JP2004157548A5 - - Google Patents

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Publication number
JP2004157548A5
JP2004157548A5 JP2003409607A JP2003409607A JP2004157548A5 JP 2004157548 A5 JP2004157548 A5 JP 2004157548A5 JP 2003409607 A JP2003409607 A JP 2003409607A JP 2003409607 A JP2003409607 A JP 2003409607A JP 2004157548 A5 JP2004157548 A5 JP 2004157548A5
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JP
Japan
Prior art keywords
photomask
image
defect
mask
laser light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003409607A
Other languages
English (en)
Japanese (ja)
Other versions
JP4309751B2 (ja
JP2004157548A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2003409607A priority Critical patent/JP4309751B2/ja
Priority claimed from JP2003409607A external-priority patent/JP4309751B2/ja
Publication of JP2004157548A publication Critical patent/JP2004157548A/ja
Publication of JP2004157548A5 publication Critical patent/JP2004157548A5/ja
Application granted granted Critical
Publication of JP4309751B2 publication Critical patent/JP4309751B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003409607A 1997-06-27 2003-12-08 フォトマスク修復方法 Expired - Fee Related JP4309751B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003409607A JP4309751B2 (ja) 1997-06-27 2003-12-08 フォトマスク修復方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP17169597 1997-06-27
JP2003409607A JP4309751B2 (ja) 1997-06-27 2003-12-08 フォトマスク修復方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP17830098A Division JPH1172905A (ja) 1997-06-27 1998-06-25 フォトマスク修復方法、検査方法、検査装置及びフォトマスク製造方法

Publications (3)

Publication Number Publication Date
JP2004157548A JP2004157548A (ja) 2004-06-03
JP2004157548A5 true JP2004157548A5 (cg-RX-API-DMAC7.html) 2005-09-22
JP4309751B2 JP4309751B2 (ja) 2009-08-05

Family

ID=32827198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003409607A Expired - Fee Related JP4309751B2 (ja) 1997-06-27 2003-12-08 フォトマスク修復方法

Country Status (1)

Country Link
JP (1) JP4309751B2 (cg-RX-API-DMAC7.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4309752B2 (ja) * 1997-06-27 2009-08-05 株式会社東芝 フォトマスク検査方法、フォトマスク検査装置及びフォトマスク製造方法
US6849363B2 (en) 1997-06-27 2005-02-01 Kabushiki Kaisha Toshiba Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device
JP2009168524A (ja) * 2008-01-11 2009-07-30 Toshiba Corp 光学系、パターン検査装置、パターンの検査方法、パターンを有する物品の製造方法
JP6345431B2 (ja) * 2014-02-03 2018-06-20 株式会社ニューフレアテクノロジー 照明装置及びパターン検査装置
JP6768622B2 (ja) * 2017-09-28 2020-10-14 株式会社ニューフレアテクノロジー 検査方法および検査装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63173322A (ja) * 1987-01-13 1988-07-16 Toshiba Corp 半導体露光装置
JPH01114035A (ja) * 1987-10-28 1989-05-02 Hitachi Ltd 露光装置
DE69208413T2 (de) * 1991-08-22 1996-11-14 Kla Instr Corp Gerät zur automatischen Prüfung von Photomaske
US5668887A (en) * 1992-05-29 1997-09-16 Eastman Kodak Company Coating density analyzer and method using non-synchronous TDI camera
JP4309752B2 (ja) * 1997-06-27 2009-08-05 株式会社東芝 フォトマスク検査方法、フォトマスク検査装置及びフォトマスク製造方法

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