JP2004323646A - 化粧料用のコポリマー及び該コポリマーを含有してなる化粧料 - Google Patents
化粧料用のコポリマー及び該コポリマーを含有してなる化粧料 Download PDFInfo
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- JP2004323646A JP2004323646A JP2003119204A JP2003119204A JP2004323646A JP 2004323646 A JP2004323646 A JP 2004323646A JP 2003119204 A JP2003119204 A JP 2003119204A JP 2003119204 A JP2003119204 A JP 2003119204A JP 2004323646 A JP2004323646 A JP 2004323646A
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- 229920001577 copolymer Polymers 0.000 title claims abstract description 90
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- 229920001223 polyethylene glycol Polymers 0.000 claims abstract description 39
- 238000005227 gel permeation chromatography Methods 0.000 claims abstract description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 57
- 239000000203 mixture Substances 0.000 claims description 25
- 125000000217 alkyl group Chemical group 0.000 claims description 23
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 23
- 125000001931 aliphatic group Chemical group 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 10
- 125000002252 acyl group Chemical group 0.000 claims description 9
- 125000001153 fluoro group Chemical group F* 0.000 claims description 7
- 125000002947 alkylene group Chemical group 0.000 claims description 6
- 229910052799 carbon Chemical group 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
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- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 3
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- VBHXIMACZBQHPX-UHFFFAOYSA-N 2,2,2-trifluoroethyl prop-2-enoate Chemical compound FC(F)(F)COC(=O)C=C VBHXIMACZBQHPX-UHFFFAOYSA-N 0.000 description 2
- YJKHMSPWWGBKTN-UHFFFAOYSA-N 2,2,3,3,4,4,5,5,6,6,7,7-dodecafluoroheptyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)F YJKHMSPWWGBKTN-UHFFFAOYSA-N 0.000 description 2
- LEEDMQGKBNGPDN-UHFFFAOYSA-N 2-methylnonadecane Chemical compound CCCCCCCCCCCCCCCCCC(C)C LEEDMQGKBNGPDN-UHFFFAOYSA-N 0.000 description 2
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- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
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- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
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Landscapes
- Cosmetics (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003119204A JP2004323646A (ja) | 2003-04-24 | 2003-04-24 | 化粧料用のコポリマー及び該コポリマーを含有してなる化粧料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003119204A JP2004323646A (ja) | 2003-04-24 | 2003-04-24 | 化粧料用のコポリマー及び該コポリマーを含有してなる化粧料 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004323646A true JP2004323646A (ja) | 2004-11-18 |
| JP2004323646A5 JP2004323646A5 (https=) | 2006-02-16 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003119204A Pending JP2004323646A (ja) | 2003-04-24 | 2003-04-24 | 化粧料用のコポリマー及び該コポリマーを含有してなる化粧料 |
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| JP (1) | JP2004323646A (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006206681A (ja) * | 2005-01-26 | 2006-08-10 | Toda Kogyo Corp | 複合粒子粉末並びに該複合粒子粉末を用いた着色組成物及び樹脂組成物 |
| WO2013031594A1 (ja) * | 2011-08-29 | 2013-03-07 | Ａｇｃセイミケミカル株式会社 | 化粧品用共重合体、化粧品粉体用表面処理剤、化粧用粉体および化粧料 |
| JP2013095754A (ja) * | 2011-11-04 | 2013-05-20 | Symrise Ag | 相乗的に作用する、３成分抗菌性混合物 |
-
2003
- 2003-04-24 JP JP2003119204A patent/JP2004323646A/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006206681A (ja) * | 2005-01-26 | 2006-08-10 | Toda Kogyo Corp | 複合粒子粉末並びに該複合粒子粉末を用いた着色組成物及び樹脂組成物 |
| WO2013031594A1 (ja) * | 2011-08-29 | 2013-03-07 | Ａｇｃセイミケミカル株式会社 | 化粧品用共重合体、化粧品粉体用表面処理剤、化粧用粉体および化粧料 |
| JPWO2013031594A1 (ja) * | 2011-08-29 | 2015-03-23 | Ａｇｃセイミケミカル株式会社 | 化粧品用共重合体、化粧品粉体用表面処理剤、化粧用粉体および化粧料 |
| US10064803B2 (en) | 2011-08-29 | 2018-09-04 | Agc Seimi Chemical Co., Ltd. | Copolymer for cosmetics, surface treatment agent for cosmetic powder, powder for cosmetics, and cosmetic preparation |
| JP2013095754A (ja) * | 2011-11-04 | 2013-05-20 | Symrise Ag | 相乗的に作用する、３成分抗菌性混合物 |
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