JP2004157548A5 - - Google Patents
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- JP2004157548A5 JP2004157548A5 JP2003409607A JP2003409607A JP2004157548A5 JP 2004157548 A5 JP2004157548 A5 JP 2004157548A5 JP 2003409607 A JP2003409607 A JP 2003409607A JP 2003409607 A JP2003409607 A JP 2003409607A JP 2004157548 A5 JP2004157548 A5 JP 2004157548A5
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- image
- defect
- mask
- laser light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Claims (4)
前記レーザ光とこのフォトマスクとを相対的に移動させながらこのフォトマスクの像を蓄積型センサで検知すると共に、この蓄積型センサから出力信号を前記移動に連動させて取り出し、前記マスクの画像を形成する画像取得工程と、
このマスクの画像に基づいてマスクパターンの欠陥を検出する欠陥検出工程と、
このパターン欠陥検出結果に基づいてパターンの欠陥位置を特定し、マスクパターンの欠陥を修復する欠陥修復工程と
を有することを特徴とするフォトマスク修復方法。 An illumination process of irradiating the photomask with the laser light in a state in which the phase of the laser light is continuously changed and the brightness distribution of the laser light is made uniform,
The image of the photomask is detected by a storage type sensor while relatively moving the laser beam and the photomask, and an output signal is extracted from the storage type sensor in conjunction with the movement, and the image of the mask is extracted. An image acquisition process to be formed;
A defect detection step of detecting a defect of the mask pattern based on the image of the mask;
And a defect repairing step of identifying a defect position of the pattern based on the pattern defect detection result and repairing the defect of the mask pattern.
前記レーザ光とこのフォトマスクとを相対的に移動させながらこのフォトマスクの像を蓄積型センサで検知すると共に、この蓄積型センサから出力信号を前記移動に連動させて取り出し、前記マスクの画像を形成する画像取得工程と、
このマスクの画像に基づいてマスクパターンの欠陥を検出する欠陥検出工程と
を有することを特徴とするフォトマスク検査方法。 An illumination step of irradiating the photomask with the laser light in a state where the phase of the laser light is changed and the brightness distribution of the laser light is made uniform,
The image of the photomask is detected by a storage type sensor while relatively moving the laser beam and the photomask, and an output signal is extracted from the storage type sensor in conjunction with the movement, and the image of the mask is extracted. An image acquisition process to be formed;
A defect detection step of detecting a defect of the mask pattern based on the image of the mask.
前記レーザ光とこのフォトマスクとを相対的に移動させながらこのフォトマスクの像をセンサで検知すると共に、この蓄積型センサから出力信号を前記移動に連動させて取り出し、前記マスクの画像を形成する画像取得部と、
このマスクの画像に基づいてマスクパターンの欠陥を検出する欠陥検出装置と
を有することを特徴とするフォトマスク検査装置。 An illumination optical system that irradiates the photomask with the laser light in a state in which the phase of the laser light is changed and the brightness distribution of the laser light is made uniform.
The image of the photomask is detected by a sensor while relatively moving the laser beam and the photomask, and an output signal is extracted from the storage type sensor in conjunction with the movement to form an image of the mask. An image acquisition unit;
A photomask inspection device comprising: a defect detection device that detects a defect of a mask pattern based on an image of the mask.
レーザ光の位相を変化させ、このレーザ光の明るさ分布を均一化した状態で、このレーザ光をフォトマスクに照射する照明工程と、
前記レーザ光とこのフォトマスクとを相対的に移動させながらこのフォトマスクの像を蓄積型センサで検知すると共に、この蓄積型センサから出力信号を前記移動に連動させて取り出し、前記マスクの画像を形成する画像取得工程と、
このマスクの画像に基づいてマスクパターンの欠陥を検出する欠陥検出工程と、
マスクパターンの欠陥が検出された場合、このパターン欠陥検出結果に基づいてパターンの欠陥位置を特定し、マスクパターンの欠陥を修復する欠陥修復工程と
を有することを特徴とするフォトマスク製造方法。 Forming a pattern on the photomask;
An illumination step of irradiating the photomask with the laser light in a state where the phase of the laser light is changed and the brightness distribution of the laser light is made uniform,
The image of the photomask is detected by a storage type sensor while relatively moving the laser beam and the photomask, and an output signal is extracted from the storage type sensor in conjunction with the movement, and the image of the mask is extracted. An image acquisition process to be formed;
A defect detection step of detecting a defect of the mask pattern based on the image of the mask;
If a defect of the mask pattern is detected, a photomask manufacturing method characterized by the pattern defect detection result based on identifying a defect position of the pattern, and a defect repairing step of repairing defects of the mask pattern.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003409607A JP4309751B2 (en) | 1997-06-27 | 2003-12-08 | Photomask repair method |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17169597 | 1997-06-27 | ||
| JP2003409607A JP4309751B2 (en) | 1997-06-27 | 2003-12-08 | Photomask repair method |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17830098A Division JPH1172905A (en) | 1997-06-27 | 1998-06-25 | Photomask repair method, inspection method, inspection apparatus and photomask production |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004157548A JP2004157548A (en) | 2004-06-03 |
| JP2004157548A5 true JP2004157548A5 (en) | 2005-09-22 |
| JP4309751B2 JP4309751B2 (en) | 2009-08-05 |
Family
ID=32827198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003409607A Expired - Fee Related JP4309751B2 (en) | 1997-06-27 | 2003-12-08 | Photomask repair method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4309751B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6849363B2 (en) | 1997-06-27 | 2005-02-01 | Kabushiki Kaisha Toshiba | Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device |
| JP4309752B2 (en) * | 1997-06-27 | 2009-08-05 | 株式会社東芝 | Photomask inspection method, photomask inspection apparatus, and photomask manufacturing method |
| JP2009168524A (en) * | 2008-01-11 | 2009-07-30 | Toshiba Corp | Optical system, device and method for inspecting pattern, and method for manufacturing article with pattern |
| JP6345431B2 (en) * | 2014-02-03 | 2018-06-20 | 株式会社ニューフレアテクノロジー | Illumination device and pattern inspection device |
| JP6768622B2 (en) * | 2017-09-28 | 2020-10-14 | 株式会社ニューフレアテクノロジー | Inspection method and inspection equipment |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63173322A (en) * | 1987-01-13 | 1988-07-16 | Toshiba Corp | Baking device for ic pattern |
| JPH01114035A (en) * | 1987-10-28 | 1989-05-02 | Hitachi Ltd | Aligner |
| DE69208413T2 (en) * | 1991-08-22 | 1996-11-14 | Kla Instr Corp | Device for automatic testing of photomask |
| US5668887A (en) * | 1992-05-29 | 1997-09-16 | Eastman Kodak Company | Coating density analyzer and method using non-synchronous TDI camera |
| JP4309752B2 (en) * | 1997-06-27 | 2009-08-05 | 株式会社東芝 | Photomask inspection method, photomask inspection apparatus, and photomask manufacturing method |
-
2003
- 2003-12-08 JP JP2003409607A patent/JP4309751B2/en not_active Expired - Fee Related
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