JP2004193592A5 - - Google Patents

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Publication number
JP2004193592A5
JP2004193592A5 JP2003394924A JP2003394924A JP2004193592A5 JP 2004193592 A5 JP2004193592 A5 JP 2004193592A5 JP 2003394924 A JP2003394924 A JP 2003394924A JP 2003394924 A JP2003394924 A JP 2003394924A JP 2004193592 A5 JP2004193592 A5 JP 2004193592A5
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JP
Japan
Prior art keywords
laser
laser beam
linear
linear laser
semiconductor film
Prior art date
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Granted
Application number
JP2003394924A
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English (en)
Japanese (ja)
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JP4364611B2 (ja
JP2004193592A (ja
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Priority to JP2003394924A priority Critical patent/JP4364611B2/ja
Priority claimed from JP2003394924A external-priority patent/JP4364611B2/ja
Publication of JP2004193592A publication Critical patent/JP2004193592A/ja
Publication of JP2004193592A5 publication Critical patent/JP2004193592A5/ja
Application granted granted Critical
Publication of JP4364611B2 publication Critical patent/JP4364611B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003394924A 2002-11-29 2003-11-26 結晶性半導体膜の作製方法 Expired - Fee Related JP4364611B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003394924A JP4364611B2 (ja) 2002-11-29 2003-11-26 結晶性半導体膜の作製方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002349007 2002-11-29
JP2003394924A JP4364611B2 (ja) 2002-11-29 2003-11-26 結晶性半導体膜の作製方法

Publications (3)

Publication Number Publication Date
JP2004193592A JP2004193592A (ja) 2004-07-08
JP2004193592A5 true JP2004193592A5 (enExample) 2006-05-25
JP4364611B2 JP4364611B2 (ja) 2009-11-18

Family

ID=32774955

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003394924A Expired - Fee Related JP4364611B2 (ja) 2002-11-29 2003-11-26 結晶性半導体膜の作製方法

Country Status (1)

Country Link
JP (1) JP4364611B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4481040B2 (ja) * 2003-03-07 2010-06-16 株式会社半導体エネルギー研究所 半導体装置の作製方法
KR100514996B1 (ko) 2004-04-19 2005-09-15 주식회사 이오테크닉스 레이저 가공 장치
SG11201405535PA (en) * 2012-04-18 2014-11-27 Applied Materials Inc Apparatus and method to reduce particles in advance anneal process
CN104282539A (zh) * 2013-07-04 2015-01-14 上海和辉光电有限公司 一种多晶硅制作方法
US9343307B2 (en) * 2013-12-24 2016-05-17 Ultratech, Inc. Laser spike annealing using fiber lasers

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