JP2004266273A5 - - Google Patents
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- Publication number
- JP2004266273A5 JP2004266273A5 JP2004036817A JP2004036817A JP2004266273A5 JP 2004266273 A5 JP2004266273 A5 JP 2004266273A5 JP 2004036817 A JP2004036817 A JP 2004036817A JP 2004036817 A JP2004036817 A JP 2004036817A JP 2004266273 A5 JP2004266273 A5 JP 2004266273A5
- Authority
- JP
- Japan
- Prior art keywords
- light
- optical system
- exposure apparatus
- projection optical
- mark
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004036817A JP4532927B2 (ja) | 2003-02-14 | 2004-02-13 | 露光装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003037290 | 2003-02-14 | ||
JP2004036817A JP4532927B2 (ja) | 2003-02-14 | 2004-02-13 | 露光装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2004266273A JP2004266273A (ja) | 2004-09-24 |
JP2004266273A5 true JP2004266273A5 (zh) | 2007-04-05 |
JP4532927B2 JP4532927B2 (ja) | 2010-08-25 |
Family
ID=33133999
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004036817A Expired - Fee Related JP4532927B2 (ja) | 2003-02-14 | 2004-02-13 | 露光装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4532927B2 (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090040493A1 (en) * | 2007-08-09 | 2009-02-12 | Hideki Komatsuda | Illumination optical system, illumination optical apparatus, exposure apparatus, and device manufacturing method |
DE102008004762A1 (de) | 2008-01-16 | 2009-07-30 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie mit einer Messeinrichtung |
JP4663749B2 (ja) * | 2008-03-11 | 2011-04-06 | 大日本印刷株式会社 | 反射型マスクの検査方法および製造方法 |
JP5361322B2 (ja) * | 2008-10-14 | 2013-12-04 | キヤノン株式会社 | 露光装置及びデバイスの製造方法 |
JP6002898B2 (ja) * | 2011-08-10 | 2016-10-05 | 株式会社ブイ・テクノロジー | 露光装置用のアライメント装置 |
US20130050674A1 (en) * | 2011-08-24 | 2013-02-28 | Asml Netherlands B.V. | Lithographic apparatus, substrate table and device manufacturing method |
US11287746B1 (en) * | 2020-09-30 | 2022-03-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | System and method for overlay error reduction |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1022213A (ja) * | 1996-06-28 | 1998-01-23 | Canon Inc | 位置検出装置及びそれを用いたデバイスの製造方法 |
JPH11233416A (ja) * | 1998-02-17 | 1999-08-27 | Nikon Corp | X線投影露光装置 |
JP3096021B2 (ja) * | 1998-05-18 | 2000-10-10 | キヤノン株式会社 | 放射光照射装置および方法 |
JP2000306816A (ja) * | 1999-04-22 | 2000-11-02 | Canon Inc | 投影露光装置、フォーカス検出装置およびデバイス製造方法 |
JP4397496B2 (ja) * | 2000-02-25 | 2010-01-13 | Okiセミコンダクタ株式会社 | 反射型露光マスクおよびeuv露光装置 |
DE10061248B4 (de) * | 2000-12-09 | 2004-02-26 | Carl Zeiss | Verfahren und Vorrichtung zur In-situ-Dekontamination eines EUV-Lithographiegerätes |
JP4803901B2 (ja) * | 2001-05-22 | 2011-10-26 | キヤノン株式会社 | 位置合わせ方法、露光装置、および半導体デバイス製造方法 |
-
2004
- 2004-02-13 JP JP2004036817A patent/JP4532927B2/ja not_active Expired - Fee Related
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