JP2007048877A - Method and device for repairing wiring pattern of electronic circuit board - Google Patents

Method and device for repairing wiring pattern of electronic circuit board Download PDF

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JP2007048877A
JP2007048877A JP2005230709A JP2005230709A JP2007048877A JP 2007048877 A JP2007048877 A JP 2007048877A JP 2005230709 A JP2005230709 A JP 2005230709A JP 2005230709 A JP2005230709 A JP 2005230709A JP 2007048877 A JP2007048877 A JP 2007048877A
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anode
wiring pattern
disconnection
electronic circuit
circuit board
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JP4701036B2 (en
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Michinobu Mizumura
通伸 水村
Takafumi Hirano
貴文 平野
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V Technology Co Ltd
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V Technology Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for repairing the wiring pattern of an electronic circuit board and a device for repairing wiring by an electroplating being capable of easily repairing the disconnection of complicated thin wiring formed on the electronic circuit board, and being capable of sufficiently thickening a thin-film metal in repairing sections while reducing an effect on sections excepting the repairing sections. <P>SOLUTION: A specified range containing the disconnection M of the wiring pattern of the electronic circuit board generating the disconnection or the like is supplied with an ultraviolet photo-setting resin, and the ultraviolet photo-setting resin is cured. A part of the photo-setting resin is removed on a place to be repaired, the section of the removed resin is supplied with an electrolyte through a dispenser nozzle 15 with a built-in anode 14, and a voltage is applied between the end face of the disconnection M and the anode 14. Consequently, the electroplating is conducted between the end face of the disconnection M and the anode 14. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明はTFT基板などの電子回路の配線の断線等を電解メッキによって補修する配線パターン補修方法及び配線パターン補修装置に関するものである。 The present invention relates to a wiring pattern repairing method and a wiring pattern repairing apparatus for repairing disconnection of wiring of an electronic circuit such as a TFT substrate by electrolytic plating.

従来、TFT基板などの電子回路の配線の断線を補修する装置には、特許文献1、特許文献2に示されるように、前記断線部分に、金属錯体や有機金属化合物を有機溶媒に溶かし込んだ溶液または金属粒子を有機溶媒に分散させた溶液を塗布した後、その塗布部分にレーザ光を照射し、前記溶液中の有機溶媒を蒸発させて金属薄膜を前記断線部に析出させることにより、断線部の両端の配線を接続導通させる装置が知られている。
特開平2−19838号公報 特開平7−29982号公報
Conventionally, in an apparatus for repairing disconnection of wiring of an electronic circuit such as a TFT substrate, as shown in Patent Document 1 and Patent Document 2, a metal complex or an organometallic compound is dissolved in an organic solvent in the disconnected portion. After applying a solution in which a solution or metal particles are dispersed in an organic solvent, the application portion is irradiated with laser light, the organic solvent in the solution is evaporated, and a metal thin film is deposited on the disconnection portion. There is known a device for connecting and conducting wiring at both ends of a part.
Japanese Patent Laid-Open No. 2-19838 JP-A-7-29982

ところが、上記した従来の配線補修装置では、前記溶液の塗布部分にレーザ光を照射するため、レーザ光のエネルギーによって金属を含む溶液の一部がレーザ光の照射部の周辺に飛散してしまい、前記断線部に析出された金属薄膜の厚さが十分に形成されず配線補修が十分に行われないという問題やレーザ光による基板の局所加熱がなされるという問題の他、従来の装置では複雑な配線補修の場合、補修が正常になされたか否かについて、補修作業終了後の導通試験など工程が必要であるなどの問題があった。 However, in the above-described conventional wiring repair device, since the laser light is irradiated to the application portion of the solution, a part of the solution containing the metal is scattered around the laser light irradiation portion by the energy of the laser light, In addition to the problem that the thickness of the metal thin film deposited on the disconnected portion is not sufficiently formed and the wiring is not sufficiently repaired, and the substrate is locally heated by laser light, the conventional apparatus is complicated. In the case of wiring repair, there is a problem that a process such as a continuity test after the repair work is required as to whether or not the repair has been normally performed.

本発明は上記事情に鑑みてなされたものであって、構造が簡単で、被補修箇所の薄膜金属の厚さを十分なものにすることができ、当該被補修箇所以外に対する影響が少なく、補修作業中に導通を確認しながら配線できる電子回路基板の配線パターン補修方法および配線パターン補修装置を提供することにある。 The present invention has been made in view of the above circumstances, has a simple structure, can make the thickness of a thin film metal at a repaired portion sufficient, has little influence on other than the repaired portion, and is repaired. An object of the present invention is to provide a wiring pattern repair method and a wiring pattern repair device for an electronic circuit board that can be wired while confirming continuity during work.

上記の課題を解決するため請求項1に記載の方法では、断線等の生じた電子回路基板の配線パターンの該断線部分を含む所定の範囲に紫外光硬化性樹脂を供給してから、該紫外光硬化性樹脂を硬化させ、その後、前記所定の範囲上の前記硬化された樹脂の一部を除去してから、該除去された樹脂の部分にアノードを内蔵するディスペンサーノズルを介して電解液を供給して後、前記断線部の端面と該アノードとの間に電圧を印加することにより、前記断線部の端面と該アノードの間で電解メッキを行って、配線パターンを補修することを特徴としている。 In order to solve the above-described problem, in the method according to claim 1, the ultraviolet light curable resin is supplied to a predetermined range including the disconnected portion of the wiring pattern of the electronic circuit board in which the disconnection or the like has occurred, and then the ultraviolet light is cured. After the photocurable resin is cured, a part of the cured resin above the predetermined range is removed, and then the electrolytic solution is supplied through a dispenser nozzle having an anode built in the removed resin part. After supplying, by applying a voltage between the end face of the disconnected portion and the anode, electrolytic plating is performed between the end face of the disconnected portion and the anode to repair the wiring pattern. Yes.

請求項2に記載の装置では、断線等の生じた電子回路基板の配線パターンの該断線部分を含む所定の範囲に紫外光硬化性樹脂を供給する手段と、電子回路基板の配線パターンの該断線部分を含む所定の範囲に供給された紫外光硬化性樹脂を硬化させる手段と、前記紫外光によって硬化された樹脂の一部を除去する除去手段と、前記除去手段によって除去された部分にアノードを内蔵するノズルを介して電解液を供給するための電解液供給手段と、前記ノズルの先端と前記断線部の端面との間隙を所定の間隙内に配置する配置手段と、前記アノードと前記断線部の端面の間に電圧を印加する印加手段と、を備えたことを特徴としている。 3. The apparatus according to claim 2, wherein means for supplying an ultraviolet curable resin to a predetermined range including the disconnected portion of the wiring pattern of the electronic circuit board in which disconnection or the like has occurred, and the disconnection of the wiring pattern of the electronic circuit board. A means for curing the ultraviolet light curable resin supplied to a predetermined range including the portion; a removing means for removing a part of the resin cured by the ultraviolet light; and an anode on the portion removed by the removing means. An electrolyte supply means for supplying an electrolyte solution through a built-in nozzle; an arrangement means for disposing a gap between a tip of the nozzle and an end face of the disconnection portion in a predetermined gap; the anode and the disconnection portion; And an applying means for applying a voltage between the end faces.

本発明の電子回路基板の配線パターン補修方法及び配線パターン補修装置によれば、前記電解液が被補修箇所のみに保持されるため、被補修箇所以外に対する影響が生じず、電解メッキが適切に行われる。
また、電解メッキ液が飛散しないため、補修部分の薄膜金属の厚さを十分なものにすることができる。
そして、前記マイクロディスペンサノズルに内蔵された電解メッキ用のアノードと前記断線部の端面の電気的導通を確認しながら補修できるため、補修作業後に補修部分の導通試験を行う必要がなく、作業工程が短くできるという優れた効果を奏する。
According to the wiring pattern repairing method and wiring pattern repairing apparatus of the electronic circuit board of the present invention, since the electrolytic solution is held only at the repaired part, there is no influence on the part other than the repaired part, and the electrolytic plating is appropriately performed. Is called.
Further, since the electrolytic plating solution does not scatter, the thickness of the thin film metal at the repaired portion can be made sufficient.
And since it can be repaired while confirming the electrical continuity between the anode for electrolytic plating built in the microdispenser nozzle and the end face of the disconnected portion, there is no need to conduct a continuity test of the repaired part after the repair work, It has an excellent effect that it can be shortened.

以下、本発明の一実施の形態について図1〜図5を参照して説明する。
図1は本発明に係る電子回路の配線パターン補修装置の一実施の形態を示す概念図である。電子回路の配線パターン補修装置1は、集積回路や液晶表示装置等の電子回路基板であって被補修箇所を有する電子回路基板(以下、単に「ワーク」という)6を載置してX-Y(図1の紙面に垂直な方向)方向に移動可能にするテーブルユニット4と、光学系ユニット3と、配線補修ユニット2と、これらを制御する制御ユニット5を備えている。
Hereinafter, an embodiment of the present invention will be described with reference to FIGS.
FIG. 1 is a conceptual diagram showing an embodiment of an electronic circuit wiring pattern repairing apparatus according to the present invention. An electronic circuit wiring pattern repairing apparatus 1 is an XY circuit board (hereinafter simply referred to as “workpiece”) 6 that is an electronic circuit board such as an integrated circuit or a liquid crystal display device and has a repaired portion. A table unit 4 that can move in the direction (perpendicular to the plane of FIG. 1), an optical system unit 3, a wiring repair unit 2, and a control unit 5 that controls these units are provided.

テーブルユニット4はワーク6を載置保持する載置台4A、テーブル4B、テーブル駆動装置4Cを備えており、テーブル駆動装置4Cによって光学系ユニット3及び配線補修ユニット2が載置台4Aと相対的に移動可能になっている。 The table unit 4 includes a mounting table 4A for mounting and holding the workpiece 6, a table 4B, and a table driving device 4C. The optical system unit 3 and the wiring repair unit 2 are moved relative to the mounting table 4A by the table driving device 4C. It is possible.

光学系ユニット3は、ワーク6に対向する対物レンズ11と、対物レンズ11の光軸Lと同軸に配置された結像レンズ13と、ハーフミラー12Aと、ハーフミラー12Bと、可変スリット8と、開閉スイッチ(図示せず)が内蔵されているレーザ照射器9とを備えている他、ハーフミラー12Bによって光軸Lから分岐された光軸L1の光軸上に配置された偏向用ミラー12Cと、偏向用ミラー12Cによって光軸L1から偏向された光軸L2上に配置されたCCDカメラ10を備えている。 The optical system unit 3 includes an objective lens 11 facing the workpiece 6, an imaging lens 13 arranged coaxially with the optical axis L of the objective lens 11, a half mirror 12A, a half mirror 12B, a variable slit 8, In addition to a laser irradiator 9 having a built-in open / close switch (not shown), a deflection mirror 12C disposed on the optical axis of the optical axis L1 branched from the optical axis L by a half mirror 12B; The CCD camera 10 is provided on the optical axis L2 deflected from the optical axis L1 by the deflecting mirror 12C.

さらに、光学系ユニット3は、ハーフミラー12Aによって光軸Lから分岐された光軸L3上に配置され、光軸L3の一部を分岐するハーフミラー12Dと、ハーフミラー12Dによって光軸L3から分岐された光軸L4の光軸上に配置され、前記光軸Lとワーク6との交点イを含む所定の領域に光を照射するための照明手段9Aと、ハーフミラー12Dを透過した光軸L3上に配置され、後述の紫外光硬化性樹脂7に紫外線を照射するための開閉用シャッター(図示せず)が内蔵されている紫外線照射器9Bを備えている。 Further, the optical system unit 3 is disposed on the optical axis L3 branched from the optical axis L by the half mirror 12A, and is branched from the optical axis L3 by the half mirror 12D that branches a part of the optical axis L3 and the half mirror 12D. An illuminating means 9A for irradiating a predetermined area including the intersection point A between the optical axis L and the workpiece 6 and an optical axis L3 transmitted through the half mirror 12D. An ultraviolet irradiator 9 </ b> B is provided which is disposed above and incorporates an opening / closing shutter (not shown) for irradiating ultraviolet light curable resin 7 described later with ultraviolet rays.

そして、CCDカメラ10は表示器11に電気的に接続しており、CCDカメラ10によって取込まれた画像が表示器11に表示できるようになっている。
また、可変スリット8は図2に示すように、スリット板8A、8B、8C、8Dを有し、これらスリット板8A、8B、8C、8Dは、制御ユニット5の制御器5Aに電気的に接続されたスリット駆動手段(図示せず)によって図2の矢印ロ方向に独立して移動可能になっている他、可変スリット8全体が図2の矢印ハの方向に回転可能になっており、開口部8Eの形状および開口部8Eの中心位置、回転各を調整することによって、レーザ照射器9からワーク6に照射するレーザ光の形状および位置が調整できるようになっている。
The CCD camera 10 is electrically connected to the display device 11 so that an image captured by the CCD camera 10 can be displayed on the display device 11.
As shown in FIG. 2, the variable slit 8 has slit plates 8A, 8B, 8C, and 8D. These slit plates 8A, 8B, 8C, and 8D are electrically connected to the controller 5A of the control unit 5. In addition to being able to move independently in the direction of arrow B in FIG. 2 by the slit driving means (not shown), the entire variable slit 8 is rotatable in the direction of arrow C in FIG. By adjusting the shape of the portion 8E and the center position and rotation of the opening 8E, the shape and position of the laser light emitted from the laser irradiator 9 to the workpiece 6 can be adjusted.

配線補修ユニット2は、第1のディスペンサーノズル13と、アノード14を内蔵した第2のディスペンサーノズル15を備えている。
第1のディスペンサーノズル13は第1のディスペンサーノズル移動手段13Aによって位置イに対し矢印β方向に沿って進退可能になっており、第1のディスペンサーノズル13には紫外光硬化性樹脂供給装置13Bが接続しており、紫外光硬化性の樹脂7が第1のディスペンサーノズル13の先端からワーク6の断線部Mを含む所定の範囲に供給できるようになっている。
The wiring repair unit 2 includes a first dispenser nozzle 13 and a second dispenser nozzle 15 having a built-in anode 14.
The first dispenser nozzle 13 can be moved back and forth in the direction of the arrow β with respect to the position A by the first dispenser nozzle moving means 13A, and an ultraviolet light curable resin supply device 13B is provided in the first dispenser nozzle 13. The ultraviolet light curable resin 7 is connected so that it can be supplied from the tip of the first dispenser nozzle 13 to a predetermined range including the disconnected portion M of the workpiece 6.

第2のディスペンサーノズル15は第2のディスペンサーノズル移動手段15Aによって位置イに対し矢印α方向に沿って接近離間可能になっている。
そして、第2のディスペンサーノズル15の先細の先端口15aの反対側の開口部15bにはCu塩からなる電解メッキ液18の電解メッキ液供給装置15Bが接続され、電解液23が第2のディスペンサーノズル15の先端口15aからワーク2の被補修箇所に供給できるようになっている。
The second dispenser nozzle 15 can be moved toward and away from the position A along the arrow α direction by the second dispenser nozzle moving means 15A.
Then, an electrolytic plating solution supply device 15B of an electrolytic plating solution 18 made of Cu salt is connected to the opening 15b on the opposite side of the tapered tip 15a of the second dispenser nozzle 15, and the electrolytic solution 23 is used as the second dispenser. It can supply to the repair location of the workpiece | work 2 from the front-end | tip port 15a of the nozzle 15. FIG.

ディスペンサーノズル15の先端口15aからワーク2の被補修箇所に電解メッキ液18を供給するときには、先端口15aを断線部Mの端面に接触させてから電解メッキ液18を供給することによって、電解メッキ液18が先端口15aの外周面に液滴(図5(d))を形成しないため、断線部Mの端面に精度よく電解メッキ液18を供給できる。 When supplying the electrolytic plating solution 18 from the tip port 15a of the dispenser nozzle 15 to the repaired portion of the workpiece 2, the electrolytic plating solution 18 is supplied after the tip port 15a is brought into contact with the end face of the disconnection portion M, thereby causing the electrolytic plating. Since the liquid 18 does not form a droplet (FIG. 5D) on the outer peripheral surface of the tip port 15 a, the electrolytic plating solution 18 can be supplied to the end surface of the disconnected portion M with high accuracy.

アノード14は軸状で、アノード進退手段14Aによって該軸方向に進退可能にされており、アノード14の先端と断線部M(図3(a))の端面との距離を電解メッキの条件に合わせて設定できるようになっている。 The anode 14 has an axial shape, and can be advanced and retracted in the axial direction by the anode advancing / retreating means 14A. The distance between the tip of the anode 14 and the end face of the disconnection portion M (FIG. 3A) is adjusted to the electrolytic plating conditions. Can be set.

アノード14とワーク6の断線部分Mの配線の端部には電解メッキをするための電圧を印加する電源装置14Bが接続されており、電源装置14Bには電解メッキ中の電流と電圧の表示ができるようになっており、アノード14の端部を接続コード16を介して電気メッキ用の電源装置14Bの正電極に接続している。電源装置14Bの負電極には接続コード16を介して断線部分Mの配線を接続しカソード17を形成している。 A power supply device 14B for applying a voltage for electrolytic plating is connected to the anode 14 and the end of the wire M of the disconnected portion M of the work 6, and the power supply device 14B displays current and voltage during electrolytic plating. The end of the anode 14 is connected to the positive electrode of the power supply device 14B for electroplating via the connection cord 16. The negative electrode of the power supply device 14 </ b> B is connected to the wire of the disconnected portion M via the connection cord 16 to form the cathode 17.

制御ユニット5は制御装置5Aと外部入力装置5Bを備えており、制御装置5Aにはテーブル移動手段4、可変スリット8のスリット駆動手段、レーザ照射器9Aの開閉スイッチ、CCDカメラ10、照明手段9C、紫外光照射器9B、ディスペンサーノズル移動手段13A、ディスペンサーノズル移動手段15A、アノード進退手段14A、電源装置14B、外部入力装置5Aが電気的に接続しており、外部入力装置5Aによって可変スリット8の開口部8Eの形状および中心位置の設定が自由に行えるようになっている。
制御装置17によって、電気メッキによる前記配線パターンの断線部MのCuの析出速度に応じた速度でワーク6を移動させるようになっており、常時、アノード14と断線部MのCu析出面との間隔を所定距離に保持できるように、テーブル移動手段4が制御できるようになっている。
The control unit 5 includes a control device 5A and an external input device 5B. The control device 5A includes a table moving means 4, a slit driving means for the variable slit 8, an open / close switch for the laser irradiator 9A, a CCD camera 10, and an illumination means 9C. The ultraviolet light irradiator 9B, the dispenser nozzle moving means 13A, the dispenser nozzle moving means 15A, the anode advance / retreat means 14A, the power supply device 14B, and the external input device 5A are electrically connected, and the external input device 5A The shape and center position of the opening 8E can be freely set.
The control device 17 moves the workpiece 6 at a speed corresponding to the deposition rate of Cu in the disconnected portion M of the wiring pattern by electroplating. The table moving means 4 can be controlled so that the interval can be maintained at a predetermined distance.

次に、前記実施の形態の配線パターン補修装置1による本発明に係る配線パターン補修方法を図4に基づいて図1〜図3も用いて説明する。
先ず、レーザ光照射器9Aの開閉スイッチ及び紫外光照射器9Bの開閉シャッターが閉の状態であることを確認してから、ワーク6を載置台4A上に載置した後、照明手段9Cを作動させてから、外部入力装置5Bを用いて制御装置5を介してワーク6の断線部分M(図3(a))が対物レンズ11の直下に位置するようにワーク6を移動させる。(ステップ1)
続いて、CCDカメラ10によって断線部分Mを撮影し、撮影した画像を表示器11に表示さ、その画像に合わせて、前記可変スリット駆動手段を作動させ、可変スリット8の開口部8Eの形状を調整する。(ステップ2)
Next, the wiring pattern repairing method according to the present invention by the wiring pattern repairing apparatus 1 of the above embodiment will be described with reference to FIGS.
First, after confirming that the open / close switch of the laser light irradiator 9A and the open / close shutter of the ultraviolet light irradiator 9B are closed, the work 6 is mounted on the mounting table 4A, and then the illumination means 9C is activated. After that, the workpiece 6 is moved using the external input device 5 </ b> B through the control device 5 so that the disconnected portion M (FIG. 3A) of the workpiece 6 is positioned directly below the objective lens 11. (Step 1)
Subsequently, the disconnection portion M is photographed by the CCD camera 10, the photographed image is displayed on the display 11, and the variable slit driving means is operated in accordance with the image, and the shape of the opening 8E of the variable slit 8 is changed. adjust. (Step 2)

次に、第1のディスペンサーノズル移動手段13Aによって、第1のディスペンサー13の先端を断線部分Mの近傍に接近させて、紫外光硬化性樹脂供給装置13Bを作動し、断線部分Mを含む所定の範囲を覆うように、紫外光硬化性樹脂7を供給して後(図3(b))、第1のディスペンサーノズル移動手段13Aを作動させて、第1のディスペンサー13の先端を紫外光が照射されない位置(以下、「ディスペンサー13の原点位置」という)まで後退させる。(ステップ3) Next, the first dispenser nozzle moving means 13A moves the tip of the first dispenser 13 close to the vicinity of the disconnected portion M, operates the ultraviolet light curable resin supply device 13B, and includes a predetermined portion including the disconnected portion M. After supplying the ultraviolet curable resin 7 so as to cover the range (FIG. 3B), the first dispenser nozzle moving means 13A is operated to irradiate the tip of the first dispenser 13 with ultraviolet light. Retreat to a position where it is not performed (hereinafter referred to as “the origin position of the dispenser 13”). (Step 3)

その後、紫外光照射器9Bの開閉シャッターを開にして、該紫外光硬化性樹脂7を硬化させてから、紫外光照射器9Bの開閉シャッターを閉にする。(ステップ4)
その後、レーザ照射器9Aの開閉スイッチを開にして、前記紫外光硬化された樹脂の所定の部分にレーザを照射して(図3(c))、当該部分の前記樹脂を除去し、図3(d)のように、断線部分Mを紫外光硬化樹脂7で囲んだ囲いNを形成する。(ステップ5)
Thereafter, the open / close shutter of the ultraviolet light irradiator 9B is opened to cure the ultraviolet light curable resin 7, and then the open / close shutter of the ultraviolet light irradiator 9B is closed. (Step 4)
Thereafter, the open / close switch of the laser irradiator 9A is opened, and a predetermined portion of the ultraviolet light cured resin is irradiated with laser (FIG. 3C), and the resin in the portion is removed. As shown in (d), an enclosure N in which the broken portion M is surrounded by the ultraviolet light curable resin 7 is formed. (Step 5)

その後、図3(e)に示すように、第2のディスペンサーノズル移動手段15Aによって囲いNに第2のディスペンサーノズル15を、アノード14と一体的に接近させた後、電気メッキ液供給装置15Aを作動させて、第2のディスペンサーノズル15から囲いN内の前記断線部分Mの端面近傍に、所定の量のCu塩からなる電解メッキ液18を供給する。(ステップ6) Thereafter, as shown in FIG. 3 (e), the second dispenser nozzle 15 is moved closer to the enclosure N by the second dispenser nozzle moving means 15A, and then the electroplating solution supply device 15A is moved to the enclosure N. By actuating, an electrolytic plating solution 18 made of a predetermined amount of Cu salt is supplied from the second dispenser nozzle 15 to the vicinity of the end face of the disconnected portion M in the enclosure N. (Step 6)

更に、第2のディスペンサーノズル15の位置を保持したまま、アノード14をアノード進退手段14Aを作動させて、断線部分Mの端面とアノード14の先端との間隙が所定範囲内になるように位置決めして保持する。
次に、電源装置14Bを作動させて、アノード14とカソード17との間に電圧を印加して、断線部分Mの端面にCuを析出させる。(ステップ7)
Further, while maintaining the position of the second dispenser nozzle 15, the anode 14 is positioned so that the gap between the end face of the broken portion M and the tip of the anode 14 is within a predetermined range by operating the anode advance / retreat means 14A. Hold.
Next, the power supply device 14B is operated, and a voltage is applied between the anode 14 and the cathode 17 to deposit Cu on the end face of the disconnected portion M. (Step 7)

その際、断線部分Mの端面に析出したCuによって、断線部Mの端面とアノード14の先端との間隙が初期設定値より減少するため、断線部Mの端面とアノード14の先端との間隙を初期設定値するようにワークWをテーブル移動手段4Cによって図3(e)の矢印ニの方向に移動させながら電解メッキを行う。(ステップ8)
そして、断線部MにCuが析出し、配線パターンが補修接続された後、電源装置14Bからの電圧印加を停止してからアノード14をアノード進退手段14Aを作動させて、図示しないアノード14の原点位置に後退させる共に、第2のディスペンサーノズル移動手段15Aを作動させて、第2のディスペンサーノズル15を所定の位置(第2のディスペンサーノズル15の先端口15aがレーザ照射器9からのレーザ光および紫外光照射器9Bからの紫外光に晒されない位置)まで後退させる。(ステップ9)
その後、レーザ照射器9Aの開閉スイッチを開にして、可変スリット8のスリット駆動手段を作動させてスリット開口部8Eの面積を拡げて、図3(g)、(h)のように囲いN全体にレーザ光を照射して除去する。(ステップ10)
そして、その他の配線パターンの断線部分があれば、その断線部分において上記の操作を繰り返し、補修箇所がなければ補修を終了する。
At this time, because the Cu deposited on the end face of the disconnection portion M reduces the gap between the end face of the disconnection portion M and the tip of the anode 14 from the initial setting value, the gap between the end face of the disconnection portion M and the tip of the anode 14 is reduced. Electrolytic plating is performed while moving the workpiece W in the direction of the arrow D in FIG. (Step 8)
Then, after Cu is deposited in the disconnection portion M and the wiring pattern is repaired and connected, the voltage application from the power supply device 14B is stopped, and then the anode 14 is operated by the anode advancing / retreating means 14A. At the same time, the second dispenser nozzle moving means 15A is operated to move the second dispenser nozzle 15 to a predetermined position (the tip port 15a of the second dispenser nozzle 15 has a laser beam from the laser irradiator 9 and Retreat to the position where the ultraviolet light from the ultraviolet light irradiator 9B is not exposed. (Step 9)
Thereafter, the open / close switch of the laser irradiator 9A is opened, the slit driving means of the variable slit 8 is activated to increase the area of the slit opening 8E, and the entire enclosure N as shown in FIGS. Are removed by laser irradiation. (Step 10)
If there is a disconnection portion of another wiring pattern, the above operation is repeated at the disconnection portion, and if there is no repair portion, the repair is terminated.

上記したように本実施例の配線パターン補修方法及び配線パターン補修装置によれば、断線部分Mの配線パターンに合わせて、電解メッキ液18を充填する樹脂の囲いNを作ることにより、複雑な配線の断線に対しても、被補修箇所のみに電解メッキ液18を充填維持できるため、周辺部分に影響を及ぼすことなく補修ができる。
また、補修後に余剰の電解メッキ液18をレーザ光で蒸発させると共に、囲いNをレーザ光によって除去できるため、後処理が容易に行える。
As described above, according to the wiring pattern repairing method and the wiring pattern repairing apparatus of the present embodiment, the complicated wiring can be obtained by forming the resin enclosure N filled with the electrolytic plating solution 18 in accordance with the wiring pattern of the disconnected portion M. Even in the case of disconnection, since the electrolytic plating solution 18 can be filled and maintained only in the repaired portion, the repair can be performed without affecting the peripheral portion.
Further, after the repair, the excess electrolytic plating solution 18 is evaporated with laser light, and the enclosure N can be removed with the laser light, so that post-processing can be easily performed.

さらに、配線パターンと同じ組成のCuを析出させて補修するため、補修後の仕上がり状態が配線パターンと区別しにくくなり、配線パターンの外観を良くすることができる。
また、電解メッキ時においてワーク6をCuの析出速度に応じて移動させるようにしたことにより、アノード14と断線部分MのCu析出面との間隔が一定となるため、電解メッキを効率良く行うことができる。
Furthermore, since Cu having the same composition as the wiring pattern is deposited and repaired, the finished state after the repair is difficult to distinguish from the wiring pattern, and the appearance of the wiring pattern can be improved.
In addition, since the work 6 is moved according to the Cu deposition rate during electrolytic plating, the distance between the anode 14 and the Cu deposition surface of the disconnected portion M becomes constant, so that the electrolytic plating can be performed efficiently. Can do.

そして、さらに、CCDカメラ10により、配線パターンの補修作業の進行状況を確認しながら正確な修正を行うことができる上、電解メッキ中の電源装置14Bの電流値を監視することにより、断線部分Mの導電性修復されているか否かの確認ができる。 Further, the CCD camera 10 can correct the wiring pattern while confirming the progress of the wiring pattern repairing operation. Further, by monitoring the current value of the power supply device 14B during the electrolytic plating, It is possible to confirm whether or not the electrical conductivity is repaired.

なお、本発明は上記実施例のみに限定されることはなく、本発明の趣旨を逸脱しない範囲で以下のようにしてもよい。
即ち、また、上記実施例では、ワーク6を載置台4A上に載置してテーブル移動手段4Cによって移動させるようにしたが、逆に、配線パターン補修ユニット2、光学ユニット3を移動させるようにしてもよい。
It should be noted that the present invention is not limited to the above embodiments, and may be as follows without departing from the spirit of the present invention.
That is, in the above embodiment, the work 6 is placed on the mounting table 4A and moved by the table moving means 4C. Conversely, the wiring pattern repair unit 2 and the optical unit 3 are moved. May be.

さらに、配線パターンの電気メッキの際に析出するCuの析出量を配線パターンの電気抵抗を計測し、その計測値に基づいて制御部によってワーク6の移動速度を制御するようにしてもよい。
さらに、また、上記実施例ではワーク6の移動に合わせてアノード14の外面に沿って必要最小限の電解メッキ液18を補給しながら断線部Mにワーク6の移動方向にCuを析出させているが、先に囲いN内を電解メッキ液18で満たしてから、ワーク6を移動させてもよい。
Further, the amount of Cu deposited during the electroplating of the wiring pattern may be measured by measuring the electrical resistance of the wiring pattern, and the moving speed of the workpiece 6 may be controlled by the control unit based on the measured value.
Furthermore, in the above-described embodiment, Cu is deposited in the moving direction of the workpiece 6 in the disconnection portion M while supplying the minimum necessary amount of the electrolytic plating solution 18 along the outer surface of the anode 14 in accordance with the movement of the workpiece 6. However, the work 6 may be moved after the enclosure N is filled with the electrolytic plating solution 18 first.

その他、アノード14の先端は、図5(a)〜図5(c)に示すように、アノード進退手段14Aによって第2のディスペンサーノズル15の先端口15aから出入りできるようにしてもよい。
この場合、先端口15aはアノード14の進退のガイドとしての機能し、先端口15aの内面とアノード14の外面との隙間の電解メッキ液18は先端口15aの内面とアノード14の外面との摺動時に潤滑材としても作用する。
In addition, as shown in FIGS. 5A to 5C, the tip of the anode 14 may be made to enter and exit from the tip port 15a of the second dispenser nozzle 15 by the anode advance / retreat means 14A.
In this case, the tip port 15 a functions as a guide for the advance and retreat of the anode 14, and the electroplating solution 18 in the gap between the inner surface of the tip port 15 a and the outer surface of the anode 14 slides between the inner surface of the tip port 15 a and the outer surface of the anode 14. Also acts as a lubricant when moving.

そして、アノード14を先端口15aから露出させながら、図5(c)に示すようにアノード14の外面に沿って電解メッキ液18をワーク6の断線部分Mに供給することによって、ワーク6の断線部分Mへの電解メッキ液18の供給量の調整をさらに精度よく行うことができるようになる。
これによって、先端口15aを断線部分Mの端面に接触させずに電解メッキ液18を供給しても図5(d)のように電解メッキ液18が先端口15aの外周面に液滴を形成することがなく、最小限な吐出量にできる。
Then, while the anode 14 is exposed from the tip end 15a, the electrolytic plating solution 18 is supplied to the disconnected portion M of the workpiece 6 along the outer surface of the anode 14 as shown in FIG. The supply amount of the electrolytic plating solution 18 to the portion M can be adjusted with higher accuracy.
Thus, even when the electrolytic plating solution 18 is supplied without bringing the tip end 15a into contact with the end face of the broken portion M, the electrolytic plating solution 18 forms droplets on the outer peripheral surface of the tip end 15a as shown in FIG. The minimum discharge amount can be achieved.

さらに、また、軸状のアノード14を第2のディスペンサー15に内蔵し、アノード進退手段14Aによってアノード14をその軸方向に進退させるようになっているが、図6に示すように、第2のディスペンサー15の内壁にアノード14をメッキや蒸着したものでもよい。この実施の形態では、アノード14は第2のディスペンサーノズル15と一体的にディスペンサーノズル移動手段15Aによって、図1の矢印α方向に移動するため、断線部分Mとアノード14の間隔は、第2のディスペンサーノズル15と断線部分Mとの間隔によって調整する。
尚、上記実施例では、Cu−Pからなるアノード14を使用したが、代わりに、不溶性のPtからなるアノード14を使用してもよい。
Furthermore, the axial anode 14 is built in the second dispenser 15, and the anode 14 is advanced and retracted in the axial direction by the anode advance / retreat means 14A. As shown in FIG. The anode 14 may be plated or deposited on the inner wall of the dispenser 15. In this embodiment, the anode 14 is moved integrally with the second dispenser nozzle 15 by the dispenser nozzle moving means 15A in the direction of the arrow α in FIG. It adjusts with the space | interval of the dispenser nozzle 15 and the disconnection part M. FIG.
In the above embodiment, the anode 14 made of Cu—P is used. Alternatively, the anode 14 made of insoluble Pt may be used.

本発明に係る電子回路の配線パターン補修装置の一実施の形態を示す概念図である。It is a conceptual diagram which shows one Embodiment of the wiring pattern repair apparatus of the electronic circuit which concerns on this invention. 可変スリットを示す概念図である。It is a conceptual diagram which shows a variable slit. 本発明に係る電子回路の配線パターン補修方法を示す概略説明図である。It is a schematic explanatory drawing which shows the wiring pattern repair method of the electronic circuit which concerns on this invention. 本発明に係る電子回路の配線パターン補修方法の工程を示す図である。It is a figure which shows the process of the wiring pattern repair method of the electronic circuit which concerns on this invention. 本発明に係る電子回路の配線パターン補修装置においてアノードをディスペンサーノズル先端口から出入りさせる場合の説明図である。It is explanatory drawing in the case of making an anode enter / exit from a dispenser nozzle front-end | tip opening | mouth in the wiring pattern repair apparatus of the electronic circuit which concerns on this invention. 本発明に係る電子回路の配線パターン補修装置においてディスペンサーノズル内壁にアノードを形成した場合の概念図である。It is a conceptual diagram at the time of forming an anode in the inner wall of the dispenser nozzle in the wiring pattern repair device for an electronic circuit according to the present invention.

符号の説明Explanation of symbols

1 電子回路の配線パターン補修装置
2 配線補修ユニット
3 光学系ユニット
4 テーブルユニット
5 制御ユニット
6 ワーク
7 紫外光硬化性樹脂
8 可変スリット
9 レーザ照射器
9B 紫外光照射器
10 CCDカメラ
11 表示器
13 第1のディスペンサーノズル
14 アノード
15 第2のディスペンサーノズル
1 Electronic circuit wiring pattern repair device 2 Wiring repair unit 3 Optical system unit 4 Table unit 5 Control unit 6 Work 7 Ultraviolet light curable resin 8 Variable slit 9 Laser irradiator 9B Ultraviolet light irradiator 10 CCD camera 11 Display 13 1 dispenser nozzle 14 anode 15 second dispenser nozzle

Claims (2)

断線等の生じた電子回路基板の配線パターンの該断線部分を含む所定の範囲に紫外光硬化性樹脂を供給してから、該紫外光硬化性樹脂を硬化させ、
その後、前記所定の範囲上の前記硬化された樹脂の一部を除去してから、該除去された樹脂の部分にアノードを内蔵するディスペンサーノズルを介して電解液を供給して後、
前記断線部の端面と該アノードとの間に電圧を印加することにより、前記断線部の端面と該アノードの間で電解メッキを行って、配線パターンを補修する電子回路の配線パターン補修方法。
After supplying the ultraviolet curable resin to a predetermined range including the disconnected portion of the wiring pattern of the electronic circuit board in which disconnection or the like has occurred, the ultraviolet curable resin is cured,
Then, after removing a part of the cured resin on the predetermined range, after supplying an electrolytic solution through a dispenser nozzle incorporating an anode to the removed resin part,
An electronic circuit wiring pattern repair method for repairing a wiring pattern by applying a voltage between an end surface of the disconnection portion and the anode, thereby performing electrolytic plating between the end surface of the disconnection portion and the anode.
断線等の生じた電子回路基板の配線パターンの該断線部分を含む所定の範囲に紫外光硬化性樹脂を供給する手段と、
電子回路基板の配線パターンの該断線部分を含む所定の範囲に供給された紫外光硬化性樹脂を硬化させる手段と、
前記紫外光によって硬化された樹脂の一部を除去する除去手段と、
前記除去手段によって除去された部分にアノードを内蔵するノズルを介して電解液を供給するための電解液供給手段と、
前記ノズルの先端と前記断線部の端面との間隙を所定の間隙内に配置する配置手段と、前記アノードと前記断線部の端面の間に電圧を印加する印加手段と、
を備えたことを特徴とする電子回路基板の配線補修用装置。
Means for supplying an ultraviolet curable resin to a predetermined range including the disconnected portion of the wiring pattern of the electronic circuit board in which disconnection or the like has occurred;
Means for curing the ultraviolet light curable resin supplied to a predetermined range including the disconnected portion of the wiring pattern of the electronic circuit board;
Removing means for removing a part of the resin cured by the ultraviolet light;
An electrolytic solution supply means for supplying an electrolytic solution through a nozzle having a built-in anode to the portion removed by the removing means;
Disposing means for disposing a gap between the tip of the nozzle and the end face of the disconnection part within a predetermined gap; and applying means for applying a voltage between the anode and the end face of the disconnection part;
An apparatus for repairing wiring of an electronic circuit board, comprising:
JP2005230709A 2005-07-15 2005-08-09 Wiring pattern repair method and wiring pattern repair device for electronic circuit board Expired - Fee Related JP4701036B2 (en)

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