JP2004361937A5 - - Google Patents

Download PDF

Info

Publication number
JP2004361937A5
JP2004361937A5 JP2004141921A JP2004141921A JP2004361937A5 JP 2004361937 A5 JP2004361937 A5 JP 2004361937A5 JP 2004141921 A JP2004141921 A JP 2004141921A JP 2004141921 A JP2004141921 A JP 2004141921A JP 2004361937 A5 JP2004361937 A5 JP 2004361937A5
Authority
JP
Japan
Prior art keywords
substrate
laser
region
thin film
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004141921A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004361937A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004141921A priority Critical patent/JP2004361937A/ja
Priority claimed from JP2004141921A external-priority patent/JP2004361937A/ja
Publication of JP2004361937A publication Critical patent/JP2004361937A/ja
Publication of JP2004361937A5 publication Critical patent/JP2004361937A5/ja
Withdrawn legal-status Critical Current

Links

JP2004141921A 2003-05-12 2004-05-12 液晶表示装置及びその作製方法 Withdrawn JP2004361937A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004141921A JP2004361937A (ja) 2003-05-12 2004-05-12 液晶表示装置及びその作製方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003133631 2003-05-12
JP2004141921A JP2004361937A (ja) 2003-05-12 2004-05-12 液晶表示装置及びその作製方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010276605A Division JP5211145B2 (ja) 2003-05-12 2010-12-13 液晶表示装置の作製方法

Publications (2)

Publication Number Publication Date
JP2004361937A JP2004361937A (ja) 2004-12-24
JP2004361937A5 true JP2004361937A5 (https=) 2007-05-31

Family

ID=34067146

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004141921A Withdrawn JP2004361937A (ja) 2003-05-12 2004-05-12 液晶表示装置及びその作製方法

Country Status (1)

Country Link
JP (1) JP2004361937A (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7858451B2 (en) * 2005-02-03 2010-12-28 Semiconductor Energy Laboratory Co., Ltd. Electronic device, semiconductor device and manufacturing method thereof
KR101563527B1 (ko) 2008-09-19 2015-10-27 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체장치
JP6257027B2 (ja) * 2013-09-11 2018-01-10 パイクリスタル株式会社 有機薄膜トランジスタの製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001201759A (ja) * 2000-01-20 2001-07-27 Sanyo Electric Co Ltd 液晶表示装置
JP2001330860A (ja) * 2000-02-28 2001-11-30 Semiconductor Energy Lab Co Ltd 半導体装置及びその作製方法
JP4700160B2 (ja) * 2000-03-13 2011-06-15 株式会社半導体エネルギー研究所 半導体装置
JP4531923B2 (ja) * 2000-04-25 2010-08-25 株式会社半導体エネルギー研究所 半導体装置
JP4439789B2 (ja) * 2001-04-20 2010-03-24 株式会社半導体エネルギー研究所 レーザ照射装置、並びに半導体装置の作製方法
JP4841751B2 (ja) * 2001-06-01 2011-12-21 株式会社半導体エネルギー研究所 有機半導体装置及びその作製方法

Similar Documents

Publication Publication Date Title
KR100899541B1 (ko) 박리 방법 및 반도체 장치 제조 방법
JP2003204067A5 (https=)
KR101040463B1 (ko) 결정화 방법, 결정화 장치, 처리대상 기판, 박막트랜지스터 및 표시 장치
KR100985012B1 (ko) 반도체 장치
US7666769B2 (en) Method for fabricating image display device
US7317205B2 (en) Light emitting device and method of manufacturing a semiconductor device
US6797550B2 (en) Semiconductor device and manufacturing method therefor
KR100915104B1 (ko) 반도체 장치의 제조 방법
JP2012033943A (ja) 半導体装置の作製方法
JP2011123495A (ja) 液晶表示装置の作製方法
KR20040054563A (ko) 반도체 장치의 제조 방법, 및 반도체 장치 및 전자기기
JP2010028128A (ja) 半導体装置の作製方法
RU2476954C2 (ru) Базовая плата, способ производства базовой платы и подложка устройства
JP2004361937A5 (https=)
US7557376B2 (en) Display device using first and second semiconductor films of different crystallinity and boundary section therebetween
TWI285783B (en) Poly silicon layer structure and forming method thereof
JP5073260B2 (ja) レーザアニール装置及びレーザアニール方法
JP3029787B2 (ja) レーザアニール方法および液晶表示装置の製造方法
TWI360839B (en) Manufacturing method of semiconductor film and ima
JP2009122282A (ja) 表示装置及びその製造方法
JP2004048029A5 (https=)
JP2004297055A (ja) 半導体装置の作製方法およびレーザ照射方法、並びにレーザ照射装置。
JP5264132B2 (ja) 半導体装置の作製方法
JP2001352073A5 (https=)
JP2005276996A (ja) 平面表示装置の製造方法