JP2004507873A - レーザ発生されたプラズマを使用する電磁放射発生 - Google Patents

レーザ発生されたプラズマを使用する電磁放射発生 Download PDF

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Publication number
JP2004507873A
JP2004507873A JP2002522474A JP2002522474A JP2004507873A JP 2004507873 A JP2004507873 A JP 2004507873A JP 2002522474 A JP2002522474 A JP 2002522474A JP 2002522474 A JP2002522474 A JP 2002522474A JP 2004507873 A JP2004507873 A JP 2004507873A
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Japan
Prior art keywords
nozzle
gas
fluid
low pressure
pressure chamber
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Pending
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JP2002522474A
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English (en)
Japanese (ja)
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JP2004507873A5 (enExample
Inventor
テイラー、アラン・ジー
クラッグ、デビッド・アール
マーサー、イアン・ピー
オールウッド、ダニエル・エー
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パワーレイズ・リミテッド
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Priority claimed from GB0021458A external-priority patent/GB0021458D0/en
Priority claimed from GB0021459A external-priority patent/GB0021459D0/en
Priority claimed from GB0021455A external-priority patent/GB0021455D0/en
Application filed by パワーレイズ・リミテッド filed Critical パワーレイズ・リミテッド
Publication of JP2004507873A publication Critical patent/JP2004507873A/ja
Publication of JP2004507873A5 publication Critical patent/JP2004507873A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0025—Systems for collecting the plasma generating material after the plasma generation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0023—Constructional details of the ejection system
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2002522474A 2000-08-31 2001-08-30 レーザ発生されたプラズマを使用する電磁放射発生 Pending JP2004507873A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
GB0021458A GB0021458D0 (en) 2000-08-31 2000-08-31 Electromagnetic radiation generation using a laser produced plasma
GB0021459A GB0021459D0 (en) 2000-08-31 2000-08-31 Electromagnetic radiation generation using a laser produced plasma
GB0021455A GB0021455D0 (en) 2000-08-31 2000-08-31 Electromagnetic radiation generation using a laser produced plasma
PCT/GB2001/003871 WO2002019781A1 (en) 2000-08-31 2001-08-30 Electromagnetic radiation generation using a laser produced plasma

Publications (2)

Publication Number Publication Date
JP2004507873A true JP2004507873A (ja) 2004-03-11
JP2004507873A5 JP2004507873A5 (enExample) 2005-03-03

Family

ID=27255866

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002522474A Pending JP2004507873A (ja) 2000-08-31 2001-08-30 レーザ発生されたプラズマを使用する電磁放射発生

Country Status (5)

Country Link
US (1) US6956885B2 (enExample)
EP (1) EP1316245A1 (enExample)
JP (1) JP2004507873A (enExample)
AU (1) AU2001282361A1 (enExample)
WO (1) WO2002019781A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003337200A (ja) * 2002-05-17 2003-11-28 Natl Inst Of Radiological Sciences 極低温クラスタ／スラッシュガスターゲットの製造方法とその装置
JP2006216394A (ja) * 2005-02-04 2006-08-17 Komatsu Ltd 極端紫外光源装置用ノズル
KR20220057590A (ko) * 2019-10-17 2022-05-09 에이에스엠엘 네델란즈 비.브이. 조명 소스 및 관련 계측 장치

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US7137274B2 (en) * 2003-09-24 2006-11-21 The Boc Group Plc System for liquefying or freezing xenon
DE102004003854A1 (de) * 2004-01-26 2005-08-18 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren und Vorrichtungen zur Erzeugung fester Filamente in einer Vakuumkammer
GB0403865D0 (en) * 2004-02-20 2004-03-24 Powerlase Ltd Laser multiplexing
US20080020083A1 (en) * 2006-06-06 2008-01-24 Kabushiki Kaisha Topcon Method for joining optical members, structure for integrating optical members and laser oscillation device
US7759663B1 (en) * 2006-12-06 2010-07-20 Asml Netherlands B.V. Self-shading electrodes for debris suppression in an EUV source
JP2013519211A (ja) 2010-02-09 2013-05-23 エナジェティック・テクノロジー・インコーポレーテッド レーザー駆動の光源
WO2013174525A1 (en) * 2012-05-25 2013-11-28 Eth Zurich Method and apparatus for generating electromagnetic radiation
WO2014139713A1 (en) * 2013-03-15 2014-09-18 Asml Holding N.V. Radiation source that jets up liquid fuel to form plasma for generating radiation and recycle liquid fuel
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition
US12165856B2 (en) 2022-02-21 2024-12-10 Hamamatsu Photonics K.K. Inductively coupled plasma light source
US12144072B2 (en) 2022-03-29 2024-11-12 Hamamatsu Photonics K.K. All-optical laser-driven light source with electrodeless ignition
US12156322B2 (en) 2022-12-08 2024-11-26 Hamamatsu Photonics K.K. Inductively coupled plasma light source with switched power supply
CN119315365B (zh) * 2024-12-18 2025-04-11 中国人民解放军国防科技大学 基于超强激光诱导的超连续极紫外相干光源产生装置

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JPH05258692A (ja) * 1992-03-10 1993-10-08 Nikon Corp Ｘ線発生方法およびｘ線発生装置
JPH07232290A (ja) * 1994-02-23 1995-09-05 Matsushita Electric Ind Co Ltd レーザ加工機用焦点調整装置
WO1997040650A1 (en) * 1996-04-25 1997-10-30 Jettec Ab Method and apparatus for generating x-ray or euv radiation
WO1998034234A1 (en) * 1997-02-04 1998-08-06 Northrop Grumman Corporation Method and apparatus for producing extreme ultra-violet light for use in photolithography
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003337200A (ja) * 2002-05-17 2003-11-28 Natl Inst Of Radiological Sciences 極低温クラスタ／スラッシュガスターゲットの製造方法とその装置
JP2006216394A (ja) * 2005-02-04 2006-08-17 Komatsu Ltd 極端紫外光源装置用ノズル
KR20220057590A (ko) * 2019-10-17 2022-05-09 에이에스엠엘 네델란즈 비.브이. 조명 소스 및 관련 계측 장치
KR102873088B1 (ko) 2019-10-17 2025-10-16 에이에스엠엘 네델란즈 비.브이. 조명 소스 및 관련 계측 장치

Also Published As

Publication number Publication date
US20050100071A1 (en) 2005-05-12
US6956885B2 (en) 2005-10-18
EP1316245A1 (en) 2003-06-04
WO2002019781A1 (en) 2002-03-07
AU2001282361A1 (en) 2002-03-13

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