JP2005136370A - 基板処理装置 - Google Patents
基板処理装置 Download PDFInfo
- Publication number
- JP2005136370A JP2005136370A JP2004044030A JP2004044030A JP2005136370A JP 2005136370 A JP2005136370 A JP 2005136370A JP 2004044030 A JP2004044030 A JP 2004044030A JP 2004044030 A JP2004044030 A JP 2004044030A JP 2005136370 A JP2005136370 A JP 2005136370A
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- JP
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- Prior art keywords
- temperature
- wafer
- heater
- control
- boat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012545 processing Methods 0.000 title claims abstract description 73
- 239000000758 substrate Substances 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 20
- 238000001514 detection method Methods 0.000 claims abstract description 5
- 239000010409 thin film Substances 0.000 abstract description 4
- 235000012431 wafers Nutrition 0.000 description 64
- 238000006243 chemical reaction Methods 0.000 description 43
- 238000010438 heat treatment Methods 0.000 description 26
- 239000007789 gas Substances 0.000 description 19
- 238000009792 diffusion process Methods 0.000 description 15
- 238000012546 transfer Methods 0.000 description 14
- 238000011282 treatment Methods 0.000 description 14
- 230000003647 oxidation Effects 0.000 description 13
- 238000007254 oxidation reaction Methods 0.000 description 13
- 238000010926 purge Methods 0.000 description 9
- 239000010408 film Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 230000001965 increasing effect Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000002791 soaking Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000000137 annealing Methods 0.000 description 2
- POIUWJQBRNEFGX-XAMSXPGMSA-N cathelicidin Chemical compound C([C@@H](C(=O)N[C@@H](CCCNC(N)=N)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](CO)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H]([C@@H](C)CC)C(=O)NCC(=O)N[C@@H](CCCCN)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](CC=1C=CC=CC=1)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](CCCNC(N)=N)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](C(C)C)C(=O)N[C@@H](CCC(N)=O)C(=O)N[C@@H](CCCNC(N)=N)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CCCCN)C(=O)N[C@@H](CC(O)=O)C(=O)N[C@@H](CC=1C=CC=CC=1)C(=O)N[C@@H](CC(C)C)C(=O)N[C@@H](CCCNC(N)=N)C(=O)N[C@@H](CC(N)=O)C(=O)N[C@@H](CC(C)C)C(=O)N[C@@H](C(C)C)C(=O)N1[C@@H](CCC1)C(=O)N[C@@H](CCCNC(N)=N)C(=O)N[C@@H]([C@@H](C)O)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](CO)C(O)=O)NC(=O)[C@H](CC=1C=CC=CC=1)NC(=O)[C@H](CC(O)=O)NC(=O)CNC(=O)[C@H](CC(C)C)NC(=O)[C@@H](N)CC(C)C)C1=CC=CC=C1 POIUWJQBRNEFGX-XAMSXPGMSA-N 0.000 description 2
- 208000037998 chronic venous disease Diseases 0.000 description 2
- 230000003028 elevating effect Effects 0.000 description 2
- 239000003779 heat-resistant material Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
Images
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004044030A JP2005136370A (ja) | 2003-10-07 | 2004-02-20 | 基板処理装置 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003348222 | 2003-10-07 | ||
| JP2004044030A JP2005136370A (ja) | 2003-10-07 | 2004-02-20 | 基板処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005136370A true JP2005136370A (ja) | 2005-05-26 |
| JP2005136370A5 JP2005136370A5 (enExample) | 2007-10-25 |
Family
ID=34655959
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004044030A Pending JP2005136370A (ja) | 2003-10-07 | 2004-02-20 | 基板処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005136370A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016104679A (ja) * | 2014-12-01 | 2016-06-09 | 住友電気工業株式会社 | 炭化珪素単結晶の製造方法 |
| KR20190070978A (ko) | 2016-12-01 | 2019-06-21 | 가부시키가이샤 코쿠사이 엘렉트릭 | 기판 처리 장치, 천장 히터 및 반도체 장치의 제조 방법 |
| CN110335901A (zh) * | 2019-08-12 | 2019-10-15 | 无锡松煜科技有限公司 | 光伏电池表面钝化系统及钝化方法 |
| CN113237234A (zh) * | 2021-05-24 | 2021-08-10 | 四川九门科技股份有限公司 | 一种小型水浴式燃气管道间接加热装置及恒温加热方法 |
-
2004
- 2004-02-20 JP JP2004044030A patent/JP2005136370A/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016104679A (ja) * | 2014-12-01 | 2016-06-09 | 住友電気工業株式会社 | 炭化珪素単結晶の製造方法 |
| KR20190070978A (ko) | 2016-12-01 | 2019-06-21 | 가부시키가이샤 코쿠사이 엘렉트릭 | 기판 처리 장치, 천장 히터 및 반도체 장치의 제조 방법 |
| US12241159B2 (en) | 2016-12-01 | 2025-03-04 | Kokusai Electric Corporation | Substrate processing apparatus and ceiling heater |
| CN110335901A (zh) * | 2019-08-12 | 2019-10-15 | 无锡松煜科技有限公司 | 光伏电池表面钝化系统及钝化方法 |
| CN110335901B (zh) * | 2019-08-12 | 2024-04-16 | 无锡松煜科技有限公司 | 光伏电池表面钝化系统及钝化方法 |
| CN113237234A (zh) * | 2021-05-24 | 2021-08-10 | 四川九门科技股份有限公司 | 一种小型水浴式燃气管道间接加热装置及恒温加热方法 |
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