JP2004343093A5 - - Google Patents
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- Publication number
- JP2004343093A5 JP2004343093A5 JP2004123452A JP2004123452A JP2004343093A5 JP 2004343093 A5 JP2004343093 A5 JP 2004343093A5 JP 2004123452 A JP2004123452 A JP 2004123452A JP 2004123452 A JP2004123452 A JP 2004123452A JP 2004343093 A5 JP2004343093 A5 JP 2004343093A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor film
- scanning
- irradiated
- mirror
- changes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010408 film Substances 0.000 claims 24
- 239000004065 semiconductor Substances 0.000 claims 24
- 238000000034 method Methods 0.000 claims 21
- 238000004519 manufacturing process Methods 0.000 claims 10
- 239000010409 thin film Substances 0.000 claims 10
- 230000001678 irradiating effect Effects 0.000 claims 8
- 239000012535 impurity Substances 0.000 claims 4
- 230000003287 optical effect Effects 0.000 claims 3
- 239000006096 absorbing agent Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004123452A JP4503344B2 (ja) | 2003-04-21 | 2004-04-19 | ビーム照射装置および半導体装置の作製方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003116392 | 2003-04-21 | ||
| JP2004123452A JP4503344B2 (ja) | 2003-04-21 | 2004-04-19 | ビーム照射装置および半導体装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004343093A JP2004343093A (ja) | 2004-12-02 |
| JP2004343093A5 true JP2004343093A5 (cg-RX-API-DMAC7.html) | 2007-05-24 |
| JP4503344B2 JP4503344B2 (ja) | 2010-07-14 |
Family
ID=33543088
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004123452A Expired - Fee Related JP4503344B2 (ja) | 2003-04-21 | 2004-04-19 | ビーム照射装置および半導体装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4503344B2 (cg-RX-API-DMAC7.html) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1547719A3 (en) * | 2003-12-26 | 2009-01-28 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation apparatus, laser irradiation method, and method for manufacturing crystalline semiconductor film |
| JP4999323B2 (ja) * | 2004-12-03 | 2012-08-15 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JP5089077B2 (ja) * | 2005-04-28 | 2012-12-05 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| DE602006004913D1 (de) | 2005-04-28 | 2009-03-12 | Semiconductor Energy Lab | Verfahren und Vorrichtung zur Herstellung von Halbleitern mittels Laserstrahlung |
| JP5137388B2 (ja) * | 2005-12-16 | 2013-02-06 | 株式会社半導体エネルギー研究所 | レーザ照射装置、レーザ照射方法及び半導体装置の作製方法 |
| KR101371265B1 (ko) * | 2005-12-16 | 2014-03-07 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 레이저 조사 장치, 레이저 조사 방법, 및 반도체 장치 제조방법 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01276621A (ja) * | 1988-04-27 | 1989-11-07 | Mitsubishi Electric Corp | ビームアニール装置 |
| JP2003045820A (ja) * | 2001-07-30 | 2003-02-14 | Semiconductor Energy Lab Co Ltd | レーザ照射装置およびレーザ照射方法、並びに半導体装置の作製方法 |
| JP5078205B2 (ja) * | 2001-08-10 | 2012-11-21 | 株式会社半導体エネルギー研究所 | レーザ照射装置 |
| JP4813743B2 (ja) * | 2002-07-24 | 2011-11-09 | 株式会社 日立ディスプレイズ | 画像表示装置の製造方法 |
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2004
- 2004-04-19 JP JP2004123452A patent/JP4503344B2/ja not_active Expired - Fee Related