JP2004170908A5 - - Google Patents

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JP2004170908A5
JP2004170908A5 JP2003321780A JP2003321780A JP2004170908A5 JP 2004170908 A5 JP2004170908 A5 JP 2004170908A5 JP 2003321780 A JP2003321780 A JP 2003321780A JP 2003321780 A JP2003321780 A JP 2003321780A JP 2004170908 A5 JP2004170908 A5 JP 2004170908A5
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film
electro
optical device
pixel
pixel electrode
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基板上に、データ線と、該データ線と交差する走査線と、前記データ線及び前記走査線の交差領域に対応するように配置された画素電極及び薄膜トランジスタが積層構造の一部をなして備えられた電気光学装置であって、
前記基板上には更に、
前記薄膜トランジスタの半導体層より上層で且つ前記画素電極より下層で形成され、画素電位に電気的に接続された蓄積容量と、
前記データ線及び前記画素電極間に配置された上側遮光膜と、
前記蓄積容量を構成する一対の電極の少なくとも一方と前記画素電極とを電気的に接続する中継層とが、前記積層構造の一部をなして備えられてなり、
前記上側遮光膜には、画素開口領域の角部を規定する三角形状の突出した領域が形成されており、
前記上側遮光膜と前記中継層とで前記画素開口領域を規定することを特徴とする電気光学装置。
A data line, a scanning line intersecting with the data line, a pixel electrode and a thin film transistor arranged to correspond to the intersecting region of the data line and the scanning line are provided as a part of a stacked structure on the substrate. Electro-optic device,
On the substrate further
A storage capacitor formed above the semiconductor layer of the thin film transistor and below the pixel electrode and electrically connected to a pixel potential;
An upper light-shielding film disposed between the data line and the pixel electrode;
A relay layer that electrically connects at least one of a pair of electrodes constituting the storage capacitor and the pixel electrode is provided as a part of the stacked structure,
In the upper light shielding film, a triangular projecting region that defines the corner of the pixel opening region is formed,
The electro-optical device is characterized in that the pixel opening region is defined by the upper light shielding film and the relay layer.
前記上側遮光膜と同一膜で形成され、前記薄膜トランジスタと前記画素電極間とを電気的に接続するための遮光性の中継膜を備え、前記遮光膜と前記中継膜とで前記画素開口領域を規定することを特徴とする請求項1に記載の電気光学装置。   A light-shielding relay film is formed of the same film as the upper light-shielding film and electrically connects the thin film transistor and the pixel electrode, and the pixel opening region is defined by the light-shielding film and the relay film. The electro-optical device according to claim 1. 前記上側遮光膜は、前記蓄積容量を成す一方の電極に接続されることを特徴とする請求項2又は3に記載の電気光学装置。   The electro-optical device according to claim 2, wherein the upper light shielding film is connected to one electrode forming the storage capacitor. 前記画素電極の下地として配置された層間絶縁膜が、前記積層構造の一部を更になしており、
該層間絶縁膜には、前記画素電極との電気的接続を図るためのコンタクトホールが形成されており、
該コンタクトホールの少なくとも内表面には、前記チタン又はその化合物を含む膜が形成されていることを特徴とする請求項1乃至3のいずれか一項に記載の電気光学装置。
An interlayer insulating film disposed as a base of the pixel electrode further forms part of the stacked structure;
Contact holes for electrical connection with the pixel electrodes are formed in the interlayer insulating film,
4. The electro-optical device according to claim 1, wherein a film containing the titanium or a compound thereof is formed on at least an inner surface of the contact hole. 5.
前記データ線は、前記中継層と同一膜として形成されていることを特徴とする請求項1に記載の電気光学装置。   The electro-optical device according to claim 1, wherein the data line is formed as the same film as the relay layer. 前記走査線は、遮光性材料から構成されており、前記上側遮光膜と共に前記画素開口領域の角部を規定してなり、該画素開口領域の角部に前記蓄積容量が形成されてなることを特徴とする請求項1に記載の電気光学装置。   The scanning line is made of a light shielding material, defines a corner of the pixel opening area together with the upper light shielding film, and the storage capacitor is formed at the corner of the pixel opening area. The electro-optical device according to claim 1. 前記中継層は、アルミニウム膜及び窒化膜からなることを特徴とする請求項1に記載の電気光学装置。   The electro-optical device according to claim 1, wherein the relay layer includes an aluminum film and a nitride film. 前記走査線、前記データ線、及び前記蓄積容量を構成する一対の電極の少なくとも一つは、遮光性材料からなることを特徴とする請求項1に記載の電気光学装置。   The electro-optical device according to claim 1, wherein at least one of the scanning line, the data line, and the pair of electrodes constituting the storage capacitor is made of a light shielding material. 前記上側遮光膜は、前記蓄積容量を構成する一対の電極の一方に電気的に接続するシールド層であって、前記データ線及び前記走査線を覆うように格子状に形成されており、
前記シールド層は、低抵抗膜を含む多層膜からなることを特徴とする請求項1に記載の電気光学装置。
The upper light shielding film is a shield layer electrically connected to one of a pair of electrodes constituting the storage capacitor, and is formed in a lattice shape so as to cover the data line and the scanning line,
The electro-optical device according to claim 1, wherein the shield layer is a multilayer film including a low resistance film.
前記シールド層は、その下層に前記低抵抗膜を有するとともに、その上層に光吸収性の材料からなる膜を有することを特徴とする請求項9に記載の電気光学装置。   The electro-optical device according to claim 9, wherein the shield layer has the low resistance film in a lower layer thereof and a film made of a light absorbing material in an upper layer thereof. 前記低抵抗膜はアルミニウム或いはアルミニウムの合金からなることを特徴とする請求項9又は10に記載の電気光学装置。   11. The electro-optical device according to claim 9, wherein the low resistance film is made of aluminum or an aluminum alloy. 前記蓄積容量は、
誘電体膜並びに該誘電体膜を挟持してなる上部電極及び下部電極からなり、前記基板の表面に平行な面に沿って積層された第1部分と、前記基板の表面に対して立ち上がった平面に沿って積層された第2部分とを含むことにより、その断面形状が凸形状を含むことを特徴とする請求項1乃至11のいずれか一項に記載の電気光学装置。
The storage capacity is
A first portion formed of a dielectric film, and an upper electrode and a lower electrode sandwiching the dielectric film, laminated along a plane parallel to the surface of the substrate; and a plane rising from the surface of the substrate 12. The electro-optical device according to claim 1, wherein the cross-sectional shape includes a convex shape.
前記蓄積容量の前記凸形状は、前記走査線及び前記データ線の少なくとも一方に沿って形成されていることを特徴とする請求項12に記載の電気光学装置。   The electro-optical device according to claim 12, wherein the convex shape of the storage capacitor is formed along at least one of the scanning line and the data line. 前記蓄積容量は、誘電体膜並びに該誘電体膜を挟持してなる上部電極及び下部電極からなり、前記誘電体膜は、窒化シリコン膜及び酸化シリコン膜からなることを特徴とする請求項1に記載の電気光学装置。   2. The storage capacitor according to claim 1, wherein the storage capacitor includes a dielectric film and an upper electrode and a lower electrode sandwiching the dielectric film, and the dielectric film includes a silicon nitride film and a silicon oxide film. The electro-optical device described. 前記画素電極の下地として配置された層間絶縁膜が、前記積層構造の一部を更になしており、
前記層間絶縁膜の表面は平坦化処理が施されていることを特徴とする請求項1に記載の電気光学装置。
An interlayer insulating film disposed as a base of the pixel electrode further forms part of the stacked structure;
The electro-optical device according to claim 1, wherein a surface of the interlayer insulating film is subjected to a planarization process.
前記画素電極は、その複数が平面配列されているとともに、第1の周期で反転駆動されるための第1の画素電極群及び該第1の周期と相補の第2の周期で反転駆動されるための第2の画素電極群を含み、
前記データ線及び前記シールド層の少なくとも一方は、前記走査線の上側を該走査線に交差して延びる本線部及び該本線部から前記走査線に沿って張り出した張り出し部を含み、
前記基板に対向配置される対向基板上に前記複数の画素電極に対向する対向電極を備え、
前記基板上における前記画素電極の下地表面には、前記張り出し部の存在に応じて平面的に見て前記走査線を挟んで相隣接する画素電極の間隙となる領域に凸部が形成されていることを特徴とする請求項15に記載の電気光学装置。
A plurality of the pixel electrodes are arranged in a plane, and are inverted and driven with a first pixel electrode group for being inverted and driven with a first cycle, and with a second cycle complementary to the first cycle. A second pixel electrode group for
At least one of the data line and the shield layer includes a main line portion extending above the scan line so as to intersect the scan line, and a projecting portion projecting from the main line portion along the scan line,
A counter electrode facing the plurality of pixel electrodes on a counter substrate disposed to face the substrate;
On the base surface of the pixel electrode on the substrate, a convex portion is formed in a region serving as a gap between adjacent pixel electrodes across the scanning line as viewed in plan according to the presence of the protruding portion. The electro-optical device according to claim 15.
前記画素電極は、その複数が平面配列されているとともに、第1の周期で反転駆動されるための第1の画素電極群及び該第1の周期と相補の第2の周期で反転駆動されるための第2の画素電極群を含み、
前記基板に対向配置される対向基板上に前記複数の画素電極に対向する対向電極と、
平面的に見て相隣接する画素電極の間隙となる領域に形成された凸部とを更に備えてなり、
前記凸部は、エッチングによって前記凸部上に一旦形成された平坦化膜を除去し且つその除去後に露出する前記凸部の表面を後退させてなる、表面段差が緩やかな凸部からなることを特徴とする請求項15に記載の電気光学装置。
A plurality of the pixel electrodes are arranged in a plane, and are inverted and driven with a first pixel electrode group for being inverted and driven with a first cycle, and with a second cycle complementary to the first cycle. A second pixel electrode group for
A counter electrode facing the plurality of pixel electrodes on a counter substrate disposed opposite to the substrate;
A convex portion formed in a region serving as a gap between adjacent pixel electrodes in plan view,
The convex portion is formed by removing a flattening film once formed on the convex portion by etching and receding the surface of the convex portion exposed after the removal, and having a gradual surface step. The electro-optical device according to claim 15.
前記画素電極は、その複数が平面配列されているとともに、第1の周期で反転駆動されるための第1の画素電極群及び該第1の周期と相補の第2の周期で反転駆動されるための第2の画素電極群を含み、
前記基板に対向配置される対向基板上に前記複数の画素電極に対向する対向電極と、
平面的に見て相隣接する画素電極の間隙となる領域に凸部を形成するために、該画素電極下且つ前記データ線及び前記シールド層の少なくとも一方と同一層として形成される凸パターンと
を備えたことを特徴とする請求項15に記載の電気光学装置。
A plurality of the pixel electrodes are arranged in a plane, and are inverted and driven with a first pixel electrode group for being inverted and driven with a first cycle, and with a second cycle complementary to the first cycle. A second pixel electrode group for
A counter electrode facing the plurality of pixel electrodes on a counter substrate disposed opposite to the substrate;
In order to form a convex portion in a region that is a gap between pixel electrodes adjacent to each other when seen in a plan view, a convex pattern is formed under the pixel electrode and as the same layer as at least one of the data line and the shield layer. 16. The electro-optical device according to claim 15, further comprising:
請求項1乃至18のいずれか一項に記載の電気光学装置を具備してなることを特徴とする電子機器。   An electronic apparatus comprising the electro-optical device according to claim 1.
JP2003321780A 2002-10-31 2003-09-12 Electro-optical device and electronic apparatus Expired - Fee Related JP4506133B2 (en)

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