JP2004354372A - 膜厚計測装置搭載の光学薄膜形成用装置及び光学薄膜の成膜方法 - Google Patents
膜厚計測装置搭載の光学薄膜形成用装置及び光学薄膜の成膜方法 Download PDFInfo
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- JP2004354372A JP2004354372A JP2004129868A JP2004129868A JP2004354372A JP 2004354372 A JP2004354372 A JP 2004354372A JP 2004129868 A JP2004129868 A JP 2004129868A JP 2004129868 A JP2004129868 A JP 2004129868A JP 2004354372 A JP2004354372 A JP 2004354372A
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004129868A JP2004354372A (ja) | 2003-05-01 | 2004-04-26 | 膜厚計測装置搭載の光学薄膜形成用装置及び光学薄膜の成膜方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003126404 | 2003-05-01 | ||
| JP2004129868A JP2004354372A (ja) | 2003-05-01 | 2004-04-26 | 膜厚計測装置搭載の光学薄膜形成用装置及び光学薄膜の成膜方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007105963A Division JP4547489B2 (ja) | 2003-05-01 | 2007-04-13 | 膜厚計測装置搭載の光学薄膜形成用装置及び光学薄膜の成膜方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004354372A true JP2004354372A (ja) | 2004-12-16 |
| JP2004354372A5 JP2004354372A5 (enrdf_load_stackoverflow) | 2007-06-07 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2004129868A Pending JP2004354372A (ja) | 2003-05-01 | 2004-04-26 | 膜厚計測装置搭載の光学薄膜形成用装置及び光学薄膜の成膜方法 |
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| JP (1) | JP2004354372A (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010073935A1 (ja) * | 2008-12-26 | 2010-07-01 | 東京エレクトロン株式会社 | 金属膜の膜厚測定方法及び基板処理方法及び装置 |
| JP2015141176A (ja) * | 2014-01-30 | 2015-08-03 | 浜松ホトニクス株式会社 | 膜厚計測方法及び膜厚計測装置 |
| JP2019522725A (ja) * | 2016-07-13 | 2019-08-15 | エヴァテック・アーゲー | 広帯域光学監視 |
| JP2021031693A (ja) * | 2019-08-19 | 2021-03-01 | 株式会社オプトラン | 光学膜厚制御装置、薄膜形成装置、光学膜厚制御方法および薄膜形成方法 |
| CN115132871A (zh) * | 2022-06-01 | 2022-09-30 | 武汉科技大学 | 一种热光伏辐射器系统、控制方法、介质、设备及终端 |
| JP2025067115A (ja) * | 2023-10-12 | 2025-04-24 | 株式会社オプトラン | 多層光学薄膜の薄膜形成装置および方法およびプログラムおよび記憶媒体 |
-
2004
- 2004-04-26 JP JP2004129868A patent/JP2004354372A/ja active Pending
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010073935A1 (ja) * | 2008-12-26 | 2010-07-01 | 東京エレクトロン株式会社 | 金属膜の膜厚測定方法及び基板処理方法及び装置 |
| JP2015141176A (ja) * | 2014-01-30 | 2015-08-03 | 浜松ホトニクス株式会社 | 膜厚計測方法及び膜厚計測装置 |
| WO2015114895A1 (ja) * | 2014-01-30 | 2015-08-06 | 浜松ホトニクス株式会社 | 膜厚計測方法及び膜厚計測装置 |
| US9846028B2 (en) | 2014-01-30 | 2017-12-19 | Hamamatsu Photonics K.K. | Film thickness measurement method and film thickness measurement device |
| JP7002476B2 (ja) | 2016-07-13 | 2022-01-20 | エヴァテック・アーゲー | 広帯域光学監視 |
| JP2019522725A (ja) * | 2016-07-13 | 2019-08-15 | エヴァテック・アーゲー | 広帯域光学監視 |
| TWI775761B (zh) * | 2016-07-13 | 2022-09-01 | 瑞士商艾維太克股份有限公司 | 在原位監視及控制基板上薄膜沉積程序以及控制在基板上產生多層薄膜之方法 |
| JP2021031693A (ja) * | 2019-08-19 | 2021-03-01 | 株式会社オプトラン | 光学膜厚制御装置、薄膜形成装置、光学膜厚制御方法および薄膜形成方法 |
| JP7303701B2 (ja) | 2019-08-19 | 2023-07-05 | 株式会社オプトラン | 光学膜厚制御装置、薄膜形成装置、光学膜厚制御方法および薄膜形成方法 |
| CN115132871A (zh) * | 2022-06-01 | 2022-09-30 | 武汉科技大学 | 一种热光伏辐射器系统、控制方法、介质、设备及终端 |
| CN115132871B (zh) * | 2022-06-01 | 2025-02-11 | 武汉科技大学 | 一种热光伏辐射器系统、控制方法、介质、设备及终端 |
| JP2025067115A (ja) * | 2023-10-12 | 2025-04-24 | 株式会社オプトラン | 多層光学薄膜の薄膜形成装置および方法およびプログラムおよび記憶媒体 |
| JP7724001B2 (ja) | 2023-10-12 | 2025-08-15 | 株式会社オプトラン | 多層光学薄膜の薄膜形成装置および方法およびプログラムおよび記憶媒体 |
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