JP2004128417A5 - - Google Patents

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Publication number
JP2004128417A5
JP2004128417A5 JP2002294125A JP2002294125A JP2004128417A5 JP 2004128417 A5 JP2004128417 A5 JP 2004128417A5 JP 2002294125 A JP2002294125 A JP 2002294125A JP 2002294125 A JP2002294125 A JP 2002294125A JP 2004128417 A5 JP2004128417 A5 JP 2004128417A5
Authority
JP
Japan
Prior art keywords
electrode
surface treatment
dielectric
treatment apparatus
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002294125A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004128417A (ja
JP3686647B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2002294125A external-priority patent/JP3686647B2/ja
Priority to JP2002294125A priority Critical patent/JP3686647B2/ja
Priority to EP03748739A priority patent/EP1475824A4/en
Priority to KR1020057018940A priority patent/KR20050103251A/ko
Priority to CA002471987A priority patent/CA2471987C/en
Priority to PCT/JP2003/012821 priority patent/WO2004032214A1/ja
Priority to KR1020047010440A priority patent/KR100552378B1/ko
Priority to TW094119296A priority patent/TW200534387A/zh
Priority to TW092127816A priority patent/TWI247353B/zh
Priority to US10/500,317 priority patent/US7819081B2/en
Publication of JP2004128417A publication Critical patent/JP2004128417A/ja
Publication of JP2004128417A5 publication Critical patent/JP2004128417A5/ja
Publication of JP3686647B2 publication Critical patent/JP3686647B2/ja
Application granted granted Critical
Priority to US11/272,157 priority patent/US20060096539A1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2002294125A 2002-10-07 2002-10-07 プラズマ表面処理装置の電極構造 Expired - Fee Related JP3686647B2 (ja)

Priority Applications (10)

Application Number Priority Date Filing Date Title
JP2002294125A JP3686647B2 (ja) 2002-10-07 2002-10-07 プラズマ表面処理装置の電極構造
TW094119296A TW200534387A (en) 2002-10-07 2003-10-07 Plasma film forming system
US10/500,317 US7819081B2 (en) 2002-10-07 2003-10-07 Plasma film forming system
CA002471987A CA2471987C (en) 2002-10-07 2003-10-07 Plasma surface processing apparatus
PCT/JP2003/012821 WO2004032214A1 (ja) 2002-10-07 2003-10-07 プラズマ成膜装置
KR1020047010440A KR100552378B1 (ko) 2002-10-07 2003-10-07 플라즈마 표면 처리 장치의 전극 구조
EP03748739A EP1475824A4 (en) 2002-10-07 2003-10-07 PLASMA FILM FORMATION SYSTEM
TW092127816A TWI247353B (en) 2002-10-07 2003-10-07 Plasma film forming system
KR1020057018940A KR20050103251A (ko) 2002-10-07 2003-10-07 플라즈마 표면 처리 장치
US11/272,157 US20060096539A1 (en) 2002-10-07 2005-11-10 Plasma film forming system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002294125A JP3686647B2 (ja) 2002-10-07 2002-10-07 プラズマ表面処理装置の電極構造

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2005000826A Division JP4361495B2 (ja) 2005-01-05 2005-01-05 プラズマ表面処理装置の電極構造

Publications (3)

Publication Number Publication Date
JP2004128417A JP2004128417A (ja) 2004-04-22
JP2004128417A5 true JP2004128417A5 (enExample) 2005-08-11
JP3686647B2 JP3686647B2 (ja) 2005-08-24

Family

ID=32284817

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002294125A Expired - Fee Related JP3686647B2 (ja) 2002-10-07 2002-10-07 プラズマ表面処理装置の電極構造

Country Status (1)

Country Link
JP (1) JP3686647B2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4650883B2 (ja) * 2004-08-27 2011-03-16 積水化学工業株式会社 プラズマ成膜方法及びプラズマ成膜装置
CN101023713B (zh) * 2004-09-29 2010-09-29 积水化学工业株式会社 等离子加工设备
JP4551290B2 (ja) * 2005-07-22 2010-09-22 積水化学工業株式会社 撥水化用常圧プラズマ処理装置
JP4574387B2 (ja) * 2005-02-21 2010-11-04 積水化学工業株式会社 プラズマ処理装置
JP5500097B2 (ja) * 2011-02-22 2014-05-21 パナソニック株式会社 誘導結合型プラズマ処理装置及び方法
CN103766000B (zh) * 2011-06-03 2018-04-10 株式会社和广武 Cvd装置以及cvd膜的制造方法
WO2013035375A1 (ja) * 2011-09-09 2013-03-14 東芝三菱電機産業システム株式会社 プラズマ発生装置およびｃｖｄ装置
KR102070400B1 (ko) * 2012-06-29 2020-01-28 주성엔지니어링(주) 기판 처리 장치 및 기판 처리 방법

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