JP2004535514A5 - - Google Patents
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- Publication number
- JP2004535514A5 JP2004535514A5 JP2003513707A JP2003513707A JP2004535514A5 JP 2004535514 A5 JP2004535514 A5 JP 2004535514A5 JP 2003513707 A JP2003513707 A JP 2003513707A JP 2003513707 A JP2003513707 A JP 2003513707A JP 2004535514 A5 JP2004535514 A5 JP 2004535514A5
- Authority
- JP
- Japan
- Prior art keywords
- inorganic material
- polymer
- polymer substrate
- composition according
- alumina
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 15
- 229910010272 inorganic material Inorganic materials 0.000 claims 11
- 239000011147 inorganic material Substances 0.000 claims 11
- 229920000642 polymer Polymers 0.000 claims 11
- 229920000307 polymer substrate Polymers 0.000 claims 9
- 239000000203 mixture Substances 0.000 claims 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 4
- -1 polyethylene Polymers 0.000 claims 4
- 238000006243 chemical reaction Methods 0.000 claims 3
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 2
- 239000011159 matrix material Substances 0.000 claims 2
- 239000000376 reactant Substances 0.000 claims 2
- 239000004698 Polyethylene Substances 0.000 claims 1
- 239000004743 Polypropylene Substances 0.000 claims 1
- 239000004793 Polystyrene Substances 0.000 claims 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims 1
- 238000000231 atomic layer deposition Methods 0.000 claims 1
- 230000004888 barrier function Effects 0.000 claims 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 1
- 125000002843 carboxylic acid group Chemical group 0.000 claims 1
- 150000001993 dienes Chemical class 0.000 claims 1
- 238000009792 diffusion process Methods 0.000 claims 1
- 239000010408 film Substances 0.000 claims 1
- 125000000524 functional group Chemical group 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 229920001903 high density polyethylene Polymers 0.000 claims 1
- 239000004700 high-density polyethylene Substances 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 229920000092 linear low density polyethylene Polymers 0.000 claims 1
- 239000004707 linear low-density polyethylene Substances 0.000 claims 1
- 229920001684 low density polyethylene Polymers 0.000 claims 1
- 239000004702 low-density polyethylene Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000010128 melt processing Methods 0.000 claims 1
- 239000002114 nanocomposite Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims 1
- 229920001748 polybutylene Polymers 0.000 claims 1
- 229920000573 polyethylene Polymers 0.000 claims 1
- 239000005020 polyethylene terephthalate Substances 0.000 claims 1
- 229920000139 polyethylene terephthalate Polymers 0.000 claims 1
- 239000004926 polymethyl methacrylate Substances 0.000 claims 1
- 229920001155 polypropylene Polymers 0.000 claims 1
- 229920002223 polystyrene Polymers 0.000 claims 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US30652101P | 2001-07-18 | 2001-07-18 | |
| PCT/US2002/022742 WO2003008110A1 (en) | 2001-07-18 | 2002-07-16 | A method of depositing an inorganic film on an organic polymer |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004535514A JP2004535514A (ja) | 2004-11-25 |
| JP2004535514A5 true JP2004535514A5 (https=) | 2005-11-17 |
| JP4295614B2 JP4295614B2 (ja) | 2009-07-15 |
Family
ID=23185674
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003513707A Expired - Lifetime JP4295614B2 (ja) | 2001-07-18 | 2002-07-16 | 有機ポリマー表面に無機薄膜を成膜する方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US20040194691A1 (https=) |
| EP (1) | EP1425110B1 (https=) |
| JP (1) | JP4295614B2 (https=) |
| CA (1) | CA2452656C (https=) |
| WO (1) | WO2003008110A1 (https=) |
Families Citing this family (81)
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| EP1629543B1 (en) * | 2003-05-16 | 2013-08-07 | E.I. Du Pont De Nemours And Company | Barrier films for flexible polymer substrates fabricated by atomic layer deposition |
| US20050056219A1 (en) * | 2003-09-16 | 2005-03-17 | Tokyo Electron Limited | Formation of a metal-containing film by sequential gas exposure in a batch type processing system |
| US20050172897A1 (en) * | 2004-02-09 | 2005-08-11 | Frank Jansen | Barrier layer process and arrangement |
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| DE102005025083B4 (de) * | 2005-05-30 | 2007-05-24 | Infineon Technologies Ag | Thermoplast-Duroplast-Verbund und Verfahren zum Verbinden eines thermoplastischen Materials mit einem duroplastischen Material |
| US7651955B2 (en) | 2005-06-21 | 2010-01-26 | Applied Materials, Inc. | Method for forming silicon-containing materials during a photoexcitation deposition process |
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| US20080014380A1 (en) * | 2006-05-12 | 2008-01-17 | Steven Jones | Iridescent film with barrier properties |
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| US20080100202A1 (en) * | 2006-11-01 | 2008-05-01 | Cok Ronald S | Process for forming oled conductive protective layer |
| WO2008069894A2 (en) * | 2006-11-13 | 2008-06-12 | The Regents Of The University Of Colorado, A Body Corporate | Molecular layer deposition process for making organic or organic-inorganic polymers |
| US7776395B2 (en) * | 2006-11-14 | 2010-08-17 | Applied Materials, Inc. | Method of depositing catalyst assisted silicates of high-k materials |
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| US20080119098A1 (en) * | 2006-11-21 | 2008-05-22 | Igor Palley | Atomic layer deposition on fibrous materials |
| US7781031B2 (en) * | 2006-12-06 | 2010-08-24 | General Electric Company | Barrier layer, composite article comprising the same, electroactive device, and method |
| US20080138624A1 (en) * | 2006-12-06 | 2008-06-12 | General Electric Company | Barrier layer, composite article comprising the same, electroactive device, and method |
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| US8637123B2 (en) * | 2009-12-29 | 2014-01-28 | Lotus Applied Technology, Llc | Oxygen radical generation for radical-enhanced thin film deposition |
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| KR20150109984A (ko) * | 2014-03-21 | 2015-10-02 | 삼성전자주식회사 | 기체 차단 필름, 이를 포함하는 냉장고 및 기체 차단 필름의 제조방법 |
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| CN107108917B (zh) * | 2014-07-24 | 2020-04-28 | 欧司朗Oled股份有限公司 | 屏障层的制备方法和包含这种屏障层的载体主体 |
| JP6812793B2 (ja) | 2014-07-29 | 2021-01-13 | 凸版印刷株式会社 | 積層体及びその製造方法、並びにガスバリアフィルム及びその製造方法 |
| US10420370B2 (en) * | 2014-11-17 | 2019-09-24 | R.J. Reynolds Tobacco Products | Moisture barriers for paper materials |
| JP6011652B2 (ja) * | 2015-02-02 | 2016-10-19 | 凸版印刷株式会社 | ガスバリア性積層体およびこの製造方法 |
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| US11996564B2 (en) | 2015-06-01 | 2024-05-28 | Forge Nano Inc. | Nano-engineered coatings for anode active materials, cathode active materials, and solid-state electrolytes and methods of making batteries containing nano-engineered coatings |
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| CN112175220B (zh) * | 2020-09-03 | 2023-01-03 | 广东以色列理工学院 | 耐高温的改性聚丙烯薄膜及其制备方法和应用 |
| FR3119104B1 (fr) * | 2021-01-28 | 2024-02-02 | Commissariat Energie Atomique | Procédé de formation d’un réseau métallo-organique |
| CN113564527B (zh) * | 2021-08-10 | 2022-06-07 | 中国科学院兰州化学物理研究所 | 一种抗辐照无氢碳膜聚合物润滑材料及其制备方法和应用 |
| CN117858999A (zh) | 2021-08-23 | 2024-04-09 | 法国圣戈班玻璃厂 | 具有潮气阻挡物的间隔件 |
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| CN114907566B (zh) * | 2022-05-11 | 2023-03-14 | 江南大学 | 一种聚酰亚胺-金属单原子复合材料及其制备方法与应用 |
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-
2002
- 2002-07-16 WO PCT/US2002/022742 patent/WO2003008110A1/en not_active Ceased
- 2002-07-16 CA CA2452656A patent/CA2452656C/en not_active Expired - Lifetime
- 2002-07-16 JP JP2003513707A patent/JP4295614B2/ja not_active Expired - Lifetime
- 2002-07-16 US US10/482,627 patent/US20040194691A1/en active Granted
- 2002-07-16 US US10/482,627 patent/US9376750B2/en not_active Expired - Fee Related
- 2002-07-16 EP EP02748191.0A patent/EP1425110B1/en not_active Expired - Lifetime
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