less.

以下、本発明の一実施の形態に係る配線補修方法および配線補修装置について、添付図面を参照して説明する。
先ず、本発明の一実施の形態に係る配線補修装置について説明する。図1において、1は配線補修装置である。この配線補修装置1は、四隅に配置された架台2を介して水平に支持されたテーブル3と、該テーブル3のX軸方向xにおける両端部に立設された一対の脚部4a,4aの上端部に、X軸方向xに向けたX軸ビーム部4bが連結され、テーブル上に載置された平板状の電子回路基板(ワーク)Wを跨ぐように設けられた門型のX軸フレーム4と、該X軸フレーム4のX軸ビーム部4bにX軸方向xに移動自在に支持されX軸スライダ5とを備えている。前記X軸フレーム4とX軸スライダ5とは前記テーブル3との間でX軸方向とこれに直角なY軸方向とに相対移動可能な支持フレームを構成している。
Hereinafter, a wiring repair method and a wiring repair apparatus according to an embodiment of the present invention will be described with reference to the accompanying drawings.
First, a wiring repair device according to an embodiment of the present invention will be described. In FIG. 1, 1 is a wiring repair device. This wiring repair device 1 includes a table 3 that is horizontally supported via a gantry 2 disposed at four corners, and a pair of legs 4a and 4a that are erected at both ends of the table 3 in the X-axis direction x. An X-axis beam frame 4b directed in the X-axis direction x is connected to the upper end, and a gate-shaped X-axis frame provided so as to straddle a flat plate-like electronic circuit board (work) W placed on the table 4 and an X-axis slider 5 supported by the X-axis beam portion 4b of the X-axis frame 4 so as to be movable in the X-axis direction x. The X-axis frame 4 and the X-axis slider 5 constitute a support frame that can move relative to the table 3 in the X-axis direction and the Y-axis direction perpendicular thereto.

前記X軸フレーム4は、その脚部4a,4aが前記テーブル3のX軸方向xの両端部にY軸方向yに沿って配置された各案内レール6,6に支持され、脚部5a,5aの下端部と前記案内レール6,6間に配置されたリニアモータやサーボモータの回転で作動される送りねじ機構等のY軸駆動装置(図示せず)によってY軸方向yに移動するようになっている。前記X軸スライダ5は、Z軸方向zの上下端部を、前記X軸ビーム部4bのZ軸方向zの上下端部にX軸方向xに沿って設けた一対の案内レール7,7に支持され、後面(背面)に固定したボールナット(図示せず)が前記案内レール7,7間にX軸方向xに沿って配置されたボールねじ8に螺合され、該ボールねじ8がX軸ビーム部4bの一端部(図1で右端部)に固定したX軸駆動モータ9によって回転されることにより、X軸方向xに移動するようになっている。前記ボールナット(図示せず)、ボールねじ8、X軸駆動モータ9等は前記X軸スライダ5をX軸方向xへ移動させるX軸駆装置を構成しているが、該X軸駆動装置は、これに限らず、リニアモータ等を用いることができる。   The X-axis frame 4 has leg portions 4a, 4a supported by guide rails 6, 6 arranged at both ends in the X-axis direction x of the table 3 along the Y-axis direction y. It is moved in the Y-axis direction y by a Y-axis drive device (not shown) such as a feed screw mechanism that is operated by rotation of a linear motor or a servo motor disposed between the lower end of 5a and the guide rails 6 and 6. It has become. The X-axis slider 5 has upper and lower end portions in the Z-axis direction z on a pair of guide rails 7 and 7 provided along the X-axis direction x on the upper and lower end portions in the Z-axis direction z of the X-axis beam portion 4b. A ball nut (not shown) that is supported and fixed to the rear surface (rear surface) is screwed to a ball screw 8 disposed along the X-axis direction x between the guide rails 7, 7. By being rotated by an X-axis drive motor 9 fixed to one end portion (right end portion in FIG. 1) of the axial beam portion 4b, the axial beam portion 4b moves in the X-axis direction x. The ball nut (not shown), the ball screw 8, the X-axis drive motor 9 and the like constitute an X-axis drive device that moves the X-axis slider 5 in the X-axis direction x. Not limited to this, a linear motor or the like can be used.

前記X軸スライダ5の前面には、前記ワークWの表面に向けてレーザ光を照射するレーザ照射装置10と、ワークWの表面にノズル11aを垂直(Z軸方向z)に向け、該ノズル11aからマスキング剤を滴下してワークWに塗布する第1のインクジェット装置(第1塗布装置)11と、ワークWの表面にノズル12aを垂直(Z軸方向z)に向け、該ノズル12aから導電性のある物質を含んだ溶液を滴下してワークWに塗布する第2のインクジェット装置12と,ワークWの表面にノズル13aを垂直(Z軸方向z)に向け、該ノズル(第2塗布装置)13aから洗浄剤を吐出してワークWの表面に付着した前記マスキング剤、導電性のある物質を含んだ溶液を除去する洗浄装置13とが、X軸方向xに所定距離を隔てて配置され、それぞれ、図示しないねじ機構とサーボモータ等とからなる第1、第2、第3、第4のZ軸駆動手段(Z軸駆動装置)を介して個別にZ軸方向zに移動調節可能にX軸スライダ5に支持されている。前記各Z軸駆動手段はとしてねじ機構とサーボモータ等に代えてリニアモータ等を用いることができる。   On the front surface of the X-axis slider 5, a laser irradiation device 10 that irradiates laser light toward the surface of the workpiece W, and a nozzle 11 a that is perpendicular to the surface of the workpiece W (Z-axis direction z), the nozzle 11 a A first ink jet device (first coating device) 11 for dropping a masking agent on the workpiece W and directing the nozzle 12a perpendicularly to the surface of the workpiece W (Z-axis direction z). A second inkjet device 12 that drops and applies a solution containing a certain substance to the workpiece W, and a nozzle 13a is directed vertically (Z-axis direction z) to the surface of the workpiece W so that the nozzle (second coating device) The masking agent discharged from 13a and adhering to the surface of the workpiece W and the cleaning device 13 for removing the solution containing the conductive substance are disposed at a predetermined distance in the X-axis direction x, It It is possible to individually adjust the movement in the Z-axis direction z via first, second, third, and fourth Z-axis driving means (Z-axis driving device) comprising a screw mechanism and a servo motor (not shown). It is supported by the shaft slider 5. As each Z-axis driving means, a linear motor or the like can be used instead of a screw mechanism and a servomotor.

前記レーザ照射装置10は、下端に対物レンズ10aを有する光学系10bの光軸をワークWの表面に垂直(Z軸方向z)に向けて設けられ、前記光学系10bの中には、レーザ発信器10cから発生されたレーザ光の形状を整形するアパーチャー機構10dが設けられている。該アパーチャー機構10dは、図示しないが、一対のスリット板を前記光軸に直交して対向させて、各スリット板の相互間隔を調整することによりスリットの幅を可変にしたスリット機構を、前記光軸方向に位置をずらして上下に一対配設し、該一対のスリット機構を前記光軸の回りに個別に旋回するように構成され、一対のスリット機構における各スリットが重ね合わせられて形成される正四角形、矩形、平行四辺形からなる任意の大きさの四辺形の開口部をレーザ光が通過することにより、前記ワークWの表面に前記開口部によって定まる平面形状のレーザ光が照射されるようになっている。   The laser irradiation apparatus 10 is provided with the optical axis of an optical system 10b having an objective lens 10a at the lower end oriented perpendicularly to the surface of the workpiece W (Z-axis direction z). An aperture mechanism 10d for shaping the shape of the laser beam generated from the vessel 10c is provided. Although not shown, the aperture mechanism 10d includes a slit mechanism in which the width of the slit is made variable by making a pair of slit plates face each other perpendicular to the optical axis and adjusting the mutual distance between the slit plates. A pair of upper and lower positions are shifted in the axial direction, and the pair of slit mechanisms are individually swiveled around the optical axis, and the slits in the pair of slit mechanisms are overlapped and formed. The laser beam passes through the opening of a quadrilateral having an arbitrary size including a regular quadrangle, a rectangle, and a parallelogram so that the surface of the workpiece W is irradiated with the planar laser beam determined by the opening. It has become.

また、前記レーザ照射装置10には、その対物レンズ10aを含む光学系10bの一部を共有する光学系14aを通して前記ワークWの表面を撮像するCCDカメラ14が付設されている。
前記第1、第2のインクジェット装置11,12は、それぞれ、溶液用カートリッジにマスキング剤、導電性のある物質を含んだ溶液が充填されており、所要持に、前記溶液用カートリッジ内が制御装置の作動で所定圧力に加圧されて、前記ノズル11a,12aから、例えば、30pl〜300plの範囲で段階的に調整可能とされた所定滴下量のマスキング剤、導電性のある物質を含んだ溶液がワークW上に滴下するようになっており、従来周知のものである。
Further, the laser irradiation apparatus 10 is provided with a CCD camera 14 for imaging the surface of the workpiece W through an optical system 14a sharing a part of the optical system 10b including the objective lens 10a.
In the first and second ink jet devices 11 and 12, the solution cartridge is filled with a solution containing a masking agent and a conductive substance, and the solution cartridge is controlled by the control device. A solution containing a predetermined amount of a masking agent and a conductive substance that can be adjusted stepwise in a range of, for example, 30 pl to 300 pl from the nozzles 11a and 12a. Is dripped onto the workpiece W, which is well known in the art.

そして、前記配線補修装置1には、図示しないが、前記レーザ照射装置10、第1のインクジェット装置11、第2のインクジェット装置12、洗浄装置13、CCDカメラ14および前記X軸駆動モータ9、Y軸駆動装置,Z軸駆動手段の作動を制御する制御装置が備えられており、該制御装置の動作プログラムにもとづく動作指令によって、前記X軸駆動モータ9、Y軸駆動装置およびZ軸駆動手段が所定順序で作動して、前記レーザ照射装置10(CCDカメラ14)、第1のインクジェット装置11、第2のインクジェット装置12および洗浄装置13が、テーブル3上のワークWに対して相対移動して所定の位置に位置決めされた後に、それぞれ前記ワークWに対して所定の処理動作を行うようになっている。   Although not shown, the wiring repair device 1 includes the laser irradiation device 10, the first ink jet device 11, the second ink jet device 12, the cleaning device 13, the CCD camera 14, and the X axis drive motor 9, Y. A control device for controlling the operation of the axis drive device and the Z-axis drive means is provided, and the X-axis drive motor 9, the Y-axis drive device, and the Z-axis drive means are controlled by an operation command based on an operation program of the control device. The laser irradiation device 10 (CCD camera 14), the first inkjet device 11, the second inkjet device 12 and the cleaning device 13 are moved relative to the workpiece W on the table 3 by operating in a predetermined order. After being positioned at a predetermined position, a predetermined processing operation is performed on each workpiece W.

次に、前記構成の配線補修装置1によって電子回路基板(ワーク)Wの配線の断線部を補修する本発明の一実施の形態に係る配線補修方法について、図2も参照しながら説明する。
配線補修の対象となるワークWは、例えば、図2に示すように、基板上に複数の配線15が互いに微小間隔をあけて平行に、かつ基板の側辺に対して斜めに形成された配線部分を備え、その配線部分の1つが断線部15cを有する配線部分15aであり、その他が断線部15cの無い正常な配線部分15bとなっている。なお、図2において、上段の図は平面図、下段の図は配線部分15aの断線部15cにおける拡大断面を示している。
先ず、配線補修装置1の制御装置が動作すると、X軸駆動モータ9とY軸駆動装置を作動させ、X軸スライダ5とX軸フレーム4を前記ワークWに対しそれぞれX,Y軸方向x,yに相対移動させて、レーザ照射装置10(CCDカメラ14)の対物レンズ10aの位置を、予め検査装置によって発見されたワークWの配線15における配線部分15aの断線部15cの位置まで移動させる。そして、レーザ照射装置10を前記第1のZ軸駆動手段によって昇降させて、前記CCDカメラ14の焦点を配線部分15aに合わせ、該CCDカメラ14で得られる画像にもとづいて断線部15cの位置とその寸法、形状を認識する(図2(a)参照)。
Next, a wiring repair method according to an embodiment of the present invention for repairing a disconnected portion of the wiring of the electronic circuit board (workpiece) W by the wiring repair device 1 having the above-described configuration will be described with reference to FIG.
For example, as shown in FIG. 2, the work W to be subjected to wiring repair is a wiring in which a plurality of wirings 15 are formed parallel to each other with a minute interval on the substrate and oblique to the side of the substrate. One of the wiring portions is a wiring portion 15a having a disconnection portion 15c, and the other is a normal wiring portion 15b having no disconnection portion 15c. In FIG. 2, the upper diagram shows a plan view, and the lower diagram shows an enlarged cross section of the broken portion 15 c of the wiring portion 15 a.
First, when the control device of the wiring repair device 1 operates, the X-axis drive motor 9 and the Y-axis drive device are operated, and the X-axis slider 5 and the X-axis frame 4 are moved in the X and Y axis directions x, The position of the objective lens 10a of the laser irradiation apparatus 10 (CCD camera 14) is moved to the position of the disconnection portion 15c of the wiring portion 15a in the wiring 15 of the workpiece W previously discovered by the inspection apparatus by being moved relative to y. Then, the laser irradiation device 10 is moved up and down by the first Z-axis driving means so that the CCD camera 14 is focused on the wiring portion 15a, and the position of the disconnection portion 15c is determined based on the image obtained by the CCD camera 14. The size and shape are recognized (see FIG. 2A).

次に、前記X軸駆モータ9を作動させて第1のインクジェット装置11が、そのノズル11aを、前記CCDカメラ14で認識された配線部分15aの断線部15cの上方位置に移動させた後、前記ノズル11aから前記断線部15c上にマスキング剤16を滴下して、断線部15cを含みそれより広い領域に塗布する(図2(b)参照)。前記マスキング剤としては、後工程のベーク炉にて昇華するような昇華性マスク樹脂、例えばパラジクロルベンゼンをアルコールやエーテル等の有機溶剤に溶かしたもの等を使用することができる。この後に、X軸駆動モータ9を作動させてレーザ照射装置10の対物レンズ10aを前記断線部15cの上方位置まで移動させてから、前記レーザ発信器10cからのレーザ光Lを前記マスキング剤16の塗膜部分に向けて照射する。その際、予め、前記アパーチャー機構10dによってレーザ光Lの照射面形状が、CCDカメラで認識された断線部15cの寸法、形状を考慮して、断線部15cを含みそれより広い配線領域17を囲む範囲にわたって矩形に整形され、この整形されたレーザ光Lがマスキング剤16の塗膜部分に照射されるので、レーザ光Lによる加熱で該加熱部分のマスキング剤が蒸発して、前記照射面形状に対応して矩形状の開口18がマスキング剤16に形成される(図2(c)参照)。   Next, after the X-axis drive motor 9 is operated and the first inkjet device 11 moves the nozzle 11a to a position above the disconnection portion 15c of the wiring portion 15a recognized by the CCD camera 14, A masking agent 16 is dropped from the nozzle 11a onto the disconnection portion 15c and applied to a wider area including the disconnection portion 15c (see FIG. 2B). As the masking agent, a sublimable mask resin that sublimes in a subsequent baking furnace, for example, one obtained by dissolving paradichlorobenzene in an organic solvent such as alcohol or ether can be used. Thereafter, the X-axis drive motor 9 is operated to move the objective lens 10a of the laser irradiation apparatus 10 to a position above the disconnection portion 15c, and then the laser light L from the laser transmitter 10c is applied to the masking agent 16. Irradiate the film part. At that time, in consideration of the size and shape of the disconnection portion 15c recognized by the CCD camera, the irradiation surface shape of the laser light L by the aperture mechanism 10d in advance includes the disconnection portion 15c and surrounds a wider wiring region 17. Since the shaped laser beam L is shaped into a rectangle over the range and the coating film portion of the masking agent 16 is irradiated, the masking agent in the heated portion evaporates by heating with the laser beam L, so that the shape of the irradiated surface is obtained. Correspondingly, a rectangular opening 18 is formed in the masking agent 16 (see FIG. 2C).

次に、X軸駆動装置9を作動させて第2のインクジェット装置12のノズル12aを、前記断線部15cの上方位置に移動させた後、前記ノズル12aから前記断線部15c上に形成された前記マスキング剤16の開口18に導電性のある物質を含んだ溶液19を滴下して塗布する(図2(d)参照)。前記導電性のある物質を含んだ溶液19は、貴金属、銅、クロム等の金属、それらの化合物からなる金属粒子が溶液中に均一に分散した状態で存在するコロイド溶液やそれらの物質を含んだペーストなど、従来周知のものである(以下、単に、「金属コロイド等」という)。
次に、X軸駆動モータ9を作動させてレーザ照射装置10の対物レンズ10aを前記断線部15cの上方位置まで移動させてから、前記レーザ発信器10cからのレーザ光Lを前記金属コロイド等19の塗膜部分に向けて照射する。その際、予め、前記アパーチャー機構10dによってレーザ光Lの照射面形状が、断線部15cを含みそれより広い配線領域17に整合する平行四辺形に整形され、この整形されたレーザ光Lが前記金属コロイド等19の塗膜部分に照射されるので、そのレーザ光Lによる加熱で該加熱部分において金属コロイド19中の溶媒が蒸発すると共に、金属コロイド等19中の金属が前記レーザ光Lの照射面形状に整合して平面視で平行四辺形に析出し、この析出した金属薄膜20によって断線部15cの両側の配線部分15aが接続されてその導通状態が修復される(図2(e)参照)。
Next, after the X-axis drive device 9 is operated to move the nozzle 12a of the second inkjet device 12 to a position above the disconnection portion 15c, the nozzle 12a is formed on the disconnection portion 15c. A solution 19 containing a conductive substance is dropped and applied to the opening 18 of the masking agent 16 (see FIG. 2D). The solution 19 containing the conductive substance contains a colloidal solution in which metal particles composed of metals such as precious metals, copper, and chromium, and their compounds are uniformly dispersed in the solution, and those substances. Conventionally known pastes and the like (hereinafter simply referred to as “metal colloids”).
Next, the X-axis drive motor 9 is operated to move the objective lens 10a of the laser irradiation apparatus 10 to a position above the disconnected portion 15c, and then the laser light L from the laser transmitter 10c is transferred to the metal colloid 19 or the like. Irradiate towards the coating part. At that time, the shape of the irradiation surface of the laser light L is shaped in advance by the aperture mechanism 10d into a parallelogram that includes the broken portion 15c and matches the wiring region 17 wider than that, and the shaped laser light L is transformed into the metal Since the coating film portion of the colloid 19 is irradiated, the solvent in the metal colloid 19 evaporates in the heated portion by the laser beam L, and the metal in the metal colloid 19 is irradiated with the laser beam L. Matching the shape and depositing into a parallelogram in plan view, the deposited metal thin film 20 connects the wiring portions 15a on both sides of the disconnection portion 15c and restores its conduction state (see FIG. 2 (e)). .

この後に、X軸駆動装置9を作動させて洗浄装置13のノズル13aを、前記金属薄膜20の上方位置に移動させた後、前記ノズル13aから前記金属薄膜20上にその周辺に十分に溢れるだけの所定量の洗浄剤を滴下する。これにより、その金属薄膜20の周囲に残留したマスキング剤やレーザL光の照射を受けなかった金属コロイド等19が洗い流されてワークWの表面を洗浄される(図2(f)参照)。前記洗浄剤としては、温純水等を使用することができる。
なお、前記洗浄装置13に乾燥装置を付設することにより、前記洗浄後に、必要に応じてワークW上にエア等を吹き付けて洗浄液の蒸発、乾燥を促進するようにしてもよい。また、前記X軸スライダ5に前記洗浄装置13を設けずに、前記配線補修装置1によって配線部分15aにおける断線部15cの導通、修復工程を行った後に、後工程である洗浄工程によってワークWを洗浄してワークW上に残留したマスキング剤や金属コロイド等19を除去することもできる。
なお、前記レーザ照射装置10,第1、第2のインクジェット装置11,12、洗浄装置13は、それぞれ、レーザ光Lの照射時、マスキング剤16や金属コロイド等19の滴下時、洗浄液の吐出時に、ワークWの表面に対する対物レンズ10a、ノズル11a,12a,13aのZ軸方向zにおける位置を、第1、第2,第3、第4のZ軸駆動手段を個別に作動させることにより、適宜に調節することは言うまでもない。
Thereafter, the nozzle 13a of the cleaning device 13 is moved to a position above the metal thin film 20 by operating the X-axis driving device 9, and then the nozzle 13a is sufficiently overflowed from the nozzle 13a onto the metal thin film 20. A predetermined amount of the cleaning agent is dropped. As a result, the masking agent remaining around the metal thin film 20 and the metal colloid 19 that has not been irradiated with the laser L light are washed away to clean the surface of the workpiece W (see FIG. 2F). As the cleaning agent, warm pure water or the like can be used.
In addition, by attaching a drying device to the cleaning device 13, after the cleaning, if necessary, air or the like may be blown onto the workpiece W to promote evaporation and drying of the cleaning liquid. Further, without providing the cleaning device 13 on the X-axis slider 5, the wiring repair device 1 performs the conduction and repair process of the disconnected portion 15c in the wiring portion 15a, and then the workpiece W is removed by a cleaning process which is a subsequent process. It is possible to remove the masking agent, metal colloid 19 and the like remaining on the workpiece W by washing.
The laser irradiation device 10, the first and second ink jet devices 11, 12 and the cleaning device 13 are respectively irradiated with the laser beam L, when the masking agent 16 and the metal colloid 19 are dropped, and when the cleaning liquid is discharged. The position of the objective lens 10a and the nozzles 11a, 12a, and 13a in the Z-axis direction z with respect to the surface of the workpiece W can be appropriately determined by individually operating the first, second, third, and fourth Z-axis driving means. Needless to say, you can adjust it.

前記のように、実施の形態に係る配線補修方法によれば、電子回路基板(ワーク)W上に形成された配線15における配線部分15aの断線部15cに、平面視で、その断線部15cより広い領域にわたってマスキング剤16を塗布してレーザ光Lを照射し、前記断線部15cを含む配線領域17のマスキング剤16を除去した後に、該マスキング剤16を除去された配線領域17に金属コロイド等19を塗布すると共に、該金属コロイド等19にレーザ光Lを照射して加熱することにより金属薄膜20を析出させて前記断線部15cを接続するようにしたので、マスキング剤16で囲まれて限定された断線部15cを含む配線領域17(マスキング剤16の開口18)に金属コロイド等19が塗布されて、該金属コロイド等19から析出されて形成された金属薄膜20によって前記断線部15cが接続され、これにより、断線部15が接続された後の接続部の形状が電子回路基板W上の配線15の形状に整合したものとすることができ、配線15の補修を、隣接する正常の配線部15bに対して短絡を生じさせるような悪影響を何ら及ぼすことなく、配線形状の合わせて正確に行うことができる。   As described above, according to the wiring repair method according to the embodiment, the disconnection portion 15c of the wiring portion 15a of the wiring 15 formed on the electronic circuit board (work) W is more than the disconnection portion 15c in plan view. After applying the masking agent 16 over a wide area and irradiating the laser beam L to remove the masking agent 16 from the wiring region 17 including the disconnection portion 15c, the wiring region 17 from which the masking agent 16 has been removed is subjected to a metal colloid or the like. 19 is applied, and the metal colloid or the like 19 is irradiated with a laser beam L and heated to deposit the metal thin film 20 to connect the disconnected portion 15c. A metal colloid 19 or the like is applied to the wiring region 17 (opening 18 of the masking agent 16) including the disconnected portion 15c and deposited from the metal colloid 19 or the like. The disconnection portion 15c is connected by the metal thin film 20 formed in this manner, and the shape of the connection portion after the disconnection portion 15 is connected to the shape of the wiring 15 on the electronic circuit board W is thereby made to match. Thus, the repair of the wiring 15 can be accurately performed in accordance with the wiring shape without causing any adverse effect that causes a short circuit on the adjacent normal wiring portion 15b.

また、前記金属コロイド等19にレーザ光Lを照射した後に電子回路基板W上に残ったマスキング剤16と金属コロイド等19を洗浄して除去するようにしたので、前記配線15における配線部15aの断線部15cの補修が終了した後に、電子回路基板W上に残ったマスキング剤と断線部15cの補修に使用されなかった金属コロイド等19を容易に除去することができ、断線を補修された電子回路基板を清浄に保つことができる。
また、前記金属コロイド等19に対して前記断線部15cを含む配線領域17の形状に整合する平面視で四辺形状に整形されたレーザ光Lを照射するようにしたので、配線15における配線部15aの断線部15cを含む配線領域17の形状に整合した形状に金属薄膜20を析出させて断線部15cを接続することができ、配線15の補修を一層正確に行うことができる。このため、電子回路基板Wの配線パターンにおける各配線15の電気抵抗が均等になり、その電気容量が設計値のものと一致させることができる。
さらに、前記マスキング剤16と金属コロイド等19をインクジェット装置11,12によって塗布するようにしたので、インクジェット装置11,12によってマスキング剤16と金属コロイド等19を、それぞれ、所定領域に無駄なく、適量、円滑に塗布することができる。
Further, the masking agent 16 and the metal colloid 19 remaining on the electronic circuit board W after the laser beam L is irradiated to the metal colloid 19 and the like are cleaned and removed. After the repair of the disconnection portion 15c is completed, the masking agent remaining on the electronic circuit board W and the metal colloid 19 that has not been used for the repair of the disconnection portion 15c can be easily removed. The circuit board can be kept clean.
Further, since the laser beam L shaped into a quadrilateral shape in plan view that matches the shape of the wiring region 17 including the disconnection portion 15 c is irradiated to the metal colloid 19 or the like, the wiring portion 15 a in the wiring 15 is irradiated. The metal thin film 20 can be deposited in a shape matched with the shape of the wiring region 17 including the disconnection portion 15c, and the disconnection portion 15c can be connected, and the wiring 15 can be repaired more accurately. For this reason, the electric resistance of each wiring 15 in the wiring pattern of the electronic circuit board W becomes uniform, and the electric capacity can be matched with the design value.
Further, since the masking agent 16 and the metal colloid 19 are applied by the ink jet devices 11 and 12, the masking agent 16 and the metal colloid 19 and the like can be applied to the predetermined areas without waste by the ink jet devices 11 and 12, respectively. Can be applied smoothly.

なお、前記実施の形態に係る配線補修方法においては、前記マスキング剤16にレーザ光Lを照射する際に、配線部15aの断線部15cを含む配線領域17において、配線部15aの底部(厚さ方向の全体)にまでレーザ光のエネルギーを及ばせて該配線部15aを除去加工し、その除去部分(配線領域17)の全体に金属コロイド等19が塗布され、そこに金属薄膜20を形成するようにしたが、これに限らず、前記配線部15aの表面もしくはその厚さ方向の一部までレーザ光Lのエネルギーを及ばせて、配線部15aを除去加工しないかもしくは厚さ方向の一部だけ除去加工して、除去加工した部分と断線部15cの隙間に金属コロイド等19が塗布され、配線15の断線部15aを接続させる修復が行われるようにしてもよい。   In the wiring repair method according to the embodiment, when the masking agent 16 is irradiated with the laser light L, in the wiring region 17 including the disconnection portion 15c of the wiring portion 15a, the bottom portion (thickness of the wiring portion 15a). The wiring portion 15a is removed by applying the energy of the laser beam to the entire direction), and a metal colloid 19 or the like is applied to the entire removed portion (wiring region 17) to form the metal thin film 20 thereon. However, the present invention is not limited to this, and the energy of the laser beam L is applied to the surface of the wiring part 15a or a part in the thickness direction thereof, so that the wiring part 15a is not removed or is partly processed in the thickness direction. Alternatively, the metal colloid 19 or the like may be applied to the gap between the removed portion and the disconnection portion 15c, and repair may be performed to connect the disconnection portion 15a of the wiring 15.

また、前記実施の形態に係る配線補修方法においては、電子回路基板Wの配線パターンにおいて基板の側辺に対して傾斜して平行に配設された配線15の補修を行う場合に適用した例を説明したが、これに限らず、基板の側辺に平行もしくは直角にして並列された配線、またはその他の形状に配設された配線、電極の補修にも適用することができる。
さらに、前記実施の形態に係る配線補正方法においては、前記マスキング剤16と金属コロイド等19とをインクジェット装置11,12でワークWの所要領域にとするするようにしたが、これに代えて、従来周知のディスペンサー装置を使用することができる。ディスペンサー装置によると、粘度の高いマスキング剤16や濃度の高い導電性ペーストを所定領域に的確に塗布することができる。なお、金属コロイド等19の導電性のある物質には、金属の他、炭素等を用いることも可能であり、金属はレーザ光で加熱して析出できるものであればよく、前記実施の形態で示した金属に限定されない。
Further, in the wiring repair method according to the embodiment, an example applied to repairing the wiring 15 arranged in parallel with an inclination with respect to the side of the board in the wiring pattern of the electronic circuit board W. Although described, the present invention is not limited to this, and the present invention can also be applied to the repair of wirings arranged in parallel or perpendicular to the side of the substrate, wirings arranged in other shapes, and electrodes.
Furthermore, in the wiring correction method according to the embodiment, the masking agent 16 and the metal colloid 19 are set to the required area of the work W by the ink jet devices 11 and 12, but instead, Conventionally known dispenser devices can be used. According to the dispenser device, it is possible to accurately apply the masking agent 16 having a high viscosity and the conductive paste having a high concentration to a predetermined region. In addition to the metal, carbon or the like can be used as the conductive material such as the metal colloid 19, and the metal can be any material that can be deposited by heating with laser light. It is not limited to the metals shown.

前記実施の形態に係る配線補修装置においては、テーブル3を架台2に固定して、X軸フレーム4とX軸スライダ5とをそれぞれY軸駆動装置とX軸駆動モータ9とでY,X軸方向y,xへ移動させて、ワークWに対して前記レーザ照射装置10(CCDカメラ14)、第1のインクジェット装置11、第2のインクジェット装置12、洗浄装置13をY,X軸方向y,xに相対的に移動させるようにしているが、これに限らず、前記X軸スライダ5を固定して、前記テーブル3を前記架台2上に設けたベースにX,Y軸方向x,yに移動自在に支持し、テーブルとベース側に設置したX,Y軸駆動装置によって前記テーブルを移動させることにより、前記ワークWに対して前記各装置10,11,12,13をX,Y軸方向x,yに相対移動させるようにしてもよい。   In the wiring repair device according to the embodiment, the table 3 is fixed to the gantry 2, and the X-axis frame 4 and the X-axis slider 5 are respectively connected to the Y-axis drive device and the X-axis drive motor 9 in the Y and X axes. The laser irradiation device 10 (CCD camera 14), the first ink jet device 11, the second ink jet device 12, and the cleaning device 13 are moved in the Y and X-axis directions y, However, the present invention is not limited to this, and the X-axis slider 5 is fixed, and the table 3 is mounted on the base provided on the gantry 2 in the X and Y-axis directions x and y. The devices 10, 11, 12, and 13 are moved in the X and Y axis directions with respect to the workpiece W by moving the table by X and Y axis driving devices that are supported movably and installed on the table and base side. Relative transfer to x and y It may be allowed to.

本発明の一実施の形態に係る配線補修装置の一例をを示す斜視図である。It is a perspective view which shows an example of the wiring repair apparatus which concerns on one embodiment of this invention. 本発明の一実施の形態に係る配線補修方法の手順を示す説明図である。It is explanatory drawing which shows the procedure of the wiring repair method which concerns on one embodiment of this invention.

符号の説明Explanation of symbols

1 配線補修装置
3 テーブル
4 X軸フレーム
5 X軸スライダ
9 X軸駆動モータ(X軸駆動装置)
10 レーザ照射装置
10d アパーチャー機構
11,12 第1、第2のインクジェット装置(第1、第2塗布装置)
13 洗浄装置
14 CCDカメラ
15 配線
15a,15b 配線部分
15c 断線部
16 マスキング剤
17 配線領域
18 開口
19 金属コロイド等
20 金属薄膜
L レーザ光
W 電子回路基板(ワーク)
DESCRIPTION OF SYMBOLS 1 Wiring repair apparatus 3 Table 4 X-axis frame 5 X-axis slider 9 X-axis drive motor (X-axis drive device)
DESCRIPTION OF SYMBOLS 10 Laser irradiation apparatus 10d Aperture mechanism 11, 12 1st, 2nd inkjet apparatus (1st, 2nd coating device)
DESCRIPTION OF SYMBOLS 13 Cleaning apparatus 14 CCD camera 15 Wiring 15a, 15b Wiring part 15c Disconnection part 16 Masking agent 17 Wiring area 18 Opening 19 Metal colloid etc. 20 Metal thin film L Laser light W Electronic circuit board (workpiece)

Claims (6)

電子回路基板上に形成された配線の断線部に、平面視で、その断線部より広い領域にわたってマスキング剤を塗布してレーザ光を照射し、前記断線部を含む配線領域のマスキング剤を除去した後に、該マスキング剤を除去された配線領域に導電性のある物質を含んだ溶液を塗布すると共に、該導電性のある物質を含んだ溶液にレーザ光を照射して加熱することにより導電性のある物質の薄膜を析出させて前記断線部を接続することを特徴とする配線補修方法。   In a plan view, the masking agent was applied to the disconnection portion of the wiring formed on the electronic circuit board over a region wider than the disconnection portion and irradiated with laser light, and the masking agent in the wiring region including the disconnection portion was removed. After that, a solution containing a conductive substance is applied to the wiring region from which the masking agent has been removed, and the conductive substance is heated by irradiating the solution containing the conductive substance with laser light. A wiring repairing method comprising depositing a thin film of a certain substance and connecting the disconnected portion. 前記導電性のある物質を含んだ溶液にレーザ光を照射した後に電子回路基板上に残ったマスキング剤と導電性のある物質を含んだ溶液を洗浄して除去することを特徴とする請求項1に記載の配線補修方法。   2. The solution containing the masking agent and the conductive substance remaining on the electronic circuit board after the solution containing the conductive substance is irradiated with laser light is removed by washing. Wiring repair method described in 1. 前記導電性のある物質を含んだ溶液に対して前記断線部を含む配線領域の形状に整合する平面視で四辺形状に整形されたレーザ光を照射することを特徴とする請求項1または2に記載の配線補修方法。   The laser light shaped into a quadrilateral shape in a plan view that matches the shape of the wiring region including the disconnection portion is irradiated to the solution containing the conductive substance. Wiring repair method described. 前記マスキング剤と導電性のある物質を含んだ溶液をインクジェット装置によって塗布することを特徴とする請求項1〜3のいずれかに記載の配線補修方法。   The wiring repair method according to claim 1, wherein a solution containing the masking agent and a conductive substance is applied by an ink jet apparatus. 前記マスキング剤と導電性のある物質を含んだ溶液をディスペンサー装置によって塗布することを特徴とする請求項1〜3のいずれかに記載の配線補修方法。   The wiring repair method according to claim 1, wherein a solution containing the masking agent and a conductive substance is applied by a dispenser device. 電子回路基板上に形成された配線の断線部に、平面視で、その断線部より広い領域にわたってマスキング剤を塗布してレーザ光を照射し、前記断線部を含む配線領域のマスキング剤を除去した後に、該マスキング剤を除去された配線領域に導電性のある物質を含んだ溶液を塗布すると共に、該導電性のある物質を含んだ溶液にレーザ光を照射して加熱することにより導電性のある物質の薄膜を析出させて前記断線部を接続することを特徴とする配線補修装置。
In a plan view, the masking agent was applied to the disconnection portion of the wiring formed on the electronic circuit board over a region wider than the disconnection portion and irradiated with laser light, and the masking agent in the wiring region including the disconnection portion was removed. After that, a solution containing a conductive substance is applied to the wiring region from which the masking agent has been removed, and the conductive substance is heated by irradiating the solution containing the conductive substance with laser light. A wiring repair device characterized in that a thin film of a certain substance is deposited to connect the disconnected portion.
JP2003400425A 2003-11-28 2003-11-28 Wiring repair method and wiring repair device Expired - Fee Related JP4370151B2 (en)

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JP2007048877A (en) * 2005-07-15 2007-02-22 V Technology Co Ltd Method and device for repairing wiring pattern of electronic circuit board
JP2009123855A (en) * 2007-11-14 2009-06-04 Dainippon Printing Co Ltd Method of repairing defects of wiring substrate
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JP4701036B2 (en) * 2005-07-15 2011-06-15 株式会社ブイ・テクノロジー Wiring pattern repair method and wiring pattern repair device for electronic circuit board
JP2007048877A (en) * 2005-07-15 2007-02-22 V Technology Co Ltd Method and device for repairing wiring pattern of electronic circuit board
JP2009123855A (en) * 2007-11-14 2009-06-04 Dainippon Printing Co Ltd Method of repairing defects of wiring substrate
CN102759829A (en) * 2012-07-03 2012-10-31 深圳市华星光电技术有限公司 Broken line repairing device and method of array substrate
WO2014005331A1 (en) * 2012-07-03 2014-01-09 深圳市华星光电技术有限公司 Array substrate broken line repairing device and repairing method
CN107479220B (en) * 2017-08-11 2020-06-26 京东方科技集团股份有限公司 Display screen repairing device and method
CN107479220A (en) * 2017-08-11 2017-12-15 京东方科技集团股份有限公司 The restorative procedure of display screen prosthetic device and display screen
CN111146182A (en) * 2020-02-14 2020-05-12 深圳第三代半导体研究院 Micro-fine line repairing material and repairing method thereof
KR20210120301A (en) * 2020-03-26 2021-10-07 국민대학교산학협력단 Repair Method of Fine Electrode
KR102323195B1 (en) * 2020-03-26 2021-11-10 국민대학교산학협력단 Repair Method of Fine Electrode
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JP7403875B1 (en) 2022-08-10 2023-12-25 株式会社スカイテクノロジー Method for repairing printed wiring boards and method for manufacturing recycled printed wiring boards

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