JP2005108709A - プラズマ処理方法及びプラズマ処理装置 - Google Patents
プラズマ処理方法及びプラズマ処理装置 Download PDFInfo
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- JP2005108709A JP2005108709A JP2003342196A JP2003342196A JP2005108709A JP 2005108709 A JP2005108709 A JP 2005108709A JP 2003342196 A JP2003342196 A JP 2003342196A JP 2003342196 A JP2003342196 A JP 2003342196A JP 2005108709 A JP2005108709 A JP 2005108709A
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- Prior art keywords
- plasma
- electrodes
- gas
- discharge
- generation
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- 238000000034 method Methods 0.000 title claims abstract description 138
- 238000009832 plasma treatment Methods 0.000 title abstract description 16
- 208000028659 discharge Diseases 0.000 claims description 176
- 238000012545 processing Methods 0.000 claims description 102
- 238000003672 processing method Methods 0.000 claims description 32
- 239000007789 gas Substances 0.000 description 164
- 239000011521 glass Substances 0.000 description 50
- -1 polyethylene Polymers 0.000 description 39
- 239000004698 Polyethylene Substances 0.000 description 36
- 229920000573 polyethylene Polymers 0.000 description 36
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 229910001873 dinitrogen Inorganic materials 0.000 description 12
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 11
- 229910001882 dioxygen Inorganic materials 0.000 description 11
- 238000012546 transfer Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- 238000001035 drying Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
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- 238000010521 absorption reaction Methods 0.000 description 3
- 238000012790 confirmation Methods 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
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- 230000007723 transport mechanism Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010891 electric arc Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000011900 installation process Methods 0.000 description 2
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
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- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
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- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
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- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 229910052757 nitrogen Inorganic materials 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
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- Plasma Technology (AREA)
- Cleaning In General (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003342196A JP2005108709A (ja) | 2003-09-30 | 2003-09-30 | プラズマ処理方法及びプラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003342196A JP2005108709A (ja) | 2003-09-30 | 2003-09-30 | プラズマ処理方法及びプラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005108709A true JP2005108709A (ja) | 2005-04-21 |
| JP2005108709A5 JP2005108709A5 (enExample) | 2005-07-14 |
Family
ID=34536561
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003342196A Pending JP2005108709A (ja) | 2003-09-30 | 2003-09-30 | プラズマ処理方法及びプラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005108709A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007188690A (ja) * | 2006-01-12 | 2007-07-26 | Matsushita Electric Ind Co Ltd | 大気圧プラズマ処理方法及び装置 |
| JP2008112923A (ja) * | 2006-10-31 | 2008-05-15 | Sekisui Chem Co Ltd | プラズマ処理方法および処理装置 |
| JP2008112971A (ja) * | 2006-10-06 | 2008-05-15 | Tokyo Electron Ltd | 基板処理方法、基板処理装置、プログラムならびに記録媒体 |
| JP2013193353A (ja) * | 2012-03-21 | 2013-09-30 | Seiko Epson Corp | 画像記録装置、画像記録方法 |
-
2003
- 2003-09-30 JP JP2003342196A patent/JP2005108709A/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007188690A (ja) * | 2006-01-12 | 2007-07-26 | Matsushita Electric Ind Co Ltd | 大気圧プラズマ処理方法及び装置 |
| JP2008112971A (ja) * | 2006-10-06 | 2008-05-15 | Tokyo Electron Ltd | 基板処理方法、基板処理装置、プログラムならびに記録媒体 |
| JP2008112923A (ja) * | 2006-10-31 | 2008-05-15 | Sekisui Chem Co Ltd | プラズマ処理方法および処理装置 |
| JP2013193353A (ja) * | 2012-03-21 | 2013-09-30 | Seiko Epson Corp | 画像記録装置、画像記録方法 |
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