JP2004170908A5 - - Google Patents
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- JP2004170908A5 JP2004170908A5 JP2003321780A JP2003321780A JP2004170908A5 JP 2004170908 A5 JP2004170908 A5 JP 2004170908A5 JP 2003321780 A JP2003321780 A JP 2003321780A JP 2003321780 A JP2003321780 A JP 2003321780A JP 2004170908 A5 JP2004170908 A5 JP 2004170908A5
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- optical device
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Claims (19)
前記基板上には更に、
前記薄膜トランジスタの半導体層より上層で且つ前記画素電極より下層で形成され、画素電位に電気的に接続された蓄積容量と、
前記データ線及び前記画素電極間に配置された上側遮光膜と、
前記蓄積容量を構成する一対の電極の少なくとも一方と前記画素電極とを電気的に接続する中継層とが、前記積層構造の一部をなして備えられてなり、
前記上側遮光膜には、画素開口領域の角部を規定する三角形状の突出した領域が形成されており、
前記上側遮光膜と前記中継層とで前記画素開口領域を規定することを特徴とする電気光学装置。 A data line, a scanning line intersecting with the data line, a pixel electrode and a thin film transistor arranged to correspond to the intersecting region of the data line and the scanning line are provided as a part of a stacked structure on the substrate. Electro-optic device,
On the substrate further
A storage capacitor formed above the semiconductor layer of the thin film transistor and below the pixel electrode and electrically connected to a pixel potential;
An upper light-shielding film disposed between the data line and the pixel electrode;
A relay layer that electrically connects at least one of a pair of electrodes constituting the storage capacitor and the pixel electrode is provided as a part of the stacked structure,
In the upper light shielding film, a triangular projecting region that defines the corner of the pixel opening region is formed,
The electro-optical device is characterized in that the pixel opening region is defined by the upper light shielding film and the relay layer.
該層間絶縁膜には、前記画素電極との電気的接続を図るためのコンタクトホールが形成されており、
該コンタクトホールの少なくとも内表面には、前記チタン又はその化合物を含む膜が形成されていることを特徴とする請求項1乃至3のいずれか一項に記載の電気光学装置。 An interlayer insulating film disposed as a base of the pixel electrode further forms part of the stacked structure;
Contact holes for electrical connection with the pixel electrodes are formed in the interlayer insulating film,
4. The electro-optical device according to claim 1, wherein a film containing the titanium or a compound thereof is formed on at least an inner surface of the contact hole. 5.
前記シールド層は、低抵抗膜を含む多層膜からなることを特徴とする請求項1に記載の電気光学装置。 The upper light shielding film is a shield layer electrically connected to one of a pair of electrodes constituting the storage capacitor, and is formed in a lattice shape so as to cover the data line and the scanning line,
The electro-optical device according to claim 1, wherein the shield layer is a multilayer film including a low resistance film.
誘電体膜並びに該誘電体膜を挟持してなる上部電極及び下部電極からなり、前記基板の表面に平行な面に沿って積層された第1部分と、前記基板の表面に対して立ち上がった平面に沿って積層された第2部分とを含むことにより、その断面形状が凸形状を含むことを特徴とする請求項1乃至11のいずれか一項に記載の電気光学装置。 The storage capacity is
A first portion formed of a dielectric film, and an upper electrode and a lower electrode sandwiching the dielectric film, laminated along a plane parallel to the surface of the substrate; and a plane rising from the surface of the substrate 12. The electro-optical device according to claim 1, wherein the cross-sectional shape includes a convex shape.
前記層間絶縁膜の表面は平坦化処理が施されていることを特徴とする請求項1に記載の電気光学装置。 An interlayer insulating film disposed as a base of the pixel electrode further forms part of the stacked structure;
The electro-optical device according to claim 1, wherein a surface of the interlayer insulating film is subjected to a planarization process.
前記データ線及び前記シールド層の少なくとも一方は、前記走査線の上側を該走査線に交差して延びる本線部及び該本線部から前記走査線に沿って張り出した張り出し部を含み、
前記基板に対向配置される対向基板上に前記複数の画素電極に対向する対向電極を備え、
前記基板上における前記画素電極の下地表面には、前記張り出し部の存在に応じて平面的に見て前記走査線を挟んで相隣接する画素電極の間隙となる領域に凸部が形成されていることを特徴とする請求項15に記載の電気光学装置。 A plurality of the pixel electrodes are arranged in a plane, and are inverted and driven with a first pixel electrode group for being inverted and driven with a first cycle, and with a second cycle complementary to the first cycle. A second pixel electrode group for
At least one of the data line and the shield layer includes a main line portion extending above the scan line so as to intersect the scan line, and a projecting portion projecting from the main line portion along the scan line,
A counter electrode facing the plurality of pixel electrodes on a counter substrate disposed to face the substrate;
On the base surface of the pixel electrode on the substrate, a convex portion is formed in a region serving as a gap between adjacent pixel electrodes across the scanning line as viewed in plan according to the presence of the protruding portion. The electro-optical device according to claim 15.
前記基板に対向配置される対向基板上に前記複数の画素電極に対向する対向電極と、
平面的に見て相隣接する画素電極の間隙となる領域に形成された凸部とを更に備えてなり、
前記凸部は、エッチングによって前記凸部上に一旦形成された平坦化膜を除去し且つその除去後に露出する前記凸部の表面を後退させてなる、表面段差が緩やかな凸部からなることを特徴とする請求項15に記載の電気光学装置。 A plurality of the pixel electrodes are arranged in a plane, and are inverted and driven with a first pixel electrode group for being inverted and driven with a first cycle, and with a second cycle complementary to the first cycle. A second pixel electrode group for
A counter electrode facing the plurality of pixel electrodes on a counter substrate disposed opposite to the substrate;
A convex portion formed in a region serving as a gap between adjacent pixel electrodes in plan view,
The convex portion is formed by removing a flattening film once formed on the convex portion by etching and receding the surface of the convex portion exposed after the removal, and having a gradual surface step. The electro-optical device according to claim 15.
前記基板に対向配置される対向基板上に前記複数の画素電極に対向する対向電極と、
平面的に見て相隣接する画素電極の間隙となる領域に凸部を形成するために、該画素電極下且つ前記データ線及び前記シールド層の少なくとも一方と同一層として形成される凸パターンと
を備えたことを特徴とする請求項15に記載の電気光学装置。 A plurality of the pixel electrodes are arranged in a plane, and are inverted and driven with a first pixel electrode group for being inverted and driven with a first cycle, and with a second cycle complementary to the first cycle. A second pixel electrode group for
A counter electrode facing the plurality of pixel electrodes on a counter substrate disposed opposite to the substrate;
In order to form a convex portion in a region that is a gap between pixel electrodes adjacent to each other when seen in a plan view, a convex pattern is formed under the pixel electrode and as the same layer as at least one of the data line and the shield layer. 16. The electro-optical device according to claim 15, further comprising:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003321780A JP4506133B2 (en) | 2002-10-31 | 2003-09-12 | Electro-optical device and electronic apparatus |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2002318625 | 2002-10-31 | ||
JP2003321780A JP4506133B2 (en) | 2002-10-31 | 2003-09-12 | Electro-optical device and electronic apparatus |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2009276224A Division JP4862936B2 (en) | 2002-10-31 | 2009-12-04 | Electro-optical device and electronic apparatus |
Publications (3)
Publication Number | Publication Date |
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JP2004170908A JP2004170908A (en) | 2004-06-17 |
JP2004170908A5 true JP2004170908A5 (en) | 2006-04-20 |
JP4506133B2 JP4506133B2 (en) | 2010-07-21 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2003321780A Expired - Fee Related JP4506133B2 (en) | 2002-10-31 | 2003-09-12 | Electro-optical device and electronic apparatus |
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JP (1) | JP4506133B2 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4349375B2 (en) * | 2005-04-11 | 2009-10-21 | セイコーエプソン株式会社 | Electro-optical device and electronic apparatus |
JP2007025611A (en) * | 2005-06-17 | 2007-02-01 | Seiko Epson Corp | Electro-optical device, method of manufacturing the same, and electronic apparatus |
JP4957023B2 (en) * | 2006-03-09 | 2012-06-20 | セイコーエプソン株式会社 | Electro-optical device and electronic apparatus |
JP5034434B2 (en) * | 2006-10-18 | 2012-09-26 | ソニー株式会社 | Electro-optic device |
JP5176814B2 (en) * | 2008-09-22 | 2013-04-03 | セイコーエプソン株式会社 | Electro-optical device, electronic apparatus, and method of manufacturing electro-optical device |
JP5482279B2 (en) * | 2010-02-17 | 2014-05-07 | セイコーエプソン株式会社 | Electro-optical device and electronic apparatus |
JP6065964B2 (en) * | 2010-10-25 | 2017-01-25 | セイコーエプソン株式会社 | Electro-optical device and electronic apparatus |
KR102650011B1 (en) * | 2016-07-14 | 2024-03-21 | 삼성디스플레이 주식회사 | Display device and manufacturing method thereof |
CN109324720B (en) * | 2018-09-28 | 2023-09-26 | 武汉华星光电技术有限公司 | Array substrate, touch display screen and driving method of array substrate |
CN113077715A (en) * | 2021-03-17 | 2021-07-06 | Tcl华星光电技术有限公司 | Display panel, manufacturing method thereof and display device |
CN115707308A (en) * | 2021-08-03 | 2023-02-17 | 华为技术有限公司 | Display panel and electronic device |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3101779B2 (en) * | 1992-01-31 | 2000-10-23 | キヤノン株式会社 | Liquid crystal display |
JP2924506B2 (en) * | 1992-10-27 | 1999-07-26 | 日本電気株式会社 | Pixel structure of active matrix liquid crystal display |
JP3490216B2 (en) * | 1996-04-24 | 2004-01-26 | シャープ株式会社 | Method for manufacturing switching element substrate |
JP3961044B2 (en) * | 1996-05-14 | 2007-08-15 | シャープ株式会社 | Electronic circuit equipment |
JP3751681B2 (en) * | 1996-06-11 | 2006-03-01 | ソニー株式会社 | Liquid crystal display device and manufacturing method thereof |
JP3808155B2 (en) * | 1997-01-17 | 2006-08-09 | 株式会社半導体エネルギー研究所 | Active matrix liquid crystal display device |
JP3767154B2 (en) * | 1997-06-17 | 2006-04-19 | セイコーエプソン株式会社 | Electro-optical device substrate, electro-optical device, electronic apparatus, and projection display device |
JP3456384B2 (en) * | 1997-09-26 | 2003-10-14 | セイコーエプソン株式会社 | LCD panel |
US6181398B1 (en) * | 1998-09-03 | 2001-01-30 | International Business Machines Corporation | Multiple pixel driven mirror electrodes for improved aperture ratio of reflective displays |
US6850292B1 (en) * | 1998-12-28 | 2005-02-01 | Seiko Epson Corporation | Electric-optic device, method of fabricating the same, and electronic apparatus |
JP3728958B2 (en) * | 1998-12-28 | 2005-12-21 | セイコーエプソン株式会社 | Electro-optical device and manufacturing method thereof |
JP3687399B2 (en) * | 1999-03-16 | 2005-08-24 | セイコーエプソン株式会社 | Electro-optical device and manufacturing method thereof |
JP4651777B2 (en) * | 1999-06-02 | 2011-03-16 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device |
JP2001133750A (en) * | 1999-08-20 | 2001-05-18 | Seiko Epson Corp | Electrooptical device |
JP3864036B2 (en) * | 2000-05-23 | 2006-12-27 | セイコーエプソン株式会社 | Liquid crystal display |
JP3608531B2 (en) * | 2000-08-31 | 2005-01-12 | セイコーエプソン株式会社 | Electro-optical device and projection display device |
JP3743291B2 (en) * | 2001-01-23 | 2006-02-08 | セイコーエプソン株式会社 | Electro-optical device and projector |
JP2002287149A (en) * | 2001-03-22 | 2002-10-03 | Seiko Epson Corp | Liquid crystal device, electronic equipment, and projection type liquid crystal device |
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2003
- 2003-09-12 JP JP2003321780A patent/JP4506133B2/en not_active Expired - Fee Related
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