JP2009123855A - Method of repairing defects of wiring substrate - Google Patents

Method of repairing defects of wiring substrate Download PDF

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JP2009123855A
JP2009123855A JP2007295121A JP2007295121A JP2009123855A JP 2009123855 A JP2009123855 A JP 2009123855A JP 2007295121 A JP2007295121 A JP 2007295121A JP 2007295121 A JP2007295121 A JP 2007295121A JP 2009123855 A JP2009123855 A JP 2009123855A
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wiring
wiring board
defect
missing
amount
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JP5076823B2 (en
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Wataru Goto
渉 後藤
Naoto Kamegawa
直人 亀川
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of repairing defects of a wiring substrate capable of repairing a missing part of a wiring pattern to planar without a prominence and easily. <P>SOLUTION: This repairing method includes: detecting a missing part 34 of a wiring pattern 32 and a missing amount thereof; and preparing a paste in an amount corresponding to the missing amount and applying the paste to the wiring substrate through a dispenser 36 to cure the paste. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、配線基板の製造工程で生じやすい配線パターンの断線や凹み等を補修する配線基板の欠陥補修方法に関する。   The present invention relates to a defect repairing method for a wiring board that repairs a disconnection, a dent, or the like of a wiring pattern that easily occurs in a manufacturing process of the wiring board.

近年、電子機器の小型化、高性能化に伴い、配線基板における配線の微細化および高密度化が要求されている。このため、配線基板の製造工程では、配線の線幅と線間隔を狭くしようとすると、配線を無欠陥で形成するのが難しく、断線や凹み等の欠陥が生じ易い。   In recent years, with the miniaturization and high performance of electronic devices, there is a demand for finer and higher density wiring on a wiring board. For this reason, in the manufacturing process of the wiring board, if it is attempted to reduce the line width and the line interval of the wiring, it is difficult to form the wiring without defects, and defects such as disconnection and dent are likely to occur.

そこで、このような断線や凹み等が生じた場合には、断線箇所等に線材を接続する補修方法が提案されている(例えば特許文献1参照)。例えば図5に示すように、絶縁基板51上に配線パターン52を含む配線層を形成した後、配線パターン52に断線箇所54等の欠陥が検出された場合には、断線箇所54に断線幅と同じ幅の線材53の両端を半田付けすることによって断線の修正が行われていた。   In view of this, a repair method has been proposed in which a wire is connected to a broken portion or the like when such a break or dent occurs (see, for example, Patent Document 1). For example, as shown in FIG. 5, after a wiring layer including the wiring pattern 52 is formed on the insulating substrate 51, when a defect such as the disconnection portion 54 is detected in the wiring pattern 52, the disconnection portion 54 The disconnection was corrected by soldering both ends of the wire 53 having the same width.

しかしながら、このような線材53を用いた従来の補修方法では、線材53の厚みの分だけ修正された箇所が盛り上がるため、修正された配線パターン52上に絶縁層55を積層すると、絶縁層55のその部位の厚さが薄くなり、特に薄型化を要求されるような層間厚の薄い多層基板の場合には絶縁性を確保することが困難であった。また、この方法では、配線の線幅と線間隔が狭いため、高度の位置合わせ精度が求められ、作業性が悪化しやすい。
特開平5−283823号公報
However, in the conventional repair method using such a wire 53, the corrected portion is raised by the thickness of the wire 53. Therefore, when the insulating layer 55 is stacked on the corrected wiring pattern 52, the insulating layer 55 In the case of a multilayer substrate having a thin interlayer thickness that requires a reduction in the thickness of the portion, and in particular, it is difficult to ensure insulation. Also, with this method, since the line width and line spacing of the wiring are narrow, a high degree of alignment accuracy is required, and workability is likely to deteriorate.
JP-A-5-283823

本発明の目的は、このような問題に対処するためになされたもので、配線パターンの欠落箇所を盛り上がりなく平坦に、かつ容易に補修することが可能な配線基板の欠陥補修方法を提供することにある。   SUMMARY OF THE INVENTION An object of the present invention is to solve such a problem, and provides a defect repair method for a wiring board capable of easily repairing a missing portion of a wiring pattern without being raised and flat. It is in.

本発明に係る配線基板の欠陥補修方法は、配線基板の配線層の欠落箇所とその欠落量を検出する欠陥検出工程と、前記欠陥検出工程で検出された欠落箇所に前記欠落量に見合った量の導電性ペーストを塗布する塗布工程と、前記塗布工程で塗布された導電性ペーストを硬化させる硬化工程と、前記配線層上に絶縁層を被覆する絶縁層被覆工程とを具備することを特徴とする。   A defect repair method for a wiring board according to the present invention includes a defect detection step for detecting a missing portion and a missing amount of a wiring layer of the wiring substrate, and an amount corresponding to the missing amount in the missing portion detected in the defect detecting step. A coating process for coating the conductive paste, a curing process for curing the conductive paste applied in the coating process, and an insulating layer coating process for coating an insulating layer on the wiring layer. To do.

すなわち、配線基板の製造工程において、配線層の欠落箇所とその欠落量を検出し、欠落量に見合った量の導電性ペーストを塗布し硬化させてから、絶縁層を被覆する。これにより、配線層の欠落箇所を盛り上がりなく平坦に補修することができる。また、欠落箇所に例えば線材を接続する従来の補修方法に比べて、容易に補修することができる。   That is, in the manufacturing process of the wiring board, the missing portion and the missing amount of the wiring layer are detected, and an amount of conductive paste corresponding to the missing amount is applied and cured, and then the insulating layer is covered. Thereby, the missing part of the wiring layer can be repaired flat without being raised. Moreover, it can repair easily compared with the conventional repair method which connects a wire, for example to a missing part.

また、本発明に係る配線基板の欠陥補修方法は、前記硬化工程で硬化された導電性ペーストの配線からはみ出した部分を除去する除去工程をさらに具備することを特徴とする。
これによれば、配線層の欠落箇所に導電性ペーストを塗布し硬化させた後、配線からはみ出した部分を除去することで、より確実に平坦に補修することができる。
The defect repairing method for a wiring board according to the present invention further includes a removing step of removing a portion protruding from the wiring of the conductive paste cured in the curing step.
According to this, after apply | coating and hardening an electrically conductive paste to the missing part of a wiring layer, by removing the part which protruded from the wiring, it can repair more reliably flat.

また、本発明に係る配線基板の欠陥補修方法は、前記塗布工程における導電性ペーストの塗布は、ディスペンサにより行われることを特徴とする。
これによれば、配線層の欠落箇所に導電性ペーストを容易に塗布することができ、作業性が向上する。
The defect repairing method for a wiring board according to the present invention is characterized in that the application of the conductive paste in the coating step is performed by a dispenser.
According to this, the conductive paste can be easily applied to the missing portion of the wiring layer, and the workability is improved.

本発明によれば、配線パターンの欠落箇所を盛り上がりなく平坦に、かつ容易に補修することが可能である。   According to the present invention, the missing portion of the wiring pattern can be repaired flatly and easily without rising.

以下、本発明の実施の形態について説明するが、本発明はこれらに限定されるものではない。   Hereinafter, although embodiment of this invention is described, this invention is not limited to these.

図1は、本発明に係る配線基板の欠陥補修方法の概略を示すフローチャートである。   FIG. 1 is a flowchart showing an outline of a defect repair method for a wiring board according to the present invention.

予め絶縁基板上に配線パターンを含む配線層を形成しておき、光学的もしくは超音波による撮像手段を用いて、断線や凹み等により配線が欠落している位置とその欠落箇所の面積の検出を行う(S11、S12)。   A wiring layer including a wiring pattern is formed in advance on an insulating substrate, and an optical or ultrasonic imaging means is used to detect the position where the wiring is missing due to disconnection or dent and the area of the missing part. Perform (S11, S12).

光学的撮像手段を用いた場合には、例えばCCDカメラ等により配線パターンを撮像し、この画像データを検査基準となる無欠陥のCADデータと比較して、対応しない箇所を欠落箇所として抽出し、あわせてその面積を算出する。   In the case of using an optical imaging means, for example, a wiring pattern is imaged by a CCD camera or the like, and this image data is compared with defect-free CAD data as an inspection standard, and a non-corresponding portion is extracted as a missing portion, In addition, the area is calculated.

一方、超音波撮像手段を用いた場合には、配線パターンを超音波で掃印し、配線パターンで反射してエコーとなって帰還する超音波映像をトランスデューサーで検出し、この画像データを検査基準となる無欠陥のCADデータと比較して、対応しない箇所を欠落箇所として抽出し、あわせてその面積を算出する。次に、検出した欠落箇所の面積に所定の配線パターンの厚みを乗じて、欠落量を算出する。   On the other hand, when an ultrasonic imaging means is used, the wiring pattern is swept with ultrasonic waves, an ultrasonic image reflected by the wiring pattern and returned as an echo is detected with a transducer, and this image data is inspected. Compared with the reference defect-free CAD data, a non-corresponding portion is extracted as a missing portion, and the area is also calculated. Next, the missing amount is calculated by multiplying the detected area of the missing portion by the thickness of the predetermined wiring pattern.

次に、検出された欠落箇所に、例えばディスペンサ等で導電性ペーストの所定量を塗布する(S13)。導電性ペーストとしては、例えば銅、銀、金、カーボン等の導電性材料にフェノール系樹脂等のバインダー成分と溶剤を加え、ペースト状としたものが用いられる。上記導電性材料の粒径は、微細な配線(例えば50μm)を補修する上で、
1.0μm以下であることが好ましい。また、導電性ペーストの塗布量は、揮発して減量する分や塗布されたペーストが配線の線幅方向に流れ込む量を考慮して、算出された欠落量よりもやや多い量が好ましい。これによれば、検出された欠落箇所の面積(欠落量)に応じて塗布量を調整することで、補修された欠落箇所におけるペーストの盛り上がりを最小限に抑えることができる。なお、上記導電性材料には、粒径5〜10nmといったナノ粒子を用いることもできる。これによれば、欠落箇所に十分な数の超微細粒子が溶着して高い導電性を得ることができる。
Next, a predetermined amount of conductive paste is applied to the detected missing portion by using, for example, a dispenser (S13). As the conductive paste, for example, a paste obtained by adding a binder component such as a phenolic resin and a solvent to a conductive material such as copper, silver, gold, or carbon is used. The particle size of the conductive material is sufficient to repair fine wiring (for example, 50 μm)
It is preferable that it is 1.0 micrometer or less. The amount of the conductive paste applied is preferably slightly larger than the calculated missing amount in consideration of the amount that is reduced by evaporation and the amount of the applied paste flowing in the line width direction of the wiring. According to this, by adjusting the application amount according to the detected area (missing amount) of the missing portion, it is possible to minimize the swell of the paste at the repaired missing portion. Note that nanoparticles having a particle diameter of 5 to 10 nm can be used as the conductive material. According to this, a sufficient number of ultrafine particles are welded to the missing portion, and high conductivity can be obtained.

続いて、欠落箇所に塗布された導電性ペーストを加熱して硬化させる(S14)。硬化した後、例えば上記欠陥検出工程(S11)で用いた光学的もしくは超音波による撮像手段によって外観検査を行う(S15)。   Subsequently, the conductive paste applied to the missing portion is heated and cured (S14). After curing, an appearance inspection is performed by an optical or ultrasonic imaging means used in the defect detection step (S11), for example (S15).

外観検査で、導電性ペーストの過剰塗布によって生じる配線の厚み以上の盛り上がりや、配線の線幅からはみ出た部分を検出した場合には(S16)、例えばブレードもしくはレーザ照射等により、はみ出た部分を切削して平坦にすることが好ましい(S17)。ブレードにより切削する場合は、配線パターンの形状にブレードの切欠部が係合するように当接させて、配線パターンと平行にブレードを移動させることにより、余分なペーストを削り取って平坦にする。   In the appearance inspection, when a bulge exceeding the thickness of the wiring caused by excessive application of the conductive paste or a portion protruding from the line width of the wiring is detected (S16), the protruding portion is detected by, for example, blade or laser irradiation. It is preferable to cut and flatten (S17). When cutting with a blade, the excess paste is scraped off and flattened by moving the blade parallel to the wiring pattern by bringing the blade into contact with the shape of the wiring pattern so that the notch of the blade engages.

配線パターン上に絶縁層を積層することで(S18)、図2に示すような欠陥が補修された配線基板1が得られる。図2は、欠陥が補修された配線基板1を模式的に示す断面図である。   By laminating the insulating layer on the wiring pattern (S18), the wiring substrate 1 with the defects repaired as shown in FIG. 2 is obtained. FIG. 2 is a cross-sectional view schematically showing the wiring board 1 in which the defect is repaired.

図2に示すように、配線パターン2の断線箇所3を盛り上がりなく、平坦に補修することができる。これにより、配線パターン3を含む配線層上に絶縁層4を積層しても、その補修部位が平坦であるため絶縁性を確実に確保することができる。特に薄型化が要求されるような多層構造の配線基板に好適である。また、配線の欠落箇所に対して、光学的撮像手段等を用いてその位置と欠落量を検出し、欠落量に見合った量の導電性ペーストを例えばディスペンサ等で塗布するため、作業者に高度な位置合わせ精度がなくても、容易に効率よく補修することができる。   As shown in FIG. 2, the broken portion 3 of the wiring pattern 2 can be repaired flat without being raised. Thereby, even if the insulating layer 4 is laminated on the wiring layer including the wiring pattern 3, since the repaired portion is flat, insulation can be reliably ensured. In particular, it is suitable for a wiring board having a multilayer structure that requires a reduction in thickness. In addition, the position and the amount of missing portions are detected with respect to the missing portion of the wiring by using an optical imaging means, and an amount of conductive paste corresponding to the missing amount is applied by, for example, a dispenser. Even if the positioning accuracy is not high, it can be repaired easily and efficiently.

次に、本発明の第1の実施形態に係る配線基板の欠陥補修方法を図3と図4を用いて説明する。   Next, a defect repair method for a wiring board according to the first embodiment of the present invention will be described with reference to FIGS.

(第1の実施形態)
図3は、本実施形態に係る配線基板の欠陥補修装置の構成を模式的に示す図である。
(First embodiment)
FIG. 3 is a diagram schematically showing the configuration of the defect repair apparatus for a wiring board according to the present embodiment.

欠陥補修装置は、配線パターンを撮像するCCDカメラ21と、その撮像結果と検出基準となる配線パターンのCADデータを比較して欠陥を検出する欠陥検出部22と、検出された欠陥のある箇所にペーストを塗布するディスペンサを備えたペースト塗布部23と、塗布されたペーストを熱硬化するハロゲンランプ照明光源を備えた硬化部24と、硬化された余分なペーストを切削するブレードを備えた切削部25と、これらを制御する制御部26から構成されている。   The defect repairing apparatus includes a CCD camera 21 that images a wiring pattern, a defect detection unit 22 that detects a defect by comparing the imaging result and CAD data of a wiring pattern serving as a detection reference, and a detected defect location. A paste application unit 23 having a dispenser for applying paste, a curing unit 24 having a halogen lamp illumination light source for thermosetting the applied paste, and a cutting unit 25 having a blade for cutting the excess paste that has been cured. And a control unit 26 for controlling them.

以下、この装置を用いた配線基板の欠陥補修方法について図4を用いて説明する。図4は、本実施形態に係る配線基板の欠陥補修方法を模式的に示す工程図である。   Hereinafter, a defect repair method for a wiring board using this apparatus will be described with reference to FIG. FIG. 4 is a process diagram schematically showing the defect repairing method for the wiring board according to the present embodiment.

予め、片面銅張り板を用意し、その片面の銅箔をエッチングでパターン化して幅50μm、ピッチ80μmの配線パターン32を含む配線層を形成した後、図4(a)に示すように、配線パターン32の一部を人為的に断線させておく。   A single-sided copper-clad plate is prepared in advance, and the copper foil on one side is patterned by etching to form a wiring layer including a wiring pattern 32 having a width of 50 μm and a pitch of 80 μm. Then, as shown in FIG. A part of the pattern 32 is artificially disconnected.

このパターン断線を有する配線基板33をXYテーブル27(図3参照)上に載置し、XYテーブル27を駆動して配線基板33がCCDカメラ21の真下に来るように位置決めする。この配線基板33をCCDカメラ21により撮像し、欠陥検出部22にて、撮像結果と検出基準であるCADデータと比較して、配線パターン32の断線箇所34の座標位置を検出する。さらに、その断線箇所34の面積も検出して、これらのデータを制御部26に送る。   The wiring board 33 having this pattern disconnection is placed on the XY table 27 (see FIG. 3), and the XY table 27 is driven so that the wiring board 33 is positioned directly below the CCD camera 21. The wiring board 33 is imaged by the CCD camera 21, and the defect detection unit 22 detects the coordinate position of the disconnected portion 34 of the wiring pattern 32 by comparing the imaging result with the CAD data that is the detection reference. Further, the area of the broken portion 34 is also detected, and these data are sent to the control unit 26.

次に、制御部26に送られた断線箇所34の座標位置のデータに基づいて配線基板33が載置されたXYテーブル27を駆動し、ディスペンサ36が設置されたペースト塗布部23の真下に移動させる。図4(b)に示すように、断線箇所34にディスペンサ36により導電性ペースト35を塗布する。その塗布量は、制御部26に送られた断線箇所34の面積に配線パターン32の厚み12μmを乗じて求めた量よりもやや多い量であることが好ましい。なお、塗布した導電性ペースト35は、プロピレングリコールエーテルなどの有機溶媒に85〜95重量%の粒径0.5μmの銀粒子と、バインダー成分としてフェノール系樹脂とを混合して、粘度を300Pa・s(22℃)としたものである。   Next, the XY table 27 on which the wiring board 33 is placed is driven based on the data of the coordinate position of the disconnection point 34 sent to the control unit 26, and moves directly below the paste application unit 23 in which the dispenser 36 is installed. Let As shown in FIG. 4B, the conductive paste 35 is applied to the broken portion 34 by the dispenser 36. The coating amount is preferably slightly larger than the amount obtained by multiplying the area of the broken portion 34 sent to the control unit 26 by the thickness 12 μm of the wiring pattern 32. The applied conductive paste 35 is prepared by mixing 85 to 95% by weight of silver particles having a particle size of 0.5 μm and a phenol resin as a binder component in an organic solvent such as propylene glycol ether, and having a viscosity of 300 Pa · s (22 ° C.).

この後、配線基板33が載置されたXYテーブル27(図3参照)を駆動して、ハロゲンランプ照明光源が配置された硬化部24の真下に移動させて、この光源の熱によって導電性ペースト35を熱硬化する。   Thereafter, the XY table 27 (see FIG. 3) on which the wiring board 33 is placed is driven and moved directly below the curing portion 24 where the halogen lamp illumination light source is disposed, and the conductive paste is heated by the heat of the light source. 35 is heat cured.

次に、配線基板33が載置されたXYテーブル27を駆動して、再度、CCDカメラ21の真下に移動しCCDカメラ21により、この配線基板33を撮像する。欠陥検出部22で撮像結果と検出基準であるCADデータを比較する。   Next, the XY table 27 on which the wiring board 33 is placed is driven, and again moves directly under the CCD camera 21, and the CCD camera 21 images the wiring board 33. The defect detection unit 22 compares the imaging result with CAD data as a detection reference.

図4(c)に示すような配線パターン32の厚さからはみ出た硬化されたペースト(切削箇所)の座標位置を検出した場合には、この座標データに基づいて配線基板33が載置されたXYテーブル27を駆動して、配線パターン32の配線の断面に対応する切欠部を有するブレード37が設置された切削部25の真下に移動させ、ブレード37によって過剰に被覆された部分を削り取る。これにより、図4(d)に示すような、パターン断線が補修された配線基板33が得られる。この後、配線パターン32を覆うように絶縁層を積層する。   When the coordinate position of the hardened paste (cutting portion) protruding from the thickness of the wiring pattern 32 as shown in FIG. 4C is detected, the wiring substrate 33 is placed based on the coordinate data. The XY table 27 is driven to move directly below the cutting portion 25 where the blade 37 having a notch corresponding to the cross section of the wiring of the wiring pattern 32 is installed, and the portion excessively covered by the blade 37 is scraped off. As a result, a wiring board 33 with a broken pattern as shown in FIG. 4D is obtained. Thereafter, an insulating layer is laminated so as to cover the wiring pattern 32.

本実施形態によれば、配線パターン32の断線箇所34を盛り上がりなく平坦に補修することができる。また、断線箇所34に例えば線材を接続して補修する従来の方法と比べて、容易に補修することができ、作業性の向上を図ることができる。また、本実施形態の補修方法を用いて配線基板33を製造することにより、配線基板33の製造不良を低減して歩留まりを向上させることができる。   According to the present embodiment, the broken portion 34 of the wiring pattern 32 can be repaired flat without being raised. Moreover, compared with the conventional method of repairing by connecting, for example, a wire to the disconnection point 34, the repair can be easily performed, and the workability can be improved. In addition, by manufacturing the wiring board 33 using the repair method of the present embodiment, it is possible to reduce manufacturing defects of the wiring board 33 and improve the yield.

なお、本実施形態で得られた配線基板33について、TCT(温度サイクルテスト)、THB(高温高湿バイアステスト)を行い、信頼性を評価した。TCTでは、配線基板33をプレコンディション(30℃、70%RH下で216時間放置した後、260℃MAXでリフロー3回)した後、−65℃/30分〜125℃/30分の温度サイクルで500サイクル後の抵抗値を測定したところ、初期抵抗に対する抵抗上昇は10%以下であった。一方、THBでは、配線基板33をプレコンディション(30℃、70%RH下で216時間放置した後、260℃MAXでリフロー3回)した後、85℃、85%RHの条件で、この配線基板33に12Vのバイアス電圧を500時間印加した後、絶縁抵抗を測定したところ、10Ω以上であった。 The wiring board 33 obtained in this embodiment was subjected to TCT (temperature cycle test) and THB (high temperature and high humidity bias test) to evaluate reliability. In TCT, the wiring board 33 is preconditioned (for 30 hours at 70 ° C. and 70% RH and then reflowed at 260 ° C. MAX for 3 times), and then a temperature cycle of −65 ° C./30 minutes to 125 ° C./30 minutes. When the resistance value after 500 cycles was measured, the resistance increase with respect to the initial resistance was 10% or less. On the other hand, in THB, after the wiring board 33 is preconditioned (for 30 hours at 30 ° C. and 70% RH and then reflowed at 260 ° C. MAX for 3 times), this wiring board is subjected to conditions of 85 ° C. and 85% RH. After applying a bias voltage of 12 V to 33 for 500 hours, the insulation resistance was measured and found to be 10 8 Ω or more.

以上のことからも明らかなように、本実施形態によれば、信頼性に優れた配線基板33を得ることができる。   As is apparent from the above, according to the present embodiment, the wiring board 33 having excellent reliability can be obtained.

(その他の実施形態)
以上、本発明の各実施の形態により具体的に説明したが、本発明はこれらの実施形態に限定されるものではなく、その要旨を逸脱しない範囲で種々変更可能である。
(Other embodiments)
The embodiments of the present invention have been specifically described above, but the present invention is not limited to these embodiments, and various modifications can be made without departing from the scope of the present invention.

本発明に係る配線基板の欠陥補修方法のフローチャートを示した図。The figure which showed the flowchart of the defect repair method of the wiring board which concerns on this invention. 図1に示した方法によって欠陥が補修された配線基板を模式的に示す断面図。Sectional drawing which shows typically the wiring board by which the defect was repaired by the method shown in FIG. 本発明の第1の実施形態に係る欠陥補修装置を模式的に示す図。The figure which shows typically the defect repair apparatus which concerns on the 1st Embodiment of this invention. 図3に示した装置を用いた欠陥補修方法を模式的に示す工程図。Process drawing which shows typically the defect repair method using the apparatus shown in FIG. 従来の方法により補修された配線基板を模式的に示す断面図。Sectional drawing which shows typically the wiring board repaired by the conventional method.

符号の説明Explanation of symbols

1,33…配線基板、2,32,52…配線パターン、3,34,54…断線箇所、4,55…絶縁層、5,31,51…絶縁基板、21…CCDカメラ、22…欠陥検出部、23…ペースト塗布部、24…硬化部、25…切削部、26…制御部、27…XYテーブル、35…導電性ペースト、36…ディスペンサ、37…ブレード、53…線材。   DESCRIPTION OF SYMBOLS 1,33 ... Wiring board, 2, 32, 52 ... Wiring pattern, 3, 34, 54 ... Disconnection location, 4,55 ... Insulating layer, 5, 31, 51 ... Insulating board, 21 ... CCD camera, 22 ... Defect detection , 23 ... paste application part, 24 ... curing part, 25 ... cutting part, 26 ... control part, 27 ... XY table, 35 ... conductive paste, 36 ... dispenser, 37 ... blade, 53 ... wire.

Claims (3)

配線基板の配線層の欠落箇所とその欠落量を検出する欠陥検出工程と、
前記欠陥検出工程で検出された欠落箇所に前記欠落量に見合った量の導電性ペーストを塗布する塗布工程と、
前記塗布工程で塗布された導電性ペーストを硬化させる硬化工程と、
前記配線層上に絶縁層を被覆する絶縁層被覆工程と
を具備することを特徴とする配線基板の欠陥補修方法。
A defect detection step for detecting a missing portion of the wiring layer of the wiring board and the amount of the missing portion;
An application step of applying a conductive paste in an amount corresponding to the amount of the missing portion in the missing portion detected in the defect detecting step;
A curing step of curing the conductive paste applied in the coating step;
A defect repairing method for a wiring board, comprising: an insulating layer coating step for coating an insulating layer on the wiring layer.
前記硬化工程で硬化された導電性ペーストの配線からはみ出した部分を除去する除去工程をさらに具備することを特徴とする請求項1に記載の配線基板の欠陥補修方法。   The defect repairing method for a wiring board according to claim 1, further comprising a removing step of removing a portion protruding from the wiring of the conductive paste cured in the curing step. 前記塗布工程における導電性ペーストの塗布は、ディスペンサにより行われることを特徴とする請求項1又は2に記載の配線基板の欠陥補修方法。   The method for repairing a defect in a wiring board according to claim 1, wherein the application of the conductive paste in the application step is performed by a dispenser.
JP2007295121A 2007-11-14 2007-11-14 Wiring board defect repair method Expired - Fee Related JP5076823B2 (en)

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JP2011035094A (en) * 2009-07-31 2011-02-17 Dainippon Printing Co Ltd Method of repairing printed board pattern
KR102084148B1 (en) * 2018-11-28 2020-03-03 (주)에이치피케이 Apparatus for reparing electrode line and method for repairing electrode line using the same

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Publication number Priority date Publication date Assignee Title
JP2011035094A (en) * 2009-07-31 2011-02-17 Dainippon Printing Co Ltd Method of repairing printed board pattern
KR102084148B1 (en) * 2018-11-28 2020-03-03 (주)에이치피케이 Apparatus for reparing electrode line and method for repairing electrode line using the same

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