JP2004247767A - 投影露光装置及びそれを用いたデバイスの製造方法 - Google Patents

投影露光装置及びそれを用いたデバイスの製造方法 Download PDF

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Publication number
JP2004247767A
JP2004247767A JP2004161353A JP2004161353A JP2004247767A JP 2004247767 A JP2004247767 A JP 2004247767A JP 2004161353 A JP2004161353 A JP 2004161353A JP 2004161353 A JP2004161353 A JP 2004161353A JP 2004247767 A JP2004247767 A JP 2004247767A
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JP
Japan
Prior art keywords
optical system
stage
pattern
focus position
projection
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Withdrawn
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JP2004161353A
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Japanese (ja)
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JP2004247767A5 (enExample
Inventor
Michio Kono
道生 河野
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Canon Inc
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Canon Inc
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Priority to JP2004161353A priority Critical patent/JP2004247767A/ja
Publication of JP2004247767A publication Critical patent/JP2004247767A/ja
Publication of JP2004247767A5 publication Critical patent/JP2004247767A5/ja
Withdrawn legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004161353A 2004-05-31 2004-05-31 投影露光装置及びそれを用いたデバイスの製造方法 Withdrawn JP2004247767A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004161353A JP2004247767A (ja) 2004-05-31 2004-05-31 投影露光装置及びそれを用いたデバイスの製造方法

Applications Claiming Priority (1)

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JP2004161353A JP2004247767A (ja) 2004-05-31 2004-05-31 投影露光装置及びそれを用いたデバイスの製造方法

Related Parent Applications (1)

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JP8092067A Division JPH09260269A (ja) 1996-03-19 1996-03-19 投影露光方法及びそれを用いたデバイスの製造方法

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JP2004247767A true JP2004247767A (ja) 2004-09-02
JP2004247767A5 JP2004247767A5 (enExample) 2006-04-20

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ID=33028717

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JP2004161353A Withdrawn JP2004247767A (ja) 2004-05-31 2004-05-31 投影露光装置及びそれを用いたデバイスの製造方法

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JP (1) JP2004247767A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008292391A (ja) * 2007-05-28 2008-12-04 Mitsutoyo Corp 共焦点光学装置
JP2013210440A (ja) * 2012-03-30 2013-10-10 Topcon Corp 投影レンズの結像位置変化量検出方法、ステージ位置の調整方法、投影レンズの結像位置変化量検出装置、ステージ位置の調整装置、および投影露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008292391A (ja) * 2007-05-28 2008-12-04 Mitsutoyo Corp 共焦点光学装置
JP2013210440A (ja) * 2012-03-30 2013-10-10 Topcon Corp 投影レンズの結像位置変化量検出方法、ステージ位置の調整方法、投影レンズの結像位置変化量検出装置、ステージ位置の調整装置、および投影露光装置

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