JP2004207731A5 - - Google Patents
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- Publication number
- JP2004207731A5 JP2004207731A5 JP2003423432A JP2003423432A JP2004207731A5 JP 2004207731 A5 JP2004207731 A5 JP 2004207731A5 JP 2003423432 A JP2003423432 A JP 2003423432A JP 2003423432 A JP2003423432 A JP 2003423432A JP 2004207731 A5 JP2004207731 A5 JP 2004207731A5
- Authority
- JP
- Japan
- Prior art keywords
- lift
- layer
- layers
- dielectric
- dielectric constant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US43597502P | 2002-12-20 | 2002-12-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004207731A JP2004207731A (ja) | 2004-07-22 |
| JP2004207731A5 true JP2004207731A5 (enExample) | 2007-02-08 |
Family
ID=32393634
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003423432A Withdrawn JP2004207731A (ja) | 2002-12-20 | 2003-12-19 | 電子デバイスの製造 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7056824B2 (enExample) |
| EP (1) | EP1431823A2 (enExample) |
| JP (1) | JP2004207731A (enExample) |
| KR (1) | KR20040055685A (enExample) |
| CN (1) | CN1521565A (enExample) |
| TW (1) | TWI248138B (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7119031B2 (en) * | 2004-06-28 | 2006-10-10 | Micron Technology, Inc. | Methods of forming patterned photoresist layers over semiconductor substrates |
| US20060000493A1 (en) * | 2004-06-30 | 2006-01-05 | Steger Richard M | Chemical-mechanical post-etch removal of photoresist in polymer memory fabrication |
| US7846017B2 (en) * | 2004-07-06 | 2010-12-07 | Igt | Methods and apparatus for facilitating remote viewing of gaming outcomes |
| US7090782B1 (en) * | 2004-09-03 | 2006-08-15 | Lam Research Corporation | Etch with uniformity control |
| US20060105567A1 (en) * | 2004-11-12 | 2006-05-18 | Intel Corporation | Method for forming a dual-damascene structure |
| US20060183055A1 (en) * | 2005-02-15 | 2006-08-17 | O'neill Mark L | Method for defining a feature on a substrate |
| US7753797B2 (en) * | 2005-03-18 | 2010-07-13 | Igt | Security methods and apparatus for a tangible medium containing wagering game outcomes |
| US20070286941A1 (en) * | 2006-06-13 | 2007-12-13 | Bin Huang | Surface treatment of a polymeric stent |
| US7998524B2 (en) | 2007-12-10 | 2011-08-16 | Abbott Cardiovascular Systems Inc. | Methods to improve adhesion of polymer coatings over stents |
| WO2010129884A1 (en) * | 2009-05-08 | 2010-11-11 | 1366 Technologies Inc. | Porous lift-off layer for selective removal of deposited films |
| US9102901B2 (en) * | 2012-12-20 | 2015-08-11 | Rohm And Haas Electronic Materials Llc | Methods and compositions for removal of metal hardmasks |
| KR102053921B1 (ko) * | 2019-03-13 | 2019-12-09 | 영창케미칼 주식회사 | 반도체 제조 공정에 있어서 식각 패턴 신규 형성 방법 |
| US12281251B2 (en) | 2019-09-30 | 2025-04-22 | Versum Materials Us, Llc | Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device |
| WO2021067150A1 (en) * | 2019-09-30 | 2021-04-08 | Versum Materials Us, Llc | Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4246374A (en) | 1979-04-23 | 1981-01-20 | Rohm And Haas Company | Imidized acrylic polymers |
| US4451971A (en) | 1982-08-02 | 1984-06-05 | Fairchild Camera And Instrument Corporation | Lift-off wafer processing |
| US4524121A (en) | 1983-11-21 | 1985-06-18 | Rohm And Haas Company | Positive photoresists containing preformed polyglutarimide polymer |
| US4636532A (en) | 1985-10-11 | 1987-01-13 | Shipley Company Inc. | Method for preparing polyglutarimide having a lower molecular weight and a low polydispersity |
| US5731385A (en) | 1993-12-16 | 1998-03-24 | International Business Machines Corporation | Polymeric dyes for antireflective coatings |
| EP0690494B1 (de) * | 1994-06-27 | 2004-03-17 | Infineon Technologies AG | Verbindungs- und Aufbautechnik für Multichip-Module |
| US5944975A (en) | 1996-03-26 | 1999-08-31 | Texas Instruments Incorporated | Method of forming a lift-off layer having controlled adhesion strength |
| TW476019B (en) * | 1999-05-27 | 2002-02-11 | Winbond Electronics Corp | Method for forming crosslinking photoresist |
| US6805139B1 (en) * | 1999-10-20 | 2004-10-19 | Mattson Technology, Inc. | Systems and methods for photoresist strip and residue treatment in integrated circuit manufacturing |
| US6352909B1 (en) | 2000-01-06 | 2002-03-05 | Silicon Wafer Technologies, Inc. | Process for lift-off of a layer from a substrate |
| NO20005980L (no) | 2000-11-27 | 2002-05-28 | Thin Film Electronics Ab | Ferroelektrisk minnekrets og fremgangsmåte ved dens fremstilling |
| US6798003B2 (en) * | 2001-07-20 | 2004-09-28 | Intel Corporation | Reliable adhesion layer interface structure for polymer memory electrode and method of making same |
| JP3810309B2 (ja) * | 2001-12-03 | 2006-08-16 | Ｎｅｃエレクトロニクス株式会社 | 半導体装置の製造方法 |
| US6878500B2 (en) | 2002-04-06 | 2005-04-12 | Marlborough, | Stripping method |
-
2003
- 2003-12-19 CN CNA2003101249615A patent/CN1521565A/zh active Pending
- 2003-12-19 KR KR1020030093626A patent/KR20040055685A/ko not_active Withdrawn
- 2003-12-19 US US10/742,424 patent/US7056824B2/en not_active Expired - Fee Related
- 2003-12-19 EP EP03258045A patent/EP1431823A2/en not_active Withdrawn
- 2003-12-19 JP JP2003423432A patent/JP2004207731A/ja not_active Withdrawn
- 2003-12-19 TW TW092136108A patent/TWI248138B/zh not_active IP Right Cessation
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