JP2004105948A - 材料の吐出方法、及び吐出装置、カラーフィルタの製造方法及び製造装置、液晶装置の製造方法及び製造装置、ｅｌ装置の製造方法及び製造装置、並びに電子機器 - Google Patents
材料の吐出方法、及び吐出装置、カラーフィルタの製造方法及び製造装置、液晶装置の製造方法及び製造装置、ｅｌ装置の製造方法及び製造装置、並びに電子機器 Download PDFInfo
- Publication number
- JP2004105948A JP2004105948A JP2003199990A JP2003199990A JP2004105948A JP 2004105948 A JP2004105948 A JP 2004105948A JP 2003199990 A JP2003199990 A JP 2003199990A JP 2003199990 A JP2003199990 A JP 2003199990A JP 2004105948 A JP2004105948 A JP 2004105948A
- Authority
- JP
- Japan
- Prior art keywords
- manufacturing
- nozzle
- nozzles
- discharge
- nozzle row
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 164
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 102
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 99
- 238000000034 method Methods 0.000 title claims description 121
- 238000007599 discharging Methods 0.000 title claims description 37
- 239000000758 substrate Substances 0.000 claims abstract description 138
- 230000003287 optical effect Effects 0.000 abstract description 11
- 230000005540 biological transmission Effects 0.000 abstract description 7
- 238000010586 diagram Methods 0.000 abstract description 7
- 239000010408 film Substances 0.000 description 54
- 238000002347 injection Methods 0.000 description 22
- 239000007924 injection Substances 0.000 description 22
- 230000008569 process Effects 0.000 description 19
- 238000005192 partition Methods 0.000 description 18
- 239000003086 colorant Substances 0.000 description 15
- 238000000206 photolithography Methods 0.000 description 15
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 11
- 238000004140 cleaning Methods 0.000 description 11
- 239000011159 matrix material Substances 0.000 description 11
- 238000000059 patterning Methods 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 229920005989 resin Polymers 0.000 description 11
- 238000003860 storage Methods 0.000 description 10
- 239000011521 glass Substances 0.000 description 9
- 229920003023 plastic Polymers 0.000 description 8
- 239000004020 conductor Substances 0.000 description 7
- 230000006870 function Effects 0.000 description 7
- 230000001965 increasing effect Effects 0.000 description 7
- 239000000956 alloy Substances 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 239000004033 plastic Substances 0.000 description 6
- 239000003566 sealing material Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 238000005520 cutting process Methods 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 230000032258 transport Effects 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 230000003028 elevating effect Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000011090 industrial biotechnology method and process Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 239000005871 repellent Substances 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Images
Landscapes
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Ink Jet (AREA)
- Optical Filters (AREA)
- Electroluminescent Light Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003199990A JP2004105948A (ja) | 2000-11-21 | 2003-07-22 | 材料の吐出方法、及び吐出装置、カラーフィルタの製造方法及び製造装置、液晶装置の製造方法及び製造装置、ｅｌ装置の製造方法及び製造装置、並びに電子機器 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000354543 | 2000-11-21 | ||
| JP2003199990A JP2004105948A (ja) | 2000-11-21 | 2003-07-22 | 材料の吐出方法、及び吐出装置、カラーフィルタの製造方法及び製造装置、液晶装置の製造方法及び製造装置、ｅｌ装置の製造方法及び製造装置、並びに電子機器 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001294726A Division JP3491155B2 (ja) | 2000-11-21 | 2001-09-26 | 材料の吐出方法、及び吐出装置、カラーフィルタの製造方法及び製造装置、液晶装置の製造方法及び製造装置、ｅｌ装置の製造方法及び製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004105948A true JP2004105948A (ja) | 2004-04-08 |
| JP2004105948A5 JP2004105948A5 (enrdf_load_stackoverflow) | 2008-08-14 |
Family
ID=32300089
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003199990A Pending JP2004105948A (ja) | 2000-11-21 | 2003-07-22 | 材料の吐出方法、及び吐出装置、カラーフィルタの製造方法及び製造装置、液晶装置の製造方法及び製造装置、ｅｌ装置の製造方法及び製造装置、並びに電子機器 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2004105948A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006289239A (ja) * | 2005-04-08 | 2006-10-26 | Shibaura Mechatronics Corp | 溶液の塗布装置及び塗布方法 |
| US7829135B2 (en) | 2005-06-22 | 2010-11-09 | Canon Kabushiki Kaisha | Method and apparatus for forming multi-layered circuit pattern |
| US7854960B2 (en) | 2006-08-31 | 2010-12-21 | Toppan Printing Co., Ltd. | Method of manufacturing an optical device, a method of manufacturing a color filter and a method of manufacturing an organic electroluminescence device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11248927A (ja) * | 1998-03-03 | 1999-09-17 | Seiko Epson Corp | フィルター製造装置とフィルター製造装置におけるインク重量測定方法 |
| JP2000100572A (ja) * | 1998-07-24 | 2000-04-07 | Seiko Epson Corp | 電界発光素子 |
| JP2000208254A (ja) * | 1999-01-11 | 2000-07-28 | Seiko Epson Corp | 有機ｅｌ素子の製造方法および有機ｅｌ表示装置 |
| WO2000059267A1 (en) * | 1999-03-29 | 2000-10-05 | Seiko Epson Corporation | Composition, method for preparing film, and functional element and method for preparing the same |
| JP2000299189A (ja) * | 1999-02-09 | 2000-10-24 | Sumitomo Chem Co Ltd | 高分子発光素子ならびにそれを用いた表示装置および面状光源 |
-
2003
- 2003-07-22 JP JP2003199990A patent/JP2004105948A/ja active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11248927A (ja) * | 1998-03-03 | 1999-09-17 | Seiko Epson Corp | フィルター製造装置とフィルター製造装置におけるインク重量測定方法 |
| JP2000100572A (ja) * | 1998-07-24 | 2000-04-07 | Seiko Epson Corp | 電界発光素子 |
| JP2000208254A (ja) * | 1999-01-11 | 2000-07-28 | Seiko Epson Corp | 有機ｅｌ素子の製造方法および有機ｅｌ表示装置 |
| JP2000299189A (ja) * | 1999-02-09 | 2000-10-24 | Sumitomo Chem Co Ltd | 高分子発光素子ならびにそれを用いた表示装置および面状光源 |
| WO2000059267A1 (en) * | 1999-03-29 | 2000-10-05 | Seiko Epson Corporation | Composition, method for preparing film, and functional element and method for preparing the same |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006289239A (ja) * | 2005-04-08 | 2006-10-26 | Shibaura Mechatronics Corp | 溶液の塗布装置及び塗布方法 |
| US7829135B2 (en) | 2005-06-22 | 2010-11-09 | Canon Kabushiki Kaisha | Method and apparatus for forming multi-layered circuit pattern |
| US7854960B2 (en) | 2006-08-31 | 2010-12-21 | Toppan Printing Co., Ltd. | Method of manufacturing an optical device, a method of manufacturing a color filter and a method of manufacturing an organic electroluminescence device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3876684B2 (ja) | カラーフィルタの製造方法、カラーフィルタの製造装置、液晶装置の製造方法、液晶装置の製造装置、ｅｌ装置の製造方法、ｅｌ装置の製造装置、材料の吐出方法、ヘッドの制御装置、電子機器 | |
| JP3953776B2 (ja) | 材料の吐出装置、及び吐出方法、カラーフィルタの製造装置及び製造方法、液晶装置の製造装置及び製造方法、ｅｌ装置の製造装置及び製造方法 | |
| US6660332B2 (en) | Methods and apparatus for making color filter by discharging a filter material | |
| JP3491155B2 (ja) | 材料の吐出方法、及び吐出装置、カラーフィルタの製造方法及び製造装置、液晶装置の製造方法及び製造装置、ｅｌ装置の製造方法及び製造装置 | |
| KR100449796B1 (ko) | 컬러 필터의 제조 방법 및 제조 장치, 액정 표시 장치의제조 방법 및 제조 장치, 전계 발광 기판의 제조 방법 및제조 장치, 전계 발광 장치의 제조 방법 및 제조 장치,성막 방법 및 성막장치, 전기광학 장치 및 그 제조 방법과전자 기기 | |
| JP2003159787A (ja) | 吐出方法およびその装置、電気光学装置、その製造方法およびその製造装置、カラーフィルタ、その製造方法およびその製造装置、ならびに基材を有するデバイス、その製造方法およびその製造装置 | |
| JP2003159786A (ja) | 吐出方法およびその装置、電気光学装置、その製造方法およびその製造装置、カラーフィルタ、その製造方法およびその製造装置、ならびに基材を有するデバイス、その製造方法およびその製造装置 | |
| JP3899879B2 (ja) | カラーフィルタの製造方法及び製造装置、液晶装置の製造方法及び製造装置、ｅｌ装置の製造方法及び製造装置、インクジェットヘッドの制御装置、材料の吐出方法及び材料の吐出装置、並びに電子機器 | |
| JP2004004803A (ja) | 材料の吐出方法、及び吐出装置、カラーフィルタの製造方法及び製造装置、液晶装置の製造方法及び製造装置、ｅｌ装置の製造方法及び製造装置、並びに電子機器 | |
| JP2003084126A (ja) | カラーフィルタの製造方法及び製造装置、液晶表示装置の製造方法及び製造装置、ｅｌ発光層配設基板の製造方法及び製造装置、ｅｌ発光装置の製造方法及び製造装置、成膜方法及び成膜装置、電気光学装置及びその製造方法並びに電子機器 | |
| JP4061838B2 (ja) | カラーフィルタ基板、カラーフィルタ基板の製造方法及び液晶装置 | |
| JP3899818B2 (ja) | カラ−フィルタ基板の製造方法 | |
| CN100433406C (zh) | 电致发光基板的制造方法及制造装置与电子装置 | |
| JP3951599B2 (ja) | カラーフィルタ基板、カラーフィルタ基板の製造方法及び液晶装置 | |
| JP4765243B2 (ja) | 材料の吐出方法 | |
| JP2004105948A (ja) | 材料の吐出方法、及び吐出装置、カラーフィルタの製造方法及び製造装置、液晶装置の製造方法及び製造装置、ｅｌ装置の製造方法及び製造装置、並びに電子機器 | |
| JP2009192945A (ja) | 流体噴射ヘッド及び流体噴射装置 | |
| JP2009189953A (ja) | 液状体吐出装置の駆動設定方法、液状体配置方法、カラーフィルタの製造方法、ｅｌ装置の製造方法 | |
| JP2005172928A (ja) | 電気光学装置の製造方法、電気光学装置用基板の製造方法、及び、電気光学装置用基板の製造装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20070403 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080627 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080627 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110712 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110826 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20111220 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120206 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20120306 |